JPS6144760A - Insulative ceramic composition - Google Patents
Insulative ceramic compositionInfo
- Publication number
- JPS6144760A JPS6144760A JP59166272A JP16627284A JPS6144760A JP S6144760 A JPS6144760 A JP S6144760A JP 59166272 A JP59166272 A JP 59166272A JP 16627284 A JP16627284 A JP 16627284A JP S6144760 A JPS6144760 A JP S6144760A
- Authority
- JP
- Japan
- Prior art keywords
- mol
- sample
- samples
- temperature
- content
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims description 12
- 239000000919 ceramic Substances 0.000 title claims description 7
- 238000010304 firing Methods 0.000 claims description 15
- 230000001590 oxidative effect Effects 0.000 claims description 6
- 229910052573 porcelain Inorganic materials 0.000 description 14
- 238000005452 bending Methods 0.000 description 13
- 239000000843 powder Substances 0.000 description 11
- 238000005245 sintering Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000009413 insulation Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910052681 coesite Inorganic materials 0.000 description 4
- 229910052906 cristobalite Inorganic materials 0.000 description 4
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 229910052682 stishovite Inorganic materials 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 229910052905 tridymite Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229910000807 Ga alloy Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Inorganic Insulating Materials (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は1回路基板の材料となる磁器組成物。[Detailed description of the invention] [Industrial application field] The present invention relates to a ceramic composition that can be used as a material for a circuit board.
特に多層回路基板用の材料として最適な磁器組成物に関
する。In particular, the present invention relates to a ceramic composition suitable as a material for multilayer circuit boards.
電気回路装置の小型化が要求される今日5回路基板は、
益々多層化、小型化、薄型化されてには、高い絶縁性と
高い抗折強度等の緒特性を具備した磁器が使用されてい
る。また、これまでは、多層回路基板の製造コストを下
げる目的で、配線用に比較的安価な導電材料(例えばニ
ッケル等の卑金属)の使用が可能なよう、焼成温度を低
く、かつ非酸化雰囲気で焼成する方法が試みられていた
。Today's 5 circuit boards, which require miniaturization of electrical circuit devices, are
As ceramics become more and more multi-layered, smaller, and thinner, porcelain is used that has properties such as high insulation and high bending strength. In addition, in order to reduce the manufacturing cost of multilayer circuit boards, it has been necessary to lower the firing temperature and use a non-oxidizing atmosphere so that relatively inexpensive conductive materials (for example, base metals such as nickel) can be used for wiring. A firing method was tried.
さらに、基板が薄型化されると、内部回路の配線パター
ンが外部から透けて見えやすくなるため2機密保持の観
点から、遮光性の高い磁器材料が要求される。Furthermore, as the substrate becomes thinner, the wiring pattern of the internal circuit becomes more visible from the outside, so from the viewpoint of maintaining security, a porcelain material with high light-shielding properties is required.
しかし非酸化雰囲気中で焼成される磁器の多くは、焼成
した後の遮光性が低いという特質がある。遮光性を高め
る方法には、磁器基板材料にCub)、jb203 、
V205等の酸化物を加える方法がある。しかし、これ
らを加えた磁器を非酸化雰囲気で焼成すると、磁器の絶
縁抵抗値が低くなってしまうという欠点がある。However, many of the porcelains fired in a non-oxidizing atmosphere have a characteristic of having low light shielding properties after firing. Methods of increasing light shielding include adding ceramic substrate materials such as Cub), jb203,
There is a method of adding an oxide such as V205. However, when porcelain containing these materials is fired in a non-oxidizing atmosphere, there is a drawback that the insulation resistance value of the porcelain becomes low.
本発明は、従来の磁器材料における上記の問題を解決す
べくなされたものであって、′遮光性が高く、かつ絶縁
性の高い磁器組成物を提供することを目的とするもので
ある。The present invention was made to solve the above-mentioned problems with conventional porcelain materials, and aims to provide a porcelain composition that has high light-shielding properties and high insulation properties.
