JPS62199465A - Heat ray radiation head - Google Patents

Heat ray radiation head

Info

Publication number
JPS62199465A
JPS62199465A JP61041591A JP4159186A JPS62199465A JP S62199465 A JPS62199465 A JP S62199465A JP 61041591 A JP61041591 A JP 61041591A JP 4159186 A JP4159186 A JP 4159186A JP S62199465 A JPS62199465 A JP S62199465A
Authority
JP
Japan
Prior art keywords
radiation
substrate
heat ray
resistor
air gap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61041591A
Other languages
Japanese (ja)
Inventor
Tomohiro Nakamori
仲森 智博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP61041591A priority Critical patent/JPS62199465A/en
Publication of JPS62199465A publication Critical patent/JPS62199465A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material

Landscapes

  • Electronic Switches (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)

Abstract

PURPOSE:To make it possible to reduce light emitting irregularity, in a heat ray radiation head for an optical printer, by enlarging the height of the air gap formed between the substrate between electrodes and a radiation resistor by providing a groove to the substrate under a radiation part. CONSTITUTION:When a printing signal is applied to the electrodes 16 of a heat ray head 14, heat rays are emitted from a radiation resistor 18 to form an electrostatic latent image on a photosensitive drum 6 through a rod array lens 13 and a toner image is formed by a developing device 18 to be transferred to a recording paper 11 by a transfer device 19. This heat ray head 14 is formed by forming the electrodes 16 and the radiation resistor 18 opposed through an air gap 17 on a low heat conductivity substrate 15 such as glass in a film form and providing a groove 20 with a depth of about 3mum to the substrate 15 at the position corresponding to the radiation part 19 of the air gap 17 by etching to form the sufficiently large air gap. By this method, the earthing of the radiation resistor to the substrate is prevented and light emitting irregularity is reduced while reliability is enhanced and printing quality can be enhanced.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、赤外線、近赤外線、可視光線などを放射して
光プリンタ用ヘッドとして用いる熱線放射ヘッドに関す
る。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a heat ray emitting head that emits infrared rays, near infrared rays, visible rays, etc. and is used as a head for an optical printer.

〔従来の技術〕[Conventional technology]

熱線放射ヘッドは放射体に通電して発熱発光させるもの
で、光プリンタ用ヘッドとしてLEDアレイ等と同様に
用いられているものであシ、以下に図面に従って従来例
を説明する。
A heat ray emitting head generates heat and emits light by energizing a radiator, and is used as a head for an optical printer in the same way as an LED array.A conventional example will be described below with reference to the drawings.

第3図は断面図であシ、図において1はガラス等の熱伝
導率の低い基板、2はエアギャップ3を設けてこの基板
1上に対向配置した金属電極、4はこの金属電極2間に
渡して配置した放射抵抗体でアシ、上記エアギャップ3
に該当する個所が放射部5となっていて基板1より浮い
た状態となっている。
Figure 3 is a cross-sectional view. In the figure, 1 is a substrate with low thermal conductivity such as glass, 2 is a metal electrode placed oppositely on this substrate 1 with an air gap 3, and 4 is a gap between the metal electrodes 2. Reed with a radiation resistor placed across the air gap 3 above.
The location corresponding to is the radiation part 5, which is floating above the substrate 1.

このように構成される熱線放射ヘッドの製造方法の1例
としては以下のような方法がある。
An example of a method for manufacturing a heat ray radiation head configured in this manner is as follows.

すなわち、基板1に電極層と放射抵抗体層を順次成膜す
る。
That is, an electrode layer and a radiation resistor layer are sequentially formed on the substrate 1.

次にホトリソエツチングによシ放射抵抗体4をパターニ
ングする。
Next, the radiation resistor 4 is patterned by photolithography.

次にホトリソにより放射部5以外をレジストで覆い、放
射部5の放射抵抗体4下の電極層をエツチングによシ除
去する。
Next, parts other than the radiation part 5 are covered with resist by photolithography, and the electrode layer under the radiation resistor 4 of the radiation part 5 is removed by etching.

最後に放射抵抗体4のパターンをマスクに電極をエツチ
ングによりノミターニングすることによって製造してい
た。
Finally, using the pattern of the radiation resistor 4 as a mask, the electrode was chisel-turned by etching.

〔発明が解決しようとする問題点3 以上説明した熱線放射ヘッドによると・ギャップの高さ
は金属電極の厚さによって決る。そこで、実際には電極
は1.5〜5μm程度の厚さで形成するが、エツチング
の際のサイドエッチの問題から電極の厚さを厚くするこ
とは不都合であシ、その結果ギャップの高さを大きくと
ることは難しいものである。
[Problem 3 to be solved by the invention According to the heat ray emitting head described above: The height of the gap is determined by the thickness of the metal electrode. Therefore, in reality, electrodes are formed with a thickness of about 1.5 to 5 μm, but it is inconvenient to increase the thickness of the electrodes due to the problem of side etching during etching, and as a result, the height of the gap increases. It is difficult to obtain a large value.

