JPS6188531A - Integrated circuit device cleaning apparatus - Google Patents

Integrated circuit device cleaning apparatus

Info

Publication number
JPS6188531A
JPS6188531A JP59209572A JP20957284A JPS6188531A JP S6188531 A JPS6188531 A JP S6188531A JP 59209572 A JP59209572 A JP 59209572A JP 20957284 A JP20957284 A JP 20957284A JP S6188531 A JPS6188531 A JP S6188531A
Authority
JP
Japan
Prior art keywords
cleaning
integrated circuit
circuit device
section
cleaning liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59209572A
Other languages
Japanese (ja)
Inventor
Toshihide Yasui
俊秀 安井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP59209572A priority Critical patent/JPS6188531A/en
Publication of JPS6188531A publication Critical patent/JPS6188531A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Cleaning By Liquid Or Steam (AREA)

Abstract

PURPOSE:To improve working efficiency by automatically carrying IC having completed soldering process from a holding apparatus, followed by cleaning, dripping and drying process, and automatically accommodating it within a magazine. CONSTITUTION:When an IC1 supported by holding apparatus is supplied 5 and is then transferred from the rear side with a pin 9, it is carried from the holding apparatuses 3, 4, it is then sent onto a rail 11 of cleaning section 6 with the lead 2 positioned downward and is then dipped into a cleaning tank 14. A jet stream to the lower side of IC from a cleaning liquid nozzle 12 of rail 11 floats an IC and gives perfect cleaning effect to the entire part of IC. The air ejected from the nozzle 13 in the tank stirs the cleaning liquid. The rail 11 and tank 14 gradually become high in the traveling direction. Thereby, the cleaning liquid flows to the exit from the inlet, improving the cleaning effect. An IC is then sent to an accommodating section 8 with pin 9 along the upper and lower four round bars 16, 17. During such transfer, water is cut with blowing of high compressed air 18 and the IC is dried up with blowing of hot air 19, and thereby the entire part is dried up perfectly. The IC is well dried with the region other than the narrow contact region exposed to such hot air and is then accommodated in the magazine.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は集積回路装置(以下ICと記す)の洗浄装置に
かかり、特にデュアル・イノライン・パッケージ型(以
下DIP型と記す)のICにおいてり1部リード及びパ
ッケージ表面の洗浄を行なう装置に関するものでちる。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a cleaning device for integrated circuit devices (hereinafter referred to as IC), and particularly to a dual innoline package type (hereinafter referred to as DIP type) IC. One part relates to equipment for cleaning the surfaces of leads and packages.

〔従来の技術〕[Conventional technology]

一般にDIP型ICの製造工程において、ICの外部リ
ードの酸化を防止し、かつICをプリント基板へ実装す
る際の半田付は性を良くするためにあらかじめ外部リー
ドに半田付は処理を行なっている。この半田付は処理は
外部リードへのフラックス塗布、噴流式半田槽による外
部リードへの半田付け、外部リードやICパッケージに
付着したフラックス残渣の洗浄、高圧空気による水切り
及び温風による乾燥という工程の順序にて行なわれ従来
この半田付は処理は第5図に示す様にICパッケージ1
の上部両角部を上部保持具33にて上方より支えるとと
もに、パッケージ1の下面を下部保持具4にて下方より
支えて行われていた。
Generally, in the manufacturing process of DIP type ICs, the external leads of the IC are pre-soldered in order to prevent oxidation of the external leads and to improve soldering properties when mounting the IC on a printed circuit board. . This soldering process consists of applying flux to the external leads, soldering to the external leads using a jet soldering bath, cleaning flux residue adhering to the external leads and IC package, draining with high pressure air, and drying with hot air. Conventionally, this soldering process is performed on IC package 1 as shown in Figure 5.
Both upper corners of the package 1 are supported from above by an upper holder 33, and the lower surface of the package 1 is supported from below by a lower holder 4.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし、両保持具3.4にて覆われるICパッケージの
表面面積が太きいためにICを洗浄する際には上部保持
部3及び下部保持部4が邪魔をしてICパッケージ1の
表面、特にフラックスの付着量が多い゛パック−2下面
や外部リード2とパッケージ1との境界面を十分に洗浄
できないという欠点があった。中でも外部リード2とパ
ンケージ1との境界面付近のフラックス残渣は集積回路
素子に悪影響を及ぼすことがあるだめ、十分時間をかけ
て洗浄するか、ICを保持具から別の洗浄カゴに移して
バラの状態で洗浄する必要があっただめ、作業性が非常
に悪かった。又、乾燥工程においても同様にパッケージ
表面が十分に乾燥できないという欠点があった。
However, since the surface area of the IC package covered by both holders 3.4 is large, the upper holding part 3 and lower holding part 4 get in the way when cleaning the IC. There was a drawback that the lower surface of the pack 2 and the interface between the external lead 2 and the package 1, which had a large amount of flux attached, could not be sufficiently cleaned. In particular, flux residue near the interface between the external lead 2 and the pan cage 1 may have a negative effect on the integrated circuit element, so either take a sufficient amount of time to clean it, or move the IC from the holder to another cleaning basket and disassemble it. The workability was very poor because it had to be cleaned in such a condition. Further, in the drying process, there is also a drawback that the surface of the package cannot be sufficiently dried.