本発明の磁器組成物は、Li2Qを0.5〜10モル%
と、 Ca O,S r O,B a O,Z n O
の一種以上からなる成分を5〜45モル%と、MgOを
1〜40.7モル%と、 A l 203’fc 1
〜40%ル%と+ Z r O2を1〜30.3モル
%と、SiO2を12.8〜65.6モル%と+’ C
r 203を0.3〜7モル%の比率で含有する混合物
を非酸化雰囲気中で焼成してなるものである。The ceramic composition of the present invention contains 0.5 to 10 mol% of Li2Q.
and Ca O, S r O, B a O, Z n O
5 to 45 mol% of a component consisting of one or more of the following, 1 to 40.7 mol% of MgO, Al 203'fc 1
~40% Le% + Z r O2 1-30.3 mol% SiO2 12.8-65.6 mol% +'C
It is obtained by firing a mixture containing 0.3 to 7 mol% of r203 in a non-oxidizing atmosphere.
以下に本発明の実施例として各成分の含有量9異なる磁
器組成物から試料を作製し、それぞれについて実施した
試験結果等について説明する。Below, as an example of the present invention, samples were prepared from porcelain compositions with nine different contents of each component, and the test results and the like conducted on each sample will be described.
まず試料1を例にとって、別表に掲げる試料の作製方法
と条件について説明すると、最初にSiO2粉末を50
.3g、CaC0:+粉末を24.5g、MgO粉末を
3.0g 、Zr O2粉末を1.7g、Al2O+粉
末を5.9g、L 12CO3粉末を10.3g、Cr
203粉末を4.3g宛秤量する。なお、上記Ca、L
iの炭酸塩粉末は、何れも空気中で安定なものを用いた
。First, taking Sample 1 as an example, to explain the preparation method and conditions for the samples listed in the attached table, first, 50% SiO2 powder was
.. 3g, CaC0:+ powder 24.5g, MgO powder 3.0g, Zr O2 powder 1.7g, Al2O+ powder 5.9g, L 12CO3 powder 10.3g, Cr
Weigh 4.3 g of 203 powder. In addition, the above Ca, L
The carbonate powders used in i were all stable in the air.
この秤量した各粉末をボールミルに入れ、約15時間ボ
ールミリングすることにより湿式混合した。The weighed powders were placed in a ball mill and wet mixed by ball milling for about 15 hours.
次ぎに同材料に対して、アクリル樹脂を12重量%、ア
リルスルホン酸を0.5重量%、水を30重量%加えて
攪拌し、スラリーを作製した。次いでこのスラリーから
ドクターブレード法によって長尺な未焼結磁器シートを
作り、これを10ω角に切断した。Next, to the same material, 12% by weight of acrylic resin, 0.5% by weight of allylsulfonic acid, and 30% by weight of water were added and stirred to prepare a slurry. Next, a long unsintered porcelain sheet was made from this slurry by a doctor blade method, and this was cut into 10 ω square pieces.
そしてこの切断された未焼結磁器シートから試験の目的
に従い、3種類の試料を作製した。Three types of samples were prepared from the cut unsintered porcelain sheets according to the purpose of the test.
即ち、上記シートを6枚重ね、 200 kg / c
nlの圧力を加えてラミネートした厚さ0.1cmの板
から。That is, stacking 6 of the above sheets, 200 kg/c
From a 0.1 cm thick plate laminated under a pressure of nl.
直径1.6cmで打ち抜いた円板形の試料と、上記シー
トを12枚重ねて同様にラミネートした厚さ0.2an
の板を長さ3.6CI1.幅0.4CI11の寸法に切
゛断した角柱形の試料と、上記シートを長さ5唾。A disk-shaped sample punched out with a diameter of 1.6 cm and a 0.2 ann thick sample made by stacking 12 of the above sheets and laminating them in the same way.
The length of the board is 3.6CI1. A prismatic sample cut to a width of 0.4 CI11 and the above sheet 5 mm in length.
幅3cmに切断し、Niペーストでその片面のはy中央
に長さ3ca、幅0.03cmの直線をO,’05cm
間隔で平行に5本スクリーン印刷した角板形の試料をそ
れぞれ複数個作製した。Cut it to 3cm wide and use Ni paste to draw a straight line 3ca long and 0.03cm wide in the center of one side of it to O,'05cm.
A plurality of rectangular plate-shaped samples were each produced by screen printing five lines in parallel at intervals.
