JPS6186461U - - Google Patents
Info
- Publication number
- JPS6186461U JPS6186461U JP17161384U JP17161384U JPS6186461U JP S6186461 U JPS6186461 U JP S6186461U JP 17161384 U JP17161384 U JP 17161384U JP 17161384 U JP17161384 U JP 17161384U JP S6186461 U JPS6186461 U JP S6186461U
- Authority
- JP
- Japan
- Prior art keywords
- dry etching
- etching device
- electrode
- high frequency
- frequency power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001312 dry etching Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Description
第１図は本考案の一実施例であるドライエツチ
ング装置の概略構成を模式化して示す構成図、第
２図は従来のドライエツチング装置の概略構成を
模式化して示した構成図である。
２１…エツチング室本体、２２…上部電極、２
３…下部電極表面、２４…下部電極本体、２５…
高周波電源、２６…真空排気口、２７…ガス導入
パイプ、２８…上部電極アース、２９…被加工基
板。
FIG. 1 is a block diagram schematically showing the schematic structure of a dry etching apparatus according to an embodiment of the present invention, and FIG. 2 is a block diagram schematically showing the schematic structure of a conventional dry etching apparatus. 21...Etching chamber main body, 22...Upper electrode, 2
3... Lower electrode surface, 24... Lower electrode body, 25...
High frequency power supply, 26... Vacuum exhaust port, 27... Gas introduction pipe, 28... Upper electrode ground, 29... Processed substrate.
Claims (1)
れ、これらに付属する真空排気系、ガス導入系お
よび高周波電源部を有するドライエツチング装置
において、電極表面の材質をバツチ交換し得るよ
うに構成したことを特徴とするドライエツチング
装置。 A dry etching device equipped with a vacuum chamber, an electrode and a substrate holder therein, and an attached vacuum exhaust system, a gas introduction system, and a high frequency power source, configured so that the material of the electrode surface can be replaced in batches. A dry etching device featuring:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17161384U JPS6186461U (en) | 1984-11-14 | 1984-11-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17161384U JPS6186461U (en) | 1984-11-14 | 1984-11-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6186461U true JPS6186461U (en) | 1986-06-06 |
Family
ID=30729289
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17161384U Pending JPS6186461U (en) | 1984-11-14 | 1984-11-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6186461U (en) |
-
1984
- 1984-11-14 JP JP17161384U patent/JPS6186461U/ja active Pending