JPH0225564U - - Google Patents
Info
- Publication number
- JPH0225564U JPH0225564U JP10394488U JP10394488U JPH0225564U JP H0225564 U JPH0225564 U JP H0225564U JP 10394488 U JP10394488 U JP 10394488U JP 10394488 U JP10394488 U JP 10394488U JP H0225564 U JPH0225564 U JP H0225564U
- Authority
- JP
- Japan
- Prior art keywords
- substrate holder
- chamber
- inlet chamber
- substrate
- cooling water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 239000000498 cooling water Substances 0.000 claims 3
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000001816 cooling Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
図面はこの考案の実施例を示し、第１図は冷却
構造を示す断面図、第２図はスパツタリング装置
の縦断面図、第３図は全体平面図、第４図は第２
図におけるＡ―Ａ線断面図である。
２……真空槽、６……チヤンバ、７……ターゲ
ツト、８……基板ホルダ、１４……基板、１６…
…公転軸、２０……モータ、２２……自転軸、３
３……給水路、３４……排水路、３６……入口室
、３７……出口室。
The drawings show an embodiment of this invention; FIG. 1 is a sectional view showing the cooling structure, FIG. 2 is a longitudinal sectional view of the sputtering device, FIG. 3 is an overall plan view, and FIG.
It is a sectional view taken along the line AA in the figure. 2... Vacuum chamber, 6... Chamber, 7... Target, 8... Substrate holder, 14... Substrate, 16...
...Revolution axis, 20...Motor, 22...Rotation axis, 3
3... Water supply channel, 34... Drain channel, 36... Inlet chamber, 37... Outlet chamber.
Claims (1)
基板ホルダを設け、基板ホルダが、真空槽の周壁
を内外に貫通する公転軸と、公転軸と同行回転す
るアームに支持された自転軸とを介して、自転し
ながら公転するプラネタリ式のスパツタリング装
置において、 基板ホルダを中空に形成し、その内部を互いに
通水自在な入口室と出口室に区画し、 公転軸の外端から、アームと自転軸を介して前
記各室に至る間に、冷却水を入口室に向つて通水
案内する給水路と、入口室から出口室へ循環した
冷却水を真空槽の外部に向つて通水案内する排水
路とをそれぞれ設け、 基板ホルダに保持された基板が、入口室を通過
する冷却水で強制冷却されるように構成したこと
を特徴とするスパツタリング装置。[Scope of Claim for Utility Model Registration] A target and a substrate holder for supporting a substrate are provided inside a vacuum chamber, and the substrate holder has a revolving axis penetrating the circumferential wall of the vacuum chamber inwardly and outwardly, and an arm that rotates along with the revolving axis. In a planetary sputtering device that revolves while rotating through a supported rotation axis, the substrate holder is formed hollow, and its interior is divided into an inlet chamber and an outlet chamber through which water can flow freely. From the outer end to each of the chambers via the arm and rotation axis, there is a water supply channel that guides the cooling water toward the inlet chamber, and a water supply channel that guides the cooling water that has circulated from the inlet chamber to the outlet chamber to the outside of the vacuum chamber. 1. A sputtering apparatus characterized in that a drainage channel is provided for guiding water flow toward the substrate holder, and the substrate held by the substrate holder is forcibly cooled by cooling water passing through the inlet chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10394488U JPH0225564U (en) | 1988-08-05 | 1988-08-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10394488U JPH0225564U (en) | 1988-08-05 | 1988-08-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0225564U true JPH0225564U (en) | 1990-02-20 |
Family
ID=31335225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10394488U Pending JPH0225564U (en) | 1988-08-05 | 1988-08-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0225564U (en) |
-
1988
- 1988-08-05 JP JP10394488U patent/JPH0225564U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0902632B1 (en) | Water-driven cleaning device | |
| JPS5925946B2 (en) | Heat exchanger | |
| JPH0419474B2 (en) | ||
| US4207650A (en) | Cleaner using high velocity air jets having a double valve having an equal number of jet nozzles operating at all times | |
| JPH0131282Y2 (en) | ||
| JPH112478A (en) | Ice making device | |
| CN220496641U (en) | Low-speed centrifuge with cleaning function | |
| JPS6010656Y2 (en) | Rotating cylindrical filter | |
| JPS5937657Y2 (en) | Ice storage of ice chip supply device | |
| JPS6310474Y2 (en) | ||
| JPH02138422U (en) | ||
| JPH01178487U (en) | ||
| JPS6354448U (en) | ||
| JPS63124350U (en) | ||
| JPS62139291U (en) | ||
| JPS62114712U (en) | ||
| JPH08250577A (en) | Planetary type wafer holder | |
| JPS6231922U (en) | ||
| JPS6024739Y2 (en) | Water pipe type rotating water intake device | |
| JPH038926Y2 (en) | ||
| JPS59169730U (en) | rotary washing brush | |
| JPS6240640B2 (en) | ||
| JPS62131713U (en) | ||
| JPS6194799U (en) | ||
| JPS6398367U (en) |