JPS6230087A - Optical information recording member - Google Patents
Optical information recording memberInfo
- Publication number
- JPS6230087A JPS6230087A JP60169608A JP16960885A JPS6230087A JP S6230087 A JPS6230087 A JP S6230087A JP 60169608 A JP60169608 A JP 60169608A JP 16960885 A JP16960885 A JP 16960885A JP S6230087 A JPS6230087 A JP S6230087A
- Authority
- JP
- Japan
- Prior art keywords
- recording
- amorphous
- recording film
- optical information
- crystalline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24312—Metals or metalloids group 14 elements (e.g. Si, Ge, Sn)
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24316—Metals or metalloids group 16 elements (i.e. chalcogenides, Se, Te)
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔発明の目的〕本発明は光、熱等を利用する光学的情報
の記録再生を行なう光学情報記録部材に関するものであ
って、その目的とするところは光学的情報の記録および
消去の繰り返し特・tiがすぐれ、かつ消去率の経時変
動も少く、情報信号を高速度かつ高密度に記録、再生す
ることのできる光学情報記録部材を提供することにある
。Detailed Description of the Invention [Object of the Invention] The present invention relates to an optical information recording member for recording and reproducing optical information using light, heat, etc. It is an object of the present invention to provide an optical information recording member that has excellent repeat characteristics of recording and erasing, ti, and has little change in erasing rate over time, and is capable of recording and reproducing information signals at high speed and high density.
レーザ光を利用する光ディスクには記録再生が1回のみ
の追記型と、記録した信号を消去して繰返して使用する
ことの可能な書き換え可能型とがあるが本発明は後者の
書き換え可能型に属する。本発明者らは先にTe−Tl
IO2の非晶質状、仲と結晶質状態との間の相転移によ
る反射率の変化を信号とする方式を提案した。また、相
転移を利用した書き換え可能な記録膜としてのTg−T
+O□に対し、各種の添加物(SW、□e、Bi、エル
、Pd、 TL、 Sgなど)を添加することも行なわ
れており、これらはO/Nが高く耐湿性のすぐれた記録
膜かえられることを明らかにしている。There are two types of optical discs that use laser light: write-once type, which allows recording and reproduction only once, and rewritable type, which allows recorded signals to be erased and used repeatedly.The present invention applies to the latter rewritable type. belong to The present inventors previously reported that Te-Tl
We proposed a method that uses changes in reflectance as a signal due to phase transition between the amorphous and crystalline states of IO2. In addition, Tg-T as a rewritable recording film using phase transition
Various additives (SW, □e, Bi, L, Pd, TL, Sg, etc.) are also added to +O□, and these are used to create recording films with high O/N and excellent moisture resistance. It is clear that it can be changed.
ところで酸化物を含む上記記録膜には以下述べるような
欠点がある。書き換え可能な元ディスクにおいてはTg
−T−○、の結晶質状態で消去が行なわれ、非晶質状態
で記録が行なわれる。However, the above-mentioned recording film containing an oxide has the following drawbacks. For rewritable original discs, Tg
Erasing is performed in the crystalline state of -T-○, and recording is performed in the amorphous state.
この結晶質と非晶質との間の相転移はレーザ光に:る除
冷と急冷の条件変化によって行なわれる。すなわち、レ
ーザ光による加熱後、除冷によって結晶質になり、急冷
によって非晶質となる。したがって、記録、消去の繰返
しによって記録膜は結晶質状態と非晶質状態の相転移が
繰返される。この場合、記録膜に酸化物が存在すると、
膜の粘性が高いためにカルコゲン化物の泳動性が少なく
なシ、膜組成の偏析が生じ易くなる。さらに、酸化物は
熱伝導率が低いのでレーザ光の入射側と反対側との間で
温度分布差を生じ、これがまた膜組成の偏析の原因にな
る。This phase transition between crystalline and amorphous is performed by changing the conditions of gradual cooling and rapid cooling using laser light. That is, after heating with laser light, it becomes crystalline by slow cooling, and becomes amorphous by rapid cooling. Therefore, as recording and erasing are repeated, the recording film undergoes repeated phase transitions between a crystalline state and an amorphous state. In this case, if oxide exists in the recording film,
Due to the high viscosity of the membrane, the migration of chalcogenide is low, and segregation of membrane composition is likely to occur. Furthermore, since oxides have low thermal conductivity, a difference in temperature distribution occurs between the laser beam incident side and the opposite side, which also causes segregation of the film composition.
以上の理由によって酸化物を含む記録膜は記録、消去の
繰返しによって特性が次第に変化する欠点がある。本発
明はこの欠点を解消すると共に、カルコゲン化合物よシ
なる従来の記録膜のO/N、消去率、耐湿性および耐熱
性などの緒特性を改善することを目的とするものである
。For the above reasons, recording films containing oxides have the disadvantage that their characteristics gradually change due to repeated recording and erasing. The object of the present invention is to eliminate this drawback and to improve the characteristics of conventional recording films made of chalcogen compounds, such as O/N, erasing rate, moisture resistance, and heat resistance.
〔発明の構成〕本発明の光学情報記録部材は、テルル(
Te)、ケルマニウム(G−)おヨヒスズ(SW)を主
成分と゛して含み、これらの元素の割合がTe、i、8
μをそれぞれ10 D at%の頂点とする3角座標図
において座標(αt=S)が、A(Teos G’5B
”2 )、B (Teos ”2 8% )、O(Tg
6.01゜S”30 )、D (Tga2 GetB
S$o )、W (Te52 G’411Su、)の5
点で囲まれた範囲内にある組成を主成分として有し、こ
れに副成分として添加されるインジウム(In)の量は
前記主成分を形成するTe−Gg−SW系の量をm、副
成分Inの量をrL(藁+ル=100)とするとき、か
の値がj 〜40 cLl!% ’でちる記録膜を有す
ることを特徴とする。[Structure of the Invention] The optical information recording member of the present invention comprises tellurium (
Contains Te), kermanium (G-), and iodine (SW) as main components, and the proportions of these elements are Te, i, 8
In the triangular coordinate diagram with μ as the apex of 10 D at%, the coordinate (αt=S) is A(Teos G'5B
"2), B (Teos"2 8%), O (Tg
6.01゜S"30), D (Tga2 GetB
S$o), 5 of W (Te52 G'411Su,)
The main component has a composition within the range surrounded by dots, and the amount of indium (In) added as a subcomponent is m, the amount of Te-Gg-SW system forming the main component is m, and the amount of indium (In) added as a subcomponent is m. When the amount of component In is rL (straw+L=100), the value is j ~ 40 cLl! It is characterized by having a recording film of %.
