JPS6187879A - Production of stranded conductor element insulated by coating with copper oxide film - Google Patents

Production of stranded conductor element insulated by coating with copper oxide film

Info

Publication number
JPS6187879A
JPS6187879A JP20754484A JP20754484A JPS6187879A JP S6187879 A JPS6187879 A JP S6187879A JP 20754484 A JP20754484 A JP 20754484A JP 20754484 A JP20754484 A JP 20754484A JP S6187879 A JPS6187879 A JP S6187879A
Authority
JP
Japan
Prior art keywords
aqueous solution
oxide film
copper
wire
strands
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20754484A
Other languages
Japanese (ja)
Other versions
JPH0351794B2 (en
Inventor
Masataka Mochizuki
正孝 望月
Michio Takaoka
道雄 高岡
Tsuneaki Motai
恒明 馬渡
Shotaro Yoshida
昭太郎 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Priority to JP20754484A priority Critical patent/JPS6187879A/en
Publication of JPS6187879A publication Critical patent/JPS6187879A/en
Publication of JPH0351794B2 publication Critical patent/JPH0351794B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • C23C22/60—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using alkaline aqueous solutions with pH greater than 8
    • C23C22/63—Treatment of copper or alloys based thereon

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Processes Specially Adapted For Manufacturing Cables (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 この発明は、銅撚線における素線の表面に酸化第二銅(
Cub)からなる皮膜を形成した絶縁導体の製造方法に
関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention is directed to a copper stranded wire in which cupric oxide (
The present invention relates to a method of manufacturing an insulated conductor having a film formed thereon.

従来の技術 電カケープルとして用いられる銅撚線は、素線を多数本
撚り合わせた後、占積率の増大を図るために圧縮成形を
施すことによって造られているが、送電電流が主に撚線
全体としての表面近傍を流れる表皮効果のために、送電
容量は断面積に比例しては増大しない。そこで、送電容
量を高めるために、素線の表面に絶縁層を設け、素線同
士を絶縁することが試みられている。
Conventional technology Twisted copper wires used as power cables are made by twisting a large number of wires together and then compressing them to increase the space factor. Due to the skin effect that flows near the surface of the entire line, the power transmission capacity does not increase in proportion to the cross-sectional area. Therefore, in order to increase the power transmission capacity, attempts have been made to provide an insulating layer on the surface of the wires to insulate them from each other.

このような絶縁導体を製造する方法として、素線の表面
に酸化第二銅(Cub)皮膜を生成させる方法が知られ
ているが、このような酸化皮膜を予め素線に形成し、し
かる後撚り合わせおよび圧縮成形を行なうとすれば、黙
り合わせ工程あるいは圧縮成形の工程において酸化皮膜
が剥離してしまうおそれが多分にある。そのため従来で
は、圧縮成形を施した銅msを酸化処理液に浸漬して素
線の表面層を酸化させ、あるいは酸化促進のために予熱
を施す等の方法が採られていた。
As a method for manufacturing such insulated conductors, a method is known in which a cupric oxide (Cub) film is formed on the surface of the wire, but such an oxide film is formed on the wire in advance, and then If twisting and compression molding are performed, there is a high possibility that the oxide film will peel off during the tacking process or the compression molding process. Conventionally, therefore, a method has been adopted in which compression-molded copper ms is immersed in an oxidizing solution to oxidize the surface layer of the wire, or preheating is performed to promote oxidation.

発明が解決しようとする問題点 しかるに銅撚線を酸化処理液に単に浸漬しただけでは充
分な酸化が生じないうえに、圧縮成形を施して素線同士
が密着しているために、中心層側の素線同士の間に酸化
処理液が入り込みにくく、そのため従来の方法では、充
分な酸化皮膜を生成させるためには長詩間を要し、生産
性が悪い問題があった。また従来の方法では、絶縁性に
劣り、かつ酸化第二銅へ変化させにくい酸化第一銅(C
LIO)が生じてしまうおそれがあった。
Problems to be Solved by the Invention However, sufficient oxidation does not occur simply by immersing stranded copper wire in an oxidizing solution, and since the wires are in close contact with each other due to compression molding, the center layer side It is difficult for the oxidation treatment liquid to enter between the strands of the strands, so in the conventional method, it takes a long time to form a sufficient oxide film, resulting in poor productivity. In addition, in the conventional method, cuprous oxide (C) has poor insulation properties and is difficult to convert into cupric oxide.
LIO) may occur.

