JPS6233321A - Vertical magnetic recording medium - Google Patents

Vertical magnetic recording medium

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Publication number
JPS6233321A
JPS6233321A JP17101185A JP17101185A JPS6233321A JP S6233321 A JPS6233321 A JP S6233321A JP 17101185 A JP17101185 A JP 17101185A JP 17101185 A JP17101185 A JP 17101185A JP S6233321 A JPS6233321 A JP S6233321A
Authority
JP
Japan
Prior art keywords
layer
coercive force
thin film
low
magnetic recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17101185A
Other languages
Japanese (ja)
Inventor
Masato Sugiyama
杉山 征人
Takashi Tomie
崇 冨江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP17101185A priority Critical patent/JPS6233321A/en
Publication of JPS6233321A publication Critical patent/JPS6233321A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To reduce the anisotropy by forming a permalloy thin film of a soft magnetic substance layer with a laminated film comprising a low coercive force layer having a small coercive force and a low isotropy layer having a small planer magnetic anisotropy. CONSTITUTION:The permalloy thin film of the soft magnetic layer is constituted with the low coercive force layer having a low coercive force and a low anisotropy layer having a small planer magnetic anisotrpy in a vertical magnetic recording medium having the permalloy thin film and a magnetic recording layer having a magnetization easy axis in vertical direction to the film face on a nonmagnetic base. As the permalloy thin film, a film having 1.0-12.0 Oe of the planer coercive force is preferred, and the anisotropic ratio is in the range of 0.90-1.10 in this range and excellent isotropy is attained. The low anisotropy layer is a layer formed under inactive gas atmosphere including 1.0-10vol% of oxygen, and as the low coercive layer, a layer formed under inactive gas environment including no oxygen or <=0.5vol% of oxygen is preferred. Thus, the permalloy thin film with a low coercive force and small anisotropy is obtained over a wide range.

Description

【発明の詳細な説明】 [利用分野] 本発明は、パーマロイ薄膜を軟磁性層とすると共に膜面
に垂直方向の磁化容易軸を有する垂直磁化層を磁気記録
層とした垂直磁気記録媒体の改良に関する。
[Detailed Description of the Invention] [Field of Application] The present invention is an improvement of a perpendicular magnetic recording medium in which a permalloy thin film is used as a soft magnetic layer and a perpendicular magnetic layer having an axis of easy magnetization perpendicular to the film surface is used as a magnetic recording layer. Regarding.

[従来技術] 上述の軟磁性層と垂直磁化層とからなる二層11jJの
磁気記録媒体は、垂直磁気記録方式において単極型ヘッ
ドによって効率良く記録できるf!直電磁気記録媒体し
て特公昭58−91月公報、特公昭58−10764公
報等に提案されている。この提案された二層膜構成の垂
直磁気記録媒体(以下パ二層肱媒体″という)は、具体
的にはRF2極スパッタ法で作成され1.軟磁性層をパ
ーマロイで垂直磁化層を Go  (コバルト)−Cr
(クロム)合金膜で構成したものであり、高い記録感度
と人なる再生出力を得られる優れたものであるが、記録
感度面。
[Prior Art] The above-described two-layer 11jJ magnetic recording medium consisting of a soft magnetic layer and a perpendicular magnetization layer has f! Direct electromagnetic recording media have been proposed in Japanese Patent Publication No. 1983-1989, Japanese Patent Publication No. 10764-1983, etc. This proposed perpendicular magnetic recording medium with a two-layer film structure (hereinafter referred to as "the double-layer medium") is specifically created by the RF bipolar sputtering method. cobalt)-Cr
It is composed of a (chromium) alloy film, and is excellent in that it can obtain high recording sensitivity and human playback output, but in terms of recording sensitivity.

再生出力面等でより一層の改善が望まれている。Further improvements are desired in terms of playback output, etc.

[発明の目的1 本発明は上述の二層膜媒体の特性が軟磁性層fなわらN
i  にッケル)、Fe(鉄)を主成分とするパーマロ
イ薄膜の特性に左右されることに着目しなされたもので
、異方性が小さくて出力が大きい垂直磁気記録媒体を目
的としたものである。
[Objective of the Invention 1] The present invention provides that the characteristics of the above-mentioned two-layer film medium are the soft magnetic layer f and the N
It was developed by focusing on the characteristics of permalloy thin films whose main component is Fe (iron), and aimed at perpendicular magnetic recording media with low anisotropy and high output. be.

