JPS62198730A - Impurity separating device - Google Patents
Impurity separating deviceInfo
- Publication number
- JPS62198730A JPS62198730A JP4056186A JP4056186A JPS62198730A JP S62198730 A JPS62198730 A JP S62198730A JP 4056186 A JP4056186 A JP 4056186A JP 4056186 A JP4056186 A JP 4056186A JP S62198730 A JPS62198730 A JP S62198730A
- Authority
- JP
- Japan
- Prior art keywords
- sample chamber
- impurities
- gas
- sample
- solid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012535 impurity Substances 0.000 title claims abstract description 66
- 239000007789 gas Substances 0.000 claims abstract description 50
- 239000007787 solid Substances 0.000 claims abstract description 43
- 238000010438 heat treatment Methods 0.000 claims abstract description 19
- 239000012159 carrier gas Substances 0.000 claims abstract description 14
- 238000006243 chemical reaction Methods 0.000 claims abstract description 7
- 238000000926 separation method Methods 0.000 claims description 21
- 230000006837 decompression Effects 0.000 claims description 2
- 239000013557 residual solvent Substances 0.000 abstract description 8
- 230000006378 damage Effects 0.000 abstract description 2
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 7
- 239000003814 drug Substances 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 239000000543 intermediate Substances 0.000 description 5
- 238000005070 sampling Methods 0.000 description 5
- 238000009835 boiling Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000004821 distillation Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- -1 No. 2 Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 238000004451 qualitative analysis Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
Landscapes
- Sampling And Sample Adjustment (AREA)
Abstract
Description
【発明の詳細な説明】
産1L辷曵オ団り汰I一
本発明は、医薬品や電子・光学部品の製造などにおける
固体原料1M品中間体、製品に付着残留した溶剤や吸着
ガスなどの不純物を分離、除去し、更にこれら不純物を
高感度に分析したりする場合に好適に使用し得る不純物
分離装置に関する。[Detailed Description of the Invention] The present invention is directed to the production of 1L solid raw material intermediates and products in the production of pharmaceuticals, electronic and optical parts, etc., and to prevent impurities such as solvents and adsorbed gases remaining on the products. The present invention relates to an impurity separation device that can be suitably used when separating and removing impurities and analyzing these impurities with high sensitivity.
・来の 術 び°nが ゛ しようとするu′′−v従
来より、医薬品の製造において高純度の薬効成分を得る
ために数多くの溶剤抽出等の精製操作が行なわれている
が、こうした製造過程で薬効成分に不純物が付若、残留
する場合がある。・Future techniques and techniques u''-v Conventionally, in the manufacture of pharmaceuticals, many purification operations such as solvent extraction have been carried out in order to obtain highly pure medicinal ingredients. During the process, impurities may be added to the medicinal ingredients and may remain.
また、セラミック電子部品や光学部品の製造においても
、基板等の固体原料や製品中間体の表面に塵埃や吸着ガ
スが付着していると所望の電気特性や光学特性等の特性
を満足する製品が得られないので、これら製品の製造過
程で塵埃、吸着ガス等の汚染物質を除去するために溶剤
による表面洗浄が行なわれているが、溶剤洗浄により汚
染物質の除去を行なうと、乾燥工程を経た後でも洗浄に
用いた溶剤が十分に除去されずに残留する場合がある。Additionally, in the production of ceramic electronic components and optical components, if dust or adsorbed gas adheres to the surface of solid raw materials such as substrates or product intermediates, the product may not meet the desired electrical or optical properties. Therefore, during the manufacturing process of these products, surface cleaning with solvents is performed to remove contaminants such as dust and adsorbed gases. Even after cleaning, the solvent used for cleaning may not be sufficiently removed and may remain.