記録膜にカルコゲン化合物を用いる試みは古く、Tt−
Geをはじめとして、これに、A7. S。Attempts to use chalcogen compounds in recording films are old, and Tt-
Including Ge, A7. S.
Si、Sg、Sh、Biなどを添加して特性を改良した
例がおる。これらカルコゲン化物よシなる査き換え可能
な記録膜は、一般に、記録、消去の繰り返しに対する安
定性が悪い特徴がある。その理由はTe%()gとその
他の添加成分が数度の繰#)返しによって記録膜の相分
離を生じ、初期と繰シ返し後では記録膜の構成成分が異
なるからである。消去可能な記録膜で相転移を利用する
場合、通常、未記録、消去状態を結晶質とし、P録f能
f−ゴLn質ふ子入古鴎翁ニジ戯省入 と箇場合、記録
はレーザ光で、記録膜を溶融させ急冷によって非晶質に
するのであるが、現在の半導体レーザはパワーに限界が
あるので融点の低い記録膜が、記録感度が高いことにな
る。そのために上述のカルコゲン化物よシなる記録膜は
記録感度を向上させるために、できるだけ融点の低い組
成、すなわち、Ttの多い膜組成となっている。Tgが
他の添加成分よシも多いことは繰り返し特性においてそ
れだけ相分離が起とシ易いことを意味する。したがって
融点を下げるために添加した過剰のTeをいかに固定し
て動きにくい組成にするかが、繰シ返し特性や、0NR
1消去率の経時変動に大きな影響を及ばずことになる。There are examples in which properties have been improved by adding Si, Sg, Sh, Bi, etc. These replaceable recording films made of chalcogenides are generally characterized by poor stability against repeated recording and erasing. The reason for this is that Te%()g and other additive components cause phase separation of the recording film by repeating it several times, and the constituent components of the recording film are different at the initial stage and after the repetition. When phase transition is used in an erasable recording film, the unrecorded and erased state is usually crystalline, and in the case of The recording film is melted with laser light and made amorphous by rapid cooling, but current semiconductor lasers have limited power, so a recording film with a low melting point has high recording sensitivity. For this reason, the above-mentioned recording film made of chalcogenide has a composition with a melting point as low as possible, that is, a film composition with a high Tt content, in order to improve recording sensitivity. The fact that Tg is more abundant than other additive components means that phase separation is more likely to occur in the repeating characteristics. Therefore, how to fix the excess Te added to lower the melting point and make it difficult to move is the key to determining the repeatability and 0NR.
This means that it does not have a large effect on the temporal fluctuation of the 1 erasure rate.
本発明の特徴は上述の従来の組成Tt−Gt−8μにエ
ルを添加して過剰の’ftを固定することにおる。過剰
のTgを固定する方法として、()(1,StLの鹸度
を増加させ、量論的なGtTt、SμTgとすることも
可能ではあるが、Ggの場合は添加量が多くなると非晶
質から結晶質への転移温度が高ぐな)、記録、消去に大
きなレーザパワーが必要となシ、実用的でない。またS
wの場合は、量論に近いSu、Te近傍組成では、蒸着
後は結晶質であ多安定な非晶質状態かえられない。した
がって本発明のように、エルを添加してTtf固定する
ことが有益である。The feature of the present invention is that L is added to the above-mentioned conventional composition Tt-Gt-8μ to fix excess 'ft. As a method of fixing excess Tg, it is possible to increase the saponity of ()(1, StL and make it stoichiometric GtTt and SμTg, but in the case of Gg, when the amount added is large, it becomes amorphous. The transition temperature from crystal to crystal is high), and large laser power is required for recording and erasing, making it impractical. Also S
In the case of w, if the composition is close to stoichiometric Su or Te, the crystalline state cannot be changed to a multistable amorphous state after vapor deposition. Therefore, it is advantageous to fix Ttf by adding L as in the present invention.
次に本発明の詳細な説明する。本発明においてTtは他
の元素を結合した状態で記録前後によって光学的濃度変
化を呈する母材である。GeはTgとの濃度比によって
非晶質、結晶質間の転移速度を支配する。すなわち、G
−の濃度が低い領域では(Tgと(Jtのみの場合は、
Ggが50αt%)、非晶質として安定に存在するが濃
度が高くなると結晶質が安定となるため、一旦結晶質と
なったものを非晶質化させることが困難となる。本発明
のGt濃度は50αtチ以下であるからGgは膜の非晶
質性を増大させることに寄与する。Swの作用はQtと
同様であるがBiLがTeとで非晶質性を増大させる領
域は狭く、本発明の範囲ではむしろ結晶化を促進する。Next, the present invention will be explained in detail. In the present invention, Tt is a base material that exhibits a change in optical density between before and after recording in a state in which other elements are bonded. Ge controls the transition rate between amorphous and crystalline depending on the concentration ratio with Tg. That is, G
- In the region where the concentration of (Tg and (Jt only) is low,
Gg (50αt%) exists stably in an amorphous state, but as the concentration increases, the crystalline state becomes more stable, making it difficult to convert a crystalline state into an amorphous state. Since the Gt concentration in the present invention is less than 50αt, Gg contributes to increasing the amorphous nature of the film. The effect of Sw is similar to that of Qt, but the region in which BiL increases amorphousness with Te is narrow, and within the scope of the present invention, it rather promotes crystallization.
