JPS62202811A - Production of high-purity boron carbide fine powder - Google Patents
Production of high-purity boron carbide fine powderInfo
- Publication number
- JPS62202811A JPS62202811A JP61041400A JP4140086A JPS62202811A JP S62202811 A JPS62202811 A JP S62202811A JP 61041400 A JP61041400 A JP 61041400A JP 4140086 A JP4140086 A JP 4140086A JP S62202811 A JPS62202811 A JP S62202811A
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- Prior art keywords
- boron nitride
- boron
- boron carbide
- fine powder
- purity
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Abstract
Description
【発明の詳細な説明】
〔産業、[−の利用分野〕
本発明は、高純度炭化硼素微粉末の製造方法に関し、さ
らに詳しくは窒化硼素(B N)と炭素材(C)から炭
化層!(B+C)を製造する方法を改良し、焼結体用原
料として好適な高純度で微細な炭化硼素を効率良く製造
する技術を提供するものである。[Detailed Description of the Invention] [Industry, [Field of Application] The present invention relates to a method for producing high-purity boron carbide fine powder, and more specifically, to a method for producing a carbonized layer from boron nitride (BN) and a carbon material (C). The present invention improves the method for producing (B+C) and provides a technology for efficiently producing high-purity, fine boron carbide suitable as a raw material for sintered bodies.
炭化硼素はダイヤモンド、立方晶窒化硼素に次いで高い
硬度を有し、耐食性、化学安定性、軽量性、耐、摩耗性
、中性子吸収能に優れている点から、原子炉用材、耐摩
耗材として広く使用されている。Boron carbide has the second highest hardness after diamond and cubic boron nitride, and is widely used as a material for nuclear reactors and wear-resistant materials due to its excellent corrosion resistance, chemical stability, lightweight, wear resistance, and neutron absorption ability. has been done.
従来、炭化硼素の製造法は種々開示されており、代表的
製造方法を以下に示す。Conventionally, various methods for manufacturing boron carbide have been disclosed, and typical manufacturing methods are shown below.
(1)酸化1累、あるいは硼酸と炭素材料を混合し加熱
する方法(特公昭53−10560)。(1) A method of mixing and heating a carbon material with a first oxidation or boric acid (Japanese Patent Publication No. 53-10560).
工業規模で実施されている方法であり、通常はアチソン
法により生産される。製造された炭化硼素は塊状で回収
され、粉砕、分級されて各種用途に供される。このため
サブミクロンの粒子の回収率は非常に低い。This method is carried out on an industrial scale and is usually produced by the Acheson method. The produced boron carbide is collected in bulk, crushed and classified, and then used for various purposes. For this reason, the recovery rate of submicron particles is extremely low.
(2)酸化硼素、硼酸に炭素粉末、マグネシウムを添加
し還元、戊化し製造する方法(特開昭6O−46910
)。(2) A method of manufacturing by adding carbon powder and magnesium to boron oxide and boric acid for reduction and oxidation (Japanese Patent Application Laid-open No. 6O-46910
).
この方法では焼成後酸処理により酸化マグネシウムを除
去する必要があることと、マグネシウムが発火、爆発の
危険性があるため、工程が複雑化する。This method complicates the process because it is necessary to remove magnesium oxide by acid treatment after firing and there is a risk of magnesium igniting or exploding.
(3)三71化硼素とメタンにより製造する方法。(3) A method of manufacturing using boron tri71 and methane.
この方法は原料の硼素源が高価であるという欠点がある
。This method has the disadvantage that the raw boron source is expensive.
(4)窒化硼素と炭素の混合物から炭化硼素を製造する
方法(特公昭45−19169、特公昭4O−2504
8)。(4) Method for producing boron carbide from a mixture of boron nitride and carbon (Japanese Patent Publication No. 45-19169, Japanese Patent Publication No. 40-2504
8).
特公昭45−19169の方法においても微細な炭化硼
素は得難い。Even with the method of Japanese Patent Publication No. 45-19169, it is difficult to obtain fine boron carbide.
