JPS615438A - Production of magnetic storage medium - Google Patents
Production of magnetic storage mediumInfo
- Publication number
- JPS615438A JPS615438A JP12611784A JP12611784A JPS615438A JP S615438 A JPS615438 A JP S615438A JP 12611784 A JP12611784 A JP 12611784A JP 12611784 A JP12611784 A JP 12611784A JP S615438 A JPS615438 A JP S615438A
- Authority
- JP
- Japan
- Prior art keywords
- magnetite
- torr
- iron oxide
- sputtering
- oxidation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 34
- 230000003647 oxidation Effects 0.000 claims abstract description 15
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 15
- 238000004544 sputter deposition Methods 0.000 claims abstract description 15
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000000654 additive Substances 0.000 claims abstract description 8
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 6
- 229910000859 α-Fe Inorganic materials 0.000 claims abstract description 3
- 239000010409 thin film Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 8
- 230000003247 decreasing effect Effects 0.000 abstract 3
- 238000005336 cracking Methods 0.000 abstract 2
- 229910006297 γ-Fe2O3 Inorganic materials 0.000 abstract 2
- 229910000838 Al alloy Inorganic materials 0.000 abstract 1
- 230000000996 additive effect Effects 0.000 abstract 1
- 238000007743 anodising Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010407 anodic oxide Substances 0.000 description 1
- 229910001566 austenite Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は磁気ディスク装置等において記録媒体として用
いられる酸化鉄磁性薄膜の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing an iron oxide magnetic thin film used as a recording medium in a magnetic disk device or the like.
(従来技術とその問題点)
磁気記録装置における記録密度の向上は斯界の変わらぬ
趨勢であり、これを実現する為ζこは磁気記録体の薄層
化、薄膜化が不可欠である。(Prior art and its problems) Improving the recording density in magnetic recording devices is a constant trend in the field, and in order to achieve this, it is essential to make the magnetic recording medium thinner and thinner.
そこで、高性能磁気記録体として薄膜化が容易な連続薄
膜媒体、特に酸化鉄磁性薄膜が注目されている。その理
由は、(1)残留磁束密度が小さく、媒体ノイズが小さ
い、(2)機械的強度と化学的安定性に富み、金属薄膜
に必要とされる保護膜を必要とせず、その結果、f3)
Ia気ヘッド−媒体間がより小さく出来高密度と低価格
化に適しているという点にある。Therefore, continuous thin film media that can be easily made thin, particularly iron oxide magnetic thin films, are attracting attention as high-performance magnetic recording bodies. The reasons for this are (1) low residual magnetic flux density and low media noise; (2) high mechanical strength and chemical stability; no protective film required for metal thin films; )
The advantage is that the distance between the Ia head and the medium can be made smaller, making it suitable for high density and low cost.
これらの酸化鉄磁性薄膜の形成法として種々提案されて
いるが、特開昭58−4914に見られるようにFe5
0.焼結体をターゲットとし、スパッタ法により直接F
e、0.を主成分とする酸化鉄磁性薄膜を形成し、これ
を熱酸化し1− Fe、0.を主成分とする酸化鉄磁性
薄膜とする方法が簡便で量産性に適している。ここに山
いられる基板としては一般(こM合金上に陽極酸化膜を
被覆した基板が用いられている。しかし磁性膜のγ−F
e、03化工程におけ化工酸化処理温度によってはM合
金と酸化被覆層との熱膨張の差によってクラックの発生
や、熱処理による基板の変化による影響で記録媒体の8
/N低下などの問題が生じるため1−Fe、03化処理
温度は出来るだけ低い方が望ましい。Various methods have been proposed for forming these iron oxide magnetic thin films, but Fe5
0. Using a sintered body as a target, F is applied directly by sputtering.
e, 0. An iron oxide magnetic thin film containing 1-Fe, 0. The method of forming an iron oxide magnetic thin film mainly composed of is simple and suitable for mass production. The substrate that can be used here is generally a substrate made of an M alloy coated with an anodic oxide film.However, the magnetic film γ-F
e.Depending on the chemical oxidation treatment temperature in the 03 process, cracks may occur due to the difference in thermal expansion between the M alloy and the oxide coating layer, and the change in the substrate due to heat treatment may cause the recording medium to 8
Since problems such as /N reduction occur, it is desirable that the 1-Fe, O3 treatment temperature be as low as possible.
(発明の目的)
本発明はこのような従来の欠点を除去せしめて熱酸化処
理温度を低減させ高性能な磁気記録体を提供することに
ある、
(発明の構成)
マグネタイトを主成分とするフェライトもしくは添加物
を含むマグネタイトをターゲットとし、スパッタリング
により基板上にマグネタイトもしくは添加物を含むマグ
ネタイトを主成分とする酸化鉄連続薄膜を形成した後、
熱酸化しγ−Fe、01もしくはr−Fe、O,(!:
Fe50.を主成分とする、またはこれらに添加物を
含む酸化鉄連続薄膜を形成する製造方法において酸化鉄
連続薄膜の形成時のスパッタ圧力を高スパッタ圧力から
低スパツタ圧力へ段階晶にもしくは連続的に変えること
を特徴とする磁気記憶体の製造方法が得られる。(Objective of the Invention) The present invention is to provide a high-performance magnetic recording medium by eliminating such conventional drawbacks and reducing the thermal oxidation treatment temperature. (Structure of the Invention) Ferrite whose main component is magnetite Alternatively, after forming a continuous thin film of iron oxide whose main component is magnetite or magnetite containing additives on the substrate by sputtering using magnetite containing additives as a target,
Thermal oxidation γ-Fe, 01 or r-Fe, O, (!:
Fe50. In a manufacturing method for forming a continuous thin film of iron oxide containing iron oxide as a main component or containing additives therein, the sputtering pressure during formation of a continuous thin film of iron oxide is changed stepwise or continuously from high sputtering pressure to low sputtering pressure. A method for manufacturing a magnetic memory body characterized by the following is obtained.