すなわち、Geと日UはTeに対する作用は似ているが
、T(との濃度比によって、非晶質性が増大した)、結
晶質性が増大したりする。GeとSw7の濃度が高くな
ると記録膜は結晶質として安定するため、非晶質から結
晶質への転移は容易になるがその逆は困難となる。した
がって、このような材料は追記型材料(W10材料)に
適している。しかし、このようなり材料でもレーザパワ
ーが強く、記録膜を充分に溶融させることが可能であれ
ば、消去可能なディスクとして使用することが可能であ
る。現在、我々が実用上入手できる半導体レーザは波長
が85Qtmでパワーは30馳程度であり、Tt、Gt
、Swの量論に近い組成(Tent、 Tt8w)を溶
融させることは困難である。(融点がSaO℃程度)T
t−Gg−Suで記録、消去可能な領域は、Tgが非常
に多い領域(80αt%以上)にあるが、この領域の組
成は転移温度が低く、熱的に不安定であ 、ること、T
gが過剰なため、繰シ返しによって、TtとTg()g
あるいはTtBrtに記録膜が相分離を起こしやすいこ
となどの欠点を有している。In other words, although Ge and U have similar effects on Te, T (depending on the concentration ratio between them, amorphousness increases) and crystallinity increases. As the concentration of Ge and Sw7 increases, the recording film becomes stable as a crystalline film, so that the transition from amorphous to crystalline becomes easy, but the reverse becomes difficult. Therefore, such a material is suitable as a write-once material (W10 material). However, even such a material can be used as an erasable disk if the laser power is strong and the recording film can be sufficiently melted. Currently, the semiconductor lasers that we can practically obtain have a wavelength of 85Qtm and a power of about 30%, with Tt, Gt
It is difficult to melt a composition close to stoichiometry (Tent, Tt8w) of , Sw. (Melting point is around SaO℃)T
The region that can be recorded and erased with t-Gg-Su is in a region where Tg is very high (80 αt% or more), but the composition of this region has a low transition temperature and is thermally unstable. T
Since g is excessive, by repeating Tt and Tg()g
Alternatively, TtBrt has the disadvantage that the recording film tends to undergo phase separation.
本発明のIかは、この過剰の7gをエルTt、エル、T
gIn−itいとして安定化させる作用を有する。According to the present invention, this excess 7g is
It has the effect of stabilizing gIn-it.
Inは7gと上記合金系においてTcが50αt%以上
の場合は融点がそれぞれ696℃667℃、455℃で
、エルを添加してもTeの融点(451℃)を上昇させ
ることはない。When In is 7g and Tc is 50αt% or more in the above alloy system, the melting points are 696°C, 667°C, and 455°C, respectively, and even if L is added, the melting point of Te (451°C) does not increase.
そのため、T、nを添加した記録膜は現行の半導体レー
ザーパワーで十分に溶融させることが可能である。しか
も熱的に不安定な過剰のTcを工nTexとして結合さ
せているため、熱的に安定で、かつ、記録、消去の繰り
返しによって相分離を生ずることなく、長期に亘って安
定な記録膜を形成する。Inの添加量は、Gt、Swと
結合した残りの過剰Tgを固定するのに必要な量であっ
て、T(の濃度の高い領域ではI3の濃度も高い。Therefore, a recording film doped with T and n can be sufficiently melted with current semiconductor laser power. Furthermore, because excess Tc, which is thermally unstable, is bonded as Tex, a recording film that is thermally stable and stable for a long period of time without causing phase separation due to repeated recording and erasing can be created. Form. The amount of In added is the amount necessary to fix the remaining excess Tg combined with Gt and Sw, and in the region where the concentration of T is high, the concentration of I3 is also high.
〔第1図の説明〕第1図は本発明の記録膜の主成分’]
’ g −() e −SILの濃度を3角座標図で表
している。同図において本発明の組成の範囲を規定する
A、B、O,D、Fiの各点の座標は、A (Te03
G’s B”2 )、B (Te030h S”s
)、C(Te68 G’2 s”yy )、D (Te
!12 G’+a 13”so ) 、E (Te52
G’4+1sq )であって、本発明の記録膜はこの
ABCDEによって囲まれた範囲内にある1−Ge−8
t+−系を主成分とし、これにエルを副成分として1〜
40αt%添加することによって形成される。したがっ
て本発明の記録膜の構成は次の一般式で表わすことがで
きる。[Explanation of Figure 1] Figure 1 shows the main components of the recording film of the present invention']
'g-()e-SIL concentration is expressed in a triangular coordinate diagram. In the figure, the coordinates of each point A, B, O, D, and Fi that define the composition range of the present invention are A (Te03
G's B"2), B (Te030h S"s
), C (Te68 G'2 s”yy ), D (Te
! 12 G'+a 13"so), E (Te52
G'4+1sq), and the recording film of the present invention has 1-Ge-8 within the range surrounded by this ABCDE.
The t+- system is the main component, and L is the subcomponent.
It is formed by adding 40αt%. Therefore, the structure of the recording film of the present invention can be expressed by the following general formula.
(Tt@3: Ge@I/ SIL@Z)mエル・ルた
だし、x+y+z=1o o、m+ル=100腺ABよ
りTeが多い場合は必然的にQe濃度が少なくなり、非
晶質化が困難となる。またatStt濃度が低いため、
非晶質から結晶質への転移温度も低い。iEoより、G
eが低い場合も、線ABよυTCが多い場合と同様に転
移温度が低い。また、結晶質から非晶質への変態に対す
る傾向は、Ttが多い場合よりも良好である、しかし、
実用的な観点からは、充分な、結晶から非晶質への相転
移が得られない。線CDよりSυ濃度が多い場合、6m
の添加は結晶質化を促進するので、非晶質化が困難とな
る。(Tt@3: Ge@I/ SIL@Z) m El Le However, x + y + z = 1 o o, m + Le = 100 If there is more Te than gland AB, the Qe concentration will inevitably decrease and amorphization will occur. It becomes difficult. Also, because the atStt concentration is low,
The transition temperature from amorphous to crystalline is also low. From iEo, G
When e is low, the transition temperature is low, as in the case where there are many lines AB and υTC. Also, the tendency for crystalline to amorphous transformation is better than with more Tt, but
From a practical point of view, a sufficient phase transition from crystal to amorphous cannot be obtained. If the Sυ concentration is higher than line CD, 6 m
Since the addition of promotes crystallization, it becomes difficult to make it amorphous.