その理由は使用する合成炉がアーク炉であり温度分布が
不均一で、得られた生成物も溶融状態の塊状で生成され
る。このため焼結体用原料に適した104m以下の微粉
末を得るためには、粉砕により製造する必要がある。し
かし炭化硼素は硬度が高く容易に破砕されない点と、粉
砕によって微粉末が得難く、不純物の混入も多い欠点が
ある。The reason for this is that the synthesis furnace used is an arc furnace, the temperature distribution is non-uniform, and the resulting product is also produced in the form of molten lumps. Therefore, in order to obtain a fine powder of 104 m or less that is suitable as a raw material for a sintered body, it is necessary to manufacture it by pulverization. However, boron carbide has the disadvantages that it is hard and cannot be easily crushed, that it is difficult to obtain fine powder by crushing, and that it is often contaminated with impurities.
また雰囲気のコントロールもなく、窒化硼素から生成す
る窒素ガスが雰囲気中に滞留するため窒素分圧も高くな
り、効果的に炭化硼素を製造することが難しい。Furthermore, there is no control of the atmosphere, and nitrogen gas generated from boron nitride remains in the atmosphere, resulting in a high nitrogen partial pressure, making it difficult to effectively produce boron carbide.
このため実際の合成温度は特公昭40−25048に見
られるごとく、2400℃以上必要である。この温度は
炭化硼素の融点2450℃に近いため生成する炭化硼素
は焼結して粒成長を生じ塊状で回収される。また高い合
成温度と温度の不均一性から、エネルギーコストもかな
り高いものになっている。For this reason, the actual synthesis temperature must be 2400° C. or higher, as seen in Japanese Patent Publication No. 40-25048. Since this temperature is close to the melting point of boron carbide, 2450° C., the boron carbide produced is sintered, causing grain growth, and is recovered in the form of a lump. Energy costs are also quite high due to high synthesis temperatures and temperature non-uniformity.
本発明者は、前記方法(4)の欠点を改善して、99%
以上の高純度で、10ILm以下の超微粉末の炭化硼素
を、高収率で製造する方法を見出すに至った。The present inventor has improved the drawbacks of the method (4) and achieved 99%
We have now found a method for producing ultrafine powder boron carbide of 10 ILm or less with high purity and high yield.
窒化硼素と炭ふを混合して次式。Mix boron nitride and carbon and use the following formula.
4BN+C+B4 G+2N2 ・・・・°
・■により炭化硼素を合成する反応において、従来は少
なくとも2000℃以上の温度で合成しないと高純度な
炭化硼素を製造することはできなかった。一方、炭化硼
素の融点は2450℃であり、高温で合成すれば必然的
に粒成長を生じた。このため焼結体用粉末として適した
数gmからサブミクロンの範囲の炭化硼素を製造するに
は粉砕による方法しかなかった。4BN+C+B4 G+2N2...°
- In the reaction of synthesizing boron carbide using (1), conventionally it was not possible to produce highly pure boron carbide unless the synthesis was carried out at a temperature of at least 2000°C or higher. On the other hand, the melting point of boron carbide is 2450°C, and grain growth inevitably occurs when synthesized at high temperatures. For this reason, the only way to produce boron carbide in the range of several gm to submicron, which is suitable as powder for sintered bodies, is to use pulverization.
粉砕による方法ではloILm以下の微粉末の回収率が
悪く、また粉砕工程での不純物の混入が多いため、高純
度で微細な粒度の炭化硼素は得難い、このため粒成長を
生ぜず窒化硼素と炭素材から効果的に微粉末の炭化硼素
を製造する方法を検討した結果、本発明を完成するに至
った0本発明はこのような改善された方法を提供しよう
とするものである。In the pulverization method, the recovery rate of fine powder below loILm is poor, and there are many impurities mixed in during the pulverization process, so it is difficult to obtain boron carbide with high purity and fine particle size. As a result of research into a method for effectively producing fine powder boron carbide from raw materials, the present invention was completed.The present invention aims to provide such an improved method.