次いでこれら試料を空気中において600℃まで毎時1
00℃の割合で昇温し、アクリル樹脂等のバインダ成分
を燃焼させた。しかる後、炉の中をN2が97.0容積
%+H2が3.0容積%の還元雰囲気に変えて、 10
00℃の温度を3時間維持して焼成し、試料1を得た。These samples were then heated at 1 hour per hour to 600°C in air.
The temperature was raised at a rate of 0.000C to burn off binder components such as acrylic resin. After that, the inside of the furnace was changed to a reducing atmosphere of 97.0% by volume of N2 + 3.0% by volume of H2.
Sample 1 was obtained by firing while maintaining the temperature at 00°C for 3 hours.
このときの上記焼成温度FTを別表に示した。The above firing temperature FT at this time is shown in the separate table.
そしてこの試料について9次の方法により試験をおこな
った。先ず、電気的特性については。This sample was tested using the following method. First, let's talk about the electrical characteristics.
上記円板形の試料を用い、この両面にインジウム−ガリ
ウム合金を塗布して、直径1 、4 cmの電極を設け
、比誘電率ε、クォリティファクターQ及び抵抗率ρ(
ΩcIn)を測定した。比誘電率εは、25℃の温度下
でIMHzの周波数で測定した静電容量により算出し、
Qは、上記静電容量と同様の条件で測定した。また抵抗
率ρは、500■の直流電圧を印加し、印加開始から6
0秒後の絶縁抵抗値から算出した。Using the disk-shaped sample described above, indium-gallium alloy was coated on both sides, electrodes with a diameter of 1.4 cm were provided, and the relative dielectric constant ε, quality factor Q, and resistivity ρ (
ΩcIn) was measured. The relative dielectric constant ε is calculated from the capacitance measured at a frequency of IMHz at a temperature of 25 ° C.
Q was measured under the same conditions as the capacitance above. In addition, the resistivity ρ is determined by applying a DC voltage of 500μ and 6
Calculated from the insulation resistance value after 0 seconds.
物理的9機械的特性については、厚さ0.2cmの角柱
形の試料を用い、熱膨張係数及び抗折強度τを測定し、
これを別表に示した。熱膨張係数は、20〜500℃の
温度間における線膨張係数α(/’C)を測定し、抗折
強度τは、 JIS−R1601の3点曲げ強さに準じ
て測定した。Physical 9 For mechanical properties, the thermal expansion coefficient and bending strength τ were measured using a prismatic sample with a thickness of 0.2 cm.
This is shown in the attached table. The thermal expansion coefficient was determined by measuring the linear expansion coefficient α (/'C) between 20 and 500°C, and the bending strength τ was determined according to the three-point bending strength of JIS-R1601.
さらに遮光性については、予めNiで片面に5本の線を
引いた角板形の試料を用い、これらの線が裏面から肉眼
で透けて見えないものを遮光性良好とし、透けて見える
ものを遮光性不良とした。Furthermore, regarding the light-shielding property, we used a rectangular plate-shaped sample with five lines drawn on one side with Ni in advance.If these lines cannot be seen through to the naked eye from the back side, the light-shielding property is good; It was determined that the light shielding property was poor.
以下、試料2〜78についても、磁器の組成が別表の各
欄に示すような含有比率となるよう各磁器材料粉末を調
合し、これから上記試料1と同様の方法及び条件で作製
した。但し、焼成温度FTは、各々異なり、別表各欄に
示す温度で実施した。また、こうして作られた各試料に
ついて、試料1と同じ方法1条件で上記の緒特性を測定
し、この内、各試料の線膨張係数α、抗折強度τ、抵抗
率ρ及び遮光性を別表の各欄に示した。なお、数値は何
れも複数個の試料について得られた測定値の平均値を示
した。Hereinafter, for Samples 2 to 78, each porcelain material powder was prepared so that the composition of the porcelain had a content ratio as shown in each column of the attached table, and was produced from this powder in the same manner and under the same conditions as Sample 1 above. However, the firing temperature FT was different and was carried out at the temperatures shown in each column of the attached table. In addition, for each sample made in this way, the above-mentioned properties were measured using the same method and conditions as Sample 1, and the linear expansion coefficient α, bending strength τ, resistivity ρ, and light shielding properties of each sample were shown in the attached table. shown in each column. In addition, all the numerical values showed the average value of the measured value obtained about several samples.