また、非晶質から結晶質への転移温度も低く、熱的な安
定性に乏しい。線D、EよりTgが少ない場合、この領
域は、TeとQg、 13LLが化学的量論に近い結晶
とじ兄安定なGtTe、P;μTgを形成するので、非
晶質化が困難となる。また、この領域は過剰なTtがほ
とんどないので、添加する工rL濃度も少ない。すなわ
ち、Inの添加効果も少ない。したがって、この領域は
、膜の融点も高く、非晶質化が困難となる。3TLが線
KAより少ない領域では、非晶質として安定であるため
、結晶化が困難である。ただし、この傾向はEA線上の
TeとGtの比によって支配され、Teが多い程結晶化
が、よシ容易で、T−濃度が70αt%付近が、最も結
晶化が困難となシ、Tgが50αt%付近で、再び、結
晶化が容易となる。その理由は、TeとGtが、非晶質
としてより安定な化合物(Jg’ft、を形成するため
で、’fe濃度が70チ付近では、全体的に結晶質化が
困難である。Furthermore, the transition temperature from amorphous to crystalline is low, and thermal stability is poor. When Tg is less than the lines D and E, it is difficult to make this region amorphous because Te, Qg, and 13LL form stable GtTe, P; μTg, which is close to the stoichiometric crystal structure. Furthermore, since there is almost no excess Tt in this region, the concentration of added phosphor is also low. That is, the effect of adding In is also small. Therefore, the melting point of the film is high in this region, making it difficult to make it amorphous. In a region where 3TL is less than line KA, crystallization is difficult because it is stable as an amorphous state. However, this tendency is controlled by the ratio of Te and Gt on the EA line; the more Te there is, the easier crystallization is, and when the T concentration is around 70αt%, crystallization is the most difficult. At around 50 αt%, crystallization becomes easy again. The reason is that Te and Gt form a more stable amorphous compound (Jg'ft), and when the 'fe concentration is around 70 cm, it is difficult to crystallize it as a whole.
以上述べた理由によシ、本発明の主成分を構成するT
g −G t −B u系は第1図においてA、B。For the reasons stated above, T which constitutes the main component of the present invention
The g-Gt-Bu system is A and B in FIG.
0、DlFiの5点で囲まれた範囲内に限定される。す
なわち、この領域内のTt −Gg−8tb にエルを
副成分として1〜40αt%添加すると実用上、結晶質
と非晶質との可逆性を利用して情報の記録、消去が可能
となる。0 and DlFi within the range surrounded by five points. That is, if 1 to 40 αt% of L is added as a subcomponent to Tt −Gg−8tb in this region, information can be practically recorded and erased by utilizing the reversibility between crystalline and amorphous states.
〔第2図の説明〕第2図は第1図と同様に本発明の記録
膜の主成分子g−GLL−fluの濃度を6角座標図で
表わしている。FSG、H,Iの4点で囲まれた部分は
特許請求の範囲(2)の領域であって、副、成分として
10〜35αt%のエルが添加される。また、H,J、
に、L、Mの5点で囲まれた部分は特許請求の範囲(5
)の領域であって1〜15αt%のエルが副成分として
添加される。なお、FないしMの各点は第4図に示すよ
うに、A、B、O,D、Eで囲まれた特許請求 ゛の範
囲(1)の領域内にあって各点の座標は次のとおシであ
る。[Explanation of FIG. 2] Similar to FIG. 1, FIG. 2 shows the concentration of the main component g-GLL-flu of the recording film of the present invention in a hexagonal coordinate diagram. The area surrounded by the four points FSG, H, and I is the area of claim (2), in which 10 to 35 αt% of L is added as a sub-component. Also, H, J,
The portion surrounded by the five points L and M is within the scope of the claim (5).
), and 1 to 15 αt% of L is added as a subcomponent. As shown in Figure 4, each point F to M is within the area defined by A, B, O, D, and E within the scope (1) of patent claim 2, and the coordinates of each point are as follows. This is Notooshi.
F C’feat Gt5 5TJ−q )、G(T
eoz G’3 8% )H(Tees G’s 5I
L29 )、工(Te?4 G’2s S”3 )J
(τ’7n G’+o S”vo )、K (Team
”to S”t )L (T I’52 G ’45
6 y、 )、M (Te52 G’+o S”2G
)FGI(Iの4点で囲まれた領域の非晶質から結晶質
への転移温度は90〜16o℃以内で、HJKLMの5
点で囲まれた領域の転移温度(150〜220℃程度)
よりも低い。Xルの添加はTe −Gg−8nだけの場
合よりも結晶転移源I随を10〜30℃高める作用を有
する。それ故Inの添加は熱的安定性を示す転移温度を
上昇させる効果と、記録膜の融点をそれほど上昇させな
いで非晶質ft、を容易にする利点を有する。F C'feat Gt5 5TJ-q), G(T
eoz G'3 8%)H(Tees G's 5I
L29), Engineering (Te?4 G'2s S”3) J
(τ'7n G'+o S"vo), K (Team
"to S"t )L (TI'52 G'45
6 y, ), M (Te52 G'+o S”2G
) FGI (The transition temperature from amorphous to crystalline in the region surrounded by the four points of I is within 90 to 16oC, and the 5 points of HJKLM
Transition temperature of the area surrounded by dots (approximately 150 to 220℃)
lower than. The addition of X has the effect of increasing the crystal dislocation source I by 10 to 30°C compared to the case of only Te-Gg-8n. Therefore, the addition of In has the effect of increasing the transition temperature indicating thermal stability and the advantage of facilitating the formation of an amorphous film without significantly increasing the melting point of the recording film.