従って、このように医薬品や電子・光学部品等の製造分
野などにおいて、固体原料、製品中間体、製品中に含浸
した残留溶剤や表面に吸着した吸着ガスなどの不純物を
工業的に乾式にて確実に除去することが必要であり、ま
た原料や製品等の検査を行ない、上述した不純物を定量
的に測定することも重要である。Therefore, in the manufacturing field of pharmaceuticals, electronic/optical components, etc., impurities such as solid raw materials, product intermediates, residual solvents impregnated in products, and adsorbed gases adsorbed on the surface can be reliably removed industrially using a dry method. It is also important to quantitatively measure the impurities mentioned above by inspecting raw materials and products.
従来、固体試料に付着した不純物を乾式除去することは
難しく、例えば、蒸気圧の低い不純物は蒸留したりなど
して抽出する抽出装置では分離し潅<、沸点200℃以
上の残留溶剤を通常のオーブン型乾燥機や蒸留装置にて
除去しようとすると固体試料の種類によっては固体試料
が軟化したり。Conventionally, it has been difficult to dry remove impurities attached to solid samples. For example, with extraction equipment that extracts impurities with low vapor pressure by distillation, the residual solvent with a boiling point of 200°C or higher is removed using normal methods. If you try to remove it with an oven type dryer or distillation device, depending on the type of solid sample, the solid sample may become soft.
溶融したりして変質や形崩れ等の変形が生じ、沸点30
0℃以上の残留溶剤を除去しようとすると固体試料の分
解が生じる場合があるため、除去が困難であるという問
題点があった。また、沸点200℃以下の残留溶剤や吸
着ガスをオーブン型乾燥機や蒸留装置で除去したり、あ
るいは沸点200℃以上の残留溶剤を減圧オーブン型乾
燥機や減圧蒸留装置で除去しようとする場合においても
、オーブン室内、蒸留塔内や固体表面に対する平衡量以
上の不純物を分離することは実質的に不可能であり、こ
のためppmオーダー程度の低濃度不純物はほとんど除
去されないという欠点を有していた。It melts and causes deformation such as deterioration and deformation, and the boiling point is 30.
If an attempt is made to remove the residual solvent at a temperature of 0° C. or higher, the solid sample may decompose, so there is a problem in that removal is difficult. In addition, when attempting to remove residual solvents and adsorbed gases with a boiling point of 200°C or lower using an oven dryer or distillation equipment, or removing residual solvents with a boiling point of 200°C or higher using a vacuum oven dryer or vacuum distillation equipment, However, it is virtually impossible to separate impurities that exceed the equilibrium amount in the oven chamber, distillation column, and solid surface, and therefore has the disadvantage that low concentration impurities on the order of ppm are hardly removed. .
このためこれ等の不純物を分析する場合においても、乾
式分離を行なって固体表面からppmオーダー程度の低
濃度不純物を分離することが困難であるために正確な分
析ができず、また、溶剤抽出を行なって固体表面に吸着
している吸着ガスを分離し1分析しようとする場合も、
抽出率の低い溶媒では確実な分離ができず、ppmオー
ダー程度の低濃度分離を行なうことが困難であり、pp
mオーダー程度の低濃度の固体表面に吸着している吸着
ガスや固体中に含浸している残留溶剤のような不純物の
分析が実質的に困難であるという問題点があった。For this reason, even when analyzing these impurities, it is difficult to perform dry separation to separate low concentration impurities on the order of ppm from the solid surface, making accurate analysis impossible. When attempting to separate and analyze the adsorbed gas adsorbed on the solid surface by
Reliable separation is not possible with a solvent with a low extraction rate, and it is difficult to perform low concentration separation on the ppm order.
There has been a problem in that it is substantially difficult to analyze impurities such as adsorbed gases adsorbed on the solid surface or residual solvent impregnated in the solid at a low concentration of about m order.
