JPS6156614B2 - - Google Patents

Info

Publication number
JPS6156614B2
JPS6156614B2 JP52115112A JP11511277A JPS6156614B2 JP S6156614 B2 JPS6156614 B2 JP S6156614B2 JP 52115112 A JP52115112 A JP 52115112A JP 11511277 A JP11511277 A JP 11511277A JP S6156614 B2 JPS6156614 B2 JP S6156614B2
Authority
JP
Japan
Prior art keywords
semiconductor substrate
photoresist layer
methyl alcohol
wafer
removal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52115112A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5449071A (en
Inventor
Kinnosuke Okutsu
Sakae Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP11511277A priority Critical patent/JPS5449071A/ja
Publication of JPS5449071A publication Critical patent/JPS5449071A/ja
Publication of JPS6156614B2 publication Critical patent/JPS6156614B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP11511277A 1977-09-27 1977-09-27 Processing method by aqueous solution of photo resist layer Granted JPS5449071A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11511277A JPS5449071A (en) 1977-09-27 1977-09-27 Processing method by aqueous solution of photo resist layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11511277A JPS5449071A (en) 1977-09-27 1977-09-27 Processing method by aqueous solution of photo resist layer

Publications (2)

Publication Number Publication Date
JPS5449071A JPS5449071A (en) 1979-04-18
JPS6156614B2 true JPS6156614B2 (cs) 1986-12-03

Family

ID=14654525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11511277A Granted JPS5449071A (en) 1977-09-27 1977-09-27 Processing method by aqueous solution of photo resist layer

Country Status (1)

Country Link
JP (1) JPS5449071A (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57173660U (cs) * 1981-04-28 1982-11-01
JPS58158440U (ja) * 1982-04-16 1983-10-22 沖電気工業株式会社 ウエハ洗浄装置

Also Published As

Publication number Publication date
JPS5449071A (en) 1979-04-18

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