従って、ギャップの高さが充分にとれないために放射抵
抗体が基板に接触することがアリ、その結果印字ドツト
間で輝度むらが生じて印字品質を低下させる原因となっ
ている。
Therefore, since the height of the gap is not sufficient, the radiation resistor may come into contact with the substrate, resulting in uneven brightness between printed dots and deterioration of printing quality.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、放射抵抗体の放射部に該当するギャップの下
部の基板に凹部を設けて放射抵抗体と基板との距離を充
分にとった熱線放射ヘッドとすることを特徴とする。
The present invention is characterized in that a recess is provided in the substrate below the gap corresponding to the radiation portion of the radiation resistor to provide a heat ray radiation head with a sufficient distance between the radiation resistor and the substrate.

〔作用〕[Effect]

基板上に電極層と放射抵抗体層を順次成膜し、エツチン
グによシ放射抵抗体をバターニングし、放射部以外をレ
ジストで覆ってエツチングにより放射部下の電極層を除
去し、続いて基板もエツチングして溝を形成し、さらに
パターニングされた放射抵抗体をマスクに電極層のエツ
チングを行なって電極を形成することによシ熱線放射ヘ
ッドとし、このように構成された熱線放射ヘッドの電極
に通電することによシジュール熱によって放射抵抗体を
加熱して放射部よシ熱線放射を生じさせ、この熱線放射
を感光ドラムに放射して感光ドラムの感光体を感光して
印字を行なうことができる。
An electrode layer and a radiation resistor layer are sequentially formed on the substrate, the radiation resistor is patterned by etching, the area other than the radiation part is covered with resist, and the electrode layer under the radiation is removed by etching, and then the radiation resistor layer is deposited on the substrate. A heat ray emitting head is obtained by etching the patterned radiation resistor to form a groove, and then etching the electrode layer using the patterned radiation resistor as a mask to form an electrode. By applying electricity to the radiation resistor, the radiation resistor is heated by sidual heat, and the radiating section generates heat ray radiation, and this heat ray radiation is radiated to the photosensitive drum to expose the photoreceptor of the photosensitive drum to perform printing. can.

〔実施例〕〔Example〕

以下に本発明の実施例を図面に従って説明する。 Embodiments of the present invention will be described below with reference to the drawings.

第2図は電子写真型プリンタの全体側面図である。図に
おいて、6は感光ドラムであり、矢印の方向に回転する
。7は帯電器、8は現像器、9は転写器、10はクリー
ナであシ、一般に使用されている電子写真プロセスと同
様であって上記の順に配置されている。
FIG. 2 is an overall side view of the electrophotographic printer. In the figure, 6 is a photosensitive drum, which rotates in the direction of the arrow. 7 is a charging device, 8 is a developing device, 9 is a transfer device, and 10 is a cleaner, which are similar to those in a generally used electrophotographic process and are arranged in the above order.

1gは記録紙でアシ、転写器9によってトナー像を転写
して定着盤12を通過する。13はロッドアレイレンズ
である。
1g is a recording paper, a toner image is transferred by a transfer device 9, and the toner image is passed through a fixing plate 12. 13 is a rod array lens.

14は熱線放射ヘッドである。この熱線放射ヘッドにつ
いて第1図に従って説明する。
14 is a heat ray radiation head. This heat ray radiation head will be explained with reference to FIG.

第1図は断面図であシ、図において15はガラス等の熱
伝導率の低い基板、16はギャップ17を介して対向設
置している電極、18はこの電極16間にわたして配置
した放射抵抗体であり、上記ギャップ17に該当する個
所が放射部19となっている。20はこの放射部19に
該当する個所の基板15に設けた溝である。
FIG. 1 is a cross-sectional view. In the figure, 15 is a substrate with low thermal conductivity such as glass, 16 is an electrode placed opposite to each other with a gap 17 in between, and 18 is a radiator placed between these electrodes 16. It is a resistor, and the portion corresponding to the gap 17 is a radiation portion 19. Reference numeral 20 denotes a groove provided in the substrate 15 at a location corresponding to the radiation portion 19.

以下に上記構成による熱線放射ヘッドの製造方法の1例
を示す。
An example of a method for manufacturing a heat ray emitting head having the above configuration will be shown below.

基板15には無アルカリガラスを用いた。For the substrate 15, alkali-free glass was used.

この基板15上にOr 120OA、Au 2.5μm
On this substrate 15, Or 120OA, Au 2.5μm
.

スパッタ法により成膜して電極層および放射抵抗体層を
形成した。
Films were formed by sputtering to form an electrode layer and a radiation resistor layer.

次に、ホトリンエツチングによすTaCヲパ’7−ニン
グして放射抵抗体18を形成する。
Next, the radiation resistor 18 is formed by patterning the TaC by photolithography.

次に、ホ) IJソにより放射部19以外をレジストで
覆ってCr、AuのエツチングにIJ放射部19下の電
極層を除去する。
Next, e) the electrode layer under the IJ radiation part 19 is removed by etching Cr and Au by covering the area other than the radiation part 19 with resist using an IJ saw.

