JPS6189629A - Method and device for drawing by scan-type beam - Google Patents

Abstract

PURPOSE:To avoid the reduction of a throughput by a method wherein a beam irradiation is conducted as a normal scan when the drawing part of a drawing pattern is scanned, while the beam irradiation is conducted as a correcting scan when the non- drawing part thereof is scanned, and thus the normal scan and the correcting scan are conducted simultaneously by one scanning. CONSTITUTION:A beam amount switching circuit 43 fulfills a function of impressing a voltage on a blanking electrode 41 so that a first beam amount can be obtained when scanning is conducted on a drawing part and that a second beam amount can be obtained when scanning is conducted on a non-drawing part. A blanking control circuit 43 fulfills a function of impressing a voltage on the blanking electrode 41 so that the beam amount can be reduced to zero at a time when the stoppage of a beam irradiation is needed, such as the time of return of a scan line. On the other hand, a beam radius controlling device 50 is composed of a beam radius adjusting electrode 51 and a beam radius shifting circuit 52. The beam radius shifting circuit 52 shifts a voltage impressed on the beam radius adjusting electrode 51 so that a first beam radius can be obtained when scanning is conducted on the drawing part and that a second beam radius can be obtained when scanning is conducted on the non-drawing part.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a scanning device and a scanning device;
The present invention relates to a scanning beam lithography method and lithography apparatus using a beam such as an electron beam, which is used for forming masks for integrated circuits or patterning wafers.

[Technique of the Invention 3 (1) In general, correction is made for 1"4" and "near" A+Song in which pattern formation is performed using an electron beam.

First, I will briefly explain this effect. Now, as shown in Fig. 2(a), a drawing pattern 2 consisting of (14) is formed on the pattern forming surface 1 (for example, a cliff) 91 wooden planks) [-] from the drawing part 2' and the non-drawing part 2''. In order to form such a line and space pattern, as shown in Fig. 2(b),
It is only necessary to shine the beam onto the pattern forming surface C)I tJ only when A3 is in G position.Actually, one beam is scanned over the pattern forming surface.
While scanning (the beam is illuminated q.1, the beam is not used for black while scanning the non-1i6 image area 2'').

However, when such scanning is performed, the dose amount on the pattern forming surface becomes as shown in FIG. 2(C). The reason why the dose has such a distribution is that in addition to the dose component caused by forward scattering of the beam, there is also a dose component caused by backward scattering. For example, in the case of an electron beam, the dose component J caused by the beam A shown in FIG.
) M- due to 1-direction scattering by anti-e4 electrons after 0-direction scattering
It is the sum of the dose component A″ (background dose). Therefore, the 1-helson distribution when beams l\A to G are used as black is the sum of the back 81 dose components (1-1) and the forward scattering of each beam. Peak A: is a composite peak.Based on such dose intervention, for example, if we assume that a pattern is formed only when the dose is iQ higher than the broken line in Fig. 2 (C), then the pattern △ Rice G
This phenomenon is generally considered to be the proximity effect.

- As a supplementary iE means for dealing with the proximity effect as mentioned above, dose correction, shape correction, etc. using a Vexk type 1111 imaging device have been known, but scanning type (Rask type) 1
Applying the same method to a single-generation device is technically difficult (this is very difficult).
1 is actually 1; 4r is almost never done.

R] Is there a way to effectively use the proximity effect described above?
announced by. Below is a brief explanation of this method (11 (
Let me explain this. (13 theory': tm t got stuck (Ma, j 8ρp1. Phys, vol.

54, (G)1'183ρ3573.

Let us now consider the case of forming a line and space pattern as shown in No. 2121(a). , 1: The,
As mentioned above, the normal scanning is performed by subtracting the dose 4i by 1 as shown in FIG. That is, in the drawing pattern shown in FIG. 3(a), the drawing part 2'
While scanning, the beam is not irradiated [).j, and while scanning the non-drawing area 2'', the beam is irradiated.

This is because the relationship between black and non-irradiation is completely opposite to that of the normal scanning mentioned above. The scanning conditions are such that the sum of the backscattering and the backscattering is equal to the backscattering (backlight dose) multiplied by 13 times in 114 scans.

Figure 3(b) shows this correction scanning (Zuru beam illumination Q'1
This section is shown in Figure 3 (C). +fi Shows the dose distribution Q (broken line) in IT constant scanning>J-o For example, the dose component caused by the beam J disappears like J'. In the end, the beams ■ to P are illuminated (the dose of J-1 is 1j, which is fl of 8 dosing components).

