JPS62113295U - - Google Patents

Info

Publication number
JPS62113295U
JPS62113295U JP20341285U JP20341285U JPS62113295U JP S62113295 U JPS62113295 U JP S62113295U JP 20341285 U JP20341285 U JP 20341285U JP 20341285 U JP20341285 U JP 20341285U JP S62113295 U JPS62113295 U JP S62113295U
Authority
JP
Japan
Prior art keywords
screen
winding shaft
outer circumferential
circumferential surface
base edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20341285U
Other languages
English (en)
Other versions
JPH0336717Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP20341285U priority Critical patent/JPH0336717Y2/ja
Publication of JPS62113295U publication Critical patent/JPS62113295U/ja
Application granted granted Critical
Publication of JPH0336717Y2 publication Critical patent/JPH0336717Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Operating, Guiding And Securing Of Roll- Type Closing Members (AREA)
  • Specific Sealing Or Ventilating Devices For Doors And Windows (AREA)

Description

【図面の簡単な説明】
第１図はこの考案の一実施例を示すもので、ス
クリーンを取付けた巻付け軸の縦断面図、第２図
はその分解斜視図、第３図はこの考案を実施した
網戸の斜視図である。 １……巻付け軸、２……取付平坦面、４……凹
条、５……ビス孔、６……両面接着テープ、７…
…防虫網、８……補強材、９……押え板、１０…
…向き合う面、１１……突条、１２……ビス挿通
孔、１３……ビス、１４……ケース、２２……ボ
ールチエーン、２３……係止具、２４……下框。

Claims (1)

  1. 【実用新案登録請求の範囲】 スクリーン７を外周に巻付ける巻付け軸１の外
    周面２に長手方向に沿つて、スクリーン７の基縁
    部をビス１３止めする押え板９で挾持固定する巻
    込式スクリーンの取付装置において、 巻付け軸１の外周面２若しくは押え板９の巻付
    け軸外周面２と向き合う面１０のいずれか一方に
    長手方向に連続する凹条４を凹設し、他方に同じ
    く長手方向に連続する突条１１を突設し、巻付け
    軸１の外周面２と押え板９間にスクリーン７の基
    縁部を挾むと共に、該凹条４と該突条１１をそれ
    らの間にスクリーン７の基縁部を挾んだ状態で嵌
    合させて、スクリーン７の基縁部を挾持固定した
    ことを特徴とする巻込式スクリーンの取付装置。
JP20341285U 1985-12-30 1985-12-30 Expired JPH0336717Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20341285U JPH0336717Y2 (ja) 1985-12-30 1985-12-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20341285U JPH0336717Y2 (ja) 1985-12-30 1985-12-30

Publications (2)

Publication Number Publication Date
JPS62113295U true JPS62113295U (ja) 1987-07-18
JPH0336717Y2 JPH0336717Y2 (ja) 1991-08-02

Family

ID=31168717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20341285U Expired JPH0336717Y2 (ja) 1985-12-30 1985-12-30

Country Status (1)

Country Link
JP (1) JPH0336717Y2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03217585A (ja) * 1990-01-22 1991-09-25 Sanwa Shutter Corp 巻取装置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1016129B2 (en) 1997-06-24 2009-06-10 Massachusetts Institute Of Technology Controlling threading dislocation densities using graded layers and planarization
US7227176B2 (en) 1998-04-10 2007-06-05 Massachusetts Institute Of Technology Etch stop layer system
US6649480B2 (en) 2000-12-04 2003-11-18 Amberwave Systems Corporation Method of fabricating CMOS inverter and integrated circuits utilizing strained silicon surface channel MOSFETs
US6703688B1 (en) 2001-03-02 2004-03-09 Amberwave Systems Corporation Relaxed silicon germanium platform for high speed CMOS electronics and high speed analog circuits
US6940089B2 (en) 2001-04-04 2005-09-06 Massachusetts Institute Of Technology Semiconductor device structure
AU2003222003A1 (en) 2002-03-14 2003-09-29 Amberwave Systems Corporation Methods for fabricating strained layers on semiconductor substrates
US6995430B2 (en) 2002-06-07 2006-02-07 Amberwave Systems Corporation Strained-semiconductor-on-insulator device structures
AU2003247513A1 (en) 2002-06-10 2003-12-22 Amberwave Systems Corporation Growing source and drain elements by selecive epitaxy
US7375385B2 (en) 2002-08-23 2008-05-20 Amberwave Systems Corporation Semiconductor heterostructures having reduced dislocation pile-ups
US7594967B2 (en) 2002-08-30 2009-09-29 Amberwave Systems Corporation Reduction of dislocation pile-up formation during relaxed lattice-mismatched epitaxy

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03217585A (ja) * 1990-01-22 1991-09-25 Sanwa Shutter Corp 巻取装置

Also Published As

Publication number Publication date
JPH0336717Y2 (ja) 1991-08-02

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