本発明は上記事情に鑑みなされたもので、医薬品や電子
・光学部品の製造などにおいてオンラインで使用し得、
その固体原料、製品中間体、製品を試料としてこれら固
体試料に含浸した残留溶剤や表面吸着した吸着ガスなど
の不純物を乾式にて確実に分離し得、従ってこれ等不純
物の高純度化除去装置δや高感度定性定量分析装置に好
適に使用し得る不純物分離装置を提供することを目的と
する。The present invention was made in view of the above circumstances, and can be used online in the manufacturing of pharmaceuticals and electronic/optical components.
Using solid raw materials, product intermediates, and products as samples, it is possible to reliably separate impurities such as residual solvent impregnated into these solid samples and adsorbed gas adsorbed on the surface using a dry method. It is an object of the present invention to provide an impurity separation device that can be suitably used for high-sensitivity qualitative and quantitative analysis devices.
偉1i1J休に解決す辱めの手段
本発明は上記目的を達成するため、不純物分離装置を直
接又は反応処理して加熱することにより気体として分離
し得る不純物が付着(含浸、吸着等)した固体試料を気
密にかつ切換えにより気体流通可能に収容し得る試料室
を有する分離装置本体と、該試料室を温度制御可能に加
熱し得る加熱装置とを具備するよう構成したものである
。In order to achieve the above-mentioned object, the present invention provides a solid sample to which impurities are attached (impregnated, adsorbed, etc.) that can be separated as a gas by heating the impurity separation device directly or through reaction treatment. The separator main body has a sample chamber that can accommodate the sample chamber airtightly and allow gas flow by switching, and a heating device that can heat the sample chamber in a temperature controllable manner.
走肛
本発明の不純物分離装置は、その試料室が固体試料を気
密に収容し得るので、加熱分離した不純物の室外への拡
散を防止でき、また、切換えにより気体流通可能である
ため、He、Ar、N、等の不活性ガスをキャリアガス
として流通して固体から分離した不純物を室外に排出す
ることにより。The impurity separator of the present invention can airtightly accommodate a solid sample in its sample chamber, preventing the heated and separated impurities from diffusing outside the room, and can also allow gas to flow through switching. By circulating an inert gas such as Ar, N, etc. as a carrier gas and discharging impurities separated from the solid to the outside.
はぼ100%の割合で不純物を分離し得、更にHよ、0
2等の反応性ガスを流通して固体表面の不純物を反応処
理して加熱気化し得る生成物にほぼ100%の割合で変
化させることができると共に。Impurities can be separated at a rate of 100%, and H, 0
By passing a reactive gas such as No. 2, impurities on the surface of the solid can be reacted and converted into a product that can be heated and vaporized almost 100% of the time.
減圧装置を接続することができ、減圧によげ不純物の分
離温度を低下して固体試料の高温による変質や変形とい
った熱破壊を防止し得るものである。A pressure reduction device can be connected, and by reducing the pressure, the temperature at which impurities are separated can be lowered, thereby preventing thermal damage such as deterioration or deformation of the solid sample due to high temperatures.
更に、具備した加熱装置が前記試料室を温度制御可能に
加熱し得るため、固体試料が上述した熱破壊を起さない
程度に、また、ラインの速度に合わせた不純物分離速度
となるよう温度調節することができ、固体試料を破壊す
ることなく不純物を分離することができるものである。Furthermore, since the equipped heating device can heat the sample chamber in a temperature-controllable manner, the temperature can be adjusted to such an extent that the solid sample does not suffer from the above-mentioned thermal destruction, and to achieve an impurity separation rate that matches the speed of the line. It is possible to separate impurities without destroying the solid sample.
以下、本発明の一実施例につき第1図及び第2図を参照
して説明する。Hereinafter, one embodiment of the present invention will be described with reference to FIGS. 1 and 2.
