JPS618152B2 - - Google Patents

Info

Publication number
JPS618152B2
JPS618152B2 JP7189979A JP7189979A JPS618152B2 JP S618152 B2 JPS618152 B2 JP S618152B2 JP 7189979 A JP7189979 A JP 7189979A JP 7189979 A JP7189979 A JP 7189979A JP S618152 B2 JPS618152 B2 JP S618152B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7189979A
Other languages
Japanese (ja)
Other versions
JPS55164076A (en
Inventor
Toshihiko Osada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7189979A priority Critical patent/JPS55164076A/ja
Publication of JPS55164076A publication Critical patent/JPS55164076A/ja
Publication of JPS618152B2 publication Critical patent/JPS618152B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3435Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP7189979A 1979-06-08 1979-06-08 Method for dry etching Granted JPS55164076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7189979A JPS55164076A (en) 1979-06-08 1979-06-08 Method for dry etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7189979A JPS55164076A (en) 1979-06-08 1979-06-08 Method for dry etching

Publications (2)

Publication Number Publication Date
JPS55164076A JPS55164076A (en) 1980-12-20
JPS618152B2 true JPS618152B2 (2) 1986-03-12

Family

ID=13473837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7189979A Granted JPS55164076A (en) 1979-06-08 1979-06-08 Method for dry etching

Country Status (1)

Country Link
JP (1) JPS55164076A (2)

Also Published As

Publication number Publication date
JPS55164076A (en) 1980-12-20

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