JPS6233315Y2 - - Google Patents

Description

[Detailed Description of the Invention] (a) Technical Field of the Invention The present invention relates to a cleaning technique applied to samples such as integrated circuit boards, and particularly relates to an improvement of a rinser dryer device that performs spin drying in a nitrogen gas atmosphere.

(b) Background of the Technology Various cleaning treatments are performed on integrated circuit boards, such as pretreatments such as oxidation, diffusion, CVD, and vapor deposition, or pretreatments for photoresist coating and photoresist film removal. Cleaning is usually performed in the following order: degreasing, heavy metal removal, etching, pure water washing, and drying. Generally, cleaning is a long process, and many cleanings with pure water are used, but in semiconductor processes, it is necessary to avoid the contamination of impurities to the utmost. Therefore, drying treatment is also generally performed in a clean atmosphere.

(c) Problems with the Prior Art Fig. 1 is a diagram showing an outline of a conventional spin drying rinser dryer device, and Fig. 2 is a plan view showing the arrangement of holder boxes in the processing tank. In the figure, a plurality of holder boxes 3 are arranged in a processing tank 2, and a holder on which a sample to be processed is placed is accommodated in the holder boxes 3. A holder box 3 equipped with a rotating disk is fixed to the bottom of the processing tank 2, and the holder box 3 is rotated by rotation of the disk.
rotates at high speed. A lid plate 4 is attached from above and sealed, and nitrogen gas or the like is introduced from a gas inlet provided in the lid plate 4 to replace the inside of the processing tank 2 with a clean, dry atmosphere. Thereafter, the holder box 3 and the accommodated holders are driven to rotate via a rotating disk, and the rinser dryer device 1 spin-dries the substrate placed on the holder. FIGS. 3 and 4 are perspective views showing conventional examples of holders for accommodating substrates. The holder 6 and the holder box (Fig. 2, 3) are formed in a frame shape in order to improve drying efficiency, and have a structure in which a supporting column 7 is fixed to the rear side for ventilation to improve the drying efficiency. The holder 6 made of wear-resistant and corrosion-resistant Teflon material is deformed by centrifugal force during high-speed rotation as shown in FIG. Floating up and falling off often occurs.

(d) Purpose of the Invention In consideration of the above, the object of the present invention is to provide a rinser dryer device that provides a means for supporting the holder's posts by providing multiple protrusions on the back of the holder box, thereby preventing substrates placed on the holder from falling off.

(e) Structure of the invention According to the invention, the above purpose is to provide a rinser dryer device that has a holder box for storing a sample to be processed, and is composed of a processing tank that rotates at high speed and a lid plate that is equipped with a carrier gas inlet. a plurality of protrusions are provided on the back surface of the holder box, and the protrusions support the pillars of the holder that accommodates the sample;
This can be achieved by using a means to prevent the sample from falling off.

(f) Examples of the invention Examples of the invention will be described below in detail with reference to drawings. FIG. 5 is a perspective view showing a holder box according to an embodiment of the present invention, and FIG. 6 is a plan view showing the relationship between the holder box shown in FIG. 5 and the holder. In the figure, a protrusion 12 is attached and fixed to a column 13 attached to the back surface of a holder box 11. In this embodiment, three of them are arranged in parallel at approximately equal intervals to support the pillars of the holder. As shown in FIG. 6, the protrusion 12 is attached at a position so as to sandwich the support column 15 fixed to the holder 14 from the outside. It should be noted that there may be some play in the contact area between the support 15 and the protrusion 12, and the deformation of the support 15 caused by rotational centrifugal force causes the protrusion 12 to deform.
This is prevented by As a result, the holder 14 can securely hold the substrate 16 and have a stable holding structure without floating or falling off. The position of the pillar of the holder 14 is constant,
Positioning can be easily achieved by defining the position of the protrusion 12 in accordance with this, and by determining the length dimension so that the tip of the protrusion 12 does not come into contact with the peripheral edge of the substrate 16.

(g) Effects of the invention As explained in detail above, by providing the means for preventing the substrate from falling off according to the present invention, a stable rinser dryer device can be obtained and the work efficiency is greatly improved.

[Brief explanation of the drawing]

Fig. 1 is a diagram showing an outline of a conventional rinser dryer device, Fig. 2 is a plan view showing the arrangement of holder boxes in a processing tank, and Figs. 3 and 4 are perspective views showing conventional examples of holders for accommodating substrates. 5 is a perspective view showing a holder box according to an embodiment of the present invention, and FIG. 6 is a plan view showing the relationship between the holder box shown in FIG. 5 and the holder. In the figure, 11... holder box, 12
...Protrusion, 13, 15... Support, 16... Board.

Claims (1)

[Scope of utility model registration request] A rinser dryer device having a holder box for accommodating a sample to be processed, consisting of a processing tank that rotates at high speed and a lid plate equipped with a carrier gas inlet, the holder box having a plurality of protrusions on the back surface. A rinser dryer device, characterized in that the protrusion supports a column of a holder that accommodates the sample, and serves as a means for preventing the sample from falling off.