犬庭■
第1,2図は本発明の一実施例に係る不純物分離装置1
を示すもので、この不純物分離装置1は一端部が閉塞さ
れた略横円筒状の分離装置本体2を具備する。この本体
2内の一端部側は固体試料が挿入される試料室3を楕成
し、この試料室3を被覆するように本体2の一端部側外
周部にマントル型ヒーターと保温材からなる加熱装置4
が配設されている。また、本体2の他端部側は冷却フラ
ンジ部5として構成されており1本体2の他端開口部に
は蓋体6が開閉可能に取り付けられて該開口部を閉塞し
、必要によりシリコーンゴム等のパツキンを介在して本
体2内、従って試料室3が気密に保持されるようになっ
ている。Inuba■ Figures 1 and 2 show an impurity separation device 1 according to an embodiment of the present invention.
This impurity separation device 1 includes a separation device main body 2 having a substantially horizontal cylindrical shape with one end closed. One end of the main body 2 has an elliptical sample chamber 3 into which a solid sample is inserted, and the outer periphery of the one end of the main body 2 is heated by a mantle-type heater and a heat insulating material so as to cover the sample chamber 3. Device 4
is installed. The other end of the main body 2 is configured as a cooling flange 5, and a lid 6 is attached to the opening at the other end of the main body 2 in an openable and closable manner to close the opening. The inside of the main body 2, and therefore the sample chamber 3, is kept airtight through gaskets such as the above.
前記本体2には、それぞれ一端がキャリアガスを充填し
たキャリアガスボンベ7、酸素ガスを充填した酸化反応
性ガスボンベ8.水素ガスを充填した還元反応性ガスボ
ンベ9と連結され、かつそれぞれストップ弁と逆止弁と
からなる流量制御弁10.11.12を介装したガス供
給管13゜14.15の他端部が冷却フランジ部5を気
密に貫通して試料室3内の他端部において位置するよう
に配設されていると共に、温度センサー16の他端が冷
却フランジ部5を気密に貫通して試料室3内に存するよ
うに配設されている。この温度センサー16の一端は加
熱装置4と接続されて温度制御を行なう温度制御器17
に連結されており。The main body 2 includes a carrier gas cylinder 7, one end of which is filled with a carrier gas, and an oxidation-reactive gas cylinder 8, which is filled with oxygen gas. The other ends of the gas supply pipes 13, 14, and 15 are connected to a reducing reactive gas cylinder 9 filled with hydrogen gas, and each has a flow control valve 10, 11, and 12 each consisting of a stop valve and a check valve. The temperature sensor 16 is disposed so as to pass through the cooling flange part 5 airtightly and be located at the other end of the sample chamber 3, and the other end of the temperature sensor 16 passes through the cooling flange part 5 airtightly and is located at the other end of the sample chamber 3. It is arranged so that it exists within. One end of this temperature sensor 16 is connected to the heating device 4 and is connected to a temperature controller 17 for controlling the temperature.
is connected to.
温度センサー16で検知された試料室3内の温度は温度
制御器17と接続された温度表示器18に表示されるよ
うになっている。The temperature inside the sample chamber 3 detected by the temperature sensor 16 is displayed on a temperature display 18 connected to a temperature controller 17.
前記本体2の一端面中央部にはガス流出口孔29が穿設
されていると共に、この孔29に圧力計19を介装する
ガス流出管2oの一端が気密に連結されている。この流
出管2oの他端は三方切換バルブ21を介して一端が減
圧装置22に連結する導管23の他端と接続されている
と共に、一端が三方切換バルブ24を介して不純物濃縮
器25及びガスサンプラー26と連結するガス採取管2
7の他端と連結されている。A gas outlet hole 29 is bored in the center of one end surface of the main body 2, and one end of a gas outlet pipe 2o having a pressure gauge 19 interposed therein is airtightly connected to this hole 29. The other end of this outflow pipe 2o is connected via a three-way switching valve 21 to the other end of a conduit 23 connected to a pressure reducing device 22, and one end is connected to an impurity concentrator 25 and a gas conduit via a three-way switching valve 24. Gas sampling pipe 2 connected to sampler 26
It is connected to the other end of 7.