In this way, by performing two scans, the normal scan and the supplementary II scan, to draw one drawing pattern, the final dose II is determined by the second II scan, as shown in Fig. 4. Figure (C) shows the sum of the size (1'+) and the distribution shown in Figure 3 (C), and the total dorsal dose H is canceled out by the correction dose Q, and correction for the proximity effect is made. It turns out.

[Problems with back-steering technology]

The aforementioned Geraint Owcn and Paul Riss
Although the method announced by Man. That is, since the same pattern is scanned twice to draw one drawing pattern, the scanning time is twice as long as that required for one scanning. Considering the time required to adjust the beam spacing and beam diameter between the normal scan and the correction scan, the throughput will be less than □ compared to a method using one scan. Such a reduction in throughput is a serious problem in the manufacture of integrated circuits that require high production efficiency and early production.

[Purpose of the invention]

SUMMARY OF THE INVENTION An object of the present invention is to provide a scanning beam writing method and a writing apparatus that can correct the proximity effect without causing a reduction in throughput.

(Summary of the Invention) A feature of the present invention is that in a scanning beam lithography method and lithography apparatus in which the proximity effect caused by regular scanning of the field is canceled out by correction scanning, when the drawing portion of the drawing pattern is scanned, the Beam irradiation is performed as a scan of
When scanning a non-drawing area, beam aiming mark 1 is performed as a correction scan, so that normal scanning and correction scanning are performed in the same song in one scan, thereby avoiding a drop in throughput. It is in.

[Embodiments of the Invention] The present invention will now be described with reference to an illustrative embodiment.Let us now consider the case of forming a line-and-space pattern as shown in FIG. 5(a). Assume that scanning is performed from left to right of the illustrated pattern. First, the scan is non(1
1" Since it is performed from both parts, the beam I for correction scanning is irradiated (FIG. 5(b)). Next, the drawing part 2'
In the scanning, beam A is irradiated as normal scanning.

Therefore, at this point, the beam amount and beam diameter are switched.

Next, in the scanning of the non-drawing area 2'', correction scanning is performed again.
The beam amount and beam diameter are changed over, and the beam J
is irradiated. Thereafter, scanning continues in the same manner while changing the beam size and beam diameter depending on whether it is a drawing area or a non-writing area. This scanning condition is the J: sea urchin correction scan and 4(
The condition is such that the sum of forward scatter and back scatter becomes similar to back scatter (backward scattering) in normal scanning. This condition can be achieved, for example, by reducing the distance between beams and widening the beam diameter in correction scanning compared to normal scanning.

When the scanning is completed in this way, the final dose distribution becomes as shown in Fig. 5 (C). This is a distribution in which the proximity effect has been corrected, similar to the distribution shown in FIG.

An example of a beam drawing apparatus is shown in FIG. The pattern forming surface support drive device 20 includes an X-Y stage 21 on which a semiconductor device, etc. is placed, an X-Y drive motor 22 that drives the stage, and a W that controls this.
Jzuru X-Y position control circuit 23 and X-Y stage 21
It is composed of a laser holder 24 and a position measuring circuit 25 for measuring the position of the holder. A beam scanning control device 30 that scans the generated electron beam on a pattern forming surface includes a deflection electrode 31 and a raster leakage circuit 3.
It is composed of 2. A voltage 1jll is applied to the deflection electrode 31 by the Rask deflection circuit 32, and the electron beam passing therethrough is scanned on the pattern forming surface. beam fr
! The ill fill device 40 includes blanking electrodes 41, beams i;j 1. I] consists of an exchange path 42, a blanking control circuit 43, and the like.

The blanking electrode 41 is located at the crossover part of the electron beam, and adjusts the electron beam's
I will. That is, when the beam JD switching circuit 42 scans the drawing area, the beam changes from the first angle to -1\\, and from non-11''1°.
The blue light that runs over 61 tons of cars is suspended from the second beam by the Jinon King Electric Power (41) (sign Ll + 1).
11 Riruru C! 4 ii sung, I run* n'/
a+'l '0111"l Gakuryaku431J:, rt line sidori lRr':'i ]] e'-muteru, M (7
) l'F stop/" necessary 'j, and in 3, the function of applying '1b pressure to the blanking electric fear 41 to lower the beam suspension was established by Song J-0-YNO, beam (completed). , Ii control device 50 is composed of 114 beam diameter adjustment circuits 1 to 51 and a beam diameter switching circuit 52. Beam diameter switching circuit 5
2, the voltage applied to the beam diameter adjustment electrode 51 is applied so that the first beam diameter increases when scanning the drawing area, and the second beam diameter increases when scanning the non-writing area. Switch. I picture control' device 60 L, Raijin (Formula 61, pattern data storage device (U2), drawing driver 1 to pattern machine 63, drawing controller λ11 circuit 64, etc., synchronization circuit 6b) , h to 1 are formed. Among the patterns 111' and 1 stored in the pattern data storage device 62, one of the patterns to be scanned (the pattern data for 0 is "1°"
63 i, :
Ill'1 Image Control 2II
Round 2R (, L, while looking at this drummy pattern 8 times,
Beam^'/switching circuit 42, blanking control circuit 71
3. (1'3J, beam diameter switching circuit 52 (required instructions 4')
Yoden'5 j l/] circuit 65
The position of the rask width direction circuit 32 and the drawing control circuit 64 are sent to the rask width direction circuit 32 and the drawing control circuit 64.

