JPS6163542A - 熱膨脹係数の大きな結晶化ガラスとその製法 - Google Patents

熱膨脹係数の大きな結晶化ガラスとその製法

Info

Publication number: JPS6163542A
Authority: JP; Japan
Prior art keywords: glass; thermal expansion; crystallized glass; expansion coefficient; crystals
Prior art date: 1984-09-03
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP18283484A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0211538B2 (fr

Inventor

Toshiharu Yamashita

俊晴山下

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Hoya Corp

Original Assignee

Hoya Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-09-03

Filing date

1984-09-03

Publication date

1986-04-01

1984-09-03 Application filed by Hoya Corp filed Critical Hoya Corp

1984-09-03 Priority to JP18283484A priority Critical patent/JPS6163542A/ja

1986-04-01 Publication of JPS6163542A publication Critical patent/JPS6163542A/ja

1990-03-14 Publication of JPH0211538B2 publication Critical patent/JPH0211538B2/ja

Status Granted legal-status Critical Current

Links

239000011521 glass Substances 0.000 title claims abstract description 64
239000013078 crystal Substances 0.000 claims abstract description 36
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 17
WVMPCBWWBLZKPD-UHFFFAOYSA-N dilithium oxido-[oxido(oxo)silyl]oxy-oxosilane Chemical compound [Li+].[Li+].[O-][Si](=O)O[Si]([O-])=O WVMPCBWWBLZKPD-UHFFFAOYSA-N 0.000 claims abstract description 14
229910052912 lithium silicate Inorganic materials 0.000 claims abstract description 14
PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 claims abstract description 13
238000002425 crystallisation Methods 0.000 claims abstract description 10
230000008025 crystallization Effects 0.000 claims abstract description 10
229910021489 α-quartz Inorganic materials 0.000 claims abstract description 8
230000008018 melting Effects 0.000 claims abstract description 7
238000002844 melting Methods 0.000 claims abstract description 7
229910052737 gold Inorganic materials 0.000 claims abstract description 3
239000006121 base glass Substances 0.000 claims abstract 3
238000004519 manufacturing process Methods 0.000 claims description 8
239000013081 microcrystal Substances 0.000 claims description 4
239000000126 substance Substances 0.000 abstract description 9
239000002994 raw material Substances 0.000 abstract description 5
238000000034 method Methods 0.000 abstract description 4
239000000203 mixture Substances 0.000 abstract description 4
230000006911 nucleation Effects 0.000 abstract description 4
238000010899 nucleation Methods 0.000 abstract description 4
235000012239 silicon dioxide Nutrition 0.000 abstract description 4
229910052709 silver Inorganic materials 0.000 abstract description 4
KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 abstract description 3
CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 abstract description 3
229910000422 cerium(IV) oxide Inorganic materials 0.000 abstract description 3
229910052906 cristobalite Inorganic materials 0.000 abstract description 3
FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 abstract description 2
229910052681 coesite Inorganic materials 0.000 abstract description 2
XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 abstract description 2
239000000377 silicon dioxide Substances 0.000 abstract description 2
229910052682 stishovite Inorganic materials 0.000 abstract description 2
229910052905 tridymite Inorganic materials 0.000 abstract description 2
230000005855 radiation Effects 0.000 abstract 2
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 abstract 1
229910052593 corundum Inorganic materials 0.000 abstract 1
238000003801 milling Methods 0.000 abstract 1
238000007669 thermal treatment Methods 0.000 abstract 1
229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
239000000758 substrate Substances 0.000 description 13
238000010438 heat treatment Methods 0.000 description 9
239000000463 material Substances 0.000 description 8
238000005520 cutting process Methods 0.000 description 6
239000010409 thin film Substances 0.000 description 6
238000001556 precipitation Methods 0.000 description 5
MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
239000000919 ceramic Substances 0.000 description 4
239000000696 magnetic material Substances 0.000 description 4
