JPS62104109A - Soft magnetic thin film - Google Patents

Soft magnetic thin film

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Publication number
JPS62104109A
JPS62104109A JP24456385A JP24456385A JPS62104109A JP S62104109 A JPS62104109 A JP S62104109A JP 24456385 A JP24456385 A JP 24456385A JP 24456385 A JP24456385 A JP 24456385A JP S62104109 A JPS62104109 A JP S62104109A
Authority
JP
Japan
Prior art keywords
thin film
magnetic
soft magnetic
magnetic thin
permeability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24456385A
Other languages
Japanese (ja)
Other versions
JPH0746655B2 (en
Inventor
Osamu Ishikawa
理 石川
Masatoshi Hayakawa
正俊 早川
Kazuhiko Hayashi
和彦 林
Yoshitaka Ochiai
落合 祥隆
Hideki Matsuda
秀樹 松田
Hiroshi Iwasaki
洋 岩崎
Koichi Aso
阿蘇 興一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
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Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP60244563A priority Critical patent/JPH0746655B2/en
Publication of JPS62104109A publication Critical patent/JPS62104109A/en
Publication of JPH0746655B2 publication Critical patent/JPH0746655B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To obtain the soft magnetic thin film having high saturation magnetic flux density Bs and high permeability mu and especially sperior abrasion resistance property by specifying the composition of a soft magnetic thin film formed of an alloy of Fe-Co-Si-Al group added with Cr. CONSTITUTION:A magnetic thin film mainly composed of Fe, Co, Si and Al is added with chrominum Cr. Namely, Fe, Co, Si and Alare main components and the composition is as 5-15atm% Co, 6-17atm% Si, 2-13atm% Al, 0.5-7atm% N, and Fe as the remainder. If the content of Co is beyond the range of 5-15atm%, an increase of a coersive force or a decline of permeability can be observed. Also, 6-17atm% of Si and 2-13atm% of Al are necessary. If the contents of Si and Al are beyond such ranges, for example, a coersive force increases so that they can not be used as a core material of a magnetic head, and at the same time, a lowering of a saturation magnetic flux density or permeability can be observed.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は例えば薄膜磁気ヘッドに用いて好適な軟磁性薄
膜に係わる。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a soft magnetic thin film suitable for use in, for example, a thin film magnetic head.

(発明の概要〕 本発明は、Fe−Co−3i −Affi系合金にCr
を添加した軟磁性薄膜であり、その組成の特定により高
い飽和磁束密度Bsを有し、透磁率μが高く、特に耐摩
耗性にすぐれた軟磁性薄膜を得るものである。
(Summary of the Invention) The present invention provides a Fe-Co-3i-Affi alloy with Cr.
By specifying its composition, a soft magnetic thin film having a high saturation magnetic flux density Bs, a high magnetic permeability μ, and particularly excellent wear resistance can be obtained.

〔従来の技術〕[Conventional technology]

各種磁気記録再生装置において、高密度記録化、高周波
数化の要求が高まり、これに対応して高い飽和磁化、高
い保磁力の磁気記録媒体が用いられる。この種の磁気記
録媒体としては、Fe、 Co、 Ni等の強磁性全屈
の粉末を用いたいわゆるメタルテープや、強磁性金属材
料をベースフィルム上に被着して成るいわゆる蒸着テー
プなどが用いられるに至っている。
2. Description of the Related Art In various magnetic recording and reproducing devices, demands for higher density recording and higher frequency are increasing, and in response to this, magnetic recording media with high saturation magnetization and high coercive force are used. As this type of magnetic recording medium, there are so-called metal tapes using ferromagnetic total bending powder such as Fe, Co, and Ni, and so-called vapor-deposited tapes made of ferromagnetic metal materials coated on a base film. It has come to the point where

これに伴い、この種の磁気記録媒体に対する磁気ヘッド
としては、高い飽和磁束密度と高透磁率のヘッド材料に
よることが要求されると共に、高密度記録の要求から、
磁気媒体と磁気ヘッドとの相対速度が、より速められる
傾向にあり、これに伴ってヘッド材料としてできるだけ
、耐摩耗性が高(、耐蝕性にすぐれているなど、磁気特
性はもとより、化学的に安定で機械的特性にすぐれてい
ることなどが要求される。
Along with this, magnetic heads for this type of magnetic recording medium are required to be made of head materials with high saturation magnetic flux density and high magnetic permeability, and due to the demand for high-density recording,
The relative speed between the magnetic medium and the magnetic head is becoming faster, and as a result, the head material has as much wear resistance as possible (excellent corrosion resistance, etc.) as well as chemical properties. It is required to be stable and have excellent mechanical properties.