[発明の構成1作用効果] 上述の目的は、以下の本発明により達成される。[Configuration 1 of the invention: Effects] The above objects are achieved by the invention as follows.

ずなわら本発明は、非磁性の基板上にパーマロイ薄膜か
らなる軟磁性層と膜面に垂直方向の磁化容易軸を有する
磁気記録層を右ツる垂直磁気記録媒体にd3いて、前記
軟磁性層のパーマロイ薄膜が、保磁力の低い低保磁力層
と面内磁気異方性の小さい低異方性層との積層膜である
ことを特徴とする垂直磁気記録媒体である。
However, the present invention provides a perpendicular magnetic recording medium in which a soft magnetic layer made of a permalloy thin film and a magnetic recording layer having an axis of easy magnetization perpendicular to the film surface are arranged on a non-magnetic substrate. This perpendicular magnetic recording medium is characterized in that the permalloy thin film of the layer is a laminated film of a low coercive force layer having a low coercive force and a low anisotropy layer having a small in-plane magnetic anisotropy.

上述の本発明は、以下のようにしてなされたも゛のであ
る。二層膜媒体の軟磁性層の保磁力は小さい程記録感度
等の面で有利と云われている。そこで20e  (エル
ステッド)以下の小さな保磁力のパーマロイ薄膜を軟磁
性層とした磁気記録媒体でディスクを作成し評価したと
ころ、その再生出力のエンベロープが変化して、安定な
再生という点からは、結局その最低点に制約され、再生
出力はあまり向上しない問題に遭遇し、種々検討の結果
、その原因が軟磁性層を構成するパーマロイ薄膜の面内
磁気異方性にあることを見出し、なされたものである。
The present invention described above was accomplished as follows. It is said that the smaller the coercive force of the soft magnetic layer of a two-layer film medium is, the more advantageous it is in terms of recording sensitivity and the like. Therefore, when we created and evaluated a magnetic recording medium using a permalloy thin film as a soft magnetic layer with a small coercive force of 20e (oersted) or less, we found that the envelope of the playback output changed, and in the end it became difficult to achieve stable playback. We encountered the problem of being restricted to the lowest point and not improving the reproduction output much, and after various studies, we discovered that the cause was the in-plane magnetic anisotropy of the permalloy thin film that constitutes the soft magnetic layer. It is.

すなわち、パーマロイ1tli2を軟磁性層とした上述
の磁気記録媒体は、パーマロイ薄膜の磁化困難軸の方向
に走行させて記録・再生した時の方が磁化容易軸の方向
の時に比べて、再生出力が大きく、特に高密度記録の高
周波領域で良好な特性を示す。
In other words, in the above-mentioned magnetic recording medium in which Permalloy 1tli2 is used as a soft magnetic layer, the reproduction output is higher when recording and reproduction is performed by running the permalloy thin film in the direction of the hard magnetization axis than when it is traveling in the direction of the easy magnetization axis. It exhibits good characteristics especially in the high frequency range of high-density recording.

すなわち、面内の再生出力を一様にするためには、軟磁
性層全体としての面内磁気異方性を減少させ、再生出力
の最低点を上界させエンベロープを面内で一様とするこ
とが必要である。その結果記録密度が高く、記録再生特
性が面内で一様なディスク方式に適した磁気記録媒体が
得られる。
In other words, in order to make the in-plane reproduction output uniform, the in-plane magnetic anisotropy of the soft magnetic layer as a whole is reduced, the lowest point of the reproduction output is upper bound, and the envelope is made uniform in the plane. It is necessary. As a result, a magnetic recording medium suitable for the disk system with high recording density and uniform recording/reproducing characteristics in the plane can be obtained.

なお、面内磁気異方性とは膜面に平行な面内での磁気異
方性のことである。
Note that in-plane magnetic anisotropy refers to magnetic anisotropy in a plane parallel to the film surface.

