JPS6161374B2 - - Google Patents

Info

Publication number
JPS6161374B2
JPS6161374B2 JP9452379A JP9452379A JPS6161374B2 JP S6161374 B2 JPS6161374 B2 JP S6161374B2 JP 9452379 A JP9452379 A JP 9452379A JP 9452379 A JP9452379 A JP 9452379A JP S6161374 B2 JPS6161374 B2 JP S6161374B2
Authority
JP
Japan
Prior art keywords
pattern
patterns
reticle
chips
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9452379A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5619051A (en
Inventor
Takao Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9452379A priority Critical patent/JPS5619051A/ja
Publication of JPS5619051A publication Critical patent/JPS5619051A/ja
Publication of JPS6161374B2 publication Critical patent/JPS6161374B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP9452379A 1979-07-25 1979-07-25 Production of photo mask Granted JPS5619051A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9452379A JPS5619051A (en) 1979-07-25 1979-07-25 Production of photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9452379A JPS5619051A (en) 1979-07-25 1979-07-25 Production of photo mask

Publications (2)

Publication Number Publication Date
JPS5619051A JPS5619051A (en) 1981-02-23
JPS6161374B2 true JPS6161374B2 (de) 1986-12-25

Family

ID=14112679

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9452379A Granted JPS5619051A (en) 1979-07-25 1979-07-25 Production of photo mask

Country Status (1)

Country Link
JP (1) JPS5619051A (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56133737A (en) * 1980-03-25 1981-10-20 Fujitsu Ltd Photomask
JPS6275636A (ja) * 1985-09-30 1987-04-07 Hoya Corp 転写マスクとパタ−ン形成方法

Also Published As

Publication number Publication date
JPS5619051A (en) 1981-02-23

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