JPS6227361B2 - - Google Patents
Info
- Publication number
- JPS6227361B2 JPS6227361B2 JP1736478A JP1736478A JPS6227361B2 JP S6227361 B2 JPS6227361 B2 JP S6227361B2 JP 1736478 A JP1736478 A JP 1736478A JP 1736478 A JP1736478 A JP 1736478A JP S6227361 B2 JPS6227361 B2 JP S6227361B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- refractive index
- basic
- high refractive
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 description 8
- 239000006185 dispersion Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Optical Filters (AREA)
Description
本発明は、適切な半値巾を有し、良好なる反射
特性を有するダイクロイツク膜に関するものであ
る。
ダイクロイツク膜は、通常高屈折率層と低屈折
率層の交互層より成るものである。従来、ダイク
ロイツク膜の構成としては、高屈折率層Hと低屈
折率層Lの基本膜厚が3:1(以下H:L=3:
1の如く略記する)のものが用いられ、従来はそ
の基本膜厚がH:L=3:1のものが多用されて
いる。この構成においては、3色分解光学系の特
に青反射ダイクロイツク膜の半値巾が充分に取れ
ず、青チヤンネルの効率を高める為にはこの半値
巾を広げる事が必要となる。この要求に従つて、
特願昭52−71896ではH:L=3:1構成と、
H:L=1:1構成を混在させ半値巾を広げる方
法が示されている。この方法では、半値巾の拡大
は可能であるが、透過帯でのリツプルを除去する
為に、中間層にリツプル除去の為の膜厚を有する
抑制層を設ける必要があり、蒸着の手順が複雑と
なり製作に技術を要する。
本発明の目的は、適切なる半値巾を有し、反射
特性が秀れていて且つ製造が容易なダイクロイツ
ク膜を提供することにある。
本発明に係るダイクロイツク膜においては、基
本的膜厚がH:L=1:3の膜においては半値巾
が拡大することに着目し、基本的膜厚がH:L=
3:1の構成とH:L=1:3の構成を有効に組
み合わせたものである。そして、その構成によ
り、半値巾が適切であり、入射光線の角度による
反射特性の変化が少なく、且つ製造の容易なダイ
クロイツク膜を得るものである。以下図面を併用
し、本発明を詳述する。
第1図は、高屈折率層に分散がないと仮定した
時の、基本となる膜厚構成がH:L=3:1(実
線)とH:L=1:3(破線)のそれぞれの入射
角0度に対する透過率特性曲線を示す図で、縦軸
に透過率T、横軸に波長λが取られている。第1
図に示す実線11及び破線12に対応するデータ
を第1表に示す。第1図に示す様に、高屈折率層
に分散が無ければ、半値巾はいずれの構成におい
ても等しいが、実際には高屈折率の物質は分散を
有する為、半値巾は等しくならない。
The present invention relates to a dichroic film having an appropriate half-width and good reflective properties. Dichroic films usually consist of alternating layers of high refractive index and low refractive index layers. Conventionally, in the structure of a dichroic film, the basic film thickness of the high refractive index layer H and the low refractive index layer L is 3:1 (hereinafter H:L=3:
Conventionally, a film with a basic film thickness of H:L=3:1 is often used. In this configuration, the half-width of the three-color separation optical system, especially the blue-reflecting dichroic film, cannot be sufficiently secured, and in order to improve the efficiency of the blue channel, it is necessary to widen this half-width. According to this request,
In the patent application No. 52-71896, H:L=3:1 configuration,
A method of widening the half-width by mixing H:L=1:1 configurations is shown. With this method, it is possible to expand the half-width, but in order to remove ripples in the transmission band, it is necessary to provide a suppression layer in the intermediate layer with a thickness sufficient to remove ripples, and the deposition procedure is complicated. Therefore, it requires skill to manufacture. SUMMARY OF THE INVENTION An object of the present invention is to provide a dichroic film that has an appropriate half-width, excellent reflective properties, and is easy to manufacture. In the dichroic film according to the present invention, we focused on the fact that the half-width increases in a film with a basic film thickness of H:L=1:3.