続いて除去された電極層をマスクに放射部19下の基板
15をエツチングして3μmの溝20を形成する。
Subsequently, using the removed electrode layer as a mask, the substrate 15 below the radiation portion 19 is etched to form a groove 20 of 3 μm.

続いてレジストを除去し、放射抵抗体18のパターンを
マスクにCr、Auのエツチングを行なって電極16を
形成して熱線放射ヘッドとする。
Subsequently, the resist is removed, and Cr and Au are etched using the pattern of the radiation resistor 18 as a mask to form the electrode 16 to form a heat ray radiation head.

以上の如く本方法によると、放射部下の電極層をエツチ
ングした後、それをマスクにして基板をエツチングする
ことができ、特別にマスク工程を必要としない処に特徴
がある。また、上記材料および成膜方法、エツチング方
法等は上記に限定されるものでは無く、各膜厚、溝の深
さも求められる性能に応じて定めればよい。
As described above, the present method is characterized in that after etching the electrode layer under the radiation, the substrate can be etched using the electrode layer as a mask, and no special masking step is required. Further, the materials, film forming methods, etching methods, etc. mentioned above are not limited to those mentioned above, and the thickness of each film and the depth of the grooves may be determined according to the required performance.

〔発明の効果〕〔Effect of the invention〕

以上詳細に説明した本発明によると、放射抵抗体の放射
部下の基板に溝を形成して充分に大きなエアギャップを
形成したことにより、放射抵抗体が基板に接地すること
が無くなり、発光むらの少ない信頼性の高い熱線放射ヘ
ッドとすることができる。
According to the present invention described in detail above, by forming a groove in the substrate below the radiation of the radiation resistor to form a sufficiently large air gap, the radiation resistor is no longer grounded to the substrate, and uneven light emission is prevented. It is possible to create a highly reliable heat ray emitting head with less heat rays.

また、溝の深さを所定深さにすることにょシェアギャッ
プの高さを電極厚に関係なく定めることができるために
電極厚を厚くする必要が無く、エツチングの際のサイド
エッチによる電極幅の細少化の問題を無くすことができ
る効果を有する。
In addition, by setting the groove depth to a predetermined depth, the height of the shear gap can be determined regardless of the electrode thickness, so there is no need to increase the electrode thickness, and the electrode width can be reduced by side etching during etching. This has the effect of eliminating the problem of miniaturization.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の一実施例を示す断面図、第2図は本
発明の熱線放射ヘッドを用いた電子写真プリンタの側面
図、第3図は従来例の熱線放射ヘッドの断面図である。 15・・・基板 16・・・電極 1T・・・エアギャ
ップ18・・・放射抵抗体 19・・・放射部 20・
・・溝特許出願人 沖電気工業株式会社 代理人弁理士 金  倉  喬  二 本類熱線放射ヘッドを用い几プリンタの側面図軸 2 
宣 へ 従来例の断面図 閣 3 ロ
FIG. 1 is a sectional view showing an embodiment of the present invention, FIG. 2 is a side view of an electrophotographic printer using the heat ray head of the present invention, and FIG. 3 is a sectional view of a conventional heat ray head. be. 15... Substrate 16... Electrode 1T... Air gap 18... Radiation resistor 19... Radiation part 20.
... Mizo patent applicant Takashi Kanakura, patent attorney for Oki Electric Industry Co., Ltd. Side view shaft 2 of a printer using two types of heat ray emitting heads
Conventional cross-section map for public relations 3 b

Claims (1)

【特許請求の範囲】 1、基板上に設けた電極間に放射抵抗体をわたし、電極
間の基板と放射抵抗体との間にエアギャップを形成し、
その個所の放射抵抗体を放射部とした熱線放射ヘッドに
おいて、 放射部下の基板に溝を設けてエアギャップの高さを大き
くしたことを特徴とする熱線放射ヘッド。
[Claims] 1. A radiation resistor is passed between electrodes provided on a substrate, and an air gap is formed between the substrate and the radiation resistor between the electrodes,
A heat ray radiation head in which a radiation resistor at that location is used as a radiation part, characterized in that a groove is provided in a substrate below the radiation to increase the height of the air gap.
JP61041591A 1986-02-28 1986-02-28 Heat ray radiation head Pending JPS62199465A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61041591A JPS62199465A (en) 1986-02-28 1986-02-28 Heat ray radiation head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61041591A JPS62199465A (en) 1986-02-28 1986-02-28 Heat ray radiation head

Publications (1)

Publication Number Publication Date
JPS62199465A true JPS62199465A (en) 1987-09-03

Family

ID=12612660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61041591A Pending JPS62199465A (en) 1986-02-28 1986-02-28 Heat ray radiation head

Country Status (1)

Country Link
JP (1) JPS62199465A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009119850A (en) * 2007-10-23 2009-06-04 Seiko Instruments Inc Heating resistor element, manufacturing method for the same, thermal head, and printer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009119850A (en) * 2007-10-23 2009-06-04 Seiko Instruments Inc Heating resistor element, manufacturing method for the same, thermal head, and printer

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