JPS623053U - - Google Patents
Info
- Publication number
- JPS623053U JPS623053U JP9546285U JP9546285U JPS623053U JP S623053 U JPS623053 U JP S623053U JP 9546285 U JP9546285 U JP 9546285U JP 9546285 U JP9546285 U JP 9546285U JP S623053 U JPS623053 U JP S623053U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- optical means
- atomic emission
- luminescent line
- emission spectrometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims 3
- 238000009616 inductively coupled plasma Methods 0.000 claims 2
- 230000003595 spectral effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 238000000295 emission spectrum Methods 0.000 description 1
Landscapes
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Description
第１図は本考案実施例の構成説明図、第２図乃
至第４図は発光スペクトル図、第５図は本考案の
他の実施例を示す構成説明図である。
１……プラズマ、２……レンズ、３，３′……
回転ミラー、３″……ビームスプリツター、４，
８……スリツト、５……凹面鏡、６……回折格子
、７……屈折板、９……光電子増倍管、１０……
光源。
FIG. 1 is an explanatory diagram of the configuration of an embodiment of the present invention, FIGS. 2 to 4 are emission spectrum diagrams, and FIG. 5 is an explanatory diagram of the configuration of another embodiment of the invention. 1...Plasma, 2...Lens, 3,3'...
Rotating mirror, 3″...beam splitter, 4,
8...Slit, 5...Concave mirror, 6...Diffraction grating, 7...Refraction plate, 9...Photomultiplier tube, 10...
light source.
Claims (1)
起させ発光したスペクトル線の位置や強度を分光
器で検出して前記試料中の被測定元素を分析する
装置において、被測定元素の波長の近傍に波長を
もつ発光線を照射する光源を設け、該光源から照
射される発光線と前記プラズマから照射される発
光線とを前記分光器の入射スリツトに選択的に導
く光学手段を設けたことを特徴とする高周波誘導
結合プラズマ回原子発光分光分析装置。 (2) 前記光学手段は回転ミラーでなる実用新案
登録請求の範囲第(1)項記載の高周波誘導プラズ
マ・原子発光分光分析装置。 (3) 前記光学手段はビームスプリツターでなる
実用新案登録請求の範囲第(1)項記載の高周波誘
導プラズマ・原子発光分光分析装置。[Claims for Utility Model Registration] (1) In an apparatus for exciting a sample using high-frequency inductively coupled plasma and detecting the position and intensity of emitted spectral lines with a spectrometer to analyze the element to be measured in the sample, A light source that emits a luminescent line having a wavelength near the wavelength of the element to be measured is provided, and the luminescent line irradiated from the light source and the luminescent line irradiated from the plasma are selectively guided to the entrance slit of the spectrometer. A high frequency inductively coupled plasma double atomic emission spectrometer characterized by being provided with optical means. (2) The high-frequency induced plasma/atomic emission spectrometer according to claim (1), wherein the optical means is a rotating mirror. (3) The high-frequency induced plasma/atomic emission spectrometer according to claim (1), wherein the optical means is a beam splitter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9546285U JPS623053U (en) | 1985-06-24 | 1985-06-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9546285U JPS623053U (en) | 1985-06-24 | 1985-06-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS623053U true JPS623053U (en) | 1987-01-09 |
Family
ID=30654602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9546285U Pending JPS623053U (en) | 1985-06-24 | 1985-06-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS623053U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5943334A (en) * | 1982-09-03 | 1984-03-10 | Seiko Instr & Electronics Ltd | Plasma emission analyzer |
-
1985
- 1985-06-24 JP JP9546285U patent/JPS623053U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5943334A (en) * | 1982-09-03 | 1984-03-10 | Seiko Instr & Electronics Ltd | Plasma emission analyzer |
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