本発明は、前記窒化硼素と炭素材から炭化硼素を製造す
る方法においては合成温度が高いため微粉末の炭化硼素
が得られない点に着目して、この点を改善した。その手
段としては、
■原料の窒化硼素として従来と異なる乱層構造の窒化硼
素を使用する。′
■雰囲気を減圧にして生成した窒素を反応系から早急に
除去し、窒素分圧を下げる。The present invention has focused on the fact that fine powder boron carbide cannot be obtained in the method for producing boron carbide from boron nitride and carbon material due to the high synthesis temperature, and has improved this point. The means for this are as follows: (1) Boron nitride with a turbostratic structure different from conventional ones is used as the raw material boron nitride. ′ ■Reduce the pressure of the atmosphere and immediately remove the generated nitrogen from the reaction system to lower the nitrogen partial pressure.
(■これらの操作によって2000℃未満の温度で合成
する。(■ Synthesis is carried out at a temperature below 2000°C by these operations.
つまり本発明の要旨は、乱層構造の窒化硼素と炭素材の
混合物を減圧下で1700℃から2000℃未満の温度
範囲での熱処理を施すことを特徴とする高純度炭化硼素
微粉末の製造方法である。In other words, the gist of the present invention is a method for producing high-purity boron carbide fine powder, which is characterized in that a mixture of boron nitride and a carbon material having a turbostratic structure is heat-treated in a temperature range from 1700°C to less than 2000°C under reduced pressure. It is.
さらに本発明の好ましい態様を述べれば。Further, preferred embodiments of the present invention will be described.
a)原料として硼素化合物と窒化剤を混合し、非酸化性
雰囲気中600〜1300℃で合成した。a) A boron compound and a nitriding agent were mixed as raw materials and synthesized at 600 to 1300°C in a non-oxidizing atmosphere.
完全に六方晶構造にまでは成長していない乱層構造の窒
化硼素を用い、これに炭素材を混合して前記混合物とし
、減圧下で1700℃以上2000℃未満で熱処理する
。Boron nitride having a turbostratic structure that has not completely grown into a hexagonal crystal structure is used, a carbon material is mixed therein to obtain the mixture, and the mixture is heat-treated at 1700° C. or more and less than 2000° C. under reduced pressure.
b)硼素化合物、窒化剤および炭素材を混合し、非酸化
性雰囲気中600〜1300℃の熱処理で乱層構造の窒
化硼素と炭素材の混合物を得、これを減圧下で1700
℃以J:〜2000℃未満で処理する。b) A boron compound, a nitriding agent, and a carbon material are mixed, and a mixture of boron nitride and carbon material with a turbostratic structure is obtained by heat treatment at 600 to 1300°C in a non-oxidizing atmosphere, and this is heated to 1700 °C under reduced pressure.
Below ℃ J: Treat at a temperature below ~2000℃.
本発明による高純度で微細な炭化硼素を製造する方法に
ついて作用と共に以下詳細に述べる。The method for producing fine boron carbide with high purity according to the present invention will be described in detail below along with its operation.
原料の窒化硼素は完全には結晶化していない。The raw material boron nitride is not completely crystallized.
乱層構造の方が反応性が高く低温で炭化硼素になりやす
い。The turbostratic structure has higher reactivity and is more likely to form boron carbide at low temperatures.
本発明方法において原料として用いる乱層構造の窒化硼
素粉末は、完全に黒鉛構造を有しておらず、隣接する層
が互いにランダムに定位する層状構造になっており、明
らかに通常の黒鉛構造の結晶質窒化硼素とは異なるもの
である。The boron nitride powder with a turbostratic structure used as a raw material in the method of the present invention does not have a graphite structure completely, but has a layered structure in which adjacent layers are randomly positioned with respect to each other, and it is clearly different from the normal graphite structure. It is different from crystalline boron nitride.
窒化硼素は合成条件により結晶構造が異なっており、た
とえば硼酸と尿素を原料として窒素雰囲気中で窒化硼素
を合成した場合を例にとると、600℃から窒化硼素が
生成するが、この場合は完全に六方晶構造にまでなりき
っておらず、結晶学り乱層構造と呼ばれるような、隣接
する層が互いにランダムに位置する構造になっている0
通常の結晶質の窒化硼素は黒鉛と同様に六方晶の層状構
造をとり、各層は完全に平行になっており、この点が乱
層構造の窒化硼素と異なる点である。さらに温度を上げ
ていくと乱層構造から六方晶構造に徐々に変化していき
、それと同時に粒成長と不純物の酸化硼素、硼酸アンモ
ニウム、結晶中の醜素、炭素などが除去されて純度も向
上していく。The crystal structure of boron nitride differs depending on the synthesis conditions. For example, when boron nitride is synthesized in a nitrogen atmosphere using boric acid and urea as raw materials, boron nitride is formed at 600°C, but in this case it is completely However, it does not have a hexagonal crystal structure, but instead has a structure in which adjacent layers are randomly positioned relative to each other, which is called a crystallographic turbostratic structure.