同表から明らかな通り、これら1〜78までの試料は、
何れも焼成温度FTが1250℃以下、線膨張係数αが
6.5X10’/℃以下、抗折強度τが1500 kg
/ cd以上、抵抗率ρが1×1013Ωcm以上で
あり、また遮光性は何れも良好であった。なお、これら
の試料は、何れも比誘電率εが9以下、Qが500〜2
000であり9回路基板材料として実用的な数値を得る
ことができた。なお、これらの具体的な数値の別表への
掲載は省略した。As is clear from the same table, these samples 1 to 78 are
In both cases, the firing temperature FT is 1250°C or less, the linear expansion coefficient α is 6.5X10'/°C or less, and the bending strength τ is 1500 kg.
/ cd or more, the resistivity ρ was 1×10 13 Ωcm or more, and the light shielding properties were all good. Note that these samples all have a dielectric constant ε of 9 or less and a Q of 500 to 2.
000, which is a practical value for 9 circuit board materials. Please note that these specific figures have been omitted from being listed in the attached table.
これに対し、上記の含有比率の要件を満たさない磁器材
料を使用し、上記試料と同し方法及び条件で79〜91
番まで13の試料を作製した。但し、焼成温度FTは、
各々異なり、それぞれ別表各欄に示した温度で実施した
。なお、一部に焼結できる温度幅が狭いために、一般の
工業用の焼成炉では、焼結ができないものがあり、これ
についてはその旨を別表に示した。On the other hand, using a porcelain material that does not meet the requirements for the content ratio above, and using the same method and conditions as the above sample, 79 to 91
Thirteen samples were prepared up to the number. However, the firing temperature FT is
Each test was conducted at a different temperature as shown in each column of the attached table. Note that there are some products that cannot be sintered in a general industrial kiln because the temperature range for sintering is narrow, and these are shown in the attached table.
また、こうして作られた各試料について、上記と同じ方
法2条件で試験を行い、この内、線膨張係数α、抗折強
度τ、抵抗率ρ及び遮光性を別表に示した。In addition, each sample made in this way was tested under the same method and two conditions as above, and the linear expansion coefficient α, bending strength τ, resistivity ρ, and light shielding properties are shown in the attached table.
本発明による磁器組成物の成分を前述のように限定した
理由を、説明すると、tllIね次の通りである。The reason why the components of the porcelain composition according to the present invention are limited as described above is as follows.
(11Si02の含有率が少な過ぎると焼成温度FTが
高くなり、逆に多過ぎると同温度FTが高くなる。(If the content of 11Si02 is too low, the firing temperature FT will be high; if it is too high, the firing temperature FT will be high.
例えば、試料1〜78の中でSiO2の含有量が12.
8モル%と最も少ないのは、試料70であるが、これが
1250℃で焼結できたのに対し、これより少ない10
.0モル%の含有率の試料79では。For example, among samples 1 to 78, the SiO2 content is 12.
Sample 70 has the lowest amount of 8 mol%, but while this could be sintered at 1250°C,
.. In sample 79 with a content of 0 mol%.
焼結に1300℃の温度を要した。一方、試料1〜78
の中でSiO2の含有量が60.0〜65.6モル%と
比較的多いのは、試料1; 5.13.16.32゜
44、55.73.74であるが、これらが何れも10
00〜1200℃の温度で焼□結できたのに対し、これ
より多い68.0モル%の3i02を含有する試料80
では、焼結に1300℃の温度を要した。Sintering required a temperature of 1300°C. On the other hand, samples 1 to 78
Among them, sample 1 has a relatively high SiO2 content of 60.0 to 65.6 mol%; 10
Sample 80 containing 68.0 mol% of 3i02 was able to be sintered at a temperature of 00 to 1200°C.
In this case, a temperature of 1300°C was required for sintering.
(21CaO、SrO、BaO、ZnOの一種以上から
なる成分の含有量が少な過ぎると焼結温度が高<抹り、
逆に多過ぎると焼結可能な温度の幅が狭くなる。(21If the content of components consisting of one or more of CaO, SrO, BaO, and ZnO is too small, the sintering temperature will be too high.
On the other hand, if the amount is too high, the range of temperatures that can be sintered will be narrowed.
例えば、試料1〜78の中でこれら酸化物の総量が5.