230000003746 surface roughness Effects 0.000 description 4
230000000694 effects Effects 0.000 description 3
239000010408 film Substances 0.000 description 3
239000002667 nucleating agent Substances 0.000 description 3
239000011148 porous material Substances 0.000 description 3
239000000843 powder Substances 0.000 description 3
239000002244 precipitate Substances 0.000 description 3
229910052611 pyroxene Inorganic materials 0.000 description 3
KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
229910021607 Silver chloride Inorganic materials 0.000 description 2
229910001035 Soft ferrite Inorganic materials 0.000 description 2
239000002253 acid Substances 0.000 description 2
230000015572 biosynthetic process Effects 0.000 description 2
239000003795 chemical substances by application Substances 0.000 description 2
239000000084 colloidal system Substances 0.000 description 2
238000000151 deposition Methods 0.000 description 2
PMYUVOOOQDGQNW-UHFFFAOYSA-N hexasodium;trioxido(trioxidosilyloxy)silane Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])O[Si]([O-])([O-])[O-] PMYUVOOOQDGQNW-UHFFFAOYSA-N 0.000 description 2
239000011159 matrix material Substances 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
239000006089 photosensitive glass Substances 0.000 description 2
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
238000005498 polishing Methods 0.000 description 2
239000010453 quartz Substances 0.000 description 2
230000035945 sensitivity Effects 0.000 description 2
230000001235 sensitizing effect Effects 0.000 description 2
239000004332 silver Substances 0.000 description 2
HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 2
SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
238000005245 sintering Methods 0.000 description 2
239000006104 solid solution Substances 0.000 description 2
229910000500 β-quartz Inorganic materials 0.000 description 2
BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
150000004649 carbonic acid derivatives Chemical class 0.000 description 1
239000004568 cement Substances 0.000 description 1
229910000420 cerium oxide Inorganic materials 0.000 description 1
238000006243 chemical reaction Methods 0.000 description 1
238000001816 cooling Methods 0.000 description 1
238000005336 cracking Methods 0.000 description 1
230000007423 decrease Effects 0.000 description 1
SMBQBQBNOXIFSF-UHFFFAOYSA-N dilithium Chemical compound [Li][Li] SMBQBQBNOXIFSF-UHFFFAOYSA-N 0.000 description 1
238000004090 dissolution Methods 0.000 description 1
238000009826 distribution Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
150000002222 fluorine compounds Chemical class 0.000 description 1
239000004088 foaming agent Substances 0.000 description 1
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
239000010931 gold Substances 0.000 description 1
150000004679 hydroxides Chemical class 0.000 description 1
229910044991 metal oxide Inorganic materials 0.000 description 1
150000004706 metal oxides Chemical class 0.000 description 1
239000005300 metallic glass Substances 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
230000001394 metastastic effect Effects 0.000 description 1
206010061289 metastatic neoplasm Diseases 0.000 description 1
238000000465 moulding Methods 0.000 description 1
150000002823 nitrates Chemical class 0.000 description 1
239000005304 optical glass Substances 0.000 description 1
BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
239000002245 particle Substances 0.000 description 1
229910000889 permalloy Inorganic materials 0.000 description 1
230000035699 permeability Effects 0.000 description 1
229910052697 platinum Inorganic materials 0.000 description 1
229910052573 porcelain Inorganic materials 0.000 description 1
238000007670 refining Methods 0.000 description 1
229910000702 sendust Inorganic materials 0.000 description 1
239000005368 silicate glass Substances 0.000 description 1
229910001961 silver nitrate Inorganic materials 0.000 description 1
239000000243 solution Substances 0.000 description 1
230000003595 spectral effect Effects 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
230000007704 transition Effects 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1

