JPS6231994B2 - - Google Patents
Info
- Publication number
- JPS6231994B2 JPS6231994B2 JP1041381A JP1041381A JPS6231994B2 JP S6231994 B2 JPS6231994 B2 JP S6231994B2 JP 1041381 A JP1041381 A JP 1041381A JP 1041381 A JP1041381 A JP 1041381A JP S6231994 B2 JPS6231994 B2 JP S6231994B2
- Authority
- JP
- Japan
- Prior art keywords
- fluorine
- waste liquid
- silicon
- alkyl group
- wastewater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052731 fluorine Inorganic materials 0.000 claims description 39
- 239000011737 fluorine Substances 0.000 claims description 39
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 36
- 239000007788 liquid Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 19
- 238000009835 boiling Methods 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- 239000002699 waste material Substances 0.000 claims description 11
- 239000002351 wastewater Substances 0.000 claims description 11
- 150000002222 fluorine compounds Chemical class 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 230000002378 acidificating effect Effects 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 150000003377 silicon compounds Chemical group 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- -1 fluorine ions Chemical class 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 6
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 6
- CTIKAHQFRQTTAY-UHFFFAOYSA-N fluoro(trimethyl)silane Chemical compound C[Si](C)(C)F CTIKAHQFRQTTAY-UHFFFAOYSA-N 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 3
- 239000000920 calcium hydroxide Substances 0.000 description 3
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 3
- 235000011116 calcium hydroxide Nutrition 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 2
- 229910001634 calcium fluoride Inorganic materials 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 230000005068 transpiration Effects 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Landscapes
- Physical Water Treatments (AREA)
- Removal Of Specific Substances (AREA)
Description
【発明の詳細な説明】
フツ化水素酸などフツ素の化合物は電子工業、
金属工業を始めとして工業的にも実験室において
も広く多量に用いられている。[Detailed description of the invention] Fluorine compounds such as hydrofluoric acid are used in the electronic industry,
It is widely used in large quantities both industrially and in laboratories, including the metal industry.
ところで、フツ素およびフツ素化合物は人体に
極めて有害で、公害防止、安全衛生上その処理や
取り扱かいに対しては十分な配慮が必要は物質で
ある。廃液処理においてはこれを除去することが
業務ずけられ、現在フツ素は排水基準として15
mg/と定められている。従来よりフツ素の処理
方法としては、消石灰や塩化カルシウムなどのカ
ルシウム塩を用い、比較的溶解度の小さいフツ化
カルシウムとして沈殿分離させることが知られて
いる。 Incidentally, fluorine and fluorine compounds are substances that are extremely harmful to the human body, and require sufficient consideration in their processing and handling in terms of pollution prevention, safety and health. In wastewater treatment, it is a duty to remove fluorine, and currently the wastewater standard for fluorine is 15%.
mg/. Conventionally, as a method for treating fluorine, it is known to use calcium salts such as slaked lime or calcium chloride, and to precipitate and separate the calcium fluoride, which has a relatively low solubility.
しかし、フツ化カルシウムは、水に対して溶解
性があるうえ、共存するイオンの影響を受けやす
く、またフツ素が錯イオンを形成しやすいために
実際上排水基準値以下に処理することが非常に困
難である。このため処理工程上の種々の工夫によ
り、ようやく規制値を保つているのが現状であ
り、より確実な処理技術の開発が望まれている。 However, calcium fluoride is soluble in water, easily affected by coexisting ions, and fluorine tends to form complex ions, so in practice it is very difficult to treat it below the wastewater standard value. It is difficult to For this reason, the current situation is that the regulation value is only maintained through various improvements in the treatment process, and the development of more reliable treatment technology is desired.
一方フツ素の規制値は上乗せ等により更に低い
値に押えられようとしており、これに応ずる方法
として活性アルミナなどの特殊な吸着剤、薬品添
加による吸着沈殿法などを用いた高度処理方法が
提案され、その実施化が試みられようとしている
が、これらの方法もその選択性やスラツジ量の増
大、処理のコストアツプなどの点で実用上問題が
多い。 On the other hand, the regulatory value for fluorine is being pushed down to an even lower value due to additions, etc., and advanced treatment methods using special adsorbents such as activated alumina and adsorption-precipitation methods by adding chemicals have been proposed as a way to respond to this. Attempts have been made to implement these methods, but these methods also have many practical problems in terms of selectivity, increased sludge volume, increased processing costs, etc.
