JPS6141773A - 無電解めつき液の添加微粒子分離装置 - Google Patents

無電解めつき液の添加微粒子分離装置

Info

Publication number
JPS6141773A
JPS6141773A JP16259984A JP16259984A JPS6141773A JP S6141773 A JPS6141773 A JP S6141773A JP 16259984 A JP16259984 A JP 16259984A JP 16259984 A JP16259984 A JP 16259984A JP S6141773 A JPS6141773 A JP S6141773A
Authority
JP
Japan
Prior art keywords
plating solution
plating liquid
plating
pulverous
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16259984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0257152B2 (2
Inventor
Toshio Kiyota
清田　利夫
Goro Takashima
高島　伍郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hino Motors Ltd
Original Assignee
Hino Motors Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hino Motors Ltd filed Critical Hino Motors Ltd
Priority to JP16259984A priority Critical patent/JPS6141773A/ja
Publication of JPS6141773A publication Critical patent/JPS6141773A/ja
Publication of JPH0257152B2 publication Critical patent/JPH0257152B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1617—Purification and regeneration of coating baths

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
JP16259984A 1984-07-31 1984-07-31 無電解めつき液の添加微粒子分離装置 Granted JPS6141773A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16259984A JPS6141773A (ja) 1984-07-31 1984-07-31 無電解めつき液の添加微粒子分離装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16259984A JPS6141773A (ja) 1984-07-31 1984-07-31 無電解めつき液の添加微粒子分離装置

Publications (2)

Publication Number Publication Date
JPS6141773A true JPS6141773A (ja) 1986-02-28
JPH0257152B2 JPH0257152B2 (2) 1990-12-04

Family

ID=15757652

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16259984A Granted JPS6141773A (ja) 1984-07-31 1984-07-31 無電解めつき液の添加微粒子分離装置

Country Status (1)

Country Link
JP (1) JPS6141773A (2)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63119669U (2) * 1987-01-28 1988-08-02
JPH02301570A (ja) * 1989-05-15 1990-12-13 C Uyemura & Co Ltd 無電解複合めっき装置
WO2012130491A1 (de) * 2011-03-31 2012-10-04 Dürr Systems GmbH Anlage für das behandeln von werkstücken mit einer prozessflüssigkeit

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63119669U (2) * 1987-01-28 1988-08-02
JPH02301570A (ja) * 1989-05-15 1990-12-13 C Uyemura & Co Ltd 無電解複合めっき装置
WO2012130491A1 (de) * 2011-03-31 2012-10-04 Dürr Systems GmbH Anlage für das behandeln von werkstücken mit einer prozessflüssigkeit
CN103476973A (zh) * 2011-03-31 2013-12-25 杜尔系统有限公司 利用加工液来处理工件的设备
CN103476973B (zh) * 2011-03-31 2016-08-24 杜尔系统有限公司 利用加工液来处理工件的设备

Also Published As

Publication number Publication date
JPH0257152B2 (2) 1990-12-04

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