JPS62287063A - 薄膜処理設備の付着物除去方法 - Google Patents

薄膜処理設備の付着物除去方法

Info

Publication number
JPS62287063A
JPS62287063A JP12982186A JP12982186A JPS62287063A JP S62287063 A JPS62287063 A JP S62287063A JP 12982186 A JP12982186 A JP 12982186A JP 12982186 A JP12982186 A JP 12982186A JP S62287063 A JPS62287063 A JP S62287063A
Authority
JP
Japan
Prior art keywords
thin film
wall
jig
film
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12982186A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6366901B2 (2
Inventor
Yuuzou Kaniko
可児子　祐三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12982186A priority Critical patent/JPS62287063A/ja
Publication of JPS62287063A publication Critical patent/JPS62287063A/ja
Publication of JPS6366901B2 publication Critical patent/JPS6366901B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP12982186A 1986-06-03 1986-06-03 薄膜処理設備の付着物除去方法 Granted JPS62287063A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12982186A JPS62287063A (ja) 1986-06-03 1986-06-03 薄膜処理設備の付着物除去方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12982186A JPS62287063A (ja) 1986-06-03 1986-06-03 薄膜処理設備の付着物除去方法

Publications (2)

Publication Number Publication Date
JPS62287063A true JPS62287063A (ja) 1987-12-12
JPS6366901B2 JPS6366901B2 (2) 1988-12-22

Family

ID=15019054

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12982186A Granted JPS62287063A (ja) 1986-06-03 1986-06-03 薄膜処理設備の付着物除去方法

Country Status (1)

Country Link
JP (1) JPS62287063A (2)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8216654B2 (en) 2003-02-19 2012-07-10 Ulvac, Inc. Components for a film-forming device and method for cleaning the same

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101024044B1 (ko) 2003-01-23 2011-03-22 가부시키가이샤 알박 성막 장치용 구성부품 및 그 세정 방법
JP4882468B2 (ja) * 2006-04-11 2012-02-22 東ソー株式会社 溶射膜除去用組成物、及びそれを用いた除去方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55154570A (en) * 1979-05-18 1980-12-02 Nec Corp Protecting method for vacuum deposition apparatus mechanism parts

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55154570A (en) * 1979-05-18 1980-12-02 Nec Corp Protecting method for vacuum deposition apparatus mechanism parts

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8216654B2 (en) 2003-02-19 2012-07-10 Ulvac, Inc. Components for a film-forming device and method for cleaning the same

Also Published As

Publication number Publication date
JPS6366901B2 (2) 1988-12-22

Similar Documents

Publication Publication Date Title
KR100323502B1 (ko) 액정표시패널의 제조방법 및 이것에 사용되는 세정장치
JPS62287063A (ja) 薄膜処理設備の付着物除去方法
JP3836603B2 (ja) 配向膜印刷版剥離洗浄装置と剥離方法
JP2786388B2 (ja) ステンレス研磨製品の製造方法及び製造装置
JPS6199336A (ja) 電子素子の製造方法
JPS5919329A (ja) 洗浄方法とその装置
JPS5866334A (ja) 半導体基板の処理装置
JPH07145472A (ja) 薄膜成膜用マスクとその洗浄方法
JPH05160104A (ja) 半導体ウェーハのウェット処理方法及びウェット処理装置
JPH02118076A (ja) 膜作製装置の洗浄方法
JPS61121335A (ja) ウエハの研削面の処理方法
JPS62264622A (ja) 半導体製造装置
RU2208520C1 (ru) Способ гравирования по стали
JPH06220600A (ja) 真空薄膜形成装置等の洗浄方法
JP2830633B2 (ja) 半導体装置の製造方法
JPS63307741A (ja) 基板面の異物除去装置
KR200365733Y1 (ko) 초음파 불산 세정 장치
JPH06312163A (ja) 成形型のクリーニング方法
JPH02119224A (ja) プラズマ分散板の再利用処理方法
JP2003338679A (ja) 基板の処理方法及び装置並びにそれに用いる除去剤
JPH05218286A (ja) 短冊型リードフレームの洗浄方法
JPH0945640A (ja) 半導体ウェーハの枚葉化処理方法、その装置、および半導体ウェーハの分離装置、ならびに、半導体ウェーハ表面付着物の除去装置
JPH0496215A (ja) 浸漬処理方法および装置
JPS63276229A (ja) ゴミ除去方法
CN117601022A (zh) 抛光机设备结晶快速清理方法