JPS6159255A - Method for measuring electric resistance of thin film on conductive substrate - Google Patents
Method for measuring electric resistance of thin film on conductive substrateInfo
- Publication number
- JPS6159255A JPS6159255A JP18038284A JP18038284A JPS6159255A JP S6159255 A JPS6159255 A JP S6159255A JP 18038284 A JP18038284 A JP 18038284A JP 18038284 A JP18038284 A JP 18038284A JP S6159255 A JPS6159255 A JP S6159255A
- Authority
- JP
- Japan
- Prior art keywords
- film
- corona discharge
- thin film
- conductive substrate
- aluminum plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 12
- 239000010409 thin film Substances 0.000 title claims description 22
- 239000000758 substrate Substances 0.000 title claims description 19
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 17
- 229910052782 aluminium Inorganic materials 0.000 abstract description 16
- 238000005259 measurement Methods 0.000 abstract description 13
- 239000010408 film Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229940099259 vaseline Drugs 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000003923 scrap metal Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/041—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Abstract
Description
【発明の詳細な説明】
発明の分野
本発明は、導電性基質上の薄膜の電気抵抗を測定する方
法に関するもので、より詳細釦は金属アルミ上の酸化ア
ルミ被膜のような薄膜の電気抵抗を、精度よ（且つ再現
性をもって簡便に測定する方法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for measuring the electrical resistance of thin films on conductive substrates, and more particularly to methods for measuring the electrical resistance of thin films, such as aluminum oxide coatings on metallic aluminum. , relates to a method for easily measuring accuracy (and reproducibility).
従来の技術及び発明の技術的課題
電子写真感光板の導電性基質としては、アルミニウム板
等が広く使用されているが、このアルミニウム板には被
覆層との密着性を高める目的で積極的く陽極酸化処理に
よる酸化膜を形成させており、或いはこのような処理を
行わない場合にも必然的に薄い酸化膜が形成されている
。この酸化膜に金属アルミニウムそのもの忙比べればは
るかに高抵抗であり、感光板製造の工種管理上、酸化膜
の電気抵抗を正確に案測することが重要となる。Prior Art and Technical Problems of the Invention Aluminum plates and the like are widely used as conductive substrates for electrophotographic photosensitive plates. An oxide film is formed by oxidation treatment, or even when such treatment is not performed, a thin oxide film is inevitably formed. This oxide film has a much higher resistance than metal aluminum itself, and it is important to accurately measure the electrical resistance of the oxide film in order to manage the type of work in photosensitive plate manufacturing.
従来、このような酸化物薄層の電気抵抗を測定するには
、この薄層表面くワセリンや銀ペーストを塗布し、電極
を密着させてその抵抗値を測定する方法や、酸化物薄層
を切削し、この切削値の固有抵抗値を測定する方法等が
知られている。Conventionally, the electrical resistance of such a thin oxide layer has been measured by coating the surface of this thin layer with vaseline or silver paste, and then measuring the resistance value by adhering an electrode to the surface of the thin oxide layer. A method of cutting the material and measuring the specific resistance value of the cutting value is known.
しかしながら、前者の方法では、ワセリンや銀ペースト
の塗布の仕方により測定値が太き（変動し、信頼性のあ
る値が得られず、また値の再現性も乏しい。更に、感光
ドラム基板のように曲率を有する場合には、測定そのも
のが困難である。However, with the former method, the measured value is large (varies) due to the way the Vaseline or silver paste is applied, making it impossible to obtain a reliable value, and the reproducibility of the value is also poor. If the surface has a curvature, the measurement itself is difficult.
また、後者の測定法は、測定サンプルが破壊されるとい
う問題があると共に、粉体の充填率により測定値が異な
り、間接的測定法たる非難を免れない。Furthermore, the latter measurement method has the problem that the measurement sample is destroyed, and the measured value varies depending on the powder filling rate, so it cannot avoid being criticized as an indirect measurement method.
発明の目的
従って、本発明の目的は、酸化物薄層の如き導電性基質
上の高抵抗＊ｉの電気抵抗を、簡単に且つ再現性良く測
定し得る方法を提供するにある。OBJECTS OF THE INVENTION Accordingly, it is an object of the present invention to provide a method for easily and reproducibly measuring the electrical resistance of high resistance*i on a conductive substrate such as a thin oxide layer.