HJKLMの5点で囲まれた領域は過剰のTeが少いの
でInの添加効果は、FGH工の場合に比べて小さい。Since the region surrounded by the five points of HJKLM has less excess Te, the effect of adding In is smaller than in the case of FGH processing.
しかしエルを添加しないTt−Qg−Su系よりも非晶
質化は容易である。H,TKLMの領域は転移温度が高
く熱的に安定であること、GtTe、 BuTeの量
論に近い組成なので結晶化は容易で非晶質化は困難であ
るが、半導体レーザを高出力にすれば非晶質化は容易に
なる。点I、TKで囲まれた部分は安定な非晶質状態の
GITりが存在する領域で結晶化は困難である。以上述
べた理由によって、本発明の主成分Tt−Qg−Su系
および副成分Inの最適の組成が限定される。However, it is easier to become amorphous than the Tt-Qg-Su system in which L is not added. The H,TKLM region has a high transition temperature and is thermally stable, and its composition is close to the stoichiometry of GtTe and BuTe, so crystallization is easy and amorphous is difficult. If so, amorphization becomes easy. The area surrounded by points I and TK is a region where stable amorphous GIT exists, and crystallization is difficult. For the reasons described above, the optimal composition of the main component Tt-Qg-Su system and the subcomponent In of the present invention is limited.
〔第3図の説明〕第5図は本発明の記録膜を用いた光デ
ィスクの断面を示している。1.5はポリカーボネイト
、アクリル樹脂、ガラス、ポリニスデル等、透明な材料
よりなる基板、2.4は種々の酸化物、硫化物、炭化物
等よυなる保護層、3は本発明の記録膜である。保護層
2.4は記録膜3の記録、消去の繰返しによる基板1.
5の熱劣化を防止すると共に、記録膜6の防湿の作用を
する。記録膜6は蒸着、スパッタリング等によって形成
される。記録膜3の膜厚は、保護層2.4の光学特性と
マツチング(記録部と未記録部との反射率の差を大きく
とることができる)する値とする。[Explanation of FIG. 3] FIG. 5 shows a cross section of an optical disk using the recording film of the present invention. 1.5 is a substrate made of a transparent material such as polycarbonate, acrylic resin, glass, polynisdel, etc.; 2.4 is a protective layer made of various oxides, sulfides, carbides, etc.; and 3 is the recording film of the present invention. . The protective layer 2.4 is formed on the substrate 1.4 by repeated recording and erasing of the recording film 3.
In addition to preventing thermal deterioration of the recording film 5, it also acts as a moisture-proofing agent for the recording film 6. The recording film 6 is formed by vapor deposition, sputtering, or the like. The thickness of the recording film 3 is set to a value that matches the optical characteristics of the protective layer 2.4 (allowing a large difference in reflectance between the recorded and unrecorded areas).
〔実施例1〕4源蒸着の電子ビーム蒸着機により、T1
.G4,3W、エルをそれぞれのソースから蒸着した。[Example 1] Using a four-source electron beam evaporator, T1
.. G4, 3W, and L were deposited from their respective sources.
基板はψ8瓢のガラス板で、真空度1X 10 To
rr、回転速1i150rpmの下で蒸着し、膜厚を1
000人とした。各ソースからの蒸着速度は記録膜中の
Tt、 Gt、Su、Inの原子数の割合を調整するた
めに変化させた。第1表の組成はこの蒸着速度から換算
した値である。The substrate is a glass plate with a diameter of ψ8, and the degree of vacuum is 1X 10 To
rr, the rotation speed was 1i150 rpm, and the film thickness was 1
000 people. The deposition rate from each source was varied to adjust the ratio of the number of Tt, Gt, Su, and In atoms in the recording film. The compositions in Table 1 are values calculated from this vapor deposition rate.
なお、代表的な組成をX線マイクロアナライザ(X)i
!Ai測定したところ、仕込値とはy同様の定量結果か
えられた。上記の製法で作成した試験片A −Mおよび
1〜16につき転移温度並びに黒化特性および白化特性
を評価した。結果は第1表に示すとおりである。第4図
は試験片A〜Mおよび1〜16の3角座標図における位
置を示している。Note that typical compositions are measured using an X-ray microanalyzer (X)i
! When Ai was measured, the quantitative results were different from the preparation values, similar to y. Test specimens A to M and 1 to 16 prepared by the above manufacturing method were evaluated for transition temperature, blackening properties, and whitening properties. The results are shown in Table 1. FIG. 4 shows the positions of test pieces A to M and 1 to 16 in a triangular coordinate diagram.
(転移温度)転移温度は蒸着直後の非晶質状態の膜が熱
によって結晶状態になる開始温度である。その測定には
膜の透過率を測定する装置を用い、ヒータによシ試験片
の温度を昇温速度1ψtCで上昇させたとき、透過率が
減少を開始する温度を転移温度とした。転移温度が高い
ことは記録膜が熱的に安定であることを意味する。(Transition temperature) The transition temperature is the temperature at which a film that is in an amorphous state immediately after vapor deposition starts to change to a crystalline state due to heat. For this measurement, a device for measuring membrane transmittance was used, and when the temperature of the test piece was raised by a heater at a heating rate of 1 ψtC, the temperature at which the transmittance started to decrease was defined as the transition temperature. A high transition temperature means that the recording film is thermally stable.