本発明はこのような状況に鑑み廃水中のフツ素
を高度に処理する全く新しい方法を提供するもの
である。すなわち本発明は従来行なわれていた中
和或いは吸着によつてフツ素を分離すると言う概
念とは全く異なり、水に対する溶解度の殆どない
揮発性のフツ素化合物を廃液中に生成せしめ、液
中からフツ素を容易に分離除去することを特徴と
するものである。 In view of this situation, the present invention provides a completely new method for highly treating fluorine in wastewater. That is, the present invention is completely different from the conventional concept of separating fluorine by neutralization or adsorption, and the present invention generates volatile fluorine compounds with almost no solubility in water in the waste liquid and extracts them from the liquid. The feature is that fluorine can be easily separated and removed.
本発明の原理を以下に説明する。 The principle of the present invention will be explained below.
酸性下において、例えばヘキサメチルジシロキ
サンはフツ素イオンと反応して低沸点化合物のフ
ルオロトリメチルシランを生成する
また他のケイ素の低沸点化合物であるクロロト
リメチルシランは
なる反応によつてフルオロトリメチルシランを生
成する。 Under acidic conditions, for example, hexamethyldisiloxane reacts with fluorine ions to form the low-boiling compound fluorotrimethylsilane. Chlorotrimethylsilane, another low boiling point compound of silicon, is Fluorotrimethylsilane is produced by the following reaction.
フルオロトリメチルシランは常温で容易に蒸発
するが、空気などのガスを導入することによりさ
らに容易に液中より蒸散させることができる。液
の酸性度が高いほど、疎水性のフルオロトリメチ
ルシランの生成量が増大し、処理上好都合であ
る。 Although fluorotrimethylsilane easily evaporates at room temperature, it can be more easily evaporated from the liquid by introducing a gas such as air. The higher the acidity of the liquid, the greater the amount of hydrophobic fluorotrimethylsilane produced, which is convenient for processing.
尚、蒸散したフルオロトリメチルシランは弱ア
ルカリ性の水溶液と反応してフツ素を遊離する。 Note that the evaporated fluorotrimethylsilane reacts with a weakly alkaline aqueous solution to liberate fluorine.
本発明は前記原理に対応する状況をフツ素およ
びフツ素化合物を含有する廃水中に人為的に作り
出すことによつて廃水中のフツ素を除去するもの
である。 The present invention removes fluorine from wastewater by artificially creating a situation corresponding to the above principle in wastewater containing fluorine and fluorine compounds.
殊に廃水は一般には酸性であり、上記の原理を
用いてフツ素を除去する上必要な一条件が満され
ていることも本法の有用性を示唆している。 In particular, wastewater is generally acidic, and the fact that one of the conditions necessary for removing fluorine using the above-mentioned principle is satisfied also suggests the usefulness of this method.
以下に本発明の実施例を説明する。 Examples of the present invention will be described below.
実施例 1
Fe5ppm、Mn0.5ppm、Zn5.6ppm、
Cr3.5ppm、Cu4ppm、Cd0.02ppm、などの重金
属を総量で約20ppm、またフツ素を30ppm含有
する廃液300mlに硫酸(1:1)を10mlとヘキサ
メチルジシロキサン74.2mg(モル比Si/F=
1.9)を加え、撹拌後毎分800mlの空気を吹き込み
12時間後液中に残存するフツ素イオンの濃度を
JIS K−0102・28の方法に従がつて分析した。そ
の結果は0.2ppmであつた。同じ廃液に水酸化カ
ルシウムを加えて中和凝沈させたときの上澄液中
のフツ素濃度は15ppmであつた。このような処
理性は従来法によつては全く実現できなかつたも
のである。Example 1 Fe5ppm, Mn0.5ppm, Zn5.6ppm,
Add 10 ml of sulfuric acid (1:1) and 74.2 mg of hexamethyldisiloxane (mole ratio Si/F =
Add 1.9) and blow in 800ml of air per minute after stirring.
After 12 hours, the concentration of fluorine ions remaining in the solution was determined.
It was analyzed according to the method of JIS K-0102.28. The result was 0.2 ppm. When the same waste liquid was neutralized and precipitated by adding calcium hydroxide, the fluorine concentration in the supernatant liquid was 15 ppm. Such processability could not be achieved at all using conventional methods.
実施例 2
Al22ppm、Si39ppm、フツ素100ppmを含有す
る液400mlに硫酸(1:1)を25mlとクロロトリ
メチルシラン525mg(モル比Si/F=2.3)を加
え、撹拌後空気を400ml/minで2時間吹き込ん
だ。この液について実施例1と同じJISの方法に
従がつて残存するフツ素濃度を分析した。その結
果は2.5ppmであつた。Example 2 25 ml of sulfuric acid (1:1) and 525 mg of chlorotrimethylsilane (molar ratio Si/F = 2.3) were added to 400 ml of a liquid containing 22 ppm of Al, 39 ppm of Si, and 100 ppm of fluorine, and after stirring, air was blown in at 400 ml/min for 2 hours. I blew time. The remaining fluorine concentration of this liquid was analyzed according to the same JIS method as in Example 1. The result was 2.5ppm.