本発明の他の目的は、コロナ放電による流れ込み電流値
を、導電性基質上の薄膜の電気抵抗の測定に利用する方
法を提供するにある。Another object of the present invention is to provide a method of utilizing the inflow current value due to corona discharge to measure the electrical resistance of a thin film on a conductive substrate.
発明の構成
本発明によれば、表面に薄膜を有する導電性基質を、薄
膜の側から一定電圧の直流コ四す放電に付して、導電性
基質とアースとの間に流れる電流値（ｈ）を測定し、表
面に薄膜を有しない以外は同じ導電性基質を対照として
直流コロナ放電に付して導電性基質とアースとの間に流
れる電流値（嶋）を測定し、これらの電流値からｆｓ膜
の電気抵抗値を算出することを特徴とする・導電性基質
上の薄膜の電気抵抗測定法が提供される。Structure of the Invention According to the present invention, a conductive substrate having a thin film on its surface is subjected to a constant voltage direct current discharge from the thin film side, and the value of the current flowing between the conductive substrate and the earth (h ), and using a conductive substrate that is the same except that it does not have a thin film on its surface as a control, subject it to DC corona discharge and measure the current value (shima) flowing between the conductive substrate and the ground, and calculate the current value. A method for measuring the electrical resistance of a thin film on a conductive substrate is provided, which is characterized in that the electrical resistance value of the fs film is calculated from the following.
発明の好適態様
本発明を、添付図面に示す具体例に基づき、以下に詳細
に説明する。PREFERRED EMBODIMENTS OF THE INVENTION The present invention will be described in detail below based on specific examples shown in the accompanying drawings.
測定原理
本発明の測定に用いる各部材の配置を示す第１図におい
て、表面に酸化物薄膜１を備えたアルミ板２から成る試
料６を、アースから絶縁した状態で保持し、アルミ板２
とアースとの間に電流計４を接続させる。試料６の薄層
１の側に小間隔をおいてコロナ放電極５を配置し、放電
極５を定電圧電源６に接続する。Measurement principle In FIG. 1 showing the arrangement of each member used in the measurement of the present invention, a sample 6 consisting of an aluminum plate 2 with an oxide thin film 1 on its surface is held in a state insulated from earth, and the aluminum plate 2 is
Connect an ammeter 4 between the terminal and ground. A corona discharge electrode 5 is placed on the side of the thin layer 1 of the sample 6 at a small interval, and the discharge electrode 5 is connected to a constant voltage power source 6.
測定に際して先ず、試料３に代えて酸化物薄膜のないア
ルミ板を対照として、コロナ放電を行い、流れ込み電流
値（ｔｌ）を電流計４により求める。In the measurement, corona discharge is first performed using an aluminum plate without an oxide thin film as a control instead of sample 3, and the inflow current value (tl) is determined using an ammeter 4.
次いで、対照アルミ板に代えて試料６をセットし、同じ
条件下にコロナ放電を行い、電流計４により流れ込み電
流値（ｌ１）を測定する。Next, a sample 6 is set in place of the control aluminum plate, corona discharge is performed under the same conditions, and the inflow current value (l1) is measured using the ammeter 4.