(黒化特性および白化特性)黒化特性は非晶質から結晶
質へ転移する転移速度を示し、白化特性は結晶質から非
晶質へ転移する転移速度を示すものでおる。測定は試験
片上の記録膜に、レンズによフレーザ光を集光させ、試
験片を上下、左右に移動して行なった。レーザ光のスポ
ットは45 X 0.4 pm、パルス巾は400n−
y。(Blackening properties and whitening properties) Blackening properties indicate the rate of transition from amorphous to crystalline, and whitening properties indicate the rate of transition from crystalline to amorphous. Measurements were carried out by focusing a laser beam onto the recording film on the test piece using a lens, and moving the test piece up and down and left and right. The laser beam spot is 45 x 0.4 pm, and the pulse width is 400n-
y.
パワー密度は1Q、6呻り20/ 波長は900Mとし
た。黒化特性は、試験片を比較的、緩かに移動させた場
合の変態(非晶質→結晶質)の速度を観察し、速度が充
分早く、かつ未記録部分と記録部分のコントラスト比が
充分大きいものを◎とした。×は緩やかに移動させても
、黒化しないもの、あるいはコントラスト比が小さいも
のを示す。○、Δは◎と×の中間に位置する。The power density was 1Q, 6 groans 20/wavelength was 900M. The blackening characteristics are determined by observing the speed of transformation (from amorphous to crystalline) when the specimen is moved relatively slowly. Those that are sufficiently large are marked as ◎. × indicates that the image does not turn black even when moved slowly, or that the contrast ratio is small. ○ and Δ are located between ◎ and ×.
この定性的な表現において、実用可能な黒化時 性は0
以上である。白化特性は、黒化した試験片を速やかに、
移動させて急冷状態を作シ、白化(結晶質→非晶質)さ
せる。白化状態が◎のものは、移動速度が比較的緩やか
でも、白化し、しかも非晶質部分と結晶質部分のコント
ラスト比が大きいものを示し、×は、全く、白化しない
ものを示している。OとΔは、◎と×の中間に位置する
。In this qualitative expression, the practical blackness is 0.
That's all. The whitening property quickly removes blackened specimens.
Move it to create a rapid cooling state and whiten it (crystalline → amorphous). A whitening state of ◎ indicates that whitening occurs even if the moving speed is relatively slow, and the contrast ratio between the amorphous portion and the crystalline portion is large, and × indicates that there is no whitening at all. O and Δ are located between ◎ and ×.
上述した表現によれば、黒化特性および白化特性がとも
にすぐれている場合は、◎、◎となるが、実際問題とし
ては同じ移動速度で、どちらも◎となることはあシ得ず
、望ましい材料としては、◎、○あるいは◎、Δのよう
に、黒化特性が多少すぐれているものが好ましい。第1
表に示すように、第1図のABODEの5点で囲まれた
本発明の領域内にある組成A −Mおよび1〜16には
黒化特性および白化特性に×はなく、光学的に情報の曹
き込みおよび消去が可能である。According to the above expression, if both the blackening property and the whitening property are excellent, ◎ and ◎ will be obtained, but in reality, it is impossible and desirable for both to be ◎ at the same movement speed. Preferably, the material has somewhat excellent blackening properties, such as ◎, ◎, ◎, ∆. 1st
As shown in the table, compositions A-M and 1-16 within the area of the present invention surrounded by the five points of ABODE in FIG. It is possible to add and erase.
第 1 表 (1)
第 1 表 (2)
〔実施例2〕この実施例は第2図のFGH工で囲まれた
領域からはTe8゜G’to S”10 (第4図の点
4)を、HJKLMで囲まれた領域からはT’60 G
’2’5日−3(第4図の点12)をそれぞれ選択し、
実施例1と同様な製法および評価法によシ、Te−ae
−sμ系にエルを添加した場合、Inの濃度の特性に及
ぼす影響を試験した。結果は第2表に示すように、F
G H工の領域ではInの濃度は10αt%から35α
t%の間が良好な特性を示しており、HJKIJMの領
域ではInのa度は1〜15αt%が使用可能であるこ
とを示している。扁24 (P(5cLt%以下)は本
発明の範囲外で、白化せず、書き換え可能な記録膜にな
らない。Table 1 (1) Table 1 (2) [Example 2] In this example, from the area surrounded by the FGH work in Figure 2, Te8°G'to S''10 (Point 4 in Figure 4) , T'60 G from the area surrounded by HJKLM
Select '2' 5th - 3 (point 12 in Figure 4) respectively,
By the same manufacturing method and evaluation method as in Example 1, Te-ae
When L was added to the -sμ system, the effect of In concentration on the characteristics was tested. The results are shown in Table 2, F
In the GH engineering region, the In concentration ranges from 10αt% to 35αt%.
Good properties are shown between t % and In in the HJKIJM range, it is possible to use In with an a degree of 1 to 15 αt %. Plate 24 (P (5 cLt% or less) is outside the scope of the present invention, does not whiten, and does not become a rewritable recording film.
A30は黒化物性はX〜Δの黒化は一応可能ではあるが
実用的には使用が困難である。Although it is possible to blacken A30 with blackening physical properties of X to Δ, it is difficult to use practically.
$ 2 表
〔光ディスクによる特性試験屋1〕第3図の基板1に厚
さ12m直径200mのポリカードネート樹脂板を使用
し、保護層2として2ルSの耐熱層を900Xの厚さに
蒸着し、その上に厚さ1oooLの記録膜5を実施例1
の方法で蒸着し、さらにその上の厚さ1800XのZn
8の保護層4を蒸着j〜で基板5を密着配置した、なお
、記録膜3には第2表の扁21および煮26を使用(〜
て2種類の光ディスクを作成した。$ 2 Table [Characteristics tester using optical disks 1] A polycarbonate resin plate with a thickness of 12 m and a diameter of 200 m is used as the substrate 1 shown in Fig. 3, and a heat-resistant layer of 2 S is evaporated to a thickness of 900 X as the protective layer 2. On top of that, a recording film 5 with a thickness of 100L is placed as shown in Example 1.
Zn was deposited using the method of
The protective layer 4 of No. 8 was deposited on the substrate 5 in close contact with the substrate 5, and the recording film 3 was made of the films 21 and 26 shown in Table 2.