しかしながら、面内の磁気異方性を一様にすることは通
常の方法では困難であり、とくに基板を一方向に移送し
て軟磁性層を形成するような場合には異方性が大ぎく発
現するのが普通であった。
However, it is difficult to make the in-plane magnetic anisotropy uniform using normal methods, and the anisotropy is particularly large when a soft magnetic layer is formed by transferring the substrate in one direction. It was common for this to occur.

本発明者らは以上の知見にもとづき鋭意ω(究した結果
、前記パーマロイ簿膜の形成を酸素を合む雰囲気中で行
えば、磁気異方性が一様になることを見出した。
Based on the above knowledge, the present inventors conducted extensive research and found that if the permalloy film is formed in an atmosphere containing oxygen, the magnetic anisotropy becomes uniform.

かかるM素雰囲気中の形成したパーマ0イアI9膜にお
いでは異方性が大[1]に改善され、したがって磁気特
性が面内で一様な優れた軟磁性層が得られるが、その保
磁力は無酸素雰囲気の場合に比べて大きくなるのが普通
である。
In the permanent OIA I9 film formed in such an M atmosphere, the anisotropy is greatly improved [1], and therefore an excellent soft magnetic layer with uniform magnetic properties in the plane can be obtained, but its coercive force is normally larger than in an oxygen-free atmosphere.

従って、かかる方法で形成したパーマロイ薄膜は軟磁性
層とした垂直磁気記録媒体は、モジュレーションは良い
が再生出力はまだ十分なものでなく、モジュレーション
が小ざく、再生出力がさらに大ぎい媒体が望まれていた
。かかる目的を達成するためには保磁力が小さくかつ異
方性も小さいという一般的には相矛盾する性質を有する
パーマロイ薄膜が必要である。本発明者らはかかる問題
点を解決するために鋭意rtll究した結果、パーマロ
イ薄膜を保磁力の小さい低保磁力層と面内磁気異方性の
小さい低異方性層とからなる積層膜とすることにより低
保磁力でかつ異方性が小さいパーマロイ薄膜が広範囲に
得られることを見出し本発明に想到した。
Therefore, perpendicular magnetic recording media in which the permalloy thin film formed by this method is used as a soft magnetic layer have good modulation, but the reproduction output is still insufficient, and a medium with small modulation and even higher reproduction output is desired. was. In order to achieve this objective, a permalloy thin film is required which has generally contradictory properties such as low coercive force and low anisotropy. The inventors of the present invention conducted extensive research to solve these problems, and found that the permalloy thin film is a laminated film consisting of a low coercive force layer with a small coercive force and a low anisotropic layer with a small in-plane magnetic anisotropy. The inventors discovered that permalloy thin films with low coercive force and small anisotropy can be obtained over a wide range by doing this, and came up with the present invention.

上述の点から本発明の垂直磁気記録媒体は、その軟磁性
層が、上述の低保磁力層と低異方性層とが積層された積
層構造のパーマロイ(Mo(T:リブデン)、CLl(
銅)等の第3成分を含/Vで良い)薄膜であるので、保
磁力の及び面内磁気異方性が実用上十分小さいvA域で
広範囲に選定でき、ディスクの場合にシステムに適応し
た種々のレベルのモジューレーションが小さく、再生出
力が比較的大きい媒体を提供できるという大きな効果を
奏する。なお、パーマロイ77g膜の透磁率についても
システムに適応して選定されるが、記録感度・再生出力
面からは透磁率の大きいものが好まし゛く用いられる。
In view of the above, the perpendicular magnetic recording medium of the present invention has a soft magnetic layer made of permalloy (Mo(T: liveden), CLl(
Since it is a thin film containing a third component such as copper (copper), etc., it can be selected from a wide range in the vA range where the coercive force and in-plane magnetic anisotropy are sufficiently small for practical use, and it is suitable for the system in the case of disks. This has the great effect of providing a medium in which the modulation of various levels is small and the playback output is relatively large. The magnetic permeability of the Permalloy 77g film is also selected depending on the system, but from the standpoint of recording sensitivity and reproduction output, a film with high magnetic permeability is preferably used.