This is an effective combination of a 3:1 configuration and an H:L=1:3 configuration. With this configuration, it is possible to obtain a dichroic film that has an appropriate half-width, has little change in reflection characteristics depending on the angle of incident light, and is easy to manufacture. The present invention will be described in detail below with reference to the drawings. Figure 1 shows the basic film thickness configurations of H:L=3:1 (solid line) and H:L=1:3 (dashed line), assuming that there is no dispersion in the high refractive index layer. This is a diagram showing a transmittance characteristic curve for an incident angle of 0 degrees, with transmittance T plotted on the vertical axis and wavelength λ plotted on the horizontal axis. 1st
Table 1 shows data corresponding to the solid line 11 and broken line 12 shown in the figure. As shown in FIG. 1, if there is no dispersion in the high refractive index layer, the half widths are the same in all configurations, but in reality, since high refractive index substances have dispersion, the half widths are not equal.
【表】
第2図及び第3図は高屈折率物質に分散を考慮
した時の特性を示す図で、第2図はH:L=3:
1の場合を、第3図はH:L=1:3の場合を示
す。第2図及び第3図の透過率特性曲線に対応す
る膜構成は第1表に示す構成と同じであるが、異
なる点は高屈折率層の屈折率nHがnH=2.07+
11/λ−318(但しλは波長で、単位はnm)に従
つ
て変化することである。第2図及び第3図におい
て、実線21,31は、入射光線の入射角が0度
の場合の特性を、破線22,32は、入射角が
44.6゜の場合の特性を示す。第2図及び第3図か
ら明らかな様に、H:L=3:1の特性はH:L
=1:3の特性に比して入射角0度において明ら
かに半値巾が狭く、入射角43.6度では反射ピーク
を同一波長に移動させて比較すれば、この傾向は
より顕著なものとなる。即ち、H:L=1:3の
構成の方が、H:L=3:1の構成よりも半値巾
が広く、半値巾に関してはH:L=1:3の構成
が好ましい。
一方、入射角が0度に比して43.6度の場合、特
性曲線が短波長側へシフトする移動量は、H:L
=3:1の構成の方がH:L=1:3の構成に比
して小さい。従つて入射光束の角度依存性におい
てはH:L=3:1の構成の方が優れている。
第4図は、本発明に係るダイクロイツク膜の透
過率特性曲線を示すものであり、実線は光線の入
射角が0度、破線は44.6度の場合の特性を示して
いる。第4図に示す特性曲線に対応する膜構成の
データを第2表に掲示する。但しnHはnH=2.07
+11/λ−318(λは波長、単位はnm)に従つて
変
化するものであり、基準波長はλ0=484nmで
ある。第2表に示す如く、本発明の膜構成は、高
屈折率の基本層として3/4λ0と1/4λ0を混在せ
し
め、又低屈折率[Table] Figures 2 and 3 are diagrams showing the characteristics of high refractive index materials when dispersion is considered. Figure 2 shows H:L=3:
1, and FIG. 3 shows the case of H:L=1:3. The film structure corresponding to the transmittance characteristic curves in FIGS. 2 and 3 is the same as the structure shown in Table 1, but the difference is that the refractive index n H of the high refractive index layer is n H =2.07+
11/λ-318 (where λ is the wavelength, the unit is nm). In FIGS. 2 and 3, solid lines 21 and 31 represent the characteristics when the angle of incidence of the incident light is 0 degrees, and broken lines 22 and 32 represent the characteristics when the angle of incidence is 0 degrees.
The characteristics for the case of 44.6° are shown. As is clear from Figures 2 and 3, the characteristics of H:L = 3:1 are H:L
Compared to the characteristic of =1:3, the half-width is clearly narrower at an incident angle of 0 degrees, and if the reflection peak is moved to the same wavelength at an incident angle of 43.6 degrees and compared, this tendency becomes even more remarkable. That is, the configuration with H:L=1:3 has a wider half-width than the configuration with H:L=3:1, and the configuration with H:L=1:3 is preferable regarding the half-width. On the other hand, when the incident angle is 43.6 degrees compared to 0 degrees, the amount of shift of the characteristic curve toward the shorter wavelength is H:L
=3:1 configuration is smaller than H:L=1:3 configuration. Therefore, the configuration of H:L=3:1 is better in terms of the angular dependence of the incident light flux. FIG. 4 shows the transmittance characteristic curve of the dichroic film according to the present invention, where the solid line shows the characteristics when the incident angle of the light beam is 0 degrees and the broken line shows the characteristics when the incident angle of the light beam is 44.6 degrees. Table 2 shows the data of the film structure corresponding to the characteristic curve shown in FIG. However , n H = 2.07
+11/λ-318 (λ is wavelength, unit is nm), and the reference wavelength is λ 0 =484 nm. As shown in Table 2, the film structure of the present invention includes a mixture of 3/4λ 0 and 1/4λ 0 as a high refractive index basic layer, and a low refractive index base layer.