Two types of optical discs were created.
この2種類の光ディスクにつき、記録パワーおよび消去
パワーは8rrLωおよび15mω、記録ビームはψ1
μrn(半値巾)、消去レーザビーム長は約1s tt
m (半値巾)として、白化状態および黒化状態での記
録、消去試験を行なった。For these two types of optical discs, the recording power and erasing power are 8rrLω and 15mω, and the recording beam is ψ1.
μrn (half width), erasure laser beam length is approximately 1s tt
Recording and erasing tests were conducted in a whitened state and a blackened state, with m (half width).
なお、記録周波数はZMHz 、ディスク周速は57n
/jである。結果は次のとおりである。The recording frequency is ZMHz, and the disk peripheral speed is 57n.
/j. The results are as follows.
(1)屋21ディスクのC/Nはs s bB、消去率
は−53dBであシ、A26デイスクのO/Nは49d
B、?酸d社−46dBであった。(2)10万回の記
録、消去を繰返した後の○βの低下は、A21テイスク
は一5dB、1626デイスクは一2dB、消去率の低
下はそれぞれ1 dBおよび0.5dBテあった。(3
) 80 ℃、6’04RI−11D下に1ヶ月放fβ
した後の屋21ディスクのO/Hの低下は−1dB、消
去率の低下は1 dBであった。(1) The C/N of the Y21 disk is ss bB, the erasure rate is -53 dB, and the O/N of the A26 disk is 49 d.
B.? The acid d company was -46 dB. (2) After repeating recording and erasing 100,000 times, the reduction in ○β was -5 dB for A21 disks, -2 dB for 1626 disks, and the reduction in erasure rate was 1 dB and 0.5 dB, respectively. (3
) 80°C, fβ exposed for 1 month under 6'04RI-11D
After this, the O/H of the Ya21 disk decreased by -1 dB, and the erasure rate decreased by 1 dB.
〔光ディスクによる特性試験42 )421光デイスク
につき、耐熱保護層としてGgO2およびsiaを用い
、その特性を試験した。保護層(2)の膜厚はa oo
i、保護層(4)の膜厚は1900λである。その他は
特性試験扁1の場合と同じである。結果は、(1) O
/Nは、G−4の場合は52dB、 Siaの場合は
50 dBであった。また、消去率は、それぞれ−47
dBおよび一48clBであった。(2)寿命試験(1
夕月放置した後の特性低下)は、Goo、の場合の0ハ
の低下は−MB、stcの場合は−αBdBであった。[Characteristics Test with Optical Disc 42] The properties of the 421 optical disc were tested using GgO2 and SIA as the heat-resistant protective layer. The thickness of the protective layer (2) is a oo
i. The thickness of the protective layer (4) is 1900λ. The rest is the same as in the case of characteristic test plate 1. The result is (1) O
/N was 52 dB for G-4 and 50 dB for Sia. Also, the erasure rate is -47
dB and -48 clB. (2) Life test (1
Regarding the characteristic deterioration after being left in the evening moon, the deterioration of 0ha in the case of Goo was -MB, and the deterioration in the case of stc was -αBdB.
〔光ディスクによる特性試験AS)記録膜を実施例1の
A5とする光ディスクを特性試験1と同じ基板および方
法によって作成した。なお、耐熱保護層2は860ス、
記録層3は300人、保護層4は1950Xである。こ
の光ディスクのc/Nは54 dB、消去率は−52d
Bであシ、10万回の記録、消去を繰返した後のc/N
の低下は一2dBであった。[Characteristics Test AS Using Optical Disc] An optical disc using the A5 recording film of Example 1 was prepared using the same substrate and method as in Characteristics Test 1. In addition, the heat-resistant protective layer 2 is 860s,
The recording layer 3 is 300 people, and the protective layer 4 is 1950X. The c/N of this optical disc is 54 dB, and the erasure rate is -52 d.
B, c/N after 100,000 recordings and deletions
The reduction was -2 dB.
〔発明の効果〕以上述べたように本発明の光学情報記録
部材は、T$−Qg−Su、系にエルを添加して記録消
去を繰返し特性を改善するに当って、数多くの実験によ
って各成分の有効な配合範囲を定め、現行の半導体レー
ザパワーで十分に黒化(消化)および白化(記録)する
ことを可能にすると共に、温度および湿度に安定で従来
のこの棟の記録膜のもつ欠点を解消するすぐれた効果を
有する。[Effects of the Invention] As described above, the optical information recording member of the present invention has been improved through numerous experiments by adding L to the T$-Qg-Su system and repeating recording and erasing. By determining the effective blending range of the ingredients, we have made it possible to achieve sufficient blackening (digestion) and whitening (recording) with current semiconductor laser power, and we have also made it possible to achieve sufficient blackening (digestion) and whitening (recording) with the current semiconductor laser power. It has an excellent effect of eliminating defects.
