JPS6190733A - Fluid treating apparatus - Google Patents
Fluid treating apparatusInfo
- Publication number
- JPS6190733A JPS6190733A JP59211773A JP21177384A JPS6190733A JP S6190733 A JPS6190733 A JP S6190733A JP 59211773 A JP59211773 A JP 59211773A JP 21177384 A JP21177384 A JP 21177384A JP S6190733 A JPS6190733 A JP S6190733A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- upstream
- section
- gas
- fluid treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J10/00—Chemical processes in general for reacting liquid with gaseous media other than in the presence of solid particles, or apparatus specially adapted therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Of Particles Using Liquids (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Gas Separation By Absorption (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、一般にバブラー(あるいはトラップ装置)と
称され、気体を液体中に送り込むことができる構造を有
する流体処理装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a fluid treatment device, generally called a bubbler (or trap device), having a structure capable of sending gas into a liquid.
(従来の技術)
一般にバブラー(あるいはトラップ装置)と称される流
体処理装置は、液体の蒸気圧に相当する飽和気体を得る
場合、あるいは、液体に気体の一部または全部を溶解、
若しくは反応させる場合、さらには、気体中にある固体
等を取り除く場合などに広く使用されている。(Prior Art) A fluid treatment device generally called a bubbler (or trap device) is used to obtain saturated gas corresponding to the vapor pressure of a liquid, or to dissolve part or all of a gas in a liquid.
It is widely used in cases where solids or the like present in gases are removed.
上記装置の従来の構造を第5図従来装置の構造断面図に
従って説明すれば、装置外部から気体が流入する上流部
(1)、装置内の液体貯留槽(8)中にあって、前記気
体を液体中に送り込む上流部(1)下側の吹出部(3)
、該液体中を通過した気体を装置外部へ排出する下流部
(2)より成り立っている。The conventional structure of the above device will be explained with reference to FIG. 5, which is a cross-sectional view of the structure of the conventional device. Upstream section (1) that sends the liquid into the liquid; Lower blowout section (3)
, and a downstream section (2) that discharges the gas that has passed through the liquid to the outside of the device.
(発明が解決しようとする問題点)
上記装置を用いて外部より気体を液体中へ送り込む場合
には、適当量(装置内に液体を収容できる貯留槽(8)
の全容積の例えば%〜%の量)の液体(4)を装置に入
れ、上流部(1)の気体の圧力を下流部(2)よりも高
くして、気体を液体中に送り込む。そのとき、万一下流
部(2)側の圧力が上流部(1)側より部へ液体が流出
する可能性がある。このため、使用者は逆流時1]二の
ために、装置外部に液体流出防止用バルブなどを設けて
、下流部(2)側の圧力が高くならぬよう上流部(1)
と吹出部(3)との間に、かなりの高低差を設けるなど
、その他特別の処置を講じるか、あるいは、逆流しても
外部装置などへ影響を及ぼさぬよう、装置外部に空の容
器を液体溜めとして設けるなどの対策を講じる。然し、
上記の対策は、作業スペースが大きくなり、操作も繁雑
になって、費用もかかる。装置外部に液体溜めを設ける
方法は、外部装置などへの影響を防ぐことはできても、
逆流して外部の液体溜めに入った液体は、下流側の気圧
を下げないかぎりその壕までは元の装置内に戻ることは
なく、その後、例え上流部側の圧力が高くなっても、液
体中に気体を注入することはできない。(Problems to be Solved by the Invention) When sending gas into a liquid from the outside using the above device, an appropriate amount (a storage tank (8) that can accommodate the liquid within the device) is required.
% to % of the total volume of the liquid (4) is placed in the device, the pressure of the gas in the upstream part (1) is higher than in the downstream part (2), and the gas is forced into the liquid. At that time, there is a possibility that the pressure on the downstream part (2) side causes liquid to flow out from the upstream part (1) side. Therefore, in case of backflow (1), the user must install a liquid leakage prevention valve on the outside of the device to prevent the pressure on the downstream (2) side from increasing.