この磁性材として、高い透磁率を有し高い飽和磁束密度
Bsを有する非晶質(アモルファス)磁性合金材料を用
いることが考えられているが、この非晶質磁性合金材料
は耐熱性に難点があり、長時間の加熱や熱サイクルによ
り透磁率が大きく劣化し再生効率が悪くなる。特に結晶
化の可能性が大きいので500℃以上の温度を長時間加
えることはできないものであり、これがため、磁気ヘッ
ドの製造工程において例えばガラス融着のように500
℃以上の温度での処理を必要とする工程を採ることは好
ましくないなどの問題点がある。
As this magnetic material, it is considered to use an amorphous magnetic alloy material that has high magnetic permeability and a high saturation magnetic flux density Bs, but this amorphous magnetic alloy material has a drawback in heat resistance. However, due to long-term heating and thermal cycling, the magnetic permeability deteriorates significantly and the regeneration efficiency deteriorates. In particular, since there is a high possibility of crystallization, it is impossible to apply temperatures of 500°C or higher for a long time.For this reason, in the manufacturing process of magnetic heads, for example, 500°C
There are problems such as the fact that it is undesirable to use a process that requires treatment at a temperature higher than °C.

このような状況から、さらに良好な軟磁気特性を示す軟
磁性材料の研究が進められ、例えば山本達治・千葉久喜
共著、「日本金属学会誌」第14巻B、第2%(195
0年)には、Fe、 Co、 Siを主成分とするFe
Co−5i系合金材料が良好な軟磁気特性を示すことが
軸告されている。
Under these circumstances, research into soft magnetic materials that exhibit even better soft magnetic properties has progressed.
In 0 years), Fe containing Fe, Co, and Si as main components
It has been reported that Co-5i alloy materials exhibit good soft magnetic properties.

しかしながら、このFe−Co−5i系合金材は、極め
て脆弱で実用性に乏しく、そのまま磁気ヘッドのコア材
料として用いることには問題がある。
However, this Fe-Co-5i alloy material is extremely brittle and has poor practical use, and there are problems in using it as it is as a core material for a magnetic head.

一方、高密度記録化に伴って記録トラック幅、したがっ
て磁気ヘッドにおける、作動磁気ギャップのトラック幅
の狭小化が要求され、この要求に対応し、しかも特に多
トラツク磁気ヘッドにおいて著しく量産性の向上をはか
ることができるものとして非磁性ないしは磁性基板上に
軟磁性薄膜による磁気へソトコアを被着形成する薄膜技
術を用いた薄膜磁気ヘッドの普及がめざましい。この種
の軟磁性薄膜としてはFe、^/、Stを主成分とする
センダスト合金薄膜が注目を集めている。
On the other hand, with high-density recording, there is a need to narrow the recording track width, and therefore the track width of the working magnetic gap in magnetic heads. Thin film magnetic heads using thin film technology, in which a soft magnetic core is formed by adhering a soft magnetic thin film onto a non-magnetic or magnetic substrate, are becoming increasingly popular. As this type of soft magnetic thin film, a Sendust alloy thin film containing Fe, ^/, and St as main components is attracting attention.

このセンダスト合金薄膜は、高い飽和磁束密度Osを有
し、比較的高硬度を有するので、上述したメタルテープ
等のように高い残留磁束密度を有する磁気記録媒体に対
しても通用することが可能である。
This Sendust alloy thin film has a high saturation magnetic flux density Os and relatively high hardness, so it can be used for magnetic recording media with high residual magnetic flux density, such as the metal tape mentioned above. be.

しかしながら、このセンダスト合金薄膜は比較的高硬度
を有するものの例えばフェライト材等に比し耐摩耗性及
び耐蝕性に劣る。
However, although this sendust alloy thin film has relatively high hardness, it has inferior wear resistance and corrosion resistance compared to, for example, ferrite materials.