Ordinary crystalline boron nitride has a hexagonal layered structure similar to graphite, and each layer is completely parallel, which is different from boron nitride, which has a turbostratic structure. As the temperature is further raised, the turbostratic structure gradually changes to a hexagonal structure, and at the same time grain growth and impurities such as boron oxide, ammonium borate, ugliness in the crystal, and carbon are removed, improving purity. I will do it.
1600℃以上になると、−次粒子径も11Lm以りに
なり、さらに加熱を続けていくと完全に六方晶構造の2
pm〜6ルmの一次粒子径を有する純度(Nの分析値か
ら計算した値)が99%以上にの窒化硼素になる。When the temperature exceeds 1600℃, the secondary particle size also becomes 11Lm or more, and as the heating continues, the hexagonal crystal structure becomes completely 2.
The resulting boron nitride has a primary particle diameter of pm to 6 pm and a purity (calculated from the analytical value of N) of 99% or more.
これらの結晶構造を定暇化する方法として結晶子の大き
さを測定する方法(7振117委負会法)がある、結晶
子の大きさはC軸方向の平均厚さくL c)とa軸方向
のモ均直径(La)で表わされるが(002)のピーク
が最も強いのでLcで表示するのが精度も良い。There is a method of measuring the size of crystallites (7-117 committee method) to determine the crystal structure.The size of crystallites is the average thickness in the C-axis direction L c) It is expressed by the average diameter (La) in the axial direction, but since the (002) peak is the strongest, it is more accurate to display it by Lc.
Lcで上記結晶構造を評価すると、はぼ100Å以下で
は乱層構造であり、はぼ100人〜400人では準黒鉛
構造をとり、はぼ400人以北では完全に六方晶構造で
あった。従って、本発明でいう乱層構造をLcで述べれ
ば略100Å以下の窒化硼素ということになる。When the crystal structure was evaluated using Lc, it was found to be a turbostratic structure below 100 Å, a quasi-graphitic structure between 100 and 400 Å, and a completely hexagonal structure north of 400 Å. Therefore, if the turbostratic structure in the present invention is expressed by Lc, it means boron nitride with a thickness of about 100 Å or less.
炭化4a素の効率的な製造方法としては、硼素化合物(
硼酸またはその脱水物など)と、窒化剤(尿素、ジシア
ンジアミドメラミン、塩化アンモニウム、シアヌル酸な
ど)と、炭素材とを混合し。As an efficient method for producing 4a carbide, a boron compound (
(boric acid or its dehydrate, etc.), a nitriding agent (urea, dicyandiamide melamine, ammonium chloride, cyanuric acid, etc.), and a carbon material.
非酸化性雰囲気中で600℃〜1300℃に加熱して乱
層構造の窒化硼素を生成せしめ、しかる後引き続いて減
圧下で熱処理することで効率よく製造することができる
。このような方法によれば1回の熱処理で炭化硼素を製
造することができ、エネルギー的に有利である。It can be efficiently produced by heating to 600° C. to 1300° C. in a non-oxidizing atmosphere to generate boron nitride with a turbostratic structure, followed by heat treatment under reduced pressure. According to such a method, boron carbide can be produced in one heat treatment, which is advantageous in terms of energy.
またその他の方法として硼砂と尿素あるいは硼酸とアン
モニアなど硼素化合物と窒化剤を混合し、非酸化性雰囲
気中で600〜1300℃に加熱するなどの方法で得ら
れた乱層構造の窒化硼素に炭素材を添加し、減圧下で加
熱することで炭化硼素を製造することができる。Another method is to mix boron compounds such as borax and urea or boric acid and ammonia with a nitriding agent and heat the mixture to 600 to 1300°C in a non-oxidizing atmosphere. Boron carbide can be produced by adding raw materials and heating under reduced pressure.