次に、この装置の使用方法につき説明すると。Next, I will explain how to use this device.
まず益体6を開放して固体試料を試料室3内に挿入して
から閉鎖する。次いで、固体試料に付着している不純物
が200℃以下の加熱で固体試料を熱破壊することなく
分離可能な場合には三方切換バルブ21を流出管20が
閉塞するよう切換えて試料室3内を常圧下にしたままで
、そうでない場合には三方切換バルブ21を流出管2o
と導管23とが連通ずるよう切換えてから減圧装置22
を始動させ、圧力計19で圧力を計測して試料室3内を
所望の減圧状態とした後、再び三方切換バルブ20を流
出管20が閉塞するよう切換えると共に減圧装置22を
停止させる操作を行なって試料室3内を減圧状態に保ち
ながら、温度制御装置17、温度表示器18、加熱装置
4をそれぞれ始動させ、試料室3内が必要温度となるよ
う温度制御装置17を調整し、温度を設定して加熱を行
ない、温度表示器18により温度センサー16で検知さ
れた試料室3内の温度を計測する。試料室3内が所定の
温度となり、十分に固体試料に付着した不純物が分離し
得る時間が経過したら必要に応じて加熱装置4、温度制
御装置17.温度表示器18を停止させ、流量制御弁1
0を流量調製して開放し、キャリアガスボンベ7がらキ
ャリアガスをガス供給管13を通して流入させる。次い
で、三方切換バルブ21を流出管20とガス採取管27
とが連通ずるよう切換えて、試料室3内の不純物を含む
キャリアガスを室外に流出させる。これにより固体試料
に付着したppmオーダー乃至はPPb、場合によって
はpptレベルの低濃度の不純物の分離が行なわれ、高
純度の固体試料が得られる。なお、医薬品や電子・光学
部品の製造などにおいてオンラインで使用する場合など
には、加熱装置4、温度制御装置17、温度表示器18
を停止させずに作動させたままの状態にしておくことも
できる。First, the sample chamber 6 is opened, a solid sample is inserted into the sample chamber 3, and then the sample chamber 3 is closed. Next, if the impurities attached to the solid sample can be separated by heating below 200°C without thermally destroying the solid sample, the three-way switching valve 21 is switched so that the outflow pipe 20 is closed, and the inside of the sample chamber 3 is removed. Leave it under normal pressure, if not, turn the three-way switching valve 21 into the outlet pipe 2o.
After switching so that the and conduit 23 are in communication with each other, the pressure reducing device 22
After starting the sample chamber 3 and measuring the pressure with the pressure gauge 19 to bring the inside of the sample chamber 3 into a desired depressurized state, the three-way switching valve 20 is again switched so that the outflow pipe 20 is closed, and at the same time, the decompression device 22 is stopped. While keeping the inside of the sample chamber 3 in a reduced pressure state, start the temperature control device 17, temperature display 18, and heating device 4, respectively, and adjust the temperature control device 17 so that the inside of the sample chamber 3 reaches the required temperature. After setting, heating is performed, and the temperature inside the sample chamber 3 detected by the temperature sensor 16 is measured by the temperature display 18. When the inside of the sample chamber 3 reaches a predetermined temperature and a sufficient amount of time has elapsed for the impurities adhering to the solid sample to be separated, the heating device 4 and the temperature control device 17. The temperature indicator 18 is stopped and the flow rate control valve 1 is turned off.
0 is opened by adjusting the flow rate, and the carrier gas is allowed to flow in from the carrier gas cylinder 7 through the gas supply pipe 13. Next, the three-way switching valve 21 is connected to the outflow pipe 20 and the gas sampling pipe 27.
The carrier gas containing impurities in the sample chamber 3 is caused to flow out of the sample chamber 3. As a result, impurities with a low concentration of ppm order or PPb, or even ppt level, attached to the solid sample are separated, and a highly pure solid sample is obtained. In addition, when used online in the manufacture of pharmaceuticals or electronic/optical components, etc., the heating device 4, temperature control device 17, and temperature display 18 are
It is also possible to leave it running without stopping it.