Take other special measures, such as creating a considerable height difference between the air outlet and the outlet (3), or place an empty container outside the device to prevent backflow from affecting external equipment. Take measures such as setting it up as a liquid reservoir. However,
The above measures require a large work space, are complicated to operate, and are expensive. Although the method of providing a liquid reservoir outside the device can prevent effects on external devices,
Liquid that flows backwards and enters the external liquid reservoir will not return to the original device until the pressure on the downstream side is lowered. After that, even if the pressure on the upstream side increases, the liquid will not flow back into the device. Gas cannot be injected into it.
(問題点を解決するための手段)
本発明は、かかる現状の問題点を解決すべく検討を行な
った結果、下流部の圧力が高くなった場合でも、装置外
部に液体が流出することのないようにしたもので、装置
内の上流部に、液体を収容するに十分な容積を有する液
体留めを有することを主たる特徴とするものであり、図
面により本発明の詳細な説明すれば、第1図、装置外部
から気体が流入する上流部(1)と、装置貯留部(8)
内の液体(4)に前記気体を送り込む上流部(1)下側
の吹出部(3)と、該液体中を通過した気体を装置外部
へ排出する下流部(2)とからなる送流管を備えた流体
処理装置において、装置内に貯留される前記液体(4)
の全体積以上の容積を有する液体留め(5)を上流部(
1)に設けたことを特徴とする流体処理装置である。(Means for Solving the Problems) As a result of studies to solve the current problems, the present invention has been developed to prevent liquid from flowing out of the device even when the downstream pressure increases. The main feature of this device is that it has a liquid retainer having a sufficient volume to accommodate the liquid in the upstream part of the device. Figure: Upstream section (1) where gas flows in from outside the device and device storage section (8)
A flow pipe consisting of an upstream part (1) that sends the gas into the liquid (4) inside, a lower blowing part (3), and a downstream part (2) that discharges the gas that has passed through the liquid to the outside of the device. In a fluid treatment device comprising: the liquid (4) stored in the device;
A liquid retainer (5) having a volume greater than or equal to the total volume of the upstream part (
1).
本発明装置は、さらに、処理液体留め(5)の底部(1
1)が吹出部側に傾斜していることを特徴とするもので
あり、さらに、本発明装置は、他の実施例として、第3
図、液体が入っている装置内貯留部(8)と、上流部(
I)とが分離可能であることを特徴とするものであり、
さらに本発明装置は、上流部(1)及び下流部(2)の
流出口継手(9)部分が自在に曲げ伸縮可能なことを特
徴とするものである。The apparatus of the present invention further comprises a bottom (1) of the processing liquid retainer (5).
1) is characterized in that it is inclined toward the blowing part side.Furthermore, as another embodiment, the device of the present invention is characterized in that the third
Figure shows the internal storage part (8) containing liquid and the upstream part (
I) is characterized in that it is separable from
Furthermore, the device of the present invention is characterized in that the outlet joints (9) of the upstream section (1) and the downstream section (2) can be freely bent and expanded.
本発明を図面に従って具体的に説明すれば、第2図は、
本発明による流体処理装置の構造を示す断面図であり、
気体は上流部(1)から装置内部に入り、液体留め(5
)を通って吹出部(3)から液体(4)中に注入され、
液体(4)中を通過した後、下流部(2)より装置外部
へ排出される。If the present invention is specifically explained according to the drawings, FIG.
1 is a sectional view showing the structure of a fluid treatment device according to the present invention,
Gas enters the inside of the device from the upstream part (1) and enters the liquid retainer (5).
) is injected into the liquid (4) from the blowout part (3),
After passing through the liquid (4), it is discharged from the downstream part (2) to the outside of the device.
