JPS6133253B2 - - Google Patents

Info

Publication number
JPS6133253B2
JPS6133253B2 JP53063596A JP6359678A JPS6133253B2 JP S6133253 B2 JPS6133253 B2 JP S6133253B2 JP 53063596 A JP53063596 A JP 53063596A JP 6359678 A JP6359678 A JP 6359678A JP S6133253 B2 JPS6133253 B2 JP S6133253B2
Authority
JP
Japan
Prior art keywords
polycrystalline silicon
film
silicon film
diffused
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53063596A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54154272A (en
Inventor
Atsushi Ueno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6359678A priority Critical patent/JPS54154272A/ja
Publication of JPS54154272A publication Critical patent/JPS54154272A/ja
Publication of JPS6133253B2 publication Critical patent/JPS6133253B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP6359678A 1978-05-26 1978-05-26 Contact forming method for semiconductor device Granted JPS54154272A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6359678A JPS54154272A (en) 1978-05-26 1978-05-26 Contact forming method for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6359678A JPS54154272A (en) 1978-05-26 1978-05-26 Contact forming method for semiconductor device

Publications (2)

Publication Number Publication Date
JPS54154272A JPS54154272A (en) 1979-12-05
JPS6133253B2 true JPS6133253B2 (it) 1986-08-01

Family

ID=13233800

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6359678A Granted JPS54154272A (en) 1978-05-26 1978-05-26 Contact forming method for semiconductor device

Country Status (1)

Country Link
JP (1) JPS54154272A (it)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57106067A (en) * 1980-12-23 1982-07-01 Toshiba Corp Manufacture of semiconductor device
JPS5780767A (en) * 1980-11-07 1982-05-20 Fujitsu Ltd Semiconductor device and manufacture thereof
JPS5788724A (en) * 1980-11-21 1982-06-02 Fujitsu Ltd Manufacture of semiconductor device
JPS5852872A (ja) * 1981-09-24 1983-03-29 Nec Corp 半導体集積回路装置
JPH0630350B2 (ja) * 1983-01-24 1994-04-20 セイコーエプソン株式会社 半導体装置の製造方法
JPS6089921A (ja) * 1983-10-24 1985-05-20 Rohm Co Ltd 半導体装置の製造方法
JPH07105361B2 (ja) * 1985-12-12 1995-11-13 富士通株式会社 半導体装置の製造方法
JPS62268130A (ja) * 1986-05-15 1987-11-20 Toshiba Corp 半導体装置の製造方法
JPS63112357A (ja) * 1986-10-25 1988-05-17 Akitomo Yano ピンチロ−ル

Also Published As

Publication number Publication date
JPS54154272A (en) 1979-12-05

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