JPS62190844A - Low temperature prober - Google Patents

Low temperature prober

Info

Publication number
JPS62190844A
JPS62190844A JP61034292A JP3429286A JPS62190844A JP S62190844 A JPS62190844 A JP S62190844A JP 61034292 A JP61034292 A JP 61034292A JP 3429286 A JP3429286 A JP 3429286A JP S62190844 A JPS62190844 A JP S62190844A
Authority
JP
Japan
Prior art keywords
probe
low temperature
low
stage
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61034292A
Other languages
Japanese (ja)
Inventor
Koichiro Kotani
小谷 紘一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP61034292A priority Critical patent/JPS62190844A/en
Publication of JPS62190844A publication Critical patent/JPS62190844A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2601Apparatus or methods therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To enhance the reliability of a semiconductor device by disposing a probe head in an atmosphere of gas having low critical temperature to perform a low temperature probe test without damaging the element characteristics of the device in a low temperature operation. CONSTITUTION:Since a cryohead is a coolant which can be cooled to 40 deg.K in a head section of a cryopump, it is used as a stage 12, and a probe card 13 is positioned while visually observing in a microscope 15 by utilizing an infrared light source 14. The infrared light does not disturb a low temperature operation. Then, a housing 16 is evacuated in vacuum by a vacuum pump 18, and helium gas is circulated in the housing 15 by other compressor 17. When a probe test is executed in this manner, the characteristics of a measuring element is not, since the helium is not dew-condensed, deteriorated. Since it is not in vacuum, a manipulator can be readily regulated, a wafer can be attracted to the low temperature stage, and the probe test can be performed while automatically moving a manipulator stage and a probe card stage.

Description

【発明の詳細な説明】 [概要] 低温動作測定用のプローバは、低温度で結露しない臨海
温度の低い気体中に、プローブヘッドを配置しておこな
う。
DETAILED DESCRIPTION OF THE INVENTION [Summary] A prober for low-temperature operation measurement has a probe head placed in a gas with a low waterfront temperature that is low and does not condense.

[産業上の利用分野コ 本発明は低温用プローバ(探針試験装置)に関する。[Industrial application fields] The present invention relates to a low temperature prober (probe testing device).

最近、半導体装置はコンピュータなどの要求から高速動
作素子が要望され、それは常温の動作だけでなく、低温
動作をも積極的に考慮した新素子が開発されている。例
えば、高電子移動度トランジスタ(HE M T : 
High Electron Mobility Tr
Recently, high-speed operation elements have been required for semiconductor devices due to the demands of computers, etc., and new elements are being developed that actively consider not only operation at room temperature but also operation at low temperatures. For example, high electron mobility transistor (HEMT:
High Electron Mobility Tr
.

)がその例である。) is an example.

このような低温動作させる半導体装置は、低温度におい
てプローブテスト(探針試験)を行なうことが望ましく
、且つ、素子を破壊しないように考慮しなければならな
い。
For such semiconductor devices operated at low temperatures, it is desirable to perform a probe test at a low temperature, and consideration must be given so as not to destroy the elements.

[従来の技術] 従来、ICなどの半導体装置は、ウェハー上に多数の素
子が形成され、これを個々のチップに分割する前に、プ
ローブ(探針)を接触させて、それらの素子の電気的特
性の良否を判別しており、これをウェハーのプローブテ
ストと云い、その測窓装置をブローμと呼んでいる。
[Prior Art] Conventionally, in semiconductor devices such as ICs, a large number of elements are formed on a wafer, and before the wafer is divided into individual chips, a probe is brought into contact with the wafer to detect the electricity of those elements. This is called a wafer probe test, and the window measurement device is called a blow μ.

それは、ウェハー状態で予めプローブテストを行なって
おけば、不良チップをパッケージに組み込む工数とパッ
ケージ等の材料が節約されるからである。
This is because if a probe test is conducted in advance in the wafer state, the number of man-hours for assembling a defective chip into a package and the materials used for the package can be saved.

第2図は従来の低温用ブローμのテストヘッドの概要図
を示しており、1はウェハー、2はステージ、3はプロ
ーブ、4は可視光源、5は顕微鏡6は保温材料からなる
函体である。
Figure 2 shows a schematic diagram of a conventional low-temperature blow μ test head, in which 1 is a wafer, 2 is a stage, 3 is a probe, 4 is a visible light source, and 5 is a microscope 6, which is a box made of heat-retaining material. be.