上述した装置の使用方法で試料室3内の不純物を含むキ
ャリアガスを室外に流出させる際に、三方切換バルブ2
1を流出管20とガス採取管27とが連通ずるよう切換
えると共に三方切換バルブ24をガス採取管27と不純
物濃縮器25とが連通ずるように切換えることにより、
固体試料から分離した不純物は不純物濃縮器25で濃縮
して回収され、一方、ガス採取管27とガスサンプラー
26とが連通ずるように切換えることにより、上述した
不純物量が一定量採取できるので、これを各種センサー
に導入して定性、定景分析検査を行なうことができる。When the carrier gas containing impurities in the sample chamber 3 flows out to the outside in the method of using the device described above, the three-way switching valve 2
1 so that the outflow pipe 20 and the gas sampling pipe 27 communicate with each other, and by switching the three-way switching valve 24 so that the gas sampling pipe 27 and the impurity concentrator 25 communicate with each other,
The impurities separated from the solid sample are concentrated and recovered by the impurity concentrator 25. On the other hand, by switching the gas sampling tube 27 and the gas sampler 26 so that they communicate with each other, a fixed amount of the above-mentioned impurities can be sampled. can be introduced into various sensors to perform qualitative and fixed-view analysis tests.
また、上述した使用方法では固体試料に付着した不純物
を分離し得ないが、酸化反応や還元反応の反応処理を施
すことにより不純物が変化して容易に加熱気化し得るも
のとなる場合は、上述した使用方法において温度制御装
置17、温度表示器18、加熱装置i!4を始動させて
から試料室3内が所定の温度に達する迄の間に流量制御
弁11又は12を流量調製して開放し、酸化反応性ガス
ボンベ8又は還元反応性ガスボンベ9から酸素ガス又は
水素ガスを流入して反応処理を行ない、十分な反応処理
が行なわれた後に流量制御弁11又は12を閉塞させる
操作を加えることにより不純物分離が行なわれる。In addition, the method of use described above cannot separate impurities attached to a solid sample, but if the impurities change and can easily be heated and vaporized by performing a reaction treatment such as an oxidation reaction or a reduction reaction, the above method can be used. In the usage method described above, the temperature control device 17, the temperature display 18, and the heating device i! 4 and until the inside of the sample chamber 3 reaches a predetermined temperature, the flow rate control valve 11 or 12 is adjusted and opened, and oxygen gas or hydrogen is supplied from the oxidation reactive gas cylinder 8 or the reduction reactive gas cylinder 9. Impurity separation is performed by introducing a gas and performing a reaction treatment, and after the reaction treatment has been sufficiently performed, an operation of closing the flow rate control valve 11 or 12 is performed.
ここで、試料室3内で分離した不純物を室外に流出させ
るためのキャリアガスとしてはN2゜Ha、Ne、Ar
等の不活性ガスを用いることができるが、固体試料が酸
化反応等に対し反応不活性である場合、空気ガスを使用
することもできる。Here, N2゜Ha, Ne, Ar is used as a carrier gas for flowing out the impurities separated in the sample chamber 3 to the outside.
If the solid sample is inert to oxidation reactions or the like, air gas can also be used.