In the above-described embodiment, the adjustment edge 1'1 of the beam suspension and the blanking operation are both performed using the same blanking electrode 41.
Although this is done using a beam, the adjustment operation for the beam can be done by providing a separate surface adjustment (no C).

(Effects of the Invention) As described above, according to the present invention, since normal scanning and correction scanning are performed at the same time, the throughput can be corrected without reducing the throughput by more than 10%. can be applied to perform lζ scanning beam writing).

[Brief explanation of the drawing]

Fig. 1 shows an embodiment of the scanning beam lithography system according to the present invention. Explanatory diagram showing Irj, Figure 3 tit ?+Ii i "Beam glaucoma in scanning and its 1 □ Showing the dose suspension distribution of the Song Dynasty? l Explanatory diagram, Figure 4 shows normal scanning and supplementary! [The dose amount obtained by performing both of the steps 1 and 1 is 1, 1, and 5. Explanation showing the resulting dose 1゛11min Ii of q・1 etc. [See Figure-C.]...Pattern forming surface, 2...1v1 both patterns, 10...Beam light generating device, 11...electronic U12
... Electron light -; Twin thread, 20 ... Bakun formation face support 1
,'I drive unit;I''・'1.21...X-Y sub--
C, 22...X-, Y drive up, ? 3...X-
Y position system 1 circuit, 2.4... Rayleigh ■4 total, 2
! □5...(, Equipment measurement circuit, 30... Beer l
j, 32... raster deflection circuit, 40... him'-me i
ii djl? )II S4<:i'i, 41--
1 Run-CI/'ri'i"fi +'II, 42・
...Beam/l cutting circuit, 43... Planking Co. 1
(Control circuit, 50... Beam diameter control device t, 5) 1.
...beam diameter adjustment electrode, 52...beam diameter switching circuit,
60... li+'i image control device, 61... Electric p1 geometry, 62... Pattern data storage device, 63... Dot pattern null for drawing, 64... Drawing control circuit, 6
5...Synchronous circuit. Applicant's agent Ino II9 Qing Figure 3 Pattern Seki Figure 4 ABCDEFG Figure 5

Claims (1)

[Scope of Claims] 1. A scanning beam lithography method for forming a drawing pattern consisting of a drawing area and a non-writing area on a pattern forming surface, wherein when scanning the drawing area, a first performing a first beam irradiation with a beam amount and a first beam diameter, and when scanning the non-drawing area, performing a second beam irradiation with a second beam amount and a second beam diameter; A scanning beam drawing method characterized in that scanning is performed while alternately switching between the first beam irradiation and the second beam irradiation. 2. The scanning beam drawing method according to claim 1, wherein the proximity effect is corrected by a summation effect of the first beam irradiation and the second beam irradiation. 3. The first beam amount is larger than the second beam amount, and the first beam amount is larger than the second beam amount.
3. The scanning beam drawing method according to claim 2, wherein the beam diameter is smaller than the second beam diameter. 4. A scanning beam lithography device that forms a drawing pattern on a pattern forming surface, which includes a drawing section and a non-writing section, comprising: a beam generating device that generates a drawing beam; and a pattern that supports the pattern forming surface. a forming surface support device; a beam scanning control device that scans the beam generated by the beam generating device on the drawing pattern forming surface; and a beam scanning control device that scans the beam generated by the beam generating device over the drawing section. a beam amount control device that sets the beam amount to a first beam amount when scanning the non-drawing portion and a second beam amount when scanning the non-drawing portion; a beam diameter control device that sets the beam diameter to a first beam diameter when scanning the non-writing portion, and sets the beam diameter to a second beam diameter when scanning the non-writing portion; 5. A scanning beam drawing apparatus according to claim 4, wherein the drawing beam is an electron beam.