例えば、77°K(液体窒素温度)でプローブテストを
行なう場合には、函体6の内部に液体窒素LN2を容れ
ておく。そうして、函体の上部に設けた窓7から、顕微
鏡で目視しながらマニピュレータを動かして、プローブ
の位置合わせをおこない、位置調整後、プローブテスト
を行なっている。また、ブローμは上記のテストヘッド
の他、コンピュータを具備しているが、図示していない
。且つ、最近では、複数のプローブをそれぞれ調整する
繁雑さを避けるため、既に位置合わせしたプローブを植
立させたプローブカードを利用することも多い。
For example, when performing a probe test at 77°K (liquid nitrogen temperature), liquid nitrogen LN2 is stored inside the box 6. Then, the probe is positioned by moving the manipulator while visually observing it through a microscope through the window 7 provided at the top of the box, and after adjusting the position, a probe test is performed. In addition to the test head described above, the blow μ is equipped with a computer, but this is not shown. In addition, recently, in order to avoid the complexity of adjusting each of a plurality of probes, a probe card on which already aligned probes are planted is often used.

[発明が解決しようとする問題点] ところで、上記のようにして、低温でプローブテストを
行なうと、ウェハー1やプローブ3の近傍で結露すると
云う厄介な問題がある。結露は水分だけでなく、液体窒
素も結露するわけで、その状態で電流を流してテストす
ると、異常な電流バスが生じて、絶縁膜が破壊される等
の問題が起こり、測定素子の動作特性が劣化する。
[Problems to be Solved by the Invention] By the way, when a probe test is performed at a low temperature as described above, there is a troublesome problem that dew condensation occurs near the wafer 1 and the probe 3. Condensation occurs not only from moisture, but also from liquid nitrogen. If you test by passing current under such conditions, an abnormal current bus will occur, causing problems such as destruction of the insulating film, and affecting the operating characteristics of the measuring element. deteriorates.

そのため、函体6の内部を真空にしてプローブテストを
行なう方法も考案されているが、真空中は熱伝導が悪(
て、ウェハーが冷却しにくいと云う欠点がある。
For this reason, a method has been devised in which the inside of the box 6 is vacuumed to perform a probe test, but heat conduction is poor in a vacuum (
However, the disadvantage is that the wafer is difficult to cool.

一方、プローブテストを行なわずに、チップに分離し組
立して、それを低温度に冷却し、低温動作特性を測定す
る方法も採られているが、この方法は工数が多くかかつ
てコストが高くなる。
On the other hand, there is also a method of separating and assembling chips, cooling them to a low temperature, and measuring their low-temperature operating characteristics without performing a probe test, but this method requires a lot of man-hours and was previously expensive. Become.

本発明は、このような欠点を解消させて、低温度でのプ
ローブテストが信頼性高くおこなえる低温用ブローμを
提案するものである。
The present invention solves these drawbacks and proposes a low-temperature blow μ that can perform probe tests at low temperatures with high reliability.

[問題点を解決するための手段] その目的は、プローブヘッドを臨界温度の低い気体、例
えば、ヘリウム(He)の雰囲気中に配置した低温用ブ
ローμによって達成される。
[Means for Solving the Problems] The object is achieved by a low-temperature blow μ in which the probe head is placed in an atmosphere of a gas with a low critical temperature, such as helium (He).

[作用] 即ち、本発明は、低温度で結露しない臨海温度の低い気
体の雰囲気中で、プローブテストをおこなう。
[Function] That is, the present invention performs a probe test in a gas atmosphere with a low critical temperature that does not cause dew condensation.

[実施例コ 以下、図面を参照して一実施例により詳細に説明する。[Example code] Hereinafter, one embodiment will be described in detail with reference to the drawings.

第1図は本発明にかかる低温用ブローμのテストヘッド
の概要図を示しており、11はウェハー。
FIG. 1 shows a schematic diagram of a low-temperature blow μ test head according to the present invention, and numeral 11 indicates a wafer.

12はクライオヘッドからなるステージ、13はプロー
ブカード、14は赤外線光源、15は赤外線顕微鏡。
12 is a stage consisting of a cryohead, 13 is a probe card, 14 is an infrared light source, and 15 is an infrared microscope.

16は保温材料からなる函体、17はヘリウムのコンプ
レッサー、18は真空ポンプ、19は透過窓である。
16 is a box made of a heat insulating material, 17 is a helium compressor, 18 is a vacuum pump, and 19 is a transmission window.

クライオヘッドはクライオポンプのヘッド部分 ゛で、
40°Kまで冷却が可能な冷却体であるから、それをス
テージ13に使用する。そして、赤外線光源14を利用
して顕微鏡15で目視しながら、プローブカード13の
位置合わせをする。この赤外線光は低温動作を害するこ
とがない。次いで、函体16の中を真空ポンプ18によ
り真空吸引し、他方のコンプレッサー17によってリヘ
リウムガスを函体16内で循環させる。コンプレッサー
17を使用する理由はヘリウムガスを多量に消費しない
ようにするためである。
The cryohead is the head part of the cryopump.
Since it is a cooling body capable of cooling up to 40°K, it is used for the stage 13. Then, the probe card 13 is aligned while being visually observed with a microscope 15 using the infrared light source 14. This infrared light does not harm low temperature operation. Next, the inside of the box 16 is vacuumed by the vacuum pump 18, and the other compressor 17 circulates the lyhelium gas inside the box 16. The reason for using the compressor 17 is to avoid consuming a large amount of helium gas.