本発明は、上記欠点を解消するために、外部リードへの
半田付は処理終了後、ICを保持具から自動的に搬出し
、十分な洗浄及び乾燥を行なうことのできるtC用洗浄
装置を提供するものである。
In order to eliminate the above-mentioned drawbacks, the present invention provides a tC cleaning device that can automatically remove the IC from the holder after soldering to the external leads and perform sufficient cleaning and drying. It is something to do.

〔問題点を解決するだめの手段〕[Failure to solve the problem]

本発明は半田付は処理用保持具に支持された集積回路装
置を搭載するIC供給部と、前記保持具より引き出して
IC供給部から搬出された集積回路装置を洗浄する洗浄
部と、洗浄された集積回路装置を乾燥する乾燥部と、乾
燥された集積回路装置をマガジンに収納させるIC収納
部と、集積回路装置に送りを与えて前記保持具より引き
出しこれを各部に沿って搬送する搬送機構とからなり、
前記洗浄部を洗浄液を収容する洗浄槽と、該洗浄槽内の
洗浄液中に集積回路装置が没する高さ位置で該装置の下
面を支え、集積回路装置の下面に向けて洗浄液を噴射す
るノズルを上面に設けた搬送レールと、洗浄液の攪拌用
ノズルとによシ構成し、さらに前記乾燥部に、集積回路
装置を線接触により支持させる棒状ガイドを設置したこ
とを特徴とする集偵回路C洗浄装置でおる。
The present invention includes an IC supply section in which an integrated circuit device supported by a processing holder is mounted, a cleaning section for cleaning the integrated circuit device pulled out from the holder and carried out from the IC supply section, and a cleaning section for cleaning the integrated circuit device. a drying section that dries the dried integrated circuit device; an IC storage section that stores the dried integrated circuit device in a magazine; and a transport mechanism that feeds the integrated circuit device to pull it out from the holder and convey it along each section. It consists of
The cleaning section includes a cleaning tank containing a cleaning liquid, and a nozzle that supports the lower surface of the integrated circuit device at a height where the integrated circuit device is submerged in the cleaning liquid in the cleaning tank and sprays the cleaning liquid toward the lower surface of the integrated circuit device. A collector circuit C comprising a conveyor rail provided on the upper surface and a nozzle for agitating the cleaning liquid, and further comprising a rod-shaped guide installed in the drying section to support the integrated circuit device by line contact. Wash with cleaning equipment.

〔実施例〕〔Example〕

以下に、本発明の一実施例を図により説明する。 An embodiment of the present invention will be described below with reference to the drawings.