(発明が解決しようとする問題点) 本発明は上述した諸問題の改善をはかり、飽和磁束密度
Bs、透過率μの低下を来すことなく、保磁力11cが
小、磁歪λSが殆ど零、磁気異方性が小さい、すぐれた
磁気的特性を有すると共に、特に耐摩耗性にすぐれた軟
磁性薄膜を提供するものである。
(Problems to be Solved by the Invention) The present invention aims to improve the above-mentioned problems, and has a structure in which the coercive force 11c is small, the magnetostriction λS is almost zero, and the saturation magnetic flux density Bs and the transmittance μ are not reduced. The object of the present invention is to provide a soft magnetic thin film that has small magnetic anisotropy, excellent magnetic properties, and particularly excellent wear resistance.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、re、 Co、 Si及びAlを主成分とす
る磁性薄膜にクロムCrを添加する。
In the present invention, chromium Cr is added to a magnetic thin film whose main components are re, Co, Si, and Al.

すなわち、本発明は、Fe、 Co、 St及びA1を
主成分とし、その組成を、Coが5〜15原子%、Si
が6〜17原子%、Alが2〜13原子%、Nが0.5
〜7原子%、残部Peとする。
That is, the present invention has Fe, Co, St, and A1 as main components, and the composition is such that Co is 5 to 15 atomic %, Si is
is 6 to 17 at%, Al is 2 to 13 at%, N is 0.5
~7 atomic %, the balance being Pe.

尚、上述の組成を有する本発明による軟磁性薄膜の膜厚
としては、10Å以上1 ms以下であることが好まし
く、さらに10Å以上100μm以下であることがより
好ましい。
The thickness of the soft magnetic thin film according to the present invention having the above composition is preferably 10 Å or more and 1 ms or less, and more preferably 10 Å or more and 100 μm or less.

〔作用〕[Effect]

上述したように本発明による軟磁性薄膜は、Fe。 As mentioned above, the soft magnetic thin film according to the present invention is made of Fe.

Co、 Si、  Al及びCrを主成分とするもので
、Alの添加によってFe−Co−5i系軟磁性体に比
し、保磁力や磁歪の小さい透磁率の高い軟磁性体が得ら
れるものであるが、加えて本発明においては、これにC
rを含有することに特徴があり、これにより、特に耐摩
耗性が向上する。
The main components are Co, Si, Al, and Cr, and by adding Al, a soft magnetic material with high magnetic permeability and low coercive force and magnetostriction can be obtained compared to Fe-Co-5i-based soft magnetic materials. However, in addition, in the present invention, C
It is characterized by containing r, which particularly improves wear resistance.

本発明者等の実験によれば、Coの含有量が5〜15原
子%の範囲を外れると、保磁力の増大や透磁率の低下が
見られた。
According to experiments conducted by the present inventors, when the Co content is outside the range of 5 to 15 at %, an increase in coercive force and a decrease in magnetic permeability are observed.

また、Si、 Aj!については、それぞれSiが6〜
17原子%、Alが2〜13原子%とする必要がある。
Also, Si, Aj! For each, Si is 6~
The content of Al should be 17 at% and 2 to 13 at%.

これは、Si及びAlの含有量がこれら範囲を外れると
、例えば保磁力が大となり磁気ヘッドのコア材料として
は使用し得なくなると同時に、飽和磁束密度の低下や透
磁率の低下が見られることによる。これに対し、上述の
範囲とすれば、低保磁力化、高飽和磁束密度化、高透磁
率化が達せられ、更に零磁歪化が得られる。
This is because if the content of Si and Al is outside these ranges, for example, the coercive force becomes too large to be used as a core material for a magnetic head, and at the same time, a decrease in saturation magnetic flux density and a decrease in magnetic permeability are observed. by. On the other hand, if the above-mentioned range is used, low coercive force, high saturation magnetic flux density, high magnetic permeability, and zero magnetostriction can be achieved.

また、Crについては、Crが5原子%未満では高い耐
摩耗性が得られず、例えはセンダストのそれより低くな
り、15原子%を超えると、飽和磁束密度などの磁気的
特性の低下を招来する。
Regarding Cr, if the Cr content is less than 5 at%, high wear resistance cannot be obtained, for example, it will be lower than that of Sendust, and if it exceeds 15 at%, magnetic properties such as saturation magnetic flux density will deteriorate. do.