第3図は、下流部(2)の圧力が高くなり、液体(4)
が逆流した場合の状態の断面で、液体(4)は、液体留
め(5)に収容され、装置外部へは流出しない。然も、
液体留め(5)に入った液体は、上流部側の圧力が高く
なれば、吹出部(3)より流出して装置の底に自然に戻
り、再び液体中へ気体を送り込むことができる。その場
合、液体留″めの底部01)が吹出部(3)=5−
側に所望角度で傾斜していると、液体留め(5)の液体
は装置の底に戻り易い。また、第3図に図示するごとく
、液体(4)が入っている部分と上流部(1)に直結す
る液体留め(5)とが分離可能であれば、液体(4)の
交換や装置の洗浄などが容易となる。Figure 3 shows that the pressure in the downstream part (2) increases and the liquid (4)
In this cross section, the liquid (4) is contained in the liquid retainer (5) and does not flow out of the device. Of course,
When the pressure on the upstream side increases, the liquid that has entered the liquid retainer (5) flows out from the blow-off part (3) and naturally returns to the bottom of the device, allowing gas to be sent into the liquid again. In that case, if the bottom part 01) of the liquid retainer is inclined at a desired angle toward the blowout part (3)=5- side, the liquid in the liquid retainer (5) will easily return to the bottom of the device. As shown in the figure, if the part containing the liquid (4) and the liquid retainer (5) directly connected to the upstream part (1) can be separated, it will be easy to replace the liquid (4) and clean the device. becomes.
本発明による流体処理装置は、加圧に耐え、液体及び気
体を構成する成分による腐蝕に対し、十分耐えるもので
あれば全ての液体、気体に対して使用できる。特に、空
気に直接触れてはならない液体に対しては、安全性の面
から極めて有効である。The fluid treatment device according to the present invention can be used for all liquids and gases as long as they can withstand pressurization and are sufficiently resistant to corrosion by components constituting the liquids and gases. In particular, it is extremely effective from a safety standpoint for liquids that must not come into direct contact with air.
例えば、近年、半導体の分野で盛んに使用されている有
機金属(例えば、ジエチル亜鉛、トリメチルアルミニウ
ム、トリエチルガリウム、トリエチルガリウム、トリイ
ソブチルアルミニウムなど)は、酸素との反応性が非常
に高く、空気に触れただけで発火することがあり、場合
によっては爆発する危険がある。このため、上記の有機
金属のような反応性の高い液体を用いる場合は、処理装
置自体が安全な液体容器を兼ねており、安全性6一
の面かも、例えばステンレス等で作られており、配管も
ステンレス等で行なう。このため、使用者は外部から液
体の逆流を確認できず、また従来の安全容器を兼ねた装
置では、装置を交換するために取り外す場合など、逆流
によって装置外部に液が流出して、発火、爆発する危険
性が極めて高いため前述したごとく、安全性の面から極
めて有効である。For example, organic metals (e.g., diethylzinc, trimethylaluminum, triethylgallium, triethylgallium, triisobutylaluminum, etc.) that have been widely used in the semiconductor field in recent years are highly reactive with oxygen and It may ignite just by touching it, and in some cases there is a risk of explosion. For this reason, when using highly reactive liquids such as the above-mentioned organometallic substances, the processing equipment itself also serves as a safe liquid container, and may be made of stainless steel, etc., for safety reasons. The piping will also be made of stainless steel. For this reason, the user cannot confirm the backflow of liquid from the outside, and with conventional devices that also serve as safety containers, when the device is removed for replacement, the backflow can cause the liquid to flow out of the device, causing ignition. As mentioned above, it is extremely effective from a safety standpoint since the risk of explosion is extremely high.
(効 果)
本発明による装置を使用すれば、装置外部に液体が流出
する可能性がないため、極めて安全に作業することがで
きる。捷だ、万一逆流した場合にも、上流側の圧力が再
び高くなれば、液体が自然に戻るため、逆流のたびに装
置を外ずして、液体を元に戻す必要はない。(Effects) If the device according to the present invention is used, there is no possibility of liquid leaking outside the device, so work can be performed extremely safely. Even if there is a backflow, the liquid will return naturally when the upstream pressure increases again, so there is no need to remove the device and return the liquid every time there is a backflow.