炭素源の炭素材は微細なものほど好ましく、その添加方
法としては、固体状あるいは液体状で混練しても良い、
原料として硼酸と窒化剤とを使用する場合には、あらか
じめ炭材を添加しておくか、鉄板、鉄粉を原料中に挿入
あるいは添加して炭素含有有機物分解ガスを試料中に滞
留させ、窒化剤中の炭素を析出させることによって炭素
源とすることもできる。この方法によれば炭素源は均一
に析出し反応性は非常に高い状態で存在する。The finer the carbon material as the carbon source, the more preferable it is, and the method of adding it may be by kneading it in solid or liquid form.
When using boric acid and a nitriding agent as raw materials, add carbon material in advance, or insert or add iron plates or iron powder into the raw materials to allow carbon-containing organic decomposition gas to remain in the sample. It can also be used as a carbon source by precipitating carbon in the agent. According to this method, the carbon source is uniformly precipitated and remains highly reactive.
この方法では鉄が残留するので1000℃前後の温度ま
で加熱した後冷却し、鉄粉の場合は酸洗により、鉄板の
場合は抜き取りにより除去する必要がある。In this method, iron remains, so it is necessary to heat it to a temperature of around 1000° C. and then cool it, and to remove it by pickling in the case of iron powder and by sampling in the case of iron plates.
窒化硼素の充填層に気体状の炭素源(メタン、エタン、
プロパンなど)を吹き込むことや、あるいは液体状の炭
素源(メタノール、エタノール、タールなど)を蒸気で
吹き込む方法なども炭素源を均一に供給する点で有効で
ある。A gaseous carbon source (methane, ethane,
Injecting a liquid carbon source (such as propane, etc.) or vaporizing a liquid carbon source (methanol, ethanol, tar, etc.) is also effective in uniformly supplying the carbon source.
使用する乱層構造の窒化硼素は加熱処理により徐々に結
晶質の窒化硼素に変化していく、このための反応性の高
い乱層構造の窒化硼素が、炭化硼素の合成温度1700
℃まで加熱処理される過程で、結晶質の窒化硼素に変化
して反応性が低下する。これを避ける方法を種々検討し
たところ、20トール以下の減圧fで加熱すれば、乱層
構造の窒化硼素は結晶化しないことが明らかになった。The turbostratic boron nitride used gradually changes into crystalline boron nitride through heat treatment.For this purpose, the highly reactive turbostratic boron nitride has a boron carbide synthesis temperature of 1700℃.
In the process of heat treatment to ℃, it changes to crystalline boron nitride and its reactivity decreases. After examining various ways to avoid this, it became clear that boron nitride having a turbostratic structure will not crystallize if heated at a reduced pressure f of 20 torr or less.
このため炭化硼素合成の熱処理条件は20I・−ル以下
が好ましい。Therefore, the heat treatment conditions for boron carbide synthesis are preferably 20 I·-L or less.
熱処理温度については、1700℃未満では炭化硼素が
十分生成せず、2000℃を越えると炭化硼素が10J
Lm以上に粒成長し、Wk粒子を回収することができな
い、このとき、真空度が高いほど炭化硼素の生成速度は
はやく、合成温度も低温にすることが可能である。19
90℃で合成する場合は、0.1トール以下にすれば数
時間で反応が完結する。また、ロータリポンプ、拡散ポ
ンプで達成可f9な真空度は10−5 トールである。As for the heat treatment temperature, if it is less than 1700℃, boron carbide will not be sufficiently generated, and if it exceeds 2000℃, boron carbide will be generated by 10J.
Grain growth exceeds Lm and Wk particles cannot be recovered. In this case, the higher the degree of vacuum, the faster the boron carbide production rate and the lower the synthesis temperature. 19
When synthesizing at 90°C, the reaction can be completed in several hours if the temperature is 0.1 Torr or less. Furthermore, the degree of vacuum that can be achieved with a rotary pump or a diffusion pump is 10-5 Torr.