〔実施例〕〔Example〕

実施例1 99.9%以上の純度の純鉄と、電解コバルトと、クロ
ムと、アルミニウムと、99.999%以上の純度のシ
リコンを用いそれぞれ秤量し、高周波誘導加熱炉を用い
てアルミするつぼ内でアルゴンカス中で熔解し直径10
5a+mのターゲット母材を鋳造した。
Example 1 A pot made of pure iron with a purity of 99.9% or more, electrolytic cobalt, chromium, aluminum, and silicon with a purity of 99.999% or more, each weighed and aluminized using a high-frequency induction heating furnace. Melt in an argon gas and
A target base material of 5a+m was cast.

この母材の両面を平面研削盤により研削し、厚さ5+u
+のスパッタリング用のターゲットを作製した。
Both sides of this base material were ground with a surface grinder to a thickness of 5+u.
A + sputtering target was prepared.

このターゲットを用いてプレナーマグネトロン型高周波
スパッタリング装置によって結晶化ガラス基板上に厚さ
2μmの膜厚のスパッタリングを行った・ このスパッタリングの条件は、 到達ガス圧      6.OX 10−’ Torr
基板温度       加熱せず Arガス圧        ?、OX 1O−3Tor
r予備スパツタ     1時間 スパッタ時間     約1時間 とした。
Using this target, sputtering was performed on a crystallized glass substrate to a thickness of 2 μm using a planar magnetron type high-frequency sputtering device. The conditions for this sputtering were as follows: Ultimate gas pressure 6. OX 10-' Torr
Substrate temperature Ar gas pressure without heating? , OX 1O-3Tor
r Preliminary sputtering 1 hour Sputtering time Approximately 1 hour.

このようにスパッタリング薄膜を形成した基板を500
℃で1時間真空アニールし、薄膜の磁気特性、すなわち
飽和磁束密度Bsと、保磁力Hcと、5Mflzの周波
数における透磁率μeffとを夫々膜組成を変えて測定
した。また、各組成について夫々その摩耗量を測定した
。その結果を第1図に示す。
The substrate on which the sputtered thin film was formed in this way was
After vacuum annealing at .degree. C. for 1 hour, the magnetic properties of the thin film, ie, the saturation magnetic flux density Bs, the coercive force Hc, and the magnetic permeability μeff at a frequency of 5 Mflz, were measured by changing the film composition. Furthermore, the amount of wear was measured for each composition. The results are shown in FIG.

ここに、摩耗量の測定は、第2図に示すように摩耗量測
定用のダミーヘッド(11を作製して行った。
Here, the amount of wear was measured by preparing a dummy head (11) for measuring the amount of wear, as shown in FIG.

このヘッド(υは@Wが3.0IIIIl、厚さtが0
.5mmで前方に円筒面状の磁気媒体との対接面を形成
し、この面に被測定薄膜(2)を被着し、このヘッド(
11を1インチVTR用の回転磁気ヘッドドラムの合板
に配し、ドラム面から80μ±5μmで突出させ、r 
 Ff320g系の磁気媒体に接続させた。この場合、
テープ走行時間5時間毎に膜面(2)を顕微鏡(倍率4
00倍)を用いて、ヘッド(1)の所定位置に付したマ
ーカー(3)からの距離をもってその摩耗量を測定した
。尚、このダミーヘッドへの被測定膜のスパッタリング
は、 到達ガス圧      6.Ox lO= Torr基
体温度       300〜400℃Arガス圧  
      ?、OX 10”’ Torr予備スパッ
タリング  1時間 スパッタ時間     4〜5時間 とした。そして、各1の組成について6(lIのダミー
ヘッドを用いて、夫々その測定を行ってその平均摩耗量
を第1図に示した。
This head (υ is @W is 3.0IIII, thickness t is 0
.. A cylindrical surface facing the magnetic medium is formed at the front with a thickness of 5 mm, the thin film to be measured (2) is adhered to this surface, and the head (
11 is placed on the plywood of a rotating magnetic head drum for a 1-inch VTR, and protrudes by 80μ±5μm from the drum surface.
It was connected to an Ff320g type magnetic medium. in this case,
The membrane surface (2) was examined under a microscope (magnification 4) every 5 hours of tape running time.
00 times), and the amount of wear was measured based on the distance from the marker (3) attached to a predetermined position on the head (1). In addition, the sputtering of the film to be measured onto this dummy head is performed at the following gas pressure: 6. Ox lO = Torr substrate temperature 300-400℃ Ar gas pressure
? , OX 10"' Torr preliminary sputtering 1 hour sputtering time 4 to 5 hours. Then, for each composition, measurements were made using a dummy head of 6 (lI), and the average wear amount was calculated as shown in Figure 1. It was shown to.