なお、上述した実施例においては、固体試料の連続出入
れを迅速に行なうために冷却フランジ部5が設けられて
いるが、冷却フランジ部5を除いて直接、試料室3の開
口部に蓋体6を取付けても差支えなく、更に固体試料や
付着した不純物に応じて、減圧装置22や、酸化反応性
ガスボンベ8と流量制御弁11とガス供給管14とから
構成される酸化反応性ガス流入システム、還元反応性ガ
スボンベ9と流量制御弁12とガス供給管15とから構
成されている還元反応性ガス流入システムを省略するこ
ともできる。また、三方切換バルブ21を介してガス流
出管と不純物濃縮器25とガスサンプラー26とを連結
し、不純物濃縮器25の出口に開閉バルブ28を介して
導’1723を接続して減圧装置22に連結することな
どにより配置を変更したり、試料室3内の空間が立方体
又は直方体となるよう分離装置本体2や加熱装置4の形
態等を変更したりしても差支えなく、装置の目的、用途
等に応じてその他の構成についても本発明の要旨を逸脱
しない範囲で種々変更することができる。In the above-mentioned embodiment, the cooling flange portion 5 is provided for rapid continuous loading and unloading of solid samples. 6 may be installed, and depending on the solid sample and attached impurities, an oxidation-reactive gas inflow system consisting of a pressure reducing device 22, an oxidation-reactive gas cylinder 8, a flow rate control valve 11, and a gas supply pipe 14 may be installed. The reducing reactive gas inflow system composed of the reducing reactive gas cylinder 9, the flow rate control valve 12, and the gas supply pipe 15 can also be omitted. In addition, the gas outlet pipe, the impurity concentrator 25 and the gas sampler 26 are connected via the three-way switching valve 21, and the conduit 1723 is connected to the outlet of the impurity concentrator 25 via the on-off valve 28 to connect the pressure reducing device 22. There is no problem in changing the arrangement by connecting them, or changing the shape of the separation device main body 2 and the heating device 4 so that the space inside the sample chamber 3 becomes a cube or a rectangular parallelepiped, depending on the purpose and application of the device. Other configurations may also be modified in accordance with the requirements without departing from the gist of the present invention.
月割j襲碩敦
以上説明したように1本発明によれば、不純物分離装置
を直接又は反応処理した後に加熱することにより気体と
して分離し得る不純物が含浸したり吸着したりして付着
した固体試料を気密にかつ切換えにより気体流通可能に
収容し得る試料室を有する分離装置本体とを具備するよ
うに構成したことにより、上記不純物を固体試料が熱破
壊されることなく乾式分離することができ、しがも不純
物分離後の固体試料を極めて高純度にすることができる
上、オンラインでの使用にも適しているため、医薬品や
電子・光学部品の製造などにおいて。As explained above, according to the present invention, solids impregnated or adsorbed with impurities that can be separated as a gas by heating the impurity separator directly or after reaction treatment are removed. By having a main body of the separator having a sample chamber that can accommodate the sample airtightly and allowing gas to flow through it by switching, the above impurities can be dry-separated without thermally destroying the solid sample. In addition to making it possible to obtain extremely high purity solid samples after impurity separation, it is also suitable for online use, such as in the production of pharmaceuticals and electronic/optical components.
その固体原料、I1品中間体、製品の高純度化のための
不純物除去や微量不純物の高感度分析に好適に使用し得
るものである。It can be suitably used for the removal of impurities for the purpose of high purity of solid raw materials, I1 product intermediates, and products, and for highly sensitive analysis of trace impurities.