1O−5)−ルで熱処理した場合には1700℃で高純
度炭化硼素微粉末を合成することができた。When heat-treated with 1O-5)-ol, high-purity boron carbide fine powder could be synthesized at 1700°C.
以上から、高純度炭化硼素微粉末を得るには、1700
℃以上2000℃未満の条件とする。From the above, in order to obtain high purity boron carbide fine powder, 1700
The temperature shall be at least ℃ but less than 2000℃.
以上の手段により純度が99%以上で平均粒径が10μ
m以下の高純度炭化硼素微粉末を製造することができた
。保持時間は粒成長を抑制する点とエネルギーコストの
点から反応完結した時点で終らせるのが好ましい。By the above method, the purity is 99% or more and the average particle size is 10μ.
It was possible to produce high-purity boron carbide fine powder of less than m. From the viewpoint of suppressing grain growth and energy cost, it is preferable to end the holding time when the reaction is completed.
実施例1
硼酸とジシアンジアミドを重量比で1:lの割合で混合
した原料100gに、カーボンブラック2.4gを添加
し、900℃で2時間窒素雰囲気中で加熱した。その後
引き続いて雰囲気を0.1トールに減圧し1950℃で
10時間保持した。Example 1 2.4 g of carbon black was added to 100 g of a raw material prepared by mixing boric acid and dicyandiamide at a weight ratio of 1:1, and the mixture was heated at 900° C. for 2 hours in a nitrogen atmosphere. Subsequently, the atmosphere was reduced to 0.1 Torr and maintained at 1950° C. for 10 hours.
冷却後生成物をX線回折で同定したところ、炭化硼素の
ピークのみ検出された。さらに化学分析によりBとCを
分析したところ(B + C)で99.7%であった。After cooling, the product was identified by X-ray diffraction, and only a boron carbide peak was detected. Furthermore, when B and C were analyzed by chemical analysis (B + C), it was 99.7%.
マイクロトラックによる平均粒径は2.6 p、 mで
あった。The average particle size by Microtrack was 2.6 p, m.
実施例2〜8
無水硼砂と尿素を重量比l:2の割合で混合し、アンモ
ニア雰囲気中で900”Oに2時間保持した後水洗して
ナトリウム分を除去し、生成物として乱層構造の窒化硼
素(窒化硼素純度91.3%、1次粒子97人)を得た
。この乱層構造の窒化硼素10gと、カーボンブラック
1.2gとを混合し黒鉛ルツボに、充填密度0.25g
/crn’で充填した。この窒化硼素を真空度と温度条
件を種々変化させて加熱した。その結果を第1表に示す
。Examples 2 to 8 Anhydrous borax and urea were mixed at a weight ratio of 1:2, held at 900"O for 2 hours in an ammonia atmosphere, and then washed with water to remove the sodium content, resulting in a product with a turbostratic structure. Boron nitride (boron nitride purity 91.3%, 97 primary particles) was obtained. 10 g of this turbostratic boron nitride and 1.2 g of carbon black were mixed and placed in a graphite crucible at a packing density of 0.25 g.
/crn'. This boron nitride was heated under various vacuum and temperature conditions. The results are shown in Table 1.
比較例1
無水硼砂と尿素を重量比でl:2の割合で混合し、アン
モニア雰囲気中で、1800”cで2時間保持した後、
水洗して結晶質六方晶窒化硼素(h−BN)を得た。こ
の窒化硼素10gとカーボンブラック1.2gとを混合
し、充填密度0.25g / c rn’でルツボ中に
充填し、真空度10−5トール以下、1600℃で10
時間加熱処理して得た生成物をX線回折で調べたところ
炭化硼素は同定されなかった。Comparative Example 1 Anhydrous borax and urea were mixed at a weight ratio of 1:2 and held at 1800"C for 2 hours in an ammonia atmosphere.
After washing with water, crystalline hexagonal boron nitride (h-BN) was obtained. 10 g of this boron nitride and 1.2 g of carbon black were mixed, filled into a crucible at a packing density of 0.25 g/c rn', and heated at a vacuum level of 10-5 torr or less at 1600°C for 10 min.
When the product obtained by heat treatment for several hours was examined by X-ray diffraction, boron carbide was not identified.