【表】【table】
【表】
の基本層としても3/4λ0と1/4λ0を混在せしめ
る構
成を取つている。即ち、低屈折率層の基本層とし
て少なくとも1層を3/4λ0の膜厚とすることによ
り半値巾の拡大を計り、高屈折率の膜厚に3/4λ0
を多用することにより入射光束の角度依存性の向
上を計つたもので、第4図に示す如く両膜構成を
効果的に混在せしめることにより、半値巾も充分
に広く、又角度依存性にも優れたダイクロイツク
膜が作成される。
又、斯様な本発明に係る膜構成においては、従
来のリツプル抑制法を用いて有効にリツプルを除
去できるもので、基板側から第1層目、第2層目
及び最終層をリツプル除去用の調整層として基本
膜層から変化させている。この様に、基板側の層
と媒質側の層を調整層とする場合は、中間層に調
整層が入る場合に比して遥かに蒸着技術は簡単と
なり、製造上容易に蒸着する事ができる。
リツプル抑制用の層の厚さは、第2表に示した
値には限らず、多少変化しても実用上さしつかえ
なく、第1層の膜厚をd1、第2層目の膜厚をd2、
第12層目の膜厚をd12とすると、d1、d2、d12は
2.5・λ0/4<d1<3.5・λ0/4、0.5・λ0/4<d
2<1.5・
λ0/4、0.5・λ0/4<d12<1.9・λ0/4に存す
ればリツプ
ルは有効に除去できる。又、上記高屈折率層とは
屈折率が2.0から2.5なる値を、低屈折率層とは屈
折率が1.35から1.50の値を有する層が最も適する
ものである。
以上、本発明に係るダイクロイツク膜において
は、高屈折率層の基本層としてλ0/4と3/4λ0の
層を
又低屈折率層としてλ0/4と3/4λ0の層をそれぞ
れ有
効に混在せしめることにより、半値巾が充分取
れ、反射率特性曲線の入射角度による移動が少な
く、且つ製造が容易という優れた効果を有するも
のである。The basic layer of [Table] also has a configuration in which 3/4λ 0 and 1/4λ 0 are mixed. That is, by making at least one basic layer of the low refractive index layer have a thickness of 3/4λ 0 , the half-width is expanded, and by using a large amount of 3/4λ 0 in the high refractive index film thickness, the incident luminous flux is By effectively mixing both film configurations as shown in Figure 4, a dichroic film with a sufficiently wide half-width and excellent angle dependence can be created. be done. In addition, in the film structure according to the present invention, ripples can be effectively removed using conventional ripple suppression methods, and the first layer, second layer, and final layer from the substrate side are used for ripple removal. The adjustment layer is changed from the basic membrane layer. In this way, when the layer on the substrate side and the layer on the medium side are used as adjustment layers, the deposition technique is much simpler than when the adjustment layer is included in the intermediate layer, and it can be easily deposited in terms of manufacturing. . The thickness of the ripple suppressing layer is not limited to the values shown in Table 2, but may vary slightly without any practical problems.The thickness of the first layer is d1 , and the thickness of the second layer is d2 ,
If the thickness of the 12th layer is d 12 , d 1 , d 2 , d 12 are
2.5・λ 0 /4<d 1 <3.5・λ 0 /4, 0.5・λ 0 /4<d
Ripples can be effectively removed if 2 <1.5·λ 0 /4 and 0.5·λ 0 /4<d 12 <1.9·λ 0 /4. Further, the most suitable high refractive index layer is a layer having a refractive index of 2.0 to 2.5, and the low refractive index layer is a layer having a refractive index of 1.35 to 1.50. As described above, in the dichroic film according to the present invention, layers of λ 0 /4 and 3/4λ 0 are used as the basic layer of the high refractive index layer, and layers of λ 0 /4 and 3/4λ 0 are used as the low refractive index layer. By effectively mixing each of them, a sufficient half-width can be obtained, there is little movement of the reflectance characteristic curve depending on the incident angle, and manufacturing is easy.