これらの電流値Ｇｗ’！から、薄膜１の電気抵抗値が次
のように算出される。先ず、第２図は対照アルミ板を用
いコロナ放電を行った場合の等価回路図であり、定電圧
電源６の電圧なｒ（ボルト）、コロナ放電時の空気抵抗
なＡ（Ω）とすると、電流値’１（アンペア）との関係
は、下記式（１）％式％（１）
一方、第６図は薄膜を備えたアルミ板を用い、コロナ放
電を行った場合の等価回路図であり、薄膜１の電気抵抗
Ｂ（Ω）と、電流値’１＊’ｔ との関係は、次式（
２）
％式％
今、コロナ放電面の面積をＳｃｍ”、 ′Ｒ膜１の厚
みをＬｃｍとすると、抵抗率ρ（Ω−α〕は式（３）％
式％（３）
として算出される。These current values Gw'! From this, the electrical resistance value of the thin film 1 is calculated as follows. First, Figure 2 is an equivalent circuit diagram when corona discharge is performed using a control aluminum plate, where the voltage of the constant voltage power supply 6 is r (volt), and the air resistance during corona discharge is A (Ω). The relationship with the current value '1 (ampere) is expressed by the following formula (1)% formula % (1) On the other hand, Figure 6 is an equivalent circuit diagram when corona discharge is performed using an aluminum plate with a thin film. , the relationship between the electrical resistance B (Ω) of the thin film 1 and the current value '1*'t is expressed by the following equation (
2) % Formula % Now, if the area of the corona discharge surface is Scm'' and the thickness of the 'R film 1 is Lcm, the resistivity ρ (Ω-α) is calculated using the formula (3)%
It is calculated as the formula % (3).
ｇ護死１
本発明の測定方法では、コロナ放電時の薄膜を通して導
電性基質への流れ込み電流値を測定するため、薄膜と電
極とが非接触の状態で測定が行われ、その抵抗値が薄膜
の表面状態に左右されないという顕著な利点がある。ま
た、流れ込み電流値は、定常状態では一定して精度良く
実測され、また定電圧電源の電圧も精度良（求められる
ので、電気抵抗の測定が良好な精度と再現性とをもって
、簡便に行われるという利点がある。これらの事実は後
述する例を参照することにより容易に了解されよう。g Death protection 1 In the measurement method of the present invention, in order to measure the value of current flowing into the conductive substrate through the thin film during corona discharge, the measurement is performed with the thin film and the electrode not in contact with each other, and the resistance value of the thin film is measured. It has the distinct advantage of being independent of surface conditions. In addition, the inflow current value is measured consistently and accurately in a steady state, and the voltage of a constant voltage power supply is also required to be accurately measured, making it possible to easily measure electrical resistance with good accuracy and reproducibility. These facts will be easily understood by referring to the examples described below.
発明の用途
本発明を陽極酸化によるアルミ酸化物薄膜の場合を例に
とって説明したが、本発明の測定法はこの場合にのみ限
定されない。Applications of the Invention Although the present invention has been described using an example of an aluminum oxide thin film formed by anodic oxidation, the measuring method of the present invention is not limited to this case.
即ち、本発明は種々の被膜を有する導電性基質に適用で
きる。例えば、種々の表面処理金屑板、特にクロメート
処理鋼板の如き化成処理板或いは電解処理板、スパッタ
リング、真空蒸着、プラズマＣＶＤ （化学蒸着法）、
イオン注入法等による種々の表面処理板の薄１ｉＬｖ電
気抵抗測定に広（適用することが可能である。That is, the present invention is applicable to conductive substrates having various coatings. For example, various surface-treated scrap metal plates, especially chemically treated plates or electrolytically treated plates such as chromate-treated steel plates, sputtering, vacuum deposition, plasma CVD (chemical vapor deposition),
It can be widely applied to the measurement of thin 1iLv electrical resistance of various surface-treated plates by ion implantation, etc.
実施例 本発明と次の例で説明する。Example The invention is illustrated in the following example.
測定試料Ａ
厚さ１朋のアルミニウム板の片面に陽極酸化処理を行な
い、厚さ１１．０μのアルマイ１１を設けた。Measurement Sample A One side of an aluminum plate with a thickness of 1 mm was anodized, and an aluminum plate 11 with a thickness of 11.0 μm was provided.
電気抵抗測定
測定試料Ａを第２図に従って、下記の条件で流れ込み電
流値！２を、また同一条件下で未処理のアルミニウム板
の流れ込み電流値ｉ１を測定した。Electrical Resistance Measurement Measure the inflow current value of measurement sample A under the following conditions according to Figure 2! 2, and the inflow current value i1 of an untreated aluminum plate was measured under the same conditions.