この発明は上記の事情に鑑み、銅撚線における素線の表
面層全体に、均一かつ充分に、しかも迅速に酸化第二銅
の皮膜を形成する酸化銅皮膜素線絶縁導体の製造方法を
提供することを目的とするものである。
In view of the above-mentioned circumstances, the present invention provides a method for producing a copper oxide film strand insulated conductor that uniformly, sufficiently, and quickly forms a cupric oxide film over the entire surface layer of the strands of a stranded copper wire. The purpose is to

問題点を解決するための手段 この発明は、上記の目的を達成するために、圧縮成形を
施したf[Iiに対して1〜10%NaClO2水溶液
と1〜10%Na OH水溶液との混合水溶液を80〜
105℃に保持して圧入する工程と、100℃程度の水
蒸気もしくは熱水を銅m線内に圧入して前記の混合水溶
液を洗浄除去する工程と、洗浄後の銅撚線を不活性雰囲
気中で100〜300℃に加熱する工程と、1〜10%
NaC1o2水溶液と1〜10%Na 01−1水溶液
との混合水溶液を再度銅撚線に圧入する工程とを含むこ
とを特徴する方法である。
Means for Solving the Problems In order to achieve the above object, the present invention provides a mixed aqueous solution of 1 to 10% NaClO2 aqueous solution and 1 to 10% NaOH aqueous solution for compression molded f[Ii. 80~
A step of maintaining the temperature at 105°C and press-fitting it, a step of injecting water vapor or hot water at about 100°C into the copper m-wire to wash and remove the mixed aqueous solution, and a step of putting the washed copper stranded wire in an inert atmosphere. heating to 100-300℃, and 1-10%
This method is characterized by including the step of again press-fitting a mixed aqueous solution of a NaC1o2 aqueous solution and a 1 to 10% Na01-1 aqueous solution into the twisted copper wire.

発明の詳細な説明 この発明では、高圧縮率の#il撚線を対象とすること
ができ、例えば占積率を90%程度とした銅?!線を対
象とすることができる。そのmm線には、通常の酸化処
理を行なう場合と同様に、酸化処理に先立って、アルカ
リ脱脂処理、si処理液の水洗除去および水切りの各処
理を施すことが好ましい。
DETAILED DESCRIPTION OF THE INVENTION The present invention can be applied to #il stranded wires with a high compression ratio, such as copper wire with a space factor of about 90%. ! Lines can be targeted. As in the case of ordinary oxidation treatment, the mm wire is preferably subjected to alkaline degreasing treatment, washing removal of the Si treatment liquid, and draining treatment prior to oxidation treatment.

このような予備処理を行なった後に、第1の酸化処理を
行なう。これは主に、外層部の素線表面に酸化第二銅皮
侵を生成することを目的とするものであって、酸化剤と
しては、1〜10%のNaClO2水溶液と1〜10%
のNa OH水溶液との混合水溶液を用い、その混合水
溶液を80〜105℃に保って対象とする銅撚線に圧入
する。
After performing such preliminary treatment, a first oxidation treatment is performed. The main purpose of this is to generate cupric oxide on the surface of the wire in the outer layer, and the oxidizing agent is a 1-10% NaClO2 aqueous solution and a 1-10%
Using a mixed aqueous solution with an NaOH aqueous solution, the mixed aqueous solution is maintained at 80 to 105°C and press-fitted into the target copper stranded wire.

その操作は例えば、密閉槽内に前記混合水溶液を入れる
とともに、対象とする#!iamをその密閉槽内に水溶
性を保持した状態で挿通し、かつその密閉槽内を加圧す
ることにより行なう。
The operation can be carried out, for example, by placing the mixed aqueous solution in a closed tank and placing #! This is carried out by inserting iam into the closed tank while maintaining its water solubility and pressurizing the inside of the closed tank.

上述した酸化処理に続いて前記混合水溶液を除去するた
めの洗浄処理を銅撚線に施す。これは次工程での加熱の
際に、Na Cj!02が分解してClO2ガスが発生
したり、またNaC1’02の結晶が生成・付着したり
することを防止し、ひいては導体表面の+trt荒れを
防止することを目的とするものであって、100℃程度
の水蒸気もしくは熱水を銅撚線に圧入することにより行
なう。より具体的には、水蒸気もしくは熱水を加圧して
封入した密閉槽内に、気密性あるいは水密性を保持した
状態で銅撚線を挿通する方法を採用することができる。
Following the oxidation treatment described above, the stranded copper wire is subjected to a cleaning treatment to remove the mixed aqueous solution. This will be converted into Na Cj! during heating in the next step. The purpose of this is to prevent the decomposition of 02 and the generation of ClO2 gas, the formation and adhesion of NaC1'02 crystals, and furthermore to prevent +trt roughness on the conductor surface. This is done by pressurizing steam or hot water at a temperature of around 10°C into the stranded copper wire. More specifically, a method can be adopted in which a stranded copper wire is inserted into a sealed tank in which steam or hot water is pressurized and sealed while maintaining airtightness or watertightness.