第1図において、本発明装置は、第5図に示すような半
田付は処理用保持具3,4にて支持されたIcパッケー
ジ1を搭載するIC供給部5と、保持具3.4よシ引き
出して19供給部5から搬出されたICパッケージ1を
洗浄する洗浄部6と、洗浄されたICパッケージ1を乾
燥する乾燥部7と、乾燥されたICパッケージ1をマガ
ジンに収納させるIC収納部8と、ICパッケージ1の
後部に搬送ピン9を押しあててICパッケージ1に送9
を与え前記保持具3,4より引き出してこれを各部に沿
って搬送する搬送機構10とから構成したものである。
In FIG. 1, the present invention apparatus includes an IC supply section 5 on which an IC package 1 supported by processing holders 3 and 4 is mounted, and a holder 3.4 for soldering as shown in FIG. A cleaning section 6 that cleans the IC package 1 pulled out and carried out from the supply section 5, a drying section 7 that dries the cleaned IC package 1, and an IC storage section that stores the dried IC package 1 in a magazine. 8, press the transport pin 9 against the rear of the IC package 1 and feed it to the IC package 1.
and a conveyance mechanism 10 for pulling out from the holders 3 and 4 and conveying them along each part.

前記洗浄部6は第2.3図に示すように、上部に前記搬
送ビン9をスライドさせるスリット15を有し、かつI
Cパッケージ1のガイドを兼ねた断面角節状の洗浄槽1
4と、該洗浄槽14内の洗浄液20中にICパンケーン
1が没する高さ位置で該パッケージ1の下面を支え、そ
の上面に洗浄液噴射用ノズル12を設けた搬送レール1
1と、洗浄液の攪拌用ノズル13とから構成されるう前
記洗浄’cb 14の底部及び搬送レール11は乾燥部
7に向けて上傾しており、洗浄部6の出口側から入口側
へ洗浄液が流れ、内部での液の循環がカスケード借と同
等に行なわれるようになっている。洗浄槽14には洗浄
液供給ポンプ21にて洗浄液が供給され、排水管22を
通して排液される。
As shown in FIG. 2.3, the cleaning section 6 has a slit 15 at the top for sliding the transport bin 9, and an I
Cleaning tank 1 with a square cross section that also serves as a guide for the C package 1
4, and a transport rail 1 that supports the lower surface of the package 1 at a height position where the IC pan cane 1 is submerged in the cleaning liquid 20 in the cleaning tank 14, and has a cleaning liquid spray nozzle 12 on its upper surface.
1 and a nozzle 13 for agitating the cleaning liquid.The bottom of the cleaning 'cb 14 and the conveyor rail 11 are inclined upward toward the drying section 7, and the cleaning liquid flows from the outlet side to the inlet side of the cleaning section 6. flows, and internal liquid circulation is performed in the same manner as in a cascade. A cleaning liquid is supplied to the cleaning tank 14 by a cleaning liquid supply pump 21 and drained through a drain pipe 22 .

洗浄部6の前段に位置するIC供給部5には、洗浄槽1
4と断面形状が同一の角筒状ガイドと、該ガイド内に設
置されICパッケージの下面を支える搬送レールとが備
えられており、供給部5の角筒状ガイドが洗浄部6のガ
イドを兼ね丸角筒状洗浄槽14に、また供給部5の搬送
レールが洗浄部6の搬送レール11に、洗浄槽14内の
洗浄液の洩出を適宜手段にて防止してそれぞれ連結させ
る。
The IC supply section 5 located upstream of the cleaning section 6 includes a cleaning tank 1.
It is equipped with a rectangular cylindrical guide having the same cross-sectional shape as 4, and a conveyance rail installed inside the guide to support the bottom surface of the IC package. The round angular cylindrical cleaning tank 14 and the conveyor rail of the supply section 5 are connected to the conveyance rail 11 of the cleaning section 6, respectively, while preventing leakage of the cleaning liquid in the cleaning tank 14 by appropriate means.

洗浄部6の後段に位置する乾燥部7には、第4図に示す
ように、洗浄部6の搬送レール11の延長線上に、IC
パッケージ1を上下から支える小径で且つ断面円形の4
本の棒状ガイド16,16.17,17を水平に設i!
e L/、該ガイドにてICを線接触により支える。ま
た該ガイド16.17に分ってその上下に水切用空気吹
出口18と温風吹出口19とを設置する。
As shown in FIG. 4, in the drying section 7 located after the washing section 6, an IC is installed on the extension line of the conveyor rail 11 of the washing section 6.
4 with a small diameter and circular cross section that supports the package 1 from above and below.
Set the book rod guides 16, 16, 17, 17 horizontally!
e L/, the IC is supported by line contact with the guide. Further, an air outlet 18 for draining water and a hot air outlet 19 are installed above and below the guides 16 and 17.