このように構成してプローブテストすれば、ヘリウムは
結露しないから、測定素子の特性を劣化させることがな
い。更に、室温と低温との切り換えも簡単になる。
If a probe test is performed with this configuration, helium does not condense, so the characteristics of the measuring element will not deteriorate. Furthermore, switching between room temperature and low temperature becomes easy.

且つ、真空中ではないから、マニピュレータの調整も容
易になり、低温ステージにウェハーを吸着させることも
できて、マニピュレータステージやプローブカードステ
ージを自動移動させながら、プローブテストもできる。
Moreover, since it is not in a vacuum, it is easy to adjust the manipulator, the wafer can be attracted to the low temperature stage, and probe tests can be performed while automatically moving the manipulator stage and probe card stage.

即ち、オートプローバに構成することも可能である。That is, it is also possible to configure it as an autoprober.

[発明の効果コ 以上の説明から明らかなように、本発明によれば低温動
作の半導体装置の素子特性を破壊せずに、低温プローブ
テストをおこなうことができ、その半導体装置の高信頼
化が図れるものである。
[Effects of the Invention] As is clear from the above explanation, according to the present invention, a low temperature probe test can be performed without destroying the element characteristics of a semiconductor device operating at low temperature, and the reliability of the semiconductor device can be improved. It is something that can be achieved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明にかかる低温用ブローμのテストヘッド
の概要図、 第2図は従来の低温用ブローμのテストヘッドの概要図
である。 図において、
FIG. 1 is a schematic diagram of a low-temperature blow μ test head according to the present invention, and FIG. 2 is a schematic diagram of a conventional low-temperature blow μ test head. In the figure,

Claims (2)

【特許請求の範囲】[Claims] (1)室温以下の低温度でウェハー上の半導体素子にプ
ローブを接触させて素子特性を測定する低温用プローバ
において、プローブヘッドを臨界温度の低い気体の雰囲
気中に配置したことを特徴とする低温用プローバ。
(1) A low-temperature prober that measures device characteristics by bringing a probe into contact with a semiconductor device on a wafer at a low temperature below room temperature, characterized in that the probe head is placed in a gas atmosphere with a low critical temperature. Prober for use.
(2)上記臨海温度の低い気体がヘリウムであることを
特徴とする特許請求の範囲第1項記載の低温用プローバ
(2) The low temperature prober according to claim 1, wherein the gas having a low critical temperature is helium.
JP61034292A 1986-02-18 1986-02-18 Low temperature prober Pending JPS62190844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61034292A JPS62190844A (en) 1986-02-18 1986-02-18 Low temperature prober

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61034292A JPS62190844A (en) 1986-02-18 1986-02-18 Low temperature prober

Publications (1)

Publication Number Publication Date
JPS62190844A true JPS62190844A (en) 1987-08-21

Family

ID=12410078

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61034292A Pending JPS62190844A (en) 1986-02-18 1986-02-18 Low temperature prober

Country Status (1)

Country Link
JP (1) JPS62190844A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6505471B1 (en) 2001-11-29 2003-01-14 Nec Corporation Method and apparatus for adjusting device used at low temperature without deterioration thereof
JP2010060555A (en) * 2008-09-04 2010-03-18 Star Technologies Inc Low-temperature measuring device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5224873B2 (en) * 1971-12-22 1977-07-04
JPS5740950A (en) * 1980-08-22 1982-03-06 Mitsubishi Electric Corp Semiconductor evaluation device
JPS5788344A (en) * 1980-11-21 1982-06-02 Fujitsu Ltd Cryostat

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5224873B2 (en) * 1971-12-22 1977-07-04
JPS5740950A (en) * 1980-08-22 1982-03-06 Mitsubishi Electric Corp Semiconductor evaluation device
JPS5788344A (en) * 1980-11-21 1982-06-02 Fujitsu Ltd Cryostat

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6505471B1 (en) 2001-11-29 2003-01-14 Nec Corporation Method and apparatus for adjusting device used at low temperature without deterioration thereof
US6615605B2 (en) 2001-11-29 2003-09-09 Nec Corporation Method and apparatus for adjusting device used at low temperature without deterioration thereof
JP2010060555A (en) * 2008-09-04 2010-03-18 Star Technologies Inc Low-temperature measuring device

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