JPS62202077A - 高周波イオンプレ−テイング装置 - Google Patents

高周波イオンプレ−テイング装置

Info

Publication number
JPS62202077A
JPS62202077A JP4437286A JP4437286A JPS62202077A JP S62202077 A JPS62202077 A JP S62202077A JP 4437286 A JP4437286 A JP 4437286A JP 4437286 A JP4437286 A JP 4437286A JP S62202077 A JPS62202077 A JP S62202077A
Authority
JP
Japan
Prior art keywords
frequency
ion plating
coils
plating apparatus
frequency excitation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4437286A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0582470B2 (mo
Inventor
Tatsuhiko Shimizu
達彦 清水
Takao Mitsui
三井 隆男
Minoru Yamamoto
稔 山元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Soken Inc
Original Assignee
Nippon Soken Inc
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Soken Inc, Toyota Motor Corp filed Critical Nippon Soken Inc
Priority to JP4437286A priority Critical patent/JPS62202077A/ja
Publication of JPS62202077A publication Critical patent/JPS62202077A/ja
Publication of JPH0582470B2 publication Critical patent/JPH0582470B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP4437286A 1986-03-01 1986-03-01 高周波イオンプレ−テイング装置 Granted JPS62202077A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4437286A JPS62202077A (ja) 1986-03-01 1986-03-01 高周波イオンプレ−テイング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4437286A JPS62202077A (ja) 1986-03-01 1986-03-01 高周波イオンプレ−テイング装置

Publications (2)

Publication Number Publication Date
JPS62202077A true JPS62202077A (ja) 1987-09-05
JPH0582470B2 JPH0582470B2 (mo) 1993-11-19

Family

ID=12689678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4437286A Granted JPS62202077A (ja) 1986-03-01 1986-03-01 高周波イオンプレ−テイング装置

Country Status (1)

Country Link
JP (1) JPS62202077A (mo)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02263347A (ja) * 1989-04-03 1990-10-26 Sanyo Electric Co Ltd 回転シリンダ装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02263347A (ja) * 1989-04-03 1990-10-26 Sanyo Electric Co Ltd 回転シリンダ装置

Also Published As

Publication number Publication date
JPH0582470B2 (mo) 1993-11-19

Similar Documents

Publication Publication Date Title
US4197175A (en) Method and apparatus for evaporating materials in a vacuum coating plant
JP3516054B2 (ja) 陰極スパッタリングによってプラズマを発生させるための装置
JP5160730B2 (ja) ビーム状プラズマ源
AU746645C (en) Method and apparatus for deposition of biaxially textured coatings
US3962988A (en) Ion-plating apparatus having an h.f. electrode for providing an h.f. glow discharge region
US5308461A (en) Method to deposit multilayer films
JP2004501277A (ja) マグネトロンスパッタリングを向上させる誘導プラズマループ
US6468387B1 (en) Apparatus for generating a plasma from an electromagnetic field having a lissajous pattern
JPH09170078A (ja) 導電性ターゲットから基板をコーティングする装置
JPH03193871A (ja) 薄膜スパツタリング方法および装置
JP3481953B2 (ja) 基板をコーティングするための装置
EP0745147B1 (en) Method and apparatus for coating a substrate
JP2005519198A (ja) 窒化チタン膜の製法
JPS62199767A (ja) イオンプレ−テイング装置
JP3197739B2 (ja) プラズマ処理装置
JPS62202077A (ja) 高周波イオンプレ−テイング装置
JPH01240645A (ja) 真空蒸着装置
JPH04268073A (ja) 圧力勾配型プラズマガンによるプラズマ発生装置
JPH04143267A (ja) 真空アーク蒸着装置の陽極
JPH04232264A (ja) サブストレートのコーティング装置
JPH05271904A (ja) 立方晶窒化硼素膜の製造方法
JPH04289162A (ja) イオンプレーティング装置
JPH01295422A (ja) プラズマ処理装置
JPS5993878A (ja) スパツタ装置
JP2001003163A (ja) イオンプレーティング蒸着装置