定電圧電源電圧ｒ士４．６４ ＫＶ
コロナ放電面の面漬Ｓ ＝ １．８ （ｃｌｒＬ） Ｘ
６． Ｏ（ｃｍ）測定の結果下記の通りであった。Constant voltage power supply voltage r 4.64 KV Surface immersion of corona discharge surface S = 1.8 (clrL)
6. The results of O (cm) measurement were as follows.
上記の測定値から、式（３）に従い、抵抗率ρ（Ω−ｃ
ｒｎ）を算出したところ、
ρ＝９．０７ｘｌＯ” （Ω−工ン
であった。From the above measured values, according to equation (3), resistivity ρ(Ω-c
rn) was calculated, and it was found that ρ=9.07xlO'' (Ω-engine).
また、同一の試料に対して〆をＶ＝５．０８ＫＶに変更
する以外はまったく同一の方法で、ｉＩ １ ’！を測
定した。Also, for the same sample, iI 1'! was measured.
その結果は
であった。これから抵抗率ρ（Ω−ｃｒｒＬ）を測定し
たところ
ρ＝９．０４ｘ１０・ （Ω−ｃｒＩＬ）であり、先の
結果とほとんどかわらず、条件が変化してもほとんど同
一の結果が得られることがわかった。The result was. When we measured the resistivity ρ (Ω-crrL), we found that ρ = 9.04x10・(Ω-crIL), which is almost the same as the previous result, and shows that almost the same results can be obtained even if the conditions change. Understood.
第１図は、本発明の測定に用いる各部材の配置を示し、
＠２図は、対照アルミ板を用いコロナ放電を行なった場
合の等価回路図、
第３図は、薄膜を備えたアルミ板を用いた場合の等価回
路図である。
側照数字１は′Ｒ膜、２は導電性基質、４は電流計、５
はコロナ放電極、６は定電圧電源な夫々示す。
特許出願人 三田工業株式会社
第１図
第２図
カー
第３図Figure 1 shows the arrangement of each member used in the measurement of the present invention, Figure 2 is an equivalent circuit diagram when corona discharge is performed using a control aluminum plate, and Figure 3 is an aluminum plate with a thin film. FIG. 2 is an equivalent circuit diagram when using Side illumination number 1 is 'R membrane, 2 is conductive substrate, 4 is ammeter, 5
6 indicates a corona discharge electrode, and 6 indicates a constant voltage power supply. Patent applicant: Sanda Kogyo Co., Ltd. Figure 1 Figure 2 Car Figure 3
Claims (1)
一定電圧の直流コロナ放電に付して、導電性基質とアー
スとの間に流れる電流値（ｉ＿２）を測定し、表面に薄
膜を有しない以外は同じ導電性基質を対照として直流コ
ロナ放電に付して導電性基質とアースとの間に流れる電
流値（ｉ＿１）を測定し、これらの電流値から薄膜の電
気抵抗値を算出することを特徴とする導電性基質上の薄
膜の電気抵抗測定法。(1) A conductive substrate with a thin film on its surface is subjected to a DC corona discharge of a constant voltage from the thin film side, and the value of the current (i_2) flowing between the conductive substrate and the ground is measured. A conductive substrate that is the same except that it does not have the same conductive substrate as a control is subjected to DC corona discharge, the current value (i_1) flowing between the conductive substrate and the earth is measured, and the electrical resistance value of the thin film is calculated from these current values. A method for measuring electrical resistance of a thin film on a conductive substrate, characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18038284A JPS6159255A (en) | 1984-08-31 | 1984-08-31 | Method for measuring electric resistance of thin film on conductive substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18038284A JPS6159255A (en) | 1984-08-31 | 1984-08-31 | Method for measuring electric resistance of thin film on conductive substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6159255A true JPS6159255A (en) | 1986-03-26 |
Family
ID=16082256
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18038284A Pending JPS6159255A (en) | 1984-08-31 | 1984-08-31 | Method for measuring electric resistance of thin film on conductive substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6159255A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0385440A (en) * | 1989-08-29 | 1991-04-10 | Yamazaki Seiki Kenkyusho:Kk | Method and apparatus for testing ion penetrability of resin material |
-
1984
- 1984-08-31 JP JP18038284A patent/JPS6159255A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0385440A (en) * | 1989-08-29 | 1991-04-10 | Yamazaki Seiki Kenkyusho:Kk | Method and apparatus for testing ion penetrability of resin material |
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