第1図かられかるように、Cr添加のFe−Co−Al
−5i系による本発明の軟磁性薄膜は、磁気的特性の低
下を来すことなく時間当りの摩耗量の向上がはかられ、
センダストのそれ0.12μs/hourより充分小に
なっている。
As can be seen from Figure 1, Cr-added Fe-Co-Al
The soft magnetic thin film of the present invention based on the -5i system can improve the amount of wear per hour without deteriorating the magnetic properties,
This is sufficiently smaller than Sendust's 0.12 μs/hour.

また、上述の本発明による軟磁性Wllilにおいて、
更に耐蝕性や耐摩耗性そのほか各種特性を改善するため
に各種元素を添加剤として加えてもよい。
Furthermore, in the soft magnetic Wllil according to the present invention described above,
Furthermore, various elements may be added as additives to improve corrosion resistance, wear resistance, and other various properties.

この添加剤として使用される元素としては、Ti。The element used as this additive is Ti.

Zr、 Hf等のIVa族元素、V、 Nb、 Ta等
のVa族元素、Mo、 W等のVla族元素、Mn等の
■a族元素、さらに白金族元素として第5周期の白金族
元素、すなわちRu、 Rh、 Rd、第6周期の白金
族元素、すなわちOs、 Ir、 PL等を挙げること
ができるものであり、これら添加剤の1種または2種以
上を組み合わせて、上記磁性薄膜に対してθ〜1off
i量%の範囲で添加し得る。
IVa group elements such as Zr and Hf, Va group elements such as V, Nb and Ta, Vla group elements such as Mo and W, ■a group elements such as Mn, and platinum group elements of the fifth period as platinum group elements, Namely, these additives include Ru, Rh, Rd, 6th period platinum group elements such as Os, Ir, PL, etc., and one or more of these additives may be used in combination to add to the magnetic thin film. Te θ ~ 1 off
It can be added in an amount of i%.

〔発明の効果〕〔Effect of the invention〕

上述したように本発明による軟磁性薄膜によれば、飽和
磁束密度の低下や、保磁力を高めることなく、高透磁率
を有し、耐摩耗性にすぐれ、更にアモルファス磁性薄膜
におけるような熱的に不安定性のない耐熱性にすぐれた
軟磁性薄膜を得ることができるので、例えば高密度記録
用の¥i膜磁気ヘッドのWIlil磁気コアとして用い
て、その利益は極めて大である。
As described above, the soft magnetic thin film according to the present invention has high magnetic permeability and excellent wear resistance without reducing the saturation magnetic flux density or increasing the coercive force, and also has thermal resistance similar to that of an amorphous magnetic thin film. Since it is possible to obtain a soft magnetic thin film with excellent heat resistance and no instability, it can be used, for example, as a WIliil magnetic core of a \i-film magnetic head for high-density recording, and its benefits are extremely large.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は軟磁性薄膜の組成と各特性の測定結果を示す表
図、第2図はその摩耗量測定用ダミーヘッドの拡大斜視
図である。 (IIはダミーヘッド、(2)は被測定薄膜である。 手続補正書 昭和60年12月9日 特許庁播官  宇 1¥ 道 部  殿1 二)51’
l の表2ノq                  
   里昭和GO年 特 許 願 第244563号2
、発明の名称 軟磁性薄膜 :3.?+!i if:、をする者 !IS件との関係   特許出願人 住 所 東京部品用区北品用6丁目7番35号名4ts
: (21B)ソニー株式会社1(表取締役 大 賀 
典 雄 4、代理人 住 所 東京都新宿区西新宿I丁目8番1号置 03−
343−5821(lリ (新宿ビル)〔j、補正によ
り増加する発明の数 +1)  明細書中、5頁゛1行INが0.5」をI−
Crが0.5」と訂正する。 (2)  同、第6頁15行1crが5原子%」を1−
Crが0.5原子%」と訂正する。 (3)  同、@6頁16行〜17行[例えば・・・低
くなり、」を削除する。 (4)  同、第9頁lO行〜11行Eはかられ・・・
ている、」を「はかられている、」と訂正する。 (5)図面中、第1図を別紙のように補正する。 以上
FIG. 1 is a table showing the composition of the soft magnetic thin film and the measurement results of each characteristic, and FIG. 2 is an enlarged perspective view of a dummy head for measuring wear amount. (II is the dummy head, and (2) is the thin film to be measured. Procedural amendment December 9, 1985 Patent office public official U 1 ¥ Road Department 1 2) 51'
l Table 2 no.q
Sato Showa GO Patent Application No. 244563 2
, Title of invention Soft magnetic thin film: 3. ? +! i if:, someone who does! Relationship with IS case Patent applicant address: 6-7-35, Kitashinyo, Tokyo Parts Store Name: 4ts
: (21B) Sony Corporation 1 (Representative Director: Ohga
Norio 4, Agent address: 8-1 Nishi-Shinjuku I-chome, Shinjuku-ku, Tokyo 03-
343-5821 (l Ri (Shinjuku Building) [j, number of inventions increased by amendment + 1) In the specification, page 5 "1 line IN is 0.5" is I-
Cr is 0.5”. (2) Same, page 6, line 15, 1cr is 5 atomic%” is 1-
Cr content is 0.5 atomic%.'' (3) Same, @page 6, lines 16-17 [For example, it becomes lower] is deleted. (4) Same, page 9, line 10 to line 11 E are calculated...
Correct "It is being measured" to "It is being measured." (5) In the drawings, correct Figure 1 as shown in the attached sheet. that's all

