JPS6148793B2 - - Google Patents
Info
- Publication number
- JPS6148793B2 JPS6148793B2 JP54090786A JP9078679A JPS6148793B2 JP S6148793 B2 JPS6148793 B2 JP S6148793B2 JP 54090786 A JP54090786 A JP 54090786A JP 9078679 A JP9078679 A JP 9078679A JP S6148793 B2 JPS6148793 B2 JP S6148793B2
- Authority
- JP
- Japan
- Prior art keywords
- misfet
- misfets
- composite
- unit
- pair
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/83125—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET] the IGFETs characterised by having shared source or drain regions
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9078679A JPS5615079A (en) | 1979-07-16 | 1979-07-16 | Insulated gate field effect transistor couple |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9078679A JPS5615079A (en) | 1979-07-16 | 1979-07-16 | Insulated gate field effect transistor couple |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5615079A JPS5615079A (en) | 1981-02-13 |
| JPS6148793B2 true JPS6148793B2 (de) | 1986-10-25 |
Family
ID=14008272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9078679A Granted JPS5615079A (en) | 1979-07-16 | 1979-07-16 | Insulated gate field effect transistor couple |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5615079A (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2154820B (en) * | 1984-01-23 | 1988-05-25 | Int Rectifier Corp | Photovoltaic relay |
| JPH0642537B2 (ja) * | 1985-11-15 | 1994-06-01 | 株式会社東芝 | 半導体装置 |
| DE3818533C2 (de) * | 1987-06-01 | 1994-05-26 | Mitsubishi Electric Corp | Feldeffekttransistor |
| JP2597749B2 (ja) * | 1990-11-19 | 1997-04-09 | 三菱電機株式会社 | ピークホールド回路 |
-
1979
- 1979-07-16 JP JP9078679A patent/JPS5615079A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5615079A (en) | 1981-02-13 |
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