JPS6182305A - Producing for magnetic head - Google Patents

Producing for magnetic head

Info

Publication number
JPS6182305A
JPS6182305A JP20524384A JP20524384A JPS6182305A JP S6182305 A JPS6182305 A JP S6182305A JP 20524384 A JP20524384 A JP 20524384A JP 20524384 A JP20524384 A JP 20524384A JP S6182305 A JPS6182305 A JP S6182305A
Authority
JP
Japan
Prior art keywords
glass
film
gap
layer
magnetic head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20524384A
Other languages
Japanese (ja)
Other versions
JPH0250524B2 (en
Inventor
Makoto Goto
良 後藤
Masaaki Ashizawa
芦沢 正昭
Shigetoshi Morita
森田 重敏
Yoshiro Shimizu
芳郎 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP20524384A priority Critical patent/JPS6182305A/en
Publication of JPS6182305A publication Critical patent/JPS6182305A/en
Publication of JPH0250524B2 publication Critical patent/JPH0250524B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/187Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/193Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features the pole pieces being ferrite or other magnetic particles
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/133Structure or manufacture of heads, e.g. inductive with cores composed of particles, e.g. with dust cores, with ferrite cores with cores composed of isolated magnetic particles
    • G11B5/1335Assembling or shaping of elements
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/187Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/23Gap features
    • G11B5/232Manufacture of gap

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To form a high-precision gap by subjecting the second layer glass to heat treatment at a prescribed temperature for a prescribed time for the purpose of discharging Ax gotten between an SiO2 film and glass films before glass films after sputtering are joined to each other. CONSTITUTION:An SiO2 film 4 and a glass film 5 are formed successively on each of ferrite cores 11 and 12 by the magnetron sputtering method. The SiO2 film is formed with 8,000Angstrom thickness and the glass film is formed with 2,000Angstrom thickness in case of 2mu gap length. These ferrite cores 11 and 12 are butted, and a reinforcing glass 6 is set, an ferrite cores 11 and 12 are heated at 850 deg.C while being press-fitted, thereby forming the gap of a magnetic head. Thus, glasses different in viscosity are used, especially, a glass having a higher viscosity at the press-fitting heating temperature than the glass film 5 is used as he reinforcing glass 6 to suppress effectively the reaction of the glass in an apex part.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、磁気ヘッドの製造方法の改良に係わり、特に
、高精度かつ高信頼性を付与したギャップ形成を可能と
する磁気ヘッドの製造方法に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an improvement in a method for manufacturing a magnetic head, and in particular, a method for manufacturing a magnetic head that enables gap formation with high precision and high reliability. It is related to.

〔従来の技術〕[Conventional technology]

磁気ヘッドのギャップを形成する方法として、2個のフ
ェライトコアーのフロントギャップ構成面にガラス材を
スパッタリングにより膜厚の合計が所定のギヤツブ巾に
等しくなるように付着せしめ、前記両コアーをそのフロ
ントギャップ構成面が前記ガラス層を介して対向する様
に圧接せしめた後、前記ガラスの軟化温度と溶融温度範
囲内にてギャップを形成する方法が、特公昭47−26
336号公報に開示されている。しかしながら、この場
合には、ガラスの軟化温度と溶融温度範囲内にて行々う
熱処理により、2つのコアーのフロントギャップ構成面
間において、全部のガラスが軟化してしまう為に、全面
均一密着が雛かしく、又、ギャップ精度バラツキを少な
く出来力いという欠点があり、又、高速スパッタ法(マ
グネトロン・スパッタ法等)によってガラス層を形成し
た場合には、ガラス層内、又は表面に気泡が発生し、強
度上の問題或いは、磁気ヘッドとして使用中に磁気記録
媒体の破片が気泡内に侵入し、特性劣化の原因と外るな
どの問題が発生した。
As a method of forming a gap in a magnetic head, a glass material is deposited on the front gap forming surfaces of two ferrite cores by sputtering so that the total film thickness is equal to a predetermined gear tooth width, and both cores are attached to the front gap forming surface of the two ferrite cores. A method of forming a gap within the softening temperature and melting temperature range of the glass after the constituent surfaces are brought into pressure contact with each other so as to face each other through the glass layer is disclosed in Japanese Patent Publication No. 47-26.
It is disclosed in Publication No. 336. However, in this case, all the glass between the front gap forming surfaces of the two cores is softened by the heat treatment performed within the range of the softening temperature and melting temperature of the glass, resulting in uniform adhesion over the entire surface. It has the disadvantage that it is difficult to create small gap precision variations, and when a glass layer is formed by high-speed sputtering method (magnetron sputtering method, etc.), air bubbles may be generated within or on the surface of the glass layer. However, problems have arisen, such as strength problems or fragments of the magnetic recording medium entering the bubbles during use as a magnetic head, which is considered to be the cause of characteristic deterioration.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