つぎに前記W4撚線を不活性雰囲気中で100〜300
℃に加熱・昇温する。これは次工程での酸化処理の際に
中心層側の素線の酸化を促進することを目的とするもの
である。ここで不活性雰囲気中で加熱するのは、空気酸
化による酸化第一銅の生成を防ぐためであり、N2ガス
やA「ガスあるいは水蒸気等によって不活性雰囲気とす
ればよ(、また加熱手段としては高周波誘導加熱装蟹を
用いればよい。銅撚線を上記のように加熱すれば、素線
が熱I!!脹して素線間の間隙が広がり、またその間隙
内の気体が熱!11ffiして外部に排出されるととも
に、次工程で酸化処理液によって冷却された際に収縮し
て減圧するために、前記の温度を次工程まで維持するこ
とにより、中心層の素線間への酸化処理液の浸入が良好
となり、また温度が高いために酸化反応が促進される。
Next, the W4 stranded wire is stranded in an inert atmosphere with a
Heat and raise temperature to ℃. The purpose of this is to promote the oxidation of the strands on the center layer side during the oxidation treatment in the next step. The purpose of heating in an inert atmosphere is to prevent the formation of cuprous oxide due to air oxidation. You can use a high-frequency induction heating device.If you heat the stranded copper wire as described above, the strands will swell with heat and the gaps between the strands will widen, and the gas in the gap will become hot! 11ffi and is discharged to the outside, and in the next process, when it is cooled by the oxidation treatment liquid, it contracts and reduces the pressure. By maintaining the above temperature until the next process, the strands between the strands in the center layer are The penetration of the oxidation treatment liquid is improved, and the oxidation reaction is promoted due to the high temperature.

さらに加熱1度を200℃以上とすれば、焼鈍の効果が
生じるから、圧縮成形に伴う加工硬化を是正し、特に中
心層側での素線の導電率を高め、その電気抵抗を低減で
きる。
Furthermore, if the heating temperature is 200° C. or higher, an annealing effect is produced, so that work hardening caused by compression molding can be corrected, and the electrical conductivity of the strands, particularly on the center layer side, can be increased and the electrical resistance thereof can be reduced.

上述のように加熱昇温した銅撚線は、その1度を保持し
たまま第2の酸化工程に送って醇化処理を施す。この第
2の酸化工程は主に中心層側の素線の酸化を目的とする
ものであり、その条件、操作は前述した第1の酸化処理
工程と同様であって、1〜10%のNa CJ202水
溶液と1〜10%のNa OH水溶液との混合水溶液を
80〜105℃に保持しっつ銅撚線に圧入することによ
り行なう。
The copper stranded wire heated to an elevated temperature as described above is sent to a second oxidation step and subjected to a smelting treatment while maintaining the same temperature. This second oxidation step is mainly aimed at oxidizing the strands on the center layer side, and its conditions and operations are the same as those of the first oxidation treatment step described above. This is carried out by press-fitting a mixed aqueous solution of a CJ202 aqueous solution and a 1-10% NaOH aqueous solution into a stranded copper wire while maintaining the temperature at 80-105°C.

なお、この第2の酸化処理工程においては、その前段で
銅撚線を加熱しであるから、前述したように中心FF4
画の素線間の間隙に酸化処理液としての前記混合水溶液
が浸入し易く、かつ酸化反応が速やかに進行し、その結
果前述した第1の鹸化処理工程において外廐部の素線が
主に酸化されることと併せて、銅に枠全体の素線の表面
がほぼ均一酸化されて酸化第二銅の皮膜が生成される。
In addition, in this second oxidation treatment step, since the copper stranded wire is heated in the previous stage, the center FF4 is heated as described above.
The mixed aqueous solution as the oxidation treatment liquid easily penetrates into the gaps between the strands of the image, and the oxidation reaction proceeds rapidly. As a result, in the first saponification treatment step, the strands of the outer part are In addition to being oxidized, the surface of the strands of the entire copper frame is oxidized almost uniformly to form a film of cupric oxide.