水酸化カルシウムを用いる従来法では40ppm
のフツ素が残存していた。 Conventional method using calcium hydroxide: 40ppm
of fluorine remained.
実施例 3
Al102ppm、Si105ppm、B41ppm、フツ素
1000ppmを含有する液30mlに硫酸(1:1)を
3mlおよび活性炭0.2gとヘキサメチルジシロキ
サン512mg(モル比Si/F=4)を加え、15時間
撹拌を行ないその後20分間空気を通気した。この
液に残存するフツ素濃度は8ppmであつた。Example 3 Al102ppm, Si105ppm, B41ppm, Fluorine
3 ml of sulfuric acid (1:1), 0.2 g of activated carbon, and 512 mg of hexamethyldisiloxane (molar ratio Si/F = 4) were added to 30 ml of a solution containing 1000 ppm, stirred for 15 hours, and then aerated with air for 20 minutes. The fluorine concentration remaining in this solution was 8 ppm.
本実施例に示されるようにフツ素と除去しにく
い錯体を作るケイ素、アルミ、ホウ素の存在下に
おいてかつフツ素濃度が1000ppmと高い場合に
おいても本方法の効果は著しいことが示された。 As shown in this example, the effect of this method is remarkable even in the presence of silicon, aluminum, and boron, which form complexes with fluorine that are difficult to remove, and even when the fluorine concentration is as high as 1000 ppm.
尚、本実施例の液を従来法で処理したときの残
存フツ素濃度は良好な場合で60ppm程度であつ
た。 Incidentally, when the liquid of this example was treated by the conventional method, the residual fluorine concentration was about 60 ppm in a good case.
実施例 4
実施例1と同じ液を用い、この液に加えるヘキ
サメチルジシロキサンの添加量のみをSi/Fのモ
ル比で0.5、1.1、5と変えたものについて残存フ
ツ素濃度をJIS方法に従がつて測定を行なつたと
ころ、それぞれ15ppm、1ppm、0.2ppmであつ
た。Example 4 Using the same solution as in Example 1, only the amount of hexamethyldisiloxane added to this solution was changed to 0.5, 1.1, and 5 in terms of Si/F molar ratio, and the residual fluorine concentration was determined according to the JIS method. When measurements were subsequently taken, they were 15 ppm, 1 ppm, and 0.2 ppm, respectively.
この結果より液中のフツ素と等量以上のケイ素
が加わるようにヘキサメチルジシロキサンの添
加、量を選べばよいことがわかる。 This result shows that the addition and amount of hexamethyldisiloxane should be selected so that silicon is added in an amount equal to or more than the fluorine in the liquid.
以上の実施例に示したように本発明によれば、
重金属や、錯体を作りやすいアルミやケイ素の共
存下においても液中のフツ素残存濃度を大巾に減
少させることができる。このように本発明の方法
によれば現在のフツ素の規制値を大巾に下まわる
ことが実証されたのみならず、今後の規制の強化
にも充分対応していくことが可能な廃水中のフツ
素およびその化合物の処理方法であることが明か
である。 According to the present invention as shown in the above embodiments,
Even in the presence of heavy metals and aluminum and silicon, which tend to form complexes, the residual concentration of fluorine in the liquid can be significantly reduced. In this way, the method of the present invention has not only been proven to be far below the current regulation value for fluorine in wastewater, but also capable of fully responding to future tightening regulations. It is clear that this is a method for treating fluorine and its compounds.
以上実施例においては液を酸性にするために硫
酸を用いたがその他の酸例えば硝酸や塩酸を用い
ても同様の効果が得られる。また、添加するケイ
素化合物としては、実施例に示すヘキサメチルジ
シロキサンやクロロトリメチルシラン以外にもア
ルキル基と結合した低沸点のケイ素化合物を用い
て実施することができる。また、本発明の実施例
においては空気を通気しているがその他の非反応
性のガス例えば窒素などを用いてもよい。なお、
通気量は蒸散時間の長短に影響を与える。さらに
充分大きな面積を有する容器中で反応を行なう場
合には単に撹拌、振とうを行なうのみで良い。低
沸点化合物の蒸散を促進するために反応熱又は人
為的に加熱することも効果的である。 Although sulfuric acid was used in the above embodiments to make the liquid acidic, similar effects can be obtained by using other acids such as nitric acid or hydrochloric acid. Further, as the silicon compound to be added, in addition to hexamethyldisiloxane and chlorotrimethylsilane shown in the examples, a low boiling point silicon compound bonded to an alkyl group may be used. Furthermore, although air is aerated in the embodiments of the present invention, other non-reactive gases such as nitrogen may also be used. In addition,
The amount of ventilation affects the length of transpiration time. Furthermore, when the reaction is carried out in a container having a sufficiently large area, it is sufficient to simply stir and shake. It is also effective to use heat of reaction or artificial heating to promote evaporation of low-boiling compounds.