Landscapes

Glass Compositions (AREA)
Magnetic Record Carriers (AREA)
Magnetic Heads (AREA)

JP18283484A 1984-09-03 1984-09-03 熱膨脹係数の大きな結晶化ガラスとその製法 Granted JPS6163542A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP18283484A JPS6163542A (ja)	1984-09-03	1984-09-03	熱膨脹係数の大きな結晶化ガラスとその製法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP18283484A JPS6163542A (ja)	1984-09-03	1984-09-03	熱膨脹係数の大きな結晶化ガラスとその製法

Publications (2)

Publication Number	Publication Date
JPS6163542A true JPS6163542A (ja)	1986-04-01
JPH0211538B2 JPH0211538B2 (fr)	1990-03-14

Family

ID=16125278

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP18283484A Granted JPS6163542A (ja)	1984-09-03	1984-09-03	熱膨脹係数の大きな結晶化ガラスとその製法

Country Status (1)

Country	Link
JP (1)	JPS6163542A (fr)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH02187922A (ja) *	1989-01-13	1990-07-24	Hitachi Ltd	磁気ディスク用基板およびその製造方法
JPH02196048A (ja) *	1989-01-23	1990-08-02	Itochu Shoji Kk	感光性ガラス
EP0626353A1 (fr) *	1993-05-19	1994-11-30	Kabushiki Kaisha Ohara	Vitro-céramique pour substrat de disque magnétique et son procédé de fabrication
EP0729924A3 (fr) *	1993-05-19	1996-09-25	Ohara Kk
KR100329001B1 (ko) *	1998-02-26	2002-03-20	가지카와 히로시	정보 자기 기억 매체용 고강성 글래스-세라믹 기판
JP2009179518A (ja) *	2008-01-30	2009-08-13	Hoya Corp	結晶化ガラス基板の製造方法及び両面配線基板の製造方法
US7589038B2 (en) *	2005-10-07	2009-09-15	Ohara Inc.	Inorganic composition
US7829489B2 (en) *	2007-05-31	2010-11-09	Corning Incorporated	Low CTE photomachinable glass

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0438666A (ja) *	1990-05-31	1992-02-07	Nakamichi Corp	ディスクプレーヤにおけるトレーのロック装置
JPH0438665A (ja) *	1990-05-31	1992-02-07	Nakamichi Corp	ディスクプレーヤにおけるトレーのロック装置
JPH04302847A (ja) *	1991-03-29	1992-10-26	Sanyo Electric Co Ltd	ディスクプレーヤのトレイ機構

1984
- 1984-09-03 JP JP18283484A patent/JPS6163542A/ja active Granted

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH02187922A (ja) *	1989-01-13	1990-07-24	Hitachi Ltd	磁気ディスク用基板およびその製造方法
JPH02196048A (ja) *	1989-01-23	1990-08-02	Itochu Shoji Kk	感光性ガラス
EP0626353A1 (fr) *	1993-05-19	1994-11-30	Kabushiki Kaisha Ohara	Vitro-céramique pour substrat de disque magnétique et son procédé de fabrication
EP0729924A3 (fr) *	1993-05-19	1996-09-25	Ohara Kk
US5567217A (en) *	1993-05-19	1996-10-22	Kabushiki Kaisya Ohara	Method for manufacturing a crystalized glass magnetic disk substrate
KR100329001B1 (ko) *	1998-02-26	2002-03-20	가지카와 히로시	정보 자기 기억 매체용 고강성 글래스-세라믹 기판
KR100329000B1 (ko) *	1998-02-26	2002-04-10	가지카와 히로시	정보 자기 기억 매체용 고강성 글래스-세라믹 기판
US7589038B2 (en) *	2005-10-07	2009-09-15	Ohara Inc.	Inorganic composition
US7829489B2 (en) *	2007-05-31	2010-11-09	Corning Incorporated	Low CTE photomachinable glass
JP2009179518A (ja) *	2008-01-30	2009-08-13	Hoya Corp	結晶化ガラス基板の製造方法及び両面配線基板の製造方法

Also Published As

Publication number	Publication date
JPH0211538B2 (fr)	1990-03-14

Legal Events

Date	Code	Title	Description
2004-09-03	EXPY	Cancellation because of completion of term

Publication	Publication Date	Title
JP5375608B2 (ja)	2013-12-25	データ記憶媒体基板用ガラス、データ記憶媒体用ガラス基板および磁気ディスク
US4480044A (en)	1984-10-30	High expansion glass-ceramic articles
TW498059B (en)	2002-08-11	High rigidity glass-ceramic substrate for a magnetic information storage medium, method for manufacturing the same, and magnetic information storage disk using the same
KR100329002B1 (ko)	2002-03-20	자기 정보기록매체용 글라스세라믹 기판
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JPH07300340A (ja)	1995-11-14	情報記録ディスク用結晶化ガラス
US5028567A (en)	1991-07-02	Glass-ceramics
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JPH10208226A (ja)	1998-08-07	結晶化ガラス磁気ディスク基板
JPH06329440A (ja)	1994-11-29	磁気ディスク用結晶化ガラスおよびその製造方法
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JPH03164445A (ja)	1991-07-16	透明結晶化ガラス
JP7276645B2 (ja)	2023-05-18	磁気記録媒体用ガラス基板
US4047960A (en)	1977-09-13	Refractory partially crystalline materials with good visible transparency
JP2023538795A5 (fr)	2024-08-05
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JP4273620B2 (ja)	2009-06-03	基板用ガラス
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JP3144820B2 (ja)	2001-03-12	結晶化ガラス
JP2827023B2 (ja)	1998-11-18	結晶化ガラス
CN118591515A (zh)	2024-09-03	经结晶化的无机组成物产品
JPH0421543A (ja)	1992-01-24	結晶化ガラス
JPH07101750A (ja)	1995-04-18	高熱膨張係数を有する結晶化ガラス