0モル%と最も少ないのは、試料12.14゜16〜2
0.22.44及び48であるが、これらが何れも11
00〜1150℃の温度で焼結できたのに対し。For example, among samples 1 to 78, the total amount of these oxides is 5.
Sample 12.14゜16~2 has the smallest amount of 0 mol%.
0.22.44 and 48, but both of these are 11
Whereas it could be sintered at a temperature of 00 to 1150°C.
3.0モル%と上記酸化物の含有量が少ない試料81で
は、焼結に1300℃の温度を要した。一方。Sample 81, which had a low content of the above-mentioned oxides at 3.0 mol %, required a temperature of 1300° C. for sintering. on the other hand.
試料1〜7B+71中テ41.1〜45.0モル%と上
記酸化物が比較的多い試料29.52.77、78が何
れも950〜1050℃の温度で焼結できたが、試料8
2のように、この含有量が50.0モル%とさらに多く
なると、焼結可能な温度の幅が狭く、一般の工業用焼成
炉では焼結させることができなかった。Samples 29, 52, 77 and 78, which had a relatively large amount of the above oxides (41.1 to 45.0 mol%) in Samples 1 to 7B+71, could all be sintered at a temperature of 950 to 1050°C, but Sample 8
When the content is even higher, such as 50.0 mol%, as in No. 2, the range of temperatures at which sintering can be performed is narrow, and sintering cannot be performed in a general industrial kiln.
+3)MgOの含有量が少ないと焼結可能な温度の幅が
狭くなり、逆に多過ぎると焼成温度FTが高くなり、し
かも絶縁性が低下する。+3) If the MgO content is too low, the range of temperatures that can be sintered will be narrow; if it is too high, the firing temperature FT will increase, and the insulation properties will decrease.
例えば、試料1〜78の中でMgOが1.0モル%と最
も少ないのは、2. 3.7〜10. ’13〜15゜
19、21.26.28.30.−32.34〜36.
4F 50.55゜57、59.73.77、78等の
試料であるが、これらが何れも950〜1200℃の温
度で焼結できたのに対し、これ以下の0.1モル%のM
gOを含有する試料83では、焼結可能な温度の幅が狭
り、一般の工業用焼成炉では焼結させることができなか
った。一方、試料1〜78の中で33.2〜40.7モ
ル%とこの含有量が比較的多いのは、試料18゜56、
70であるが、これらが何れも1150〜1250℃の
温度で焼結できたのに対し、これ以上の45.0モル%
のMgOを含む試料84ては、焼結に1350℃の温度
を要した。しかも前者は、抵抗率ρが何れもlXl01
3Ωcm以上あったが、後者は、1×1Q11Ω儂と低
かった。For example, among samples 1 to 78, the one with the lowest MgO content of 1.0 mol% is 2. 3.7-10. '13-15°19, 21.26.28.30. -32.34~36.
Samples such as 4F 50.55゜57, 59.73.77, 78, etc. could all be sintered at a temperature of 950 to 1200°C, but 0.1 mol% M below this temperature
Sample 83 containing gO had a narrow range of temperatures at which it could be sintered, and could not be sintered in a general industrial kiln. On the other hand, among samples 1 to 78, samples 18゜56, 33.2 to 40.7 mol%, and
70, but while all of these could be sintered at a temperature of 1150 to 1250°C, 45.0 mol%
Sample 84 containing MgO required a temperature of 1350° C. for sintering. Moreover, in the former case, the resistivity ρ is lXl01
It was over 3Ωcm, but the latter was as low as 1×1Q11Ωcm.
(41Al’201]は機械的強度に優れ、この量が多
いと抗折強度が高くなるが9反面これが多過ぎると焼成
温度FTが高くなる。(41Al'201) has excellent mechanical strength, and when the amount is large, the bending strength is high, but on the other hand, when it is too large, the firing temperature FT becomes high.
例えば、試料1〜78の中でこの含有量が31.6〜4
0.0と比較的多い試料19.23.49.57.70
では、 2400〜2600kg/cjという高い抗折
強度が得られ、しかも1150〜1250℃の温度で焼
結させることができた。しかし、 45.0モル%とこ
れより多いAl2O3を含む試料85では、抗折強度が
2500 kg / csAと向上する傾向が見られな
いうえ。For example, in samples 1 to 78, this content is 31.6 to 4
Sample 19.23.49.57.70 with a relatively large number of 0.0
In this case, a high bending strength of 2400 to 2600 kg/cj was obtained, and it was possible to sinter at a temperature of 1150 to 1250°C. However, in sample 85 containing Al2O3 higher than this at 45.0 mol%, there is no tendency for the bending strength to improve to 2500 kg/csA.