(構成の詳細な説明)
本発明は、上述の方法をとることにより従来技術の問題
点を解決した。すなわち、酸化鉄連続薄膜の形成時のス
パッタ圧力を上げる程酸化度の高い膜が得られ、これを
熱酸化すると酸化度の高い膜程低い温度でr−Fe、0
3が得られる。したかって本方法のように膜形成時に酸
化度の高い組成の膜を酸化が遅い下層へ設けることによ
って膜全体の酸化を容易に促進させることが出来る。(Detailed Description of Configuration) The present invention solves the problems of the prior art by taking the above-described method. In other words, the higher the sputtering pressure during the formation of a continuous iron oxide thin film, the higher the degree of oxidation will be obtained, and when this is thermally oxidized, the film with a higher degree of oxidation will undergo r-Fe, 0 at a lower temperature.
3 is obtained. Therefore, by providing a film having a composition with a high degree of oxidation on a lower layer where oxidation is slow during film formation as in the present method, oxidation of the entire film can be easily promoted.
(実施例) 以下本発明の実施例について説明する。(Example) Examples of the present invention will be described below.
まず、酸化鉄連続薄膜の形成時のスパッタ圧PArを高
スパッタ圧力からI X 1O−2Thrr 、 4
Xl0−3”rr W 2 X 1O−3Torrと低
スパツタ圧力へ3段階圧力を変化させて形成した試料1
. I XIO”Torr S、□か
ら連続的に2 X 10 ”Torr へ圧力を変化
させて形成した試料25次に比較例として圧力2XlO
−3Torr 一定で形成した場合の試料3を作製した
、スパッタターゲットには2wt%Co 、 3wt%
Cuを含有したマグネタイトを用い、酸化鉄連続薄膜の
厚さ0.18μmとした。First, the sputtering pressure PAr during formation of a continuous iron oxide thin film is changed from high sputtering pressure to I X 1O-2Thrr, 4
Sample 1 formed by changing the pressure in 3 steps to a low sputtering pressure of Xl0-3”rr W 2 X 1O-3Torr
.. Sample 25 was formed by continuously changing the pressure from I XIO" Torr S, □ to 2
Sample 3 was prepared when forming at a constant -3 Torr, and the sputter target contained 2 wt% Co and 3 wt%
Magnetite containing Cu was used, and the thickness of the iron oxide continuous thin film was 0.18 μm.
試料1〜3を大気中で260℃(試料3については26
0℃と300℃以上で)1時間熱酸化した0表に熱酸化
後のそれぞれの薄膜の電気抵抗を示した。Samples 1 to 3 were heated at 260°C in the air (260°C for sample 3).
Table 1 shows the electrical resistance of each thin film after thermal oxidation.
表
(発明の効果)
以上のように本発明によれば従来より大幅に熱酸化温度
を低減でき、クラック発生や8/N低下を防止できた。Table (Effects of the Invention) As described above, according to the present invention, the thermal oxidation temperature can be significantly reduced compared to the conventional method, and crack generation and 8/N reduction can be prevented.
Claims (1)
を含むマグネタイトをターゲットとし、スパッタリング
により基板上にマグネタイトもしくは添加物を含むマグ
ネタイトを主成分とする酸化鉄連続薄膜を形成した後、
熱酸化しγ−Fe_2O_3もしくはγ−Fe_2O_
3とFe_3O_4を主成分とするまたはこれらに添加
物を含む酸化鉄連続薄膜を形成する製造方法において、
酸化鉄連続薄膜の形成時のスパッタ圧力を高圧力から低
圧力へ段階的にもしくは連続的に変えることを特徴とす
る磁気記憶体の製造方法。After forming a continuous thin film of iron oxide mainly composed of magnetite or magnetite containing additives on a substrate by sputtering using ferrite containing magnetite as a main component or magnetite containing additives as a target,
Thermal oxidation γ-Fe_2O_3 or γ-Fe_2O_
In a manufacturing method for forming a continuous iron oxide thin film mainly composed of 3 and Fe_3O_4 or containing additives thereto,
A method for manufacturing a magnetic memory body, characterized in that the sputtering pressure during the formation of a continuous iron oxide thin film is changed stepwise or continuously from a high pressure to a low pressure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12611784A JPS615438A (en) | 1984-06-19 | 1984-06-19 | Production of magnetic storage medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12611784A JPS615438A (en) | 1984-06-19 | 1984-06-19 | Production of magnetic storage medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS615438A true JPS615438A (en) | 1986-01-11 |
| JPH0552567B2 JPH0552567B2 (en) | 1993-08-05 |
Family
ID=14927057
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12611784A Granted JPS615438A (en) | 1984-06-19 | 1984-06-19 | Production of magnetic storage medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS615438A (en) |
-
1984
- 1984-06-19 JP JP12611784A patent/JPS615438A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0552567B2 (en) | 1993-08-05 |
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