JPS62132723A - 第４アンモニウムシリケ−ト粉末およびその製造法 - Google Patents
第４アンモニウムシリケ−ト粉末およびその製造法Info
- Publication number
- JPS62132723A JPS62132723A JP27081085A JP27081085A JPS62132723A JP S62132723 A JPS62132723 A JP S62132723A JP 27081085 A JP27081085 A JP 27081085A JP 27081085 A JP27081085 A JP 27081085A JP S62132723 A JPS62132723 A JP S62132723A
- Authority
- JP
- Japan
- Prior art keywords
- quaternary ammonium
- silicate
- ammonium silicate
- powder
- molar ratio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Silicates, Zeolites, And Molecular Sieves (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27081085A JPS62132723A (ja) | 1985-12-03 | 1985-12-03 | 第４アンモニウムシリケ−ト粉末およびその製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27081085A JPS62132723A (ja) | 1985-12-03 | 1985-12-03 | 第４アンモニウムシリケ−ト粉末およびその製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62132723A true JPS62132723A (ja) | 1987-06-16 |
| JPH0566887B2 JPH0566887B2 (2) | 1993-09-22 |
Family
ID=17491331
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27081085A Granted JPS62132723A (ja) | 1985-12-03 | 1985-12-03 | 第４アンモニウムシリケ−ト粉末およびその製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62132723A (2) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5817610A (en) * | 1996-09-06 | 1998-10-06 | Olin Microelectronic Chemicals, Inc. | Non-corrosive cleaning composition for removing plasma etching residues |
-
1985
- 1985-12-03 JP JP27081085A patent/JPS62132723A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5817610A (en) * | 1996-09-06 | 1998-10-06 | Olin Microelectronic Chemicals, Inc. | Non-corrosive cleaning composition for removing plasma etching residues |
| US6020292A (en) * | 1996-09-06 | 2000-02-01 | Olin Microelectronic Chemicals, Inc. | Non-corrosive cleaning composition for removing plasma etching residues |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0566887B2 (2) | 1993-09-22 |
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