焼結に1300℃の温度を要した。Sintering required a temperature of 1300°C.
f51 Z r O2の含有量が少ないと絶縁性が低
下し、これが多過ぎると焼成温度FTが高くなる。If the content of f51 Z r O2 is small, the insulation properties will be reduced, and if it is too large, the firing temperature FT will become high.
例えば、試料1〜78の中でZrO2が1.0モル%と
最も少ないのは、1,2,4,6,7゜9、12.13
.16.17.21.23.27.29.31〜33゜
36〜3B、 49. ’52.56.57.60.6
L 65.70.74゜76等の試料であるが、これら
の抵抗率ρが何れもlX1013Ωcm以上あったのに
対し、0.1モル%とこれ以下の含有率の試料86では
、抵抗率ρがlXl0IIΩcIllであった。また、
試料1〜78の中で25.0〜30.3モル%とZrO
2の含有量が比較的多い試料20と58テは、 115
0〜1200℃(7)温度で焼結できたのに対し、これ
以上の33.0モル%の含有量を持つ試料87では、焼
結に1300’cの温度を要した。For example, among samples 1 to 78, the one with the lowest ZrO2 content of 1.0 mol% is 1, 2, 4, 6, 7°9, 12.13
.. 16.17.21.23.27.29.31~33°36~3B, 49. '52.56.57.60.6
Samples such as L 65.70.74゜76 had a resistivity ρ of 1×1013 Ωcm or more, whereas sample 86 with a content of 0.1 mol% or less had a resistivity ρ of was lXl0IIΩcIll. Also,
25.0 to 30.3 mol% and ZrO in samples 1 to 78
Samples 20 and 58, which have a relatively high content of 2, are 115
While it was possible to sinter at a temperature of 0 to 1200°C (7), sample 87 with a higher content of 33.0 mol % required a temperature of 1300'c for sintering.
(61Li20が少な過ぎると熱膨張係数が大きくなり
、逆に多過ぎると絶縁性が低下する。(If the amount of 61Li20 is too small, the thermal expansion coefficient will increase, and if it is too large, the insulation properties will decrease.
゛例えば、試料1〜78の中で0.5〜0.9モル%と
Li2Oの含有量が比較的少ないのは、53゜58、6
4.67、77といった試料であるが、これらの線膨張
係数αが何れも5.8〜6.5 X 10−6/ ”c
以下であるのに対し、これらより少ない0.2モル%の
含有量の試料88では、線膨張係数αが7.2X10−
6/”Cと高くなっている。一方、試料1〜87の中で
Li2Oの含有量が比較的多い1゜9、22.24等の
試料では、抵抗率ρが何れも1×1Q13ΩcII+以
上であるのに対し、同含有率が12.0モル%の試料8
9では、抵抗率ρがlXl0IIΩcmと低かった。゛For example, among samples 1 to 78, the one with a relatively low Li2O content of 0.5 to 0.9 mol% is 53゜58,6
4.67 and 77, both of which have linear expansion coefficients α of 5.8 to 6.5 x 10-6/”c
On the other hand, in sample 88 with a lower content of 0.2 mol%, the linear expansion coefficient α is 7.2X10-
On the other hand, among samples 1 to 87, samples such as 1゜9 and 22.24, which have a relatively high Li2O content, have resistivity ρ of 1×1Q13ΩcII+ or more. In contrast, sample 8 with the same content of 12.0 mol%
9, the resistivity ρ was as low as 1X10IIΩcm.
+71Cr203の含有量が少な過ぎると良好な遮光性
が得られず、逆に多過ぎると抵抗率が低下し、抗折強度
も低下する。If the content of +71Cr203 is too small, good light-shielding properties cannot be obtained, and on the other hand, if it is too large, the resistivity and bending strength will decrease.