なお、本発明において、再生出力レベルの低下も少なく
、且つディスクとした場合のモジュレーションも実用上
必要と云われる5%以下を満足覆るという実用面から、
パーマロイ薄膜は全体としてその面内保磁力が1.0〜
12.0Q e  (エルステッド)の範囲であるもの
が好ましい。この範囲では異方性比が0.90〜1,1
0の範囲にあり、等方性が良い。ここで異方性比とは磁
化容易軸方向の面内保磁力HCEを磁化困難軸方向の面
内保磁力HCHで除しlこf+ l−I CF / l
−I CHである。又、上述のパーマ[1イ薄膜は、生
産面、得られる膜特性面等から各層は物理的堆積法によ
り形成された層であって、その低置方性層は酸素含有率
が1.0〜10容LO%のM索S 15不活性気体雰囲
気下で形成された層であり、その低保磁力層は酸素を含
まないか、含んだとしてもその含有率が0.5容品%以
下の低酸素含有不活性気体雰囲気下で形成された層であ
ることが好ましい。
In addition, in the present invention, from a practical point of view, the reduction in the playback output level is small and the modulation when used as a disc satisfies the 5% or less that is said to be practically necessary.
The permalloy thin film as a whole has an in-plane coercive force of 1.0~
A range of 12.0 Q e (Oersted) is preferred. In this range, the anisotropy ratio is 0.90 to 1,1
It is in the range of 0 and has good isotropy. Here, the anisotropy ratio is calculated by dividing the in-plane coercive force HCE in the direction of the easy axis by the in-plane coercive force HCH in the direction of the hard axis.
-I CH. In addition, in the above-mentioned Permanent [1] thin film, each layer is formed by a physical deposition method in terms of production and film characteristics, and the low orientation layer has an oxygen content of 1.0. ~10 volume LO% M rope S 15 A layer formed under an inert gas atmosphere, and the low coercive force layer does not contain oxygen, or even if it does, the content is 0.5 volume % or less The layer is preferably formed under a low oxygen-containing inert gas atmosphere.

以上の本発明において磁気記録層としては実施例のCo
−Cr合金膜からなる垂直磁化層は勿論、W(タングス
テン)、l’a(タンタル)笠の第3元素を添加したG
o−Cr合金、その仙公知の垂直磁化層が適用できるこ
とは本発明の趣旨から明らかである。
In the present invention described above, the magnetic recording layer is made of Co as in the embodiment.
-In addition to the perpendicular magnetization layer made of a Cr alloy film, the G
It is clear from the spirit of the present invention that an o-Cr alloy and its well-known perpendicular magnetization layer can be applied.

以下、上述の本発明の詳細を実施例に基いて説明する。Hereinafter, the details of the above-mentioned present invention will be explained based on examples.

なお、この発明の実施例は、対向ターゲット式スパッタ
法によりなされたものであるが、発明の趣旨からして、
明らかに他の方法、たとえば蒸着。
Note that although the embodiments of this invention were made using the facing target sputtering method, from the perspective of the spirit of the invention,
Obviously other methods, e.g. vapor deposition.

スパッタリング、インブレーティングなどのいわゆる物
理的堆積法(PVD法)が適用できることは明らかであ
る。
It is clear that so-called physical deposition methods (PVD methods) such as sputtering and inblating can be applied.

なお、上述の対向ターゲット式スパッタ法は、特開昭5
7−158380号公報等で公知のスパッタ法で、一対
の対向配置されたターゲットの側方に基板を配し、ター
ゲット間に垂直方向にプラズマ捕捉用の磁界を印加して
スパッタし、基板上に膜を形成するスパッタ法を云う。
Note that the above-mentioned facing target sputtering method is
Using a sputtering method known in Japanese Patent No. 7-158380, etc., a substrate is placed on the side of a pair of opposing targets, and a magnetic field for plasma trapping is applied perpendicularly between the targets to perform sputtering, thereby sputtering onto the substrate. Refers to the sputtering method for forming a film.

第1図は本発明の実施に用いた対向ターゲット式スパッ
タ装置の構造図である。
FIG. 1 is a structural diagram of a facing target type sputtering apparatus used in carrying out the present invention.

図から明らかな通り、本装置は前述の特開昭57−15
8380号公報で公知の対向ターゲット式スパッタ装置
と基本的に同じ構成となっている。
As is clear from the figure, this device is based on the aforementioned Japanese Unexamined Patent Publication No. 57-15
It has basically the same configuration as the facing target type sputtering apparatus known in Japanese Patent No. 8380.