実施例(ておいて、半田付は処理用保持具に支持された
ICパッケージをIC供給部5((搭載し、搬送機構1
0を駆動してその搬送ビンにて前記ICパッケージlの
後部から送りを与えると、ICパッケージ1は保持具3
,4間から抜は出して供給部5の搬送レールにそのリー
ド2を下方に向けて、その下面が支えられかつ角筒状ガ
イドに案内されて、洗浄部6の搬送レール11まで搬送
され、洗浄槽14の液中に浸漬される。搬送レール11
には複数個の洗浄液噴射ノズル12が設けられており、
ノズル12からは常時洗浄液がICパッケージ下面に噴
射されているだめ、ICパッケージは噴流により浮上し
、ICパッケージ下面と搬送レール11との間には絶え
ず洗浄液の膜が生じる。洗浄液を第4図に示す様にa 
−a’の面を保つ様に供給すると、IC搬送中において
はICパッケージ1及び外部リード2はすべての面が完
全に洗浄液に触しているため、良好な洗浄効果が得られ
る。又、洗浄槽14内部に複数個のエアー噴射ノズル1
3が設けられており、ノズルより噴射したエアーが角筒
状の洗浄槽内部の洗浄液を適度に攪拌してlc衣表面の
洗浄液のゆきわた9を良くすることによシ洗浄効果が高
まる。従って洗浄時間が短縮され、−装置構成上も洗浄
部におけるICの搬送距離も短くて済むため、機(を上
も簡単なものになる。さらに搬送レール1工及びその洗
#槽14は、第2図に示すようにICの進行方向にゆる
やかに高くなる傾斜を有しており、洗浄部の搬送レール
部においては出口側から入口側へ洗浄液が流れるため、
内部での液の循環もカスケード槽と同等に行なわれ、良
好な洗浄効果を得ることができる。
In this embodiment, soldering is carried out by loading the IC package supported by the processing holder into the IC supply section 5 (((
0 and feeds the IC package 1 from the rear part of the IC package 1 using the transport bin, the IC package 1 is moved to the holder 3.
, 4, and the lead 2 is directed downward to the conveyance rail of the supply section 5, and the lower surface thereof is supported and guided by the rectangular cylindrical guide, and conveyed to the conveyance rail 11 of the cleaning section 6, It is immersed in the liquid in the cleaning tank 14. Transport rail 11
is provided with a plurality of cleaning liquid spray nozzles 12,
Since the cleaning liquid is constantly sprayed onto the lower surface of the IC package from the nozzle 12, the IC package floats due to the jet flow, and a film of cleaning liquid is constantly formed between the lower surface of the IC package and the transport rail 11. Add the cleaning solution as shown in Figure 4.
If the cleaning liquid is supplied so as to maintain the surface -a', all surfaces of the IC package 1 and the external leads 2 are completely in contact with the cleaning liquid during IC transportation, so that a good cleaning effect can be obtained. Moreover, a plurality of air injection nozzles 1 are installed inside the cleaning tank 14.
3 is provided, and the air injected from the nozzle moderately stirs the cleaning liquid inside the rectangular tubular cleaning tank to improve the distribution 9 of the cleaning liquid on the surface of the LC clothing, thereby increasing the cleaning effect. Therefore, the cleaning time is shortened, and the device configuration and the transport distance of the IC in the cleaning section are shortened, making the machine simpler. As shown in Figure 2, it has a slope that gradually increases in the direction of IC movement, and the cleaning liquid flows from the outlet side to the inlet side in the conveyor rail section of the cleaning section.
The internal circulation of the liquid is carried out in the same manner as in a cascade tank, and a good cleaning effect can be obtained.