以上、本発明による流体処理装置を用いて、各種用途に
使用する気体を処理することにより、使用者が特別の処
置を講じなくとも、安全に、能率よく作業できるように
なった。As described above, by using the fluid treatment device according to the present invention to treat gases used for various purposes, the user can now work safely and efficiently without taking any special measures.
(実施例1)
第4図に図示するように、装置本体はステンレス製で、
上流部(])及び下流部(2)にそれぞれパルプ(6)
(NUPRO製 5S−48に、−51)を、継手(
9) (CAJON製 5S−4VCR,−2−GR,
5S−4VCR−3,5S−4VCR−4)を介して取
付けである。洗浄用口(7)は、装置内部を洗浄する場
合の洗浄液の出入口である。(Example 1) As shown in Fig. 4, the main body of the device is made of stainless steel.
Pulp (6) in the upstream part (]) and downstream part (2), respectively.
(manufactured by NUPRO 5S-48, -51) to the fitting (
9) (CAJON 5S-4VCR, -2-GR,
5S-4VCR-3, 5S-4VCR-4). The cleaning port (7) is an inlet/outlet for cleaning liquid when cleaning the inside of the device.
上流部(1)には、容積約34Jの液体留め(5)を備
え底部(If)は、約15°の傾斜をつけている。ジエ
チル亜鉛の入っている装置の部分は、直径34UL;l
。The upstream part (1) is provided with a liquid retainer (5) having a volume of about 34 J, and the bottom part (If) is inclined at about 15°. The part of the apparatus containing diethylzinc has a diameter of 34 UL;
.
高さ180111711パルプ(6)を含めた容器全体
の高さは3401EIRに設定して作成した装置を使用
して、装置貯留部(8)内に、処理液としてジエチル亜
鉛259を空気に触れないように上流部(1)側より封
入する。Height 180111711 The height of the entire container including the pulp (6) is set to 3401 EIR. from the upstream part (1) side.
次に気体供給側と上流部(1)を連結して、上流部(1
)よりヘリウムガスを所定圧力で圧送注入することによ
り、ジエチル亜鉛が砲和したヘリウムガスを得ることが
できた。この場合、ジエチル亜鉛25q゛の容積は約2
5mA’で、液体留めの容積の方が大きく、従って装置
外部にジエチル亜鉛が流出することばなかった。Next, connect the gas supply side and the upstream section (1), and connect the upstream section (1) to the gas supply side.
), it was possible to obtain helium gas bombarded with diethylzinc by injecting helium gas at a predetermined pressure. In this case, the volume of 25 q゛ diethylzinc is approximately 2
At 5 mA', the volume of the liquid retainer was larger, so diethylzinc did not leak out of the device.
(実施例2)
第3図に図示するように、装置全体はガラス製で、上流
部(1)及び約50m庫体留め(5)、吹出部(3)と
、液体(4)として硫酸の入る容器としての貯留部(8
)及び下流部(2)とは、摺り合わせになっており、装
置全体の大きさは、高さ約15cmに設定した装置を使
用した。(Example 2) As shown in Fig. 3, the entire device is made of glass, and includes an upstream section (1), a storage body retainer (5) of about 50m, a blowout section (3), and a sulfuric acid solution as a liquid (4). Reservoir as a container (8
) and the downstream part (2) were rubbed together, and the overall size of the device was set to about 15 cm in height.