すなわら、図において10は真空槽、20は真空槽10
を排気J−る真空ポンプ等からなる排気系、30は真空
!ri10内に所定のガスを導入して真空Piio内の
圧力を10−1〜10″4Torr程度の所定のガス圧
力に設定するガス導入系である。
That is, in the figure, 10 is a vacuum chamber, and 20 is a vacuum chamber 10.
Exhaust system consisting of a vacuum pump, etc. 30 is a vacuum! This is a gas introduction system that introduces a predetermined gas into the ri 10 and sets the pressure in the vacuum Piio to a predetermined gas pressure of about 10-1 to 10''4 Torr.

そして、真空槽10内には、図示の如く真空槽10の銅
板71.12に絶縁部材13.74を介して固着された
ターゲットホルダー15.16により1対のターゲット
T+ 、Tzが、そのスパッタされる而−r + s 
In the vacuum chamber 10, a pair of targets T+ and Tz are sputtered by a target holder 15.16 fixed to a copper plate 71.12 of the vacuum chamber 10 via an insulating member 13.74 as shown in the figure. ru-r + s
.

T2Sを空間を隔てて平行に対面するように配設しであ
る。そして、ターグツt”T+、Tzを取着するターゲ
ットボルダ−15,16は、冷水パイプ151.161
を介して冷却水が循環し、ターゲットT1.丁2、永久
磁石152,162が冷却される。、磁石152.16
2はターゲットT1.1−2を介してN(引。
The T2S are arranged so as to face each other in parallel across a space. The target boulders 15 and 16 for attaching the targs t"T+ and Tz are the cold water pipes 151 and 161.
Cooling water is circulated through the target T1. The permanent magnets 152 and 162 are cooled. , magnet 152.16
2 through target T1.1-2.

S極が対向するように設けてあり、従って磁界はターゲ
ットT’1.T2に垂iな方向に、かつターゲット間の
みに形成される。なお、17.18は、絶縁部材13.
14及びターゲットホルダー15.16をスパッタリン
グ時のプラズマ粒子から保護するためとターゲット表面
以外の部分の責常放市を防止するためのシールドである
The south poles are arranged so as to face each other, so that the magnetic field is applied to the target T'1. It is formed in the direction perpendicular to T2 and only between the targets. Note that 17.18 indicates the insulating member 13.
14 and target holders 15 and 16 from plasma particles during sputtering, and to prevent exposure to parts other than the target surface.

また、磁性薄膜が形成される基板40を保持する基板保
持手段41は、真空槽1σ内のターグツ(−丁t。
Further, the substrate holding means 41 holding the substrate 40 on which the magnetic thin film is formed is placed in the vacuum chamber 1σ.

Tzの側方に設(]である。基板保持手段41は、図示
省略した支持ブラケットにより夫々回転自在がつ互いに
軸平行に支持された繰り出しロール41a。
The substrate holding means 41 are feed rolls 41a which are rotatably supported by support brackets (not shown) and are supported parallel to each other.

支持ロール41b9巻取ロール41cの3個の【コール
からなり、基板40をターゲラ1〜T+、−[2間の空
間に対向するようにスパッタ面TI9.1’7Sに対し
て略直角方向に保持するように配置しである。
The substrate 40 is held in a direction substantially perpendicular to the sputtering surface TI9.1'7S so as to face the space between the targeters 1 to T+ and -[2. It is arranged as follows.

従って基板40は基板保持手段41cによりスパッタ面
TIS、T2Sに対して直角方向に移動可能である。な
お、支持ロール41bはその表面濃度が調節可能となっ
ている。
Therefore, the substrate 40 can be moved in a direction perpendicular to the sputtering surfaces TIS and T2S by the substrate holding means 41c. Note that the surface density of the support roll 41b can be adjusted.

一方、スパッタ電力を供給する直流電源からなる電力供
給手段50はプラス側をアースに、マイナス側をターゲ
ットT+ 、T2に夫々接続する。従って電力供給手段
50からのスパッタ電力は、アースをアノードとし、タ
ーゲットT+ 、T2をカソードとして、アノード、カ
ソード間に供給される。
On the other hand, a power supply means 50 consisting of a DC power source for supplying sputtering power has its positive side connected to ground and its negative side connected to targets T+ and T2, respectively. Therefore, the sputtering power from the power supply means 50 is supplied between the anode and the cathode, with the ground as the anode and the targets T+ and T2 as the cathodes.