後者の問題は、特に、ビデオヘッドに比較してギャップ
長の広いフロッピーディスク或いはハードディスク用ヘ
ッドの製造には、生産性の面から考えて、高速スパッタ
法の適用が不可欠であり、それに伴ないガラス層内、又
は表面に気泡が発生する卯1合が急激に多くなるために
、実用上解決をしなければならない重要問題であると考
え、発明者等は、鉛量検討を重ね、本発明に至ったもの
である。
The latter problem is particularly important when manufacturing floppy disk or hard disk heads, which have wider gap lengths than video heads, from the viewpoint of productivity, and the application of high-speed sputtering is essential. Since the number of cases where air bubbles are generated in the layer or on the surface increases rapidly, the inventors believe that this is an important problem that must be solved in practice, and after repeated studies on the amount of lead, the present invention has been developed. This is what we have come to.

本発明者等は、上記気泡が、高速スパッタ時のガラス層
内に吸蔵されたArがガラス層同志の熱圧着接合の為の
熱処理の際に、接合後ガラス層内、又は表面の気泡を形
成することによるものであることを確認し、本発明をな
すに至ったものである。
The present inventors have discovered that the above air bubbles are caused by Ar occluded in the glass layer during high-speed sputtering, which forms air bubbles within or on the surface of the glass layer after bonding during heat treatment for thermocompression bonding of the glass layers. We have confirmed that this is due to the above, and have come up with the present invention.

本発明は、接合後ギャップ部に気泡がなく、高精度かつ
高信頼性を付与したギャップ形成を可能にした磁気ヘッ
ドの製造方法を提供するものである0 〔問題点を解決するための手段〕 本発明においては、磁気ヘッドのギャップを構成する2
個の組立片のギャップ構成面に第1層として、St O
x膜を、第2層として、ガラス膜を高速スパッタ法によ
りl1ff1次形成し、この後、脱Arのだめの熱処理
を第2層ガラスの軟化温度乃至950℃の間の温度で1
5分乃至1時間桁々りた後に、前記組立片の互いに組合
せられるべきギャップ構成面同志を対向させて重ね合わ
せ、加圧しながら加熱する事により、2個の組立片の第
2層とじて、6 のガラス膜同志を接合すると共に、ギャップ部の磁気記
録媒体と対向する面の反対側部分に補強ガラスを接合す
る。
The present invention provides a method for manufacturing a magnetic head that is free from air bubbles in the gap portion after bonding and enables gap formation with high precision and high reliability.0 [Means for Solving the Problems] In the present invention, two parts constituting the gap of the magnetic head are
As the first layer, St O
As a second layer, a glass film is first formed using a high-speed sputtering method, and then heat treatment is performed to remove Ar at a temperature between the softening temperature of the second layer glass and 950°C.
After 5 minutes to 1 hour, the gap-constituting surfaces of the assembly pieces to be combined with each other are placed on top of each other, and the second layer of the two assembly pieces is assembled by heating while applying pressure. At the same time, a reinforcing glass is bonded to the opposite side of the surface facing the magnetic recording medium in the gap portion.

St 02膜とガラス膜との膜厚比は10:1乃至10
:4が適当である。
The film thickness ratio of St 02 film and glass film is 10:1 to 10
:4 is appropriate.