次に第5図に示す洗浄装置の乾燥部においてはICは細
い丸棒状の上下4本のガイド16.17に沿って搬送ビ
ン9によりIC収納部8まで搬送される。乾燥部におい
ては第1図に示すように吹出口18よりの高圧空気によ
る水切り、吹出口19の温風による乾燥を経てICパッ
ケージ1や外部リード2に付着しだ洗浄液を乾燥させる
。ICはガイド16.17と接触する極く狭い箇所を除
きその表面が露出されるため、効果的な乾燥作業が可能
となる。
Next, in the drying section of the cleaning apparatus shown in FIG. 5, the IC is transported to the IC storage section 8 by the transport bin 9 along four guides 16 and 17, each of which has a thin round bar shape, upper and lower. In the drying section, as shown in FIG. 1, the cleaning liquid adhering to the IC package 1 and the external leads 2 is dried by removing water using high-pressure air from the outlet 18 and drying by hot air from the outlet 19. Since the surface of the IC is exposed except for extremely narrow areas where it contacts the guides 16 and 17, effective drying work is possible.

その後、ICはマガジンに収納される。Thereafter, the IC is stored in a magazine.

〔発明の効果〕〔Effect of the invention〕

以上述べた様に本発明による洗浄装置は半田付は処理の
終わった保持具から自動的にICを搬出し、洗浄、水切
り、乾燥の各工程を経てマガジンへ収納を行なうため、
作業効率が向上でき、しかも洗浄時には洗浄液がすべて
のICのパッケージ表面及び外部リードに完全に接触す
るだめ、十分な洗浄効果が得られ、乾燥時においてもガ
イドに接融する極く狭い部分を除き完全露出されるため
、製品の品質上罠絶犬なる効果を発揮するものである。
As described above, the cleaning device according to the present invention automatically carries out the IC from the holder after soldering and stores it in the magazine after passing through the cleaning, draining, and drying steps.
Work efficiency can be improved, and since the cleaning liquid completely contacts all IC package surfaces and external leads during cleaning, a sufficient cleaning effect can be obtained. Because it is completely exposed, the quality of the product is extremely effective.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例である洗浄装置の概略全体構
成図、第2図は洗浄部の部分断面斜視図、第3図は洗浄
部の搬送レールの部分断面図、第4図は乾燥部における
ICの保持状態を示す断面図、第5図は従来の半田付は
処理用保持具のIC保持状態を示す断面図である。 尚、図において1・・・ICパッケージ、2・・・IC
の外部リード、3・・・上部保持具、4・・・下部保持
具、5・・・IC供給部、6・・・洗浄部、7・・・乾
燥部、8・・・IC収納部、9・・・搬送ビン、10・
・・搬送機構、11・・・搬送レール、12・・・洗浄
水噴射ノズル、13・・・攪拌用ノズル、14・・・洗
浄槽、15・・スリット、16・・・ガイド、17・・
・ガイド、18・・・吹出口、19・・吹出口、2o・
・・洗浄液、21・・・洗浄液供給ポンプ、22・・・
排液管、a−a’〜洗浄液の上面である。 第1図 第3図 14弓充摩糟
Fig. 1 is a schematic overall configuration diagram of a cleaning device that is an embodiment of the present invention, Fig. 2 is a partial cross-sectional perspective view of the cleaning section, Fig. 3 is a partial cross-sectional view of the conveyance rail of the cleaning section, and Fig. 4 is a partial cross-sectional view of the cleaning section. FIG. 5 is a cross-sectional view showing how the IC is held in the drying section, and FIG. 5 is a cross-sectional view showing how the IC is held by a conventional soldering holder. In addition, in the figure, 1...IC package, 2...IC
external lead, 3... upper holder, 4... lower holder, 5... IC supply section, 6... washing section, 7... drying section, 8... IC storage section, 9...Transportation bin, 10.
...Transportation mechanism, 11...Transportation rail, 12...Washing water injection nozzle, 13...Agitation nozzle, 14...Cleaning tank, 15...Slit, 16...Guide, 17...
・Guide, 18...Blowout outlet, 19...Blowout outlet, 2o・
...Cleaning liquid, 21...Cleaning liquid supply pump, 22...
Drain pipe, aa' - upper surface of cleaning liquid. Figure 1 Figure 3 Figure 14 Yumi Makasu

Claims (1)