なお、プレスパッタ時基板40を保護するため、基板4
0とターゲットT+ 、T2との間に出入するシ17ツ
ター(図示省略)が設けである。
Note that in order to protect the substrate 40 during pre-sputtering, the substrate 4
A shutter (not shown) is provided between T0 and targets T+ and T2.

以上の通り、前述の特開昭57−158380号公報の
ものと基本的には同じ構成であり、公知の通り高速低温
スパックが可能となる。ずなわら、ターゲッhT+、T
2間の空間に、磁界の作用によりスパッタガスイオン。
As described above, the structure is basically the same as that of the above-mentioned Japanese Patent Application Laid-Open No. 57-158380, and high-speed low-temperature spucking is possible as is known. Zunawara, target hT+,T
Sputter gas ions are generated in the space between the two by the action of the magnetic field.

スパッタにJ、り放出されたγ電子等が束縛され高密度
プラズマが形成される。
γ electrons etc. emitted by the sputtering are bound and a high-density plasma is formed.

従って、ターゲットT+、丁2のスパッタが促進されて
前記空間より析出間が増大し、基板40上への堆積速度
が増し高速度スパッタが出来る上、基板40がターゲッ
トT+ 、T2の側方にあるので低温スパッタも出来る
Therefore, the sputtering of targets T+ and T2 is promoted, the distance between the deposits increases from the space, and the deposition rate on the substrate 40 increases, allowing high-speed sputtering, and the substrate 40 is located on the side of the targets T+ and T2. Therefore, low-temperature sputtering is also possible.

なJ′3、本発明の対向ターゲット式スパッタでムは、
前述の装置のものに限定される乙のでなく、前述の通り
一対の対向させたターゲラ1−の側方に基板を配し、タ
ーゲット間に垂直方向の磁界を印加してスパッタし、基
板上に膜を形成するスパッタ法を云う。従って、磁界発
生手段も永久磁石でなく、電磁石を用いても良い。また
、磁界もターゲット間の空間にγ電子等を閏じ込めるも
のであれば良く、従ってターゲット全面でなく、ターゲ
ラ1−周囲のみに発生さヒた場合ら含む。
J′3, the facing target sputtering system of the present invention is
The method is not limited to the above-mentioned apparatus, but as described above, a substrate is placed on the side of a pair of targeters 1 facing each other, and a perpendicular magnetic field is applied between the targets to perform sputtering, and sputtering is performed on the substrate. Refers to the sputtering method for forming a film. Therefore, the magnetic field generating means may also be an electromagnet instead of a permanent magnet. Further, the magnetic field may be of any type as long as it can entrain γ electrons and the like into the space between the targets, and therefore includes the case where it is generated not over the entire surface of the target but only around the target laser 1.

次に上述の対向ターゲット式スパッタ装置により実施し
た本発明に係わる垂直磁気記録媒体の実施例を説明する
Next, an example of a perpendicular magnetic recording medium according to the present invention, which was implemented using the above-mentioned facing target type sputtering apparatus, will be described.

なJ5、得られた合金膜の結晶構造は理学型tFi製訂
数X線回析装置を用いて同定し、垂直配向性は六方最密
構造かつ(002)面ビークのロッキングカーブを前記
X線回折装置で求め、その半値幅△θすで評価した。
J5, the crystal structure of the obtained alloy film was identified using a Rigaku-type tFi numerical X-ray diffraction device, and the vertical orientation was a hexagonal close-packed structure and the rocking curve of the (002) plane peak was determined using the X-ray diffraction method. It was determined using a device, and its half width Δθ has already been evaluated.

膜厚及び組成については、螢光X線装置を用いて予め較
正した曲線から求めた。
The film thickness and composition were determined from a curve calibrated in advance using a fluorescent X-ray device.

媒体の磁気特性は撮動試料型磁力計で測定して求めた。The magnetic properties of the medium were determined using a moving sample magnetometer.

二層膜媒体の記録・再生特性は、前述の特公