なお、!%柊的には前記の混合水溶液を水洗除去すると
ともに、銅撚線に水切り・乾燥処理を施した後、巻取る
。また上述した一連の処理は、予め圧縮成形を施したF
[ffをドラムから繰り出して走行させつつ行なう所r
R連続処理が好ましく、そのためには前述した酸化処理
のための密閉槽や洗浄のための密閉槽あるいは加熱装置
を順次配列し、これらの密閉槽はあるいは装置に対象と
する銅撚線を挿通・走行させればよい。さらにこの発明
で対象とするf!4撚線は、それ自体nn製品とされる
ものであってもよく、あるいは複数本組合せて1本の導
体とするセグメントであってもよい。
In addition,! In the process, the mixed aqueous solution is removed by washing with water, and the stranded copper wire is drained and dried, and then wound up. In addition, the above-mentioned series of processing is performed on F, which has been compression-molded in advance.
[This is done while letting the ff out of the drum and running it.
R Continuous treatment is preferred, and for that purpose, the aforementioned closed tanks for oxidation treatment, closed tanks for cleaning, or heating equipment are arranged in sequence, and the target copper stranded wire is inserted into the closed tanks or the equipment. Just let it run. Furthermore, the f! The four-stranded wire itself may be an nn product, or may be a segment in which a plurality of wires are combined to form one conductor.

発明の効果 以上の説明から明らかなようにこの発明の方法によれば
、比較的高温で酸化反応を行なわせるにも拘わらず空気
酸化による酸化第一銅の生成の余地がなく、しかも加熱
工程を含んで中心府側への酸化処理液の浸入およびその
酸化反応を促進するから、圧縮成形を施したw4撚轢全
体での素線を均一に酸化させて酸化第二銅皮膜を充分か
つ迅速に生成させることができる。
Effects of the Invention As is clear from the above explanation, according to the method of the present invention, although the oxidation reaction is carried out at a relatively high temperature, there is no room for the production of cuprous oxide due to air oxidation, and moreover, the heating step is not required. It promotes the penetration of the oxidation treatment liquid into the center side and the oxidation reaction, so the strands of the entire compression-molded W4 strand are uniformly oxidized and the cupric oxide film is sufficiently and quickly formed. can be generated.

Claims (1)

【特許請求の範囲】[Claims] 予め圧縮成形した銅撚線に対し、1〜10%(重量%、
以下同じ)NaClO_2水溶液と1〜10%NaOH
水溶液との混合水溶液を80〜105℃に保持して圧入
し、ついで100℃程度の水蒸気もしくは熱水を前記銅
撚線に圧入して洗浄し、しかる後その銅撚線を不活性雰
囲気中で100〜300℃に加熱し、さらに加熱後の銅
撚線に対し1〜10%NaClO_2水溶液と1〜10
%NaOH水溶液との混合水溶液を80〜105℃に保
持して圧入することを特徴とする酸化銅皮膜素線絶縁導
体の製造方法。
1 to 10% (weight%,
Same below) NaClO_2 aqueous solution and 1-10% NaOH
A mixed aqueous solution with an aqueous solution is maintained at 80 to 105°C and then press-fitted, steam or hot water at about 100°C is press-fitted into the copper strands for cleaning, and then the copper strands are placed in an inert atmosphere. Heating to 100-300℃, and then adding 1-10% NaClO_2 aqueous solution and 1-10% NaClO_2 aqueous solution to the heated copper stranded wire.
% NaOH aqueous solution is maintained at 80 to 105°C and press-fitted.
JP20754484A 1984-10-03 1984-10-03 Production of stranded conductor element insulated by coating with copper oxide film Granted JPS6187879A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20754484A JPS6187879A (en) 1984-10-03 1984-10-03 Production of stranded conductor element insulated by coating with copper oxide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20754484A JPS6187879A (en) 1984-10-03 1984-10-03 Production of stranded conductor element insulated by coating with copper oxide film

Publications (2)

Publication Number Publication Date
JPS6187879A true JPS6187879A (en) 1986-05-06
JPH0351794B2 JPH0351794B2 (en) 1991-08-07

Family

ID=16541484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20754484A Granted JPS6187879A (en) 1984-10-03 1984-10-03 Production of stranded conductor element insulated by coating with copper oxide film

Country Status (1)

Country Link
JP (1) JPS6187879A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759608A (en) * 1980-09-24 1982-04-10 Satsuo Tomita Dehydrator
JPS5823470A (en) * 1981-08-06 1983-02-12 Oki Electric Ind Co Ltd semiconductor equipment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759608A (en) * 1980-09-24 1982-04-10 Satsuo Tomita Dehydrator
JPS5823470A (en) * 1981-08-06 1983-02-12 Oki Electric Ind Co Ltd semiconductor equipment

Also Published As

Publication number Publication date
JPH0351794B2 (en) 1991-08-07

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