本発明は以上のようにフツ素及びフツ素化合物
を含む廃液中にフツ素の低沸点化合物を生成する
反応条件を作り、アルキル基と結合したケイ素化
合物を添加するのみで、生成したフツ素の低沸点
化合物は室温又は加熱状態で自然に蒸散するた
め、液中に生成されたフツ素の化沸点化合物を除
去するために特別の工程は不要であり、処理工程
を簡略化して処理能率を高め、しかも簡単な操作
で高度の処理を行なうことができる。特に廃液は
一般に酸性に保たれているため、従来法に比して
さらに作業性を高めることができる。なお、生成
されたフツ素の低沸点化合物はこれを回収して再
利用を図ることも極めて容易となる。したがつて
本発明によれば、現在のフツ素の排水基準以下の
低濃度に処理することが可能であり、従来厄介視
されていた廃液中のフツ素及びフツ素化合物の処
理上の種々の問題点を一挙に解消できる効果を有
するものである。 As described above, the present invention creates reaction conditions for producing low boiling point compounds of fluorine in waste liquid containing fluorine and fluorine compounds, and simply adds a silicon compound bonded to an alkyl group. Since low-boiling compounds naturally evaporate at room temperature or under heating, no special process is required to remove the fluorine-boiling compounds generated in the liquid, simplifying the treatment process and increasing treatment efficiency. Moreover, advanced processing can be performed with simple operations. In particular, since the waste liquid is generally kept acidic, workability can be further improved compared to conventional methods. Note that it is also extremely easy to recover and reuse the low boiling point compound of fluorine produced. Therefore, according to the present invention, it is possible to treat fluorine to a low concentration below the current wastewater standards, and it is possible to solve various problems in the treatment of fluorine and fluorine compounds in wastewater, which have been considered troublesome in the past. This has the effect of solving problems all at once.
Claims (1)
の除去に際し、アルキル基と結合したケイ素の低
沸点化合物を酸性の液性状態の廃液中に添加し、
廃液中のフツ素イオン及びフツ素化合物とアルキ
ル基と結合したケイ素化合物との反応によつて生
成されるフツ素の低沸点化合物を蒸散させて液中
から除去することを特徴とする廃液の処理方法。 2 廃液中に添加するアルキル基と結合したケイ
素の低沸点化合物の添加量を廃水中に含まれたフ
ツ素に対しケイ素とフツ素とのモル比で1以上と
することを特徴とする特許請求の範囲第1項記載
の廃液の処理方法。 3 アルキル基と結合したケイ素の低沸点化合物
を添加した廃液中に活性炭を共存させることを特
徴とする特許請求の範囲第1項記載の廃液の処理
方法。[Claims] 1. When removing fluorine and fluorine compounds contained in waste liquid, a low boiling point compound of silicon bonded to an alkyl group is added to the waste liquid in an acidic liquid state,
A waste liquid treatment characterized by evaporating and removing from the liquid a low boiling point compound of fluorine produced by the reaction of fluorine ions and fluorine compounds in the waste liquid with a silicon compound bonded to an alkyl group. Method. 2. A patent claim characterized in that the amount of a low-boiling silicon compound bonded to an alkyl group added to the wastewater is set to a molar ratio of silicon to fluorine relative to fluorine contained in the wastewater of 1 or more. A method for treating waste liquid according to item 1. 3. The method for treating waste liquid according to claim 1, characterized in that activated carbon is allowed to coexist in the waste liquid to which a low-boiling compound of silicon bonded to an alkyl group is added.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1041381A JPS57127486A (en) | 1981-01-27 | 1981-01-27 | Treatment of waste liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1041381A JPS57127486A (en) | 1981-01-27 | 1981-01-27 | Treatment of waste liquid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57127486A JPS57127486A (en) | 1982-08-07 |
| JPS6231994B2 true JPS6231994B2 (en) | 1987-07-11 |
Family
ID=11749456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1041381A Granted JPS57127486A (en) | 1981-01-27 | 1981-01-27 | Treatment of waste liquid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57127486A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5597545A (en) * | 1994-11-14 | 1997-01-28 | Alliedsignal Inc. | Recovery of HF from aqueous streams |
-
1981
- 1981-01-27 JP JP1041381A patent/JPS57127486A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5597545A (en) * | 1994-11-14 | 1997-01-28 | Alliedsignal Inc. | Recovery of HF from aqueous streams |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57127486A (en) | 1982-08-07 |
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