装置の一ヒ部開ロ部より貯留部(8)内に濃硫酸約30
m1!を入れた後、上流部(1)より相対湿度30%の
空気を導入して、濃硫酸液体中に該空気を送り込むこと
により、下流部(2)より相対湿度0.1%以下の空気
を得た。この場合、下流部(2)の圧力が高くなっても
、濃硫酸は、液体留め(5)に入り、装置外部に流出す
ることはなかった。Approximately 30 ml of concentrated sulfuric acid is contained in the storage part (8) from the opening of one part of the device.
m1! After introducing air with a relative humidity of 30% from the upstream part (1) and feeding the air into the concentrated sulfuric acid liquid, air with a relative humidity of 0.1% or less is introduced from the downstream part (2). Obtained. In this case, even if the pressure in the downstream section (2) increased, the concentrated sulfuric acid entered the liquid retainer (5) and did not flow out of the apparatus.
第1図は、本発明の流体処理装置の基本的構造を示す断
面図、第2図は、本発明の流体処理装置において液体が
逆流した場合の様子を説明する断面図、第3図、第4図
は、本発明の流体処理装置の実施例を示す要部断面図、
第5図は、従来の流体処理装置の基本的構造を示す断面
図である。
1・・上流部 2・・下流部
3・・・吹出部 4・・液 体5・・液体留め
6・・・バルブ7・・・洗浄用口 8・
・・貯留部9・・継 手 JO・・摺り合せI
f・・・液体留め底部FIG. 1 is a sectional view showing the basic structure of the fluid treatment device of the present invention, FIG. 2 is a sectional view illustrating what happens when liquid flows backward in the fluid treatment device of the present invention, FIG. 4 is a cross-sectional view of essential parts showing an embodiment of the fluid treatment device of the present invention;
FIG. 5 is a sectional view showing the basic structure of a conventional fluid treatment device. 1.Upstream section 2.Downstream section 3.Blowout section 4.Liquid 5..Liquid retainer 6..Valve 7..Cleaning port 8.
・Reservoir 9 ・Joint JO ・Slide I
f...liquid retainer bottom
Claims (1)
体に前記の気体を送り込む上流部下側の吹出部と、該液
体中を通過した気体を装置外部へ排出する下流部とから
なる送流管を備えた流体処理装置において、装置内に貯
留される前記液体の全体積以上の容積を有する液体留め
を上流部に設けたことを特徴とする流体処理装置。 2)液体留めの底部が吹出部側に傾斜していることを特
徴とする特許請求の範囲第1項記載の流体処理装置。 3)液体が入っている装置内貯留部と、上流部とが分離
可能である特許請求の範囲第1項及び第2項記載の流体
処理装置。 4)上流部及び下流部の継手部分が自在に曲げ伸縮可能
な特許請求の範囲第1項、第2項及び第3項記載の流体
処理装置。[Claims] 1) An upstream section into which gas flows from outside the device, a blow-out section below the upstream section which sends the gas into the liquid inside the device, and a blow-off section below the upstream side which discharges the gas that has passed through the liquid to the outside of the device. What is claimed is: 1. A fluid treatment device comprising a flow pipe consisting of a downstream portion and a downstream portion, the fluid treatment device comprising a liquid retainer having a volume greater than the total volume of the liquid stored in the device in the upstream portion. 2) The fluid treatment device according to claim 1, wherein the bottom of the liquid retainer is inclined toward the blowout portion. 3) The fluid processing device according to claims 1 and 2, wherein the internal storage section containing the liquid and the upstream section are separable. 4) The fluid treatment device according to claims 1, 2, and 3, in which the upstream and downstream joint portions are freely bendable and expandable.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59211773A JPS6190733A (en) | 1984-10-09 | 1984-10-09 | Fluid treating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59211773A JPS6190733A (en) | 1984-10-09 | 1984-10-09 | Fluid treating apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6190733A true JPS6190733A (en) | 1986-05-08 |
| JPS6320569B2 JPS6320569B2 (en) | 1988-04-28 |
Family
ID=16611350
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59211773A Granted JPS6190733A (en) | 1984-10-09 | 1984-10-09 | Fluid treating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6190733A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0317473U (en) * | 1989-07-04 | 1991-02-21 |
-
1984
- 1984-10-09 JP JP59211773A patent/JPS6190733A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6320569B2 (en) | 1988-04-28 |
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