JPS6231922U - - Google Patents
Info
- Publication number
- JPS6231922U JPS6231922U JP12160485U JP12160485U JPS6231922U JP S6231922 U JPS6231922 U JP S6231922U JP 12160485 U JP12160485 U JP 12160485U JP 12160485 U JP12160485 U JP 12160485U JP S6231922 U JPS6231922 U JP S6231922U
- Authority
- JP
- Japan
- Prior art keywords
- gas
- pipe
- cleaning liquid
- rotating body
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 7
- 238000005192 partition Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 3
- 239000003517 fume Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Description
第1図はこの考案に係るガス処理装置の縦断面
図である。
1……ガス導通管、2……回転胴、3,4……
支持体、5,6……透孔、7……円盤状仕切板、
8……扁平管路、9……隙間、10……ガス洗浄
液、11……網板、12……台盤、13……原動
機、14……原動機軸、15,16……調車、1
7……Vベルト、18……吸出しパイプ、20…
…ポンプ、21a……浄化槽、22……入水側、
23……排出側、24……吐出パイプ、25……
ポンプ、26……ダクト、27……煙突、28…
…煙路、29……盲蓋。
FIG. 1 is a longitudinal sectional view of a gas treatment apparatus according to this invention. 1... Gas conduction pipe, 2... Rotating cylinder, 3, 4...
Support body, 5, 6... Through hole, 7... Disc-shaped partition plate,
8... Flat pipe, 9... Gap, 10... Gas cleaning liquid, 11... Net plate, 12... Base plate, 13... Prime mover, 14... Prime mover shaft, 15, 16... Pulley, 1
7...V belt, 18...Suction pipe, 20...
...Pump, 21a...Septic tank, 22...Water inlet side,
23...Discharge side, 24...Discharge pipe, 25...
Pump, 26...Duct, 27...Chimney, 28...
...Fume path, 29...Blind lid.
Claims (1)
け、該導通管1は一双の支持体3,4で水平に、
又回動して円周の位置を変化できるように固定し
、該導通管1には、回転胴2の内部において、該
導通管1の下部母線方向に少くとも2箇処に、透
孔5,6を設け、該2箇処の透孔5,6の中間に
は、導通管1内を盲板7′となつて区画し、外周
は回転胴2の内壁に僅かな隙間9を残して及ぶ円
盤状仕切板7を設け、回転胴2内を前後二室に分
け、透孔5寄りを前室2a、透孔6寄りを後室2
bとし、一方の透孔5には半径方向に扁平管路8
を設けて回転胴2の前室2aへのガス導入口5′
とし、他方の透孔6を後室2bからの洗浄ガス導
出口6とし、回転胴2内にはガス洗浄液10を湛
えさせ、該導通管1の上部側母線方向に沿つて該
回転胴2の半径方向に網板11を固定し、前記扁
平管路8のガス導入口5は前記ガス洗浄液10の
液面に達する長さとし、該回転胴2は外部に設置
した原動機13により回転されるようにし、更に
、ガス導通管1の出口側から回転胴2の後室2b
内にガス洗浄液10の吸出しパイプ18をその端
部がガス洗浄液10の液面以下になるように挿入
し、この吸出しパイプ18の他端をポンプ20を
介して外部に設置した浄化槽21の入水側22に
接続し、一方、ガス導通管1の入口側からは回転
胴2の前室2a内に吐出パイプ24の先端を挿入
し、この吐出パイプ24と前記浄化槽21の排水
側23とをポンプ25を介して接続し、ガス洗浄
液10を浄化槽21により浄化しながらたえず循
環させるようにしたことを特徴とするガス処理装
置。 A rotary cylinder 2 is rotatably provided on the outer periphery of a gas conduction pipe 1, and the conduction pipe 1 is horizontally supported by a pair of supports 3 and 4.
The conduction tube 1 is fixed so that it can be rotated to change its circumferential position, and the conduction tube 1 is provided with through holes 5 at at least two locations in the direction of the lower generatrix of the conduction tube 1 inside the rotating body 2. , 6 are provided, and a blind plate 7' is provided between the two through holes 5 and 6 to partition the inside of the conduit 1, leaving a slight gap 9 on the outer periphery of the inner wall of the rotary cylinder 2. A disk-shaped partition plate 7 is installed to divide the inside of the rotating body 2 into two front and rear chambers, with the area near the through hole 5 serving as the front chamber 2a, and the area near the through hole 6 serving as the rear chamber 2.
b, and one through hole 5 has a flat conduit 8 in the radial direction.
A gas inlet 5' to the front chamber 2a of the rotating barrel 2 is provided.
The other through hole 6 is used as the cleaning gas outlet 6 from the rear chamber 2b, and the rotating barrel 2 is filled with gas cleaning liquid 10. The mesh plate 11 is fixed in the radial direction, the gas inlet 5 of the flat pipe line 8 has a length that reaches the liquid level of the gas cleaning liquid 10, and the rotary cylinder 2 is rotated by a prime mover 13 installed outside. , further, the rear chamber 2b of the rotating body 2 from the outlet side of the gas communication pipe 1.
A suction pipe 18 for the gas cleaning liquid 10 is inserted into the tank so that its end is below the level of the gas cleaning liquid 10, and the other end of the suction pipe 18 is installed outside via a pump 20 on the water inlet side of the septic tank 21. 22, and on the other hand, the tip of the discharge pipe 24 is inserted into the front chamber 2a of the rotating body 2 from the inlet side of the gas conduit 1, and the discharge pipe 24 and the drainage side 23 of the septic tank 21 are connected to the pump 25. A gas processing apparatus characterized in that the gas cleaning liquid 10 is constantly circulated while being purified by a septic tank 21.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12160485U JPS6231922U (en) | 1985-08-09 | 1985-08-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12160485U JPS6231922U (en) | 1985-08-09 | 1985-08-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6231922U true JPS6231922U (en) | 1987-02-25 |
Family
ID=31011034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12160485U Pending JPS6231922U (en) | 1985-08-09 | 1985-08-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6231922U (en) |
-
1985
- 1985-08-09 JP JP12160485U patent/JPS6231922U/ja active Pending
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