第1図は、高屈折率層に分散が無いと仮定した
場合のH:L=3:1とH:L=1:3を基本構
成とするダイクロイツク膜の透過率特性を示す
図、第2図は、高屈折率層が分散を有する場合、
H:L=3:1を基本構成とするダイクロイツク
膜の透過率特性の一実施例を示す図、第3図は高
屈折率層が分散を有する場合、H:L=1:3を
基本構成とするダイクロイツク膜の透過率特性の
一実施例を示す図、第4図は本発明に係るダイク
ロイツク膜の透過率特性の一実施例を示す図であ
る。
T……透過率、λ……波長。
Figure 1 is a diagram showing the transmittance characteristics of dichroic films with basic configurations of H:L = 3:1 and H:L = 1:3, assuming that there is no dispersion in the high refractive index layer. Figure 2 shows that when the high refractive index layer has dispersion,
A diagram showing an example of the transmittance characteristics of a dichroic film having a basic configuration of H:L=3:1. FIG. FIG. 4 is a diagram showing an example of the transmittance characteristics of the dichroic film according to the present invention. T...Transmittance, λ...Wavelength.
Claims (1)
12層で構成され、基準波長をλ0とすると、前記
低屈折率層の基本層の光学的膜厚はλ0/4と3
λ0/4が混在し、前記高屈折率層の基本層の光
学的膜厚はλ0/4と3λ0/4が混在し、基板
側から数えて第1、第3、第5、及び第7層目は
3λ0/4を基本膜厚とする高屈折率層、第9及
び第11層目はλ0/4を基本膜厚とする高屈折率
層、第2、第4、第6、第8及び第12層目はλ
0/4を基本膜厚とする低屈折率層、第10層目は
3λ0/4を基本膜厚とする低屈折率層であるこ
とを特徴とするダイクロイツク膜。1 High refractive index layers and low refractive index layers are arranged alternately
It is composed of 12 layers, and if the reference wavelength is λ 0 , the optical thickness of the basic layer of the low refractive index layer is λ 0 /4 and 3.
The basic layer of the high refractive index layer has a mixture of λ 0 / 4 and 3λ 0 /4, and the first, third, fifth, and The 7th layer is a high refractive index layer with a basic thickness of 3λ 0 /4; the 9th and 11th layers are high refractive index layers with a basic thickness of λ 0 /4; 6. The 8th and 12th layers are λ
A dichroic film characterized in that the tenth layer is a low refractive index layer having a basic thickness of 3λ 0 /4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1736478A JPS54110855A (en) | 1978-02-17 | 1978-02-17 | Dichroic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1736478A JPS54110855A (en) | 1978-02-17 | 1978-02-17 | Dichroic film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54110855A JPS54110855A (en) | 1979-08-30 |
| JPS6227361B2 true JPS6227361B2 (en) | 1987-06-15 |
Family
ID=11941968
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1736478A Granted JPS54110855A (en) | 1978-02-17 | 1978-02-17 | Dichroic film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54110855A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6444468A (en) * | 1987-08-12 | 1989-02-16 | Fuji Xerox Co Ltd | Developing method |
| US7298550B2 (en) | 2004-07-22 | 2007-11-20 | Olympus Corporation | Dichroic mirror, fluorescence filter set, and fluoroscopy apparatus |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4837279B2 (en) * | 2004-04-05 | 2011-12-14 | オリンパス株式会社 | Epi-illumination microscope and fluorescent filter set |
-
1978
- 1978-02-17 JP JP1736478A patent/JPS54110855A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6444468A (en) * | 1987-08-12 | 1989-02-16 | Fuji Xerox Co Ltd | Developing method |
| US7298550B2 (en) | 2004-07-22 | 2007-11-20 | Olympus Corporation | Dichroic mirror, fluorescence filter set, and fluoroscopy apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54110855A (en) | 1979-08-30 |
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