第1図は本発明の一実施例を示す概略機構図、第2図は
キャリアガス供給管、反応性ガス供給管、温度センサー
の分離装置本体への取り付は状態を示す概略断面図であ
る。
1・・・不純物分離装置
2・・・分離装置本体
3・・・試料室
4・・・加熱装置Fig. 1 is a schematic mechanical diagram showing one embodiment of the present invention, and Fig. 2 is a schematic cross-sectional view showing how a carrier gas supply pipe, a reactive gas supply pipe, and a temperature sensor are attached to the separation device main body. . 1... Impurity separation device 2... Separation device main body 3... Sample chamber 4... Heating device
Claims (1)
て分離し得る不純物を付着した固体試料を気密にかつ切
換えにより気体流通可能に収容し得る試料室を有する分
離装置本体と該試料室を温度制御可能に加熱し得る加熱
装置とを具備したことを特徴とする不純物分離装置。 2、一端がキャリアガス容器に連結されたキャリアガス
供給管の他端を試料室内に配置すると共に、前記本体に
ガス排出口を設けて、前記キャリアガス容器からのキャ
リアガスが試料室内を流れた後、ガス排出口から排出さ
れるようにした特許請求の範囲第1項記載の不純物分離
装置。 3、一端が反応性ガス容器に連結された反応性ガス供給
管の他端を試料室内に配置すると共に、前記本体にガス
排出口を設けて、前記反応性ガス容器からの反応性ガス
が試料室内を流れた後、ガス排出口から排出されるよう
にした特許請求の範囲第1項又は第2項記載の不純物分
離装置。 4、前記本体に減圧装置を接続して、試料室内を脱気し
得るようにした特許請求の範囲第1項乃至第3項のいず
れか1項に記載の不純物分離装置。[Scope of Claims] 1. A separation device main body having a sample chamber capable of accommodating a solid sample containing impurities that can be separated as a gas either directly or by reaction treatment and heating, in an airtight manner and in a gas-flowable manner by switching. An impurity separation device comprising: a heating device capable of heating the sample chamber in a temperature controllable manner. 2. One end of the carrier gas supply pipe was connected to the carrier gas container, and the other end was placed in the sample chamber, and a gas outlet was provided in the main body, so that the carrier gas from the carrier gas container flowed into the sample chamber. 2. The impurity separation device according to claim 1, wherein the impurity separator is configured to discharge the impurity from the gas discharge port. 3. One end of the reactive gas supply pipe is connected to the reactive gas container, and the other end is arranged in the sample chamber, and a gas outlet is provided in the main body, so that the reactive gas from the reactive gas container is connected to the sample chamber. The impurity separation device according to claim 1 or 2, wherein the impurity separator is configured to flow in a room and then be discharged from a gas outlet. 4. The impurity separation device according to any one of claims 1 to 3, wherein a decompression device is connected to the main body so that the inside of the sample chamber can be degassed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4056186A JPS62198730A (en) | 1986-02-26 | 1986-02-26 | Impurity separating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4056186A JPS62198730A (en) | 1986-02-26 | 1986-02-26 | Impurity separating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62198730A true JPS62198730A (en) | 1987-09-02 |
Family
ID=12583871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4056186A Pending JPS62198730A (en) | 1986-02-26 | 1986-02-26 | Impurity separating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62198730A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102527088A (en) * | 2011-12-19 | 2012-07-04 | 长安大学 | Pressure-reducing type asphalt four-component separating device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5786739A (en) * | 1980-11-19 | 1982-05-29 | Kobe Steel Ltd | Gas sampling method |
| JPS57128829A (en) * | 1981-02-04 | 1982-08-10 | Toshiba Corp | Thermal decomposing device |
| JPS5810047B2 (en) * | 1980-11-11 | 1983-02-24 | 中村 藤三雄 | How to make pickles using bananas |
| JPS60190860A (en) * | 1984-03-12 | 1985-09-28 | Hitachi Ltd | Trace organic matter measuring device |
-
1986
- 1986-02-26 JP JP4056186A patent/JPS62198730A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5810047B2 (en) * | 1980-11-11 | 1983-02-24 | 中村 藤三雄 | How to make pickles using bananas |
| JPS5786739A (en) * | 1980-11-19 | 1982-05-29 | Kobe Steel Ltd | Gas sampling method |
| JPS57128829A (en) * | 1981-02-04 | 1982-08-10 | Toshiba Corp | Thermal decomposing device |
| JPS60190860A (en) * | 1984-03-12 | 1985-09-28 | Hitachi Ltd | Trace organic matter measuring device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102527088A (en) * | 2011-12-19 | 2012-07-04 | 长安大学 | Pressure-reducing type asphalt four-component separating device |
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