実施例9
硼酸と尿素を重量比でl:2の割合で混合した原料1k
gを、窒素雰囲気中900℃で2時間熱処理を行った後
、1トールに減圧して1900°Cまで昇温した後、メ
タンガスを100cc/minの速度で吹き込みながら
5時間保持した。Example 9 1k of raw material prepared by mixing boric acid and urea at a weight ratio of 1:2
g was heat-treated at 900° C. for 2 hours in a nitrogen atmosphere, the pressure was reduced to 1 Torr, the temperature was raised to 1900° C., and the mixture was held for 5 hours while blowing methane gas at a rate of 100 cc/min.
その結果書た生成物をX線回折で調べたところ炭化硼素
のみのピークが検出された。化学分析では(B + C
)で99.6%であった。またマイクロトラックによる
f均粒径は1.7gmであった。When the resulting product was examined by X-ray diffraction, only a peak of boron carbide was detected. In chemical analysis (B + C
) was 99.6%. Further, the f average particle size measured by Microtrack was 1.7 gm.
実施例1O
実施例9と同一熱処理を行ない、メタンの代りにメチル
アルコールを試料充填層に吹き込んだところ、X線回折
による生成物の同定では炭化硼素のみのピークが得られ
た。化学分析では(B + C)で99.2%であった
。またマイクロトラックによる平均粒径は2.1gmで
あった。Example 1O The same heat treatment as in Example 9 was carried out, but methyl alcohol was blown into the sample packed bed instead of methane. When the product was identified by X-ray diffraction, only a peak of boron carbide was obtained. Chemical analysis showed that (B + C) was 99.2%. Furthermore, the average particle size measured by Microtrack was 2.1 gm.
〔発明の効果〕
本発明によって、焼結体原料として適した99.5%以
上の高純度で10gm以下の微粉末の炭化硼素を、高い
回収率で製造できるようになった。特に加熱処理だけの
簡単な操作で製造できるので低コストで大樋生産が可能
になった。[Effects of the Invention] According to the present invention, boron carbide in the form of a fine powder of 10 gm or less with a high purity of 99.5% or more and suitable as a raw material for a sintered body can be produced with a high recovery rate. In particular, since it can be manufactured with a simple operation of just heat treatment, it has become possible to produce large gutters at low cost.
Claims (1)
1700℃以上2000℃未満の熱処理を施すことを特
徴とする高純度炭化硼素微粉末の製造方法。 2 硼素化合物と窒化剤とを混合し、非酸化性雰囲気中
で600〜1300℃の熱処理を施して得た乱層構造の
窒化硼素を用いることを特徴とする特許請求の範囲第1
項に記載の方法。 3 硼素化合物、窒化剤および炭素材を混合し、非酸化
性雰囲気中で600〜1300℃の熱処理を施し、乱層
構造の窒化硼素と炭素材の混合物とすることを特徴とす
る特許請求の範囲第1項に記載の方法。[Claims] 1. A method for producing high-purity boron carbide fine powder, which comprises heat-treating a mixture of boron nitride and a carbon material having a turbostratic structure at a temperature of 1700°C or more and less than 2000°C under reduced pressure. 2. Claim 1, characterized in that boron nitride with a turbostratic structure obtained by mixing a boron compound and a nitriding agent and subjecting the mixture to heat treatment at 600 to 1300°C in a non-oxidizing atmosphere is used.
The method described in section. 3. Claims characterized in that a boron compound, a nitriding agent, and a carbon material are mixed and heat treated at 600 to 1300°C in a non-oxidizing atmosphere to form a mixture of boron nitride and carbon material with a turbostratic structure. The method described in paragraph 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61041400A JPS62202811A (en) | 1986-02-28 | 1986-02-28 | Production of high-purity boron carbide fine powder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61041400A JPS62202811A (en) | 1986-02-28 | 1986-02-28 | Production of high-purity boron carbide fine powder |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62202811A true JPS62202811A (en) | 1987-09-07 |
Family
ID=12607326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61041400A Pending JPS62202811A (en) | 1986-02-28 | 1986-02-28 | Production of high-purity boron carbide fine powder |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62202811A (en) |
-
1986
- 1986-02-28 JP JP61041400A patent/JPS62202811A/en active Pending
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