第1図二本発明の光学情報記録部材の記録膜の主成分の
組成を示す5角座標図
第2、特許請求の範囲(2)および(6)の記録膜の主
成分の組成を示す3角座標図
第3図:本発明の光学情報記録部材の断面図第4図:本
発明の実施例1の試験片A −Mおよび1〜16の3角
座標図における位置
を示す図
図面の浄書(内容に変更なし)
才1図
牙2居
牙3図
才4図
手 続 補 正 書(方式)
%式%
t 事件の表示
昭和60年籍許顧第169608号
Z 発明の名称
光学情報記録部材
五 補正をする者
事件との関係 %粁出願人
571 大阪府門真市大字門真1006@地582
松下電器産業株式会社
屯代理人Figure 1.2 Pentagonal coordinate diagram showing the composition of the main components of the recording film of the optical information recording member of the present invention.2.3 Showing the composition of the main components of the recording film of claims (2) and (6). Angular coordinate diagram Figure 3: Cross-sectional view of the optical information recording member of the present invention Figure 4: A drawing showing the positions of test pieces A-M and 1 to 16 in the triangular coordinate diagram of Example 1 of the present invention (No change in content) 1, 2, 3, 4 Procedures Amendment book (method) % formula % t Indication of the case 1985 Registration Permit No. 169608 Z Name of the invention Optical information recording member 5. Relationship with the case of the person making the amendment Applicant 571 1006 Kadoma, Kadoma City, Osaka Prefecture @ 582 Ji
Matsushita Electric Industrial Co., Ltd. Tun Agent
Claims (2)
ズ(Su)を主成分として含み、これらの元素の割合が
Te、Ge、Suをそれぞれ100at%の頂点とする
3角座標図において座標(at%)が、A(Te_9_
3Ge_3Su_2)、B(Te_9_3Ge_2Su
_3)、C(Te_6_8Ge_2Su_3_0)、D
(Te_5_2Ge_1_3Su_3_0)、E(Te
_5_2Ge_4_6Su_2)の5点で囲まれた範囲
内にある組成を主成分として有し、これに副成分として
添加されるインジウム(In)の量は前記主成分を形成
するTe−Ge−Su系の量をm、副成分Inの量をn
(m+n=100)とするとき、nの値が1〜40at
%である記録膜を有することを特徴とする光学情報記録
部材(1) Contains tellurium (Te), germanium (Ge), and tin (Su) as main components, and the ratio of these elements is the coordinate (at %) is A(Te_9_
3Ge_3Su_2), B(Te_9_3Ge_2Su
_3), C(Te_6_8Ge_2Su_3_0), D
(Te_5_2Ge_1_3Su_3_0), E(Te
_5_2Ge_4_6Su_2) The main component has a composition within the range surrounded by the five points, and the amount of indium (In) added as a subcomponent is the amount of the Te-Ge-Su system forming the main component. m, the amount of subcomponent In is n
(m+n=100), the value of n is 1 to 40at
An optical information recording member characterized by having a recording film of %.
前記3角座標図のF(Te_9_2Ge_5Su_3)
、G(Te_9_2Ge_3Su_3)、H(Te_6
_8Ge_3Su_2_9)、I(Te_7_4Ge_
2_3Su_3)の4点で囲まれる範囲内にあって、前
記副成分として添加されるInの添加量は、前記nの値
が10〜35at%であることを特徴とする特許請求の
範囲(1)の光学情報記録部材(3)前記主成分を構成
するTe、Ge、Suの座標が前記3角座標図のH(T
e_6_8Ge_3Su_2_9)、J(Te_7_0
Ge_1_0Su_2_0)、K(Te_6_8Ge_
2_9Su_3)、L(Te_5_2、Ge_4_5S
u_3)M(Te_5_2Ge_1_9Su_2_9)
の5点で囲まれる範囲内にあって、前記副成分として添
加されるInの添加量は前記1の値が1〜15at%で
あることを特徴とする特許請求の範囲(1)の光学情報
記録部材(2) The coordinates of Te, Ge, and Su that constitute the main components are F (Te_9_2Ge_5Su_3) in the triangular coordinate diagram.
, G(Te_9_2Ge_3Su_3), H(Te_6
_8Ge_3Su_2_9), I(Te_7_4Ge_
Claim (1) characterized in that the amount of In added as the subcomponent is within the range surrounded by the four points 2_3Su_3), and the value of n is 10 to 35 at%. Optical information recording member (3) The coordinates of Te, Ge, and Su constituting the main components are H(T) in the triangular coordinate diagram.
e_6_8Ge_3Su_2_9), J(Te_7_0
Ge_1_0Su_2_0), K(Te_6_8Ge_
2_9Su_3), L(Te_5_2, Ge_4_5S
u_3) M(Te_5_2Ge_1_9Su_2_9)
Optical information according to claim (1), characterized in that the amount of In added as the subcomponent is within a range surrounded by five points, and the value of 1 is 1 to 15 at%. recording member
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60169608A JPH0714657B2 (en) | 1985-07-31 | 1985-07-31 | Optical information recording member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60169608A JPH0714657B2 (en) | 1985-07-31 | 1985-07-31 | Optical information recording member |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6230087A true JPS6230087A (en) | 1987-02-09 |
| JPH0714657B2 JPH0714657B2 (en) | 1995-02-22 |
Family
ID=15889651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60169608A Expired - Lifetime JPH0714657B2 (en) | 1985-07-31 | 1985-07-31 | Optical information recording member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0714657B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6240648A (en) * | 1985-08-15 | 1987-02-21 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Memorization of optical information |
| JPS6276035A (en) * | 1985-09-30 | 1987-04-08 | Tdk Corp | Information recording medium and recording method |
| JPH01162247A (en) * | 1987-12-18 | 1989-06-26 | Nippon Telegr & Teleph Corp <Ntt> | Rewriting type phase transfer optical recording medium |
| CN102612763A (en) * | 2009-09-11 | 2012-07-25 | 国立大学法人东北大学 | Phase change material and phase change memory element |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6131291A (en) * | 1984-07-24 | 1986-02-13 | Daicel Chem Ind Ltd | Optical information-recording medium |
-
1985
- 1985-07-31 JP JP60169608A patent/JPH0714657B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6131291A (en) * | 1984-07-24 | 1986-02-13 | Daicel Chem Ind Ltd | Optical information-recording medium |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6240648A (en) * | 1985-08-15 | 1987-02-21 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Memorization of optical information |
| JPS6276035A (en) * | 1985-09-30 | 1987-04-08 | Tdk Corp | Information recording medium and recording method |
| JPH01162247A (en) * | 1987-12-18 | 1989-06-26 | Nippon Telegr & Teleph Corp <Ntt> | Rewriting type phase transfer optical recording medium |
| CN102612763A (en) * | 2009-09-11 | 2012-07-25 | 国立大学法人东北大学 | Phase change material and phase change memory element |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0714657B2 (en) | 1995-02-22 |
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