Claims (1)

【特許請求の範囲】[Claims]  Coが5〜15原子%、Siが6〜17原子%、Al
が2〜13原子%、Crが0.5〜7原子%、残部Fe
の組成を有することを特徴とする軟磁性薄膜。
Co: 5 to 15 at%, Si: 6 to 17 at%, Al
is 2 to 13 at%, Cr is 0.5 to 7 at%, and the balance is Fe.
A soft magnetic thin film characterized by having a composition.
JP60244563A 1985-10-31 1985-10-31 Soft magnetic thin film Expired - Lifetime JPH0746655B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60244563A JPH0746655B2 (en) 1985-10-31 1985-10-31 Soft magnetic thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60244563A JPH0746655B2 (en) 1985-10-31 1985-10-31 Soft magnetic thin film

Publications (2)

Publication Number Publication Date
JPS62104109A true JPS62104109A (en) 1987-05-14
JPH0746655B2 JPH0746655B2 (en) 1995-05-17

Family

ID=17120575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60244563A Expired - Lifetime JPH0746655B2 (en) 1985-10-31 1985-10-31 Soft magnetic thin film

Country Status (1)

Country Link
JP (1) JPH0746655B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01217708A (en) * 1988-02-24 1989-08-31 Tokin Corp Magnetic alloy
CN104762553A (en) * 2014-05-21 2015-07-08 北京北冶功能材料有限公司 Novel high resistivity crystalline state magnetically soft alloy

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5370021A (en) * 1976-12-03 1978-06-22 Furukawa Electric Co Ltd:The Wear resistant high permeability alloy
JPS552783A (en) * 1978-11-10 1980-01-10 Hitachi Metals Ltd Wear resistant alloy of high permeability
JPS5867845A (en) * 1981-10-19 1983-04-22 Hitachi Metals Ltd High permeability alloy thin strip

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5370021A (en) * 1976-12-03 1978-06-22 Furukawa Electric Co Ltd:The Wear resistant high permeability alloy
JPS552783A (en) * 1978-11-10 1980-01-10 Hitachi Metals Ltd Wear resistant alloy of high permeability
JPS5867845A (en) * 1981-10-19 1983-04-22 Hitachi Metals Ltd High permeability alloy thin strip

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01217708A (en) * 1988-02-24 1989-08-31 Tokin Corp Magnetic alloy
CN104762553A (en) * 2014-05-21 2015-07-08 北京北冶功能材料有限公司 Novel high resistivity crystalline state magnetically soft alloy

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