例えば、Cr2O3の含有量が0.3モル%と試料1〜
78の中で最も少ない14.15.44: 56等の試
料では、焼結温度が1150〜1250℃、抗折強度が
1700〜1900 kg / cJであり、遮光性も
良好であったが、これが0.1モル%と少ない試料90
では、遮光性が不良となった。また、試料1〜78の中
でCr2O3の含有量が5〜7モル%と比較的多い試料
25.55.57.62.67では、抵抗率ρが何れも
lX1013Ω!以上、抗折強度:<2300〜260
0 kg / C−であったが、これが12モル%の試
料91では、抵抗率ρがlXl0”Ωcmと低く、抗折
強度も1500 kg / ctlと低かった。For example, samples 1 to 1 with a Cr2O3 content of 0.3 mol%
In the sample such as 14.15.44: 56, which is the smallest among 78, the sintering temperature was 1150 to 1250 °C, the bending strength was 1700 to 1900 kg/cJ, and the light shielding property was also good. Sample 90 with a small amount of 0.1 mol%
In this case, the light shielding property was poor. Furthermore, among samples 1 to 78, sample 25.55.57.62.67, which has a relatively large Cr2O3 content of 5 to 7 mol%, has a resistivity ρ of lX1013Ω! Above, bending strength: <2300~260
0 kg/C-, but in sample 91 with 12 mol%, the resistivity ρ was as low as 1X10''Ωcm, and the bending strength was also as low as 1500 kg/ctl.
以上説明した通り1本発明による磁器組成物は、非酸化
雰囲気中において1250℃以下の比較的低い温度で焼
結させることができると同時に。As explained above, the porcelain composition according to the present invention can be sintered at a relatively low temperature of 1250° C. or lower in a non-oxidizing atmosphere.
高い遮光性が得られ、しかも実用上充分な絶縁抵抗が得
られる。従って、低いコストでの基板の製造が可能であ
ると共に、薄型化に対応でき。High light-shielding properties and practically sufficient insulation resistance can be obtained. Therefore, it is possible to manufacture the substrate at low cost, and it is also possible to reduce the thickness of the substrate.
かつ薄型化された基板でも配線パターンの機密性を保持
することができる。Moreover, the confidentiality of the wiring pattern can be maintained even on a thinned board.
Claims (1)
BaO、ZnOの一種以上からなる成分を5〜45モル
%と、MgOを1〜40.7モル%と、Al_2O_3
を1〜40モル%と、ZrO_2を1〜30.3モル%
と、SiO_2を12.8〜65.6モル%と、Cr_
2O_3を0.3〜7モル%の比率で含有する混合物を
非酸化雰囲気中で焼成してなることを特徴とする絶縁性
磁器組成物。0.5 to 10 mol% of Li_2O, CaO, SrO,
5 to 45 mol% of components consisting of one or more of BaO and ZnO, 1 to 40.7 mol% of MgO, and Al_2O_3
1 to 40 mol% and 1 to 30.3 mol% of ZrO_2
, 12.8 to 65.6 mol% of SiO_2, and Cr_
An insulating ceramic composition characterized in that it is made by firing a mixture containing 0.3 to 7 mol% of 2O_3 in a non-oxidizing atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59166272A JPS6144760A (en) | 1984-08-08 | 1984-08-08 | Insulative ceramic composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59166272A JPS6144760A (en) | 1984-08-08 | 1984-08-08 | Insulative ceramic composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6144760A true JPS6144760A (en) | 1986-03-04 |
| JPH0225863B2 JPH0225863B2 (en) | 1990-06-06 |
Family
ID=15828303
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59166272A Granted JPS6144760A (en) | 1984-08-08 | 1984-08-08 | Insulative ceramic composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6144760A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5717474A (en) * | 1980-06-30 | 1982-01-29 | Nippon Electric Co | Multilayer ceramic substrate |
| JPS5945967A (en) * | 1982-09-03 | 1984-03-15 | 日立化成工業株式会社 | Color ceramics for electronic parts |
-
1984
- 1984-08-08 JP JP59166272A patent/JPS6144760A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5717474A (en) * | 1980-06-30 | 1982-01-29 | Nippon Electric Co | Multilayer ceramic substrate |
| JPS5945967A (en) * | 1982-09-03 | 1984-03-15 | 日立化成工業株式会社 | Color ceramics for electronic parts |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0225863B2 (en) | 1990-06-06 |
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