【特許請求の範囲】[Claims] (1)半田付け処理用保持具に支持された集積回路装置
を搭載するIC供給部と、前記保持具より引き出してI
C供給部から搬出された集積回路装置を洗浄する洗浄部
と、洗浄された集積回路装置を乾燥する乾燥部と、乾燥
された集積回路装置をマガジンに収納させるIC収納部
と、集積回路装置に送りを与えて前記保持具より引き出
しこれを各部に沿って搬送する搬送機溝とからなり、前
記洗浄部を洗浄液を収容する洗浄槽と、該洗浄槽内の洗
浄液中に集積回路装置が没する高さ位置で該装置の下面
を支え、集積回路装置の下面に向けて洗浄液を噴射する
ノズルを上面に設けた搬送レールと、洗浄液の攪拌用ノ
ズルとにより構成し、さらに前記乾燥部に、集積回路装
置を線接触により支持させる棒状のガイドを設置したこ
とを特徴とする集積回路装置の洗浄装置。
(1) An IC supply unit that mounts an integrated circuit device supported by a holder for soldering, and an IC supply unit that is pulled out from the holder and
A cleaning section that cleans the integrated circuit device carried out from the C supply section, a drying section that dries the cleaned integrated circuit device, an IC storage section that stores the dried integrated circuit device in a magazine, and an IC storage section that stores the dried integrated circuit device in a magazine. The integrated circuit device is comprised of a conveyor groove that feeds the parts and pulls them out of the holder and conveys them along each part; It supports the bottom surface of the device at a height position, and is composed of a transport rail having a nozzle on the top surface for spraying cleaning liquid toward the bottom surface of the integrated circuit device, and a nozzle for stirring the cleaning liquid. A cleaning device for an integrated circuit device, characterized in that a rod-shaped guide is installed to support the circuit device through line contact.
JP59209572A 1984-10-05 1984-10-05 Integrated circuit device cleaning apparatus Pending JPS6188531A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59209572A JPS6188531A (en) 1984-10-05 1984-10-05 Integrated circuit device cleaning apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59209572A JPS6188531A (en) 1984-10-05 1984-10-05 Integrated circuit device cleaning apparatus

Publications (1)

Publication Number Publication Date
JPS6188531A true JPS6188531A (en) 1986-05-06

Family

ID=16575050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59209572A Pending JPS6188531A (en) 1984-10-05 1984-10-05 Integrated circuit device cleaning apparatus

Country Status (1)

Country Link
JP (1) JPS6188531A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0235979A (en) * 1988-07-22 1990-02-06 Isamu Mitsunaka Cleaning apparatus
JPH04215879A (en) * 1990-11-26 1992-08-06 Seiko Epson Corp Workpiece cleaning method and cleaning device
JPH0647354A (en) * 1992-07-28 1994-02-22 Matsushita Electric Works Ltd Apparatus for washing hoop material
JPH06285440A (en) * 1992-04-16 1994-10-11 Seikosha Co Ltd Cleaning and drying apparatus
JP2002252200A (en) * 2001-02-22 2002-09-06 Hitachi Electronics Eng Co Ltd Substrate processing apparatus and processing method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416856A (en) * 1977-07-08 1979-02-07 Nippon Gakki Seizo Kk Apparatus for cleaning and drying steel plate
JPS58147246A (en) * 1982-02-26 1983-09-02 Nec Corp Switching control system for digital phase demodulator
JPS5997761A (en) * 1982-11-29 1984-06-05 Tamura Seisakusho Co Ltd Automatic soldering device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416856A (en) * 1977-07-08 1979-02-07 Nippon Gakki Seizo Kk Apparatus for cleaning and drying steel plate
JPS58147246A (en) * 1982-02-26 1983-09-02 Nec Corp Switching control system for digital phase demodulator
JPS5997761A (en) * 1982-11-29 1984-06-05 Tamura Seisakusho Co Ltd Automatic soldering device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0235979A (en) * 1988-07-22 1990-02-06 Isamu Mitsunaka Cleaning apparatus
JPH04215879A (en) * 1990-11-26 1992-08-06 Seiko Epson Corp Workpiece cleaning method and cleaning device
JPH06285440A (en) * 1992-04-16 1994-10-11 Seikosha Co Ltd Cleaning and drying apparatus
JPH0647354A (en) * 1992-07-28 1994-02-22 Matsushita Electric Works Ltd Apparatus for washing hoop material
JP2002252200A (en) * 2001-02-22 2002-09-06 Hitachi Electronics Eng Co Ltd Substrate processing apparatus and processing method

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