〔作用〕[Effect]

本発明者等の検討に依れば、高速スパッタ時にガラス膜
、或いはSt Ch膜に取り込まれるArは、ガラス膜
+ SI O2膜を加熱することにより放出されるが、
磁気ヘッドとして実用上差しつかえがない程度まで放出
させるためには、スパッタ後、ガラス膜同志の接合工程
前に、第2層のガラス軟化温度乃至950℃の間、好オ
しくは、第2層ガラスの軟化温度より100℃高い温度
乃至870℃の間で、15分乃至1時間、加熱すれば良
いことが判かった。
According to the studies of the present inventors, Ar taken into the glass film or St Ch film during high-speed sputtering is released by heating the glass film + SI O2 film.
In order to emit light to a level that is practically acceptable for a magnetic head, it is preferable to heat the second layer between the glass softening temperature of the second layer and 950° C. after sputtering and before the step of bonding the glass films together. It has been found that heating can be carried out for 15 minutes to 1 hour at a temperature between 100°C higher than the softening temperature of glass and 870°C.

スパッタ膜をSt Ox膜である第1層と、ガラス膜で
ある第2層との複合層とした理由は、次の通りである。
The reason why the sputtered film is a composite layer of the first layer, which is an St Ox film, and the second layer, which is a glass film, is as follows.

即ち、スパッタ膜をガラス膜のみとした場合に、4 。That is, when the sputtered film is only a glass film, 4.

は、前記脱Ar熱処理の際に、ガラス膜が軟化し、ガラ
ス膜接合熱処理の前に既に膜厚の均一性が失なわれて、
ガラス膜接合後のギャップ長目標値に対する実際製品の
ギャップ長バラツキが多くなってしまうことから、81
02膜とガラス膜の2層構造にする必要があるからであ
る。又、この様な2層構造にすることにより、ガラス膜
同志の接合熱処理の際に、ギャップ長が目標値通りであ
り、バラツキが少なく、又、ギャップ部分の接合強度が
大きくなる。
The glass film softens during the Ar removal heat treatment, and the film thickness uniformity is already lost before the glass film bonding heat treatment,
Since the gap length of the actual product will vary widely with respect to the target gap length after glass film bonding, 81
This is because it is necessary to have a two-layer structure of the 02 film and the glass film. In addition, by forming such a two-layer structure, the gap length is in accordance with the target value during the bonding heat treatment between the glass films, there is little variation, and the bonding strength at the gap portion is increased.

〔実施例〕〔Example〕

次に、本発明の実施例について説明する。 Next, examples of the present invention will be described.

第1図に示すように、フェライトコア11,12に、各
々SiOg膜4.およびガラス膜5を順次マグネトロン
・スパッタ法により形成する。2μmのギャップ長に対
して、5i02膜は8000A 、ガラス膜は200O
Aの厚さに形成した。これらフェライトコア11,12
を互いにつきあわせ、補強ガラス6をセットして、85
0℃においてフェライトコア11゜12を圧着しながら
加熱することによって、磁気ヘッドのギャップを形成し
た。第2図に、接着に用いたガラス膜5のガラスと、補
強ガラス6との粘性特性を示した。このように粘性の違
うガラスを用いることに依り、特に、補強ガラス6とし
て、ガラス膜5よりも圧着加熱温度において、粘度の高
いガラスを用いることにより、エイペックス部分のガラ
スの反応を抑えるのに有効であった○第6図に従来法、
即ち、ガラス膜5と補強ガラス6とに同一のガラスを用
いた場合のエイペックス部分のギャップ形成後の図を(
b)として、又、本実施例によるものを(a)として部
分概略図を示しだ。
As shown in FIG. 1, SiOg films 4. Then, a glass film 5 is sequentially formed by magnetron sputtering. For a gap length of 2 μm, the 5i02 film is 8000A and the glass film is 200O
It was formed to a thickness of A. These ferrite cores 11, 12
85 and set the reinforced glass 6 against each other.
The gap of the magnetic head was formed by heating the ferrite cores 11 and 12 while pressing them together at 0°C. FIG. 2 shows the viscosity characteristics of the glass of the glass film 5 used for adhesion and the reinforced glass 6. By using glasses with different viscosities as described above, in particular, by using a glass with a higher viscosity than the glass film 5 at the pressure bonding heating temperature as the reinforcing glass 6, the reaction of the glass in the apex portion can be suppressed. It was effective ○ Figure 6 shows the conventional method,
In other words, the diagram after forming the gap in the apex part when the same glass is used for the glass film 5 and the reinforcing glass 6 is shown in (
Partial schematic diagrams are shown as (b) and (a) of this embodiment.

第4図は、8102膜4とガラス膜6との膜厚の和に対
するガラス膜6の比率tglass / (tglas
s +tsio2)に対して、目標ギャップ長に対する
ギャップ長不良の比率がどの様に依存するかを示した図
である。
FIG. 4 shows the ratio tglass / (tglass
s + tsio2) is a diagram showing how the ratio of defective gap lengths to the target gap length depends.

tglass/ tglass + tsio2が、約
0.4までの所でバラツキ少なくギャップ形成が出来る
A gap can be formed with little variation when tglass/tglass + tsio2 is up to about 0.4.

第5図は、tglass/1g1ass + tsio
2に対して、ギャップ強度がどのように依存するかを示
したものである。tglass 71g1ass + 
tsio2が約0.1以上の所で、従来方法によるより
も、強度の大きいギャップ形成をなし得る。
Figure 5 shows tglass/1g1ass + tsio
Fig. 2 shows how the gap strength depends on Fig. 2. tglass 71g1ass +
When tsio2 is about 0.1 or more, stronger gap formation can be achieved than with conventional methods.

以上から分かる様に、tglass/1g1ass +
 tsio2が0.1〜0.4の範囲で、精度9強度と
もに従来よりも秀れたギャップ形成が可能である。表1
は、光学ギャップ長と、実効ギャップ長との差が従来法
に比較して、いかに改善されるかを比較したものであ〔
発明の効果〕 以上、説明した様に、本発明に依れば、従来法よりも高
強度、高精度のギャップ形成がノ(ラツキ少なく得られ
るという効果がある。
As you can see from the above, tglass/1g1ass +
When tsio2 is in the range of 0.1 to 0.4, it is possible to form a gap that is superior to the conventional method in both precision and strength. Table 1
This is a comparison of how the difference between the optical gap length and the effective gap length is improved compared to the conventional method.
[Effects of the Invention] As explained above, according to the present invention, there is an effect that gap formation with higher strength and higher precision can be obtained with less irregularity than the conventional method.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明によるギャップ形成工程図。 第2図は、接着ガラスと補強ガラスの粘性特性を、7 
。 示す図、第6図は、エアペックス部概略図、第4図、第
5図は、各々第2ガラス層厚さと不良率。 強度の関係を示す図である。 11 、12−:フエライトコア、 4 : St 0
2膜。 5ニガラス膜、6:補強ガラス。 、8 。 第 l 図 →T
FIG. 1 is a gap forming process diagram according to the present invention. Figure 2 shows the viscosity properties of bonded glass and reinforced glass at 7
. FIG. 6 is a schematic diagram of the airpex part, and FIGS. 4 and 5 show the thickness of the second glass layer and the defective rate, respectively. It is a figure showing the relationship of strength. 11, 12-: Ferrite core, 4: St 0
2 membranes. 5 Ni glass film, 6: Reinforced glass. , 8. Figure l→T

Claims (1)

【特許請求の範囲】 1、磁気ヘッドのギャップを構成する組立片のギャップ
構成面の各々に、第1層としてSiO_2膜を、第2層
としてガラス膜を高速スパッタ法により順次形成し、前
記組立片の互いに組合せられるべきギャップ構成面同志
を対向させて重ね合わせ、加圧しながら加熱することに
より、前記2個の組立片の第2層であるガラス膜同志を
接合すると共に、ギャップ部の磁気記録媒体と対向する
面の反対側部分に補強ガラスを接合するものにおいて、
スパッタ後、ガラス膜同志の接合工程の前に、該第2層
ガラスの軟化温度乃至950℃の間の温度で、15分乃
至1時間スパッタによりSiO_2膜及びガラス膜中に
入りこんだArを放出させる熱処理を施こすことを特徴
とする磁気ヘッドの製造方法。 2、Arを放出させる熱処理が、ガラス膜の軟化温度よ
り100℃高い温度乃至870℃であることを特徴とす
る特許請求の範囲第1項記載の磁気ヘッドの製造方法。 3、第1層と第2層の膜厚の比が、10:1乃至10:
4であることを特徴とする特許請求の範囲第1項記載の
磁気ヘッドの製造方法。
[Claims] 1. A SiO_2 film as a first layer and a glass film as a second layer are sequentially formed by high-speed sputtering on each of the gap-constituting surfaces of the assembly pieces that make up the gap of the magnetic head. By stacking the gap-forming surfaces of the pieces to be assembled with each other facing each other and heating while applying pressure, the glass films that are the second layer of the two assembled pieces are joined together, and the magnetic recording in the gap portion is In the case where reinforced glass is bonded to the opposite side of the surface facing the medium,
After sputtering and before the step of bonding the glass films together, release the Ar that has entered into the SiO_2 film and the glass film by sputtering for 15 minutes to 1 hour at a temperature between the softening temperature of the second layer glass and 950°C. A method of manufacturing a magnetic head, which comprises performing heat treatment. 2. The method of manufacturing a magnetic head according to claim 1, wherein the heat treatment for releasing Ar is performed at a temperature ranging from 100°C to 870°C higher than the softening temperature of the glass film. 3. The ratio of the film thickness of the first layer and the second layer is 10:1 to 10:
4. The method of manufacturing a magnetic head according to claim 1, wherein:
JP20524384A 1984-09-29 1984-09-29 Producing for magnetic head Granted JPS6182305A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20524384A JPS6182305A (en) 1984-09-29 1984-09-29 Producing for magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20524384A JPS6182305A (en) 1984-09-29 1984-09-29 Producing for magnetic head

Publications (2)

Publication Number Publication Date
JPS6182305A true JPS6182305A (en) 1986-04-25
JPH0250524B2 JPH0250524B2 (en) 1990-11-02

Family

ID=16503765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20524384A Granted JPS6182305A (en) 1984-09-29 1984-09-29 Producing for magnetic head

Country Status (1)

Country Link
JP (1) JPS6182305A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5208971A (en) * 1990-05-17 1993-05-11 Matsushita Electric Industrial Co., Ltd. Process of manufacturing a magnetic head

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5208971A (en) * 1990-05-17 1993-05-11 Matsushita Electric Industrial Co., Ltd. Process of manufacturing a magnetic head

Also Published As

Publication number Publication date
JPH0250524B2 (en) 1990-11-02

Similar Documents

Publication Publication Date Title
US5001590A (en) Magnetic head having core halves with a barrier layer therebetween
JPS6182305A (en) Producing for magnetic head
JPS6341126B2 (en)
JPH0152808B2 (en)
JPS6221176B2 (en)
JPS6180512A (en) Magnetic head
JPH0439731B2 (en)
JPS6226089B2 (en)
JP3114220B2 (en) Manufacturing method of magnetic head
JPS62295204A (en) Magnetic head
JPS6265214A (en) Method for joining gap part of core for magnetic head
JPS60140504A (en) Production for magnetic head
JPS59107414A (en) Magnetic head
JPS6265215A (en) Joining method for gap part of core for magnetic head
JPH0227726B2 (en) JIKIHETSUDO
JPH022212B2 (en)
JPH04254908A (en) Production of magnetic head
JPS6292107A (en) Manufacture of magnetic head
JPH10283610A (en) Magnetic head and method of manufacturing the same
JPH0334124B2 (en)
JPH0263245B2 (en)
JPS62273613A (en) Manufacturing method of magnetic head
JPS6095706A (en) Manufacture of magnetic head
JPS6038714A (en) Thin film video head and its manufacturing method
JPH07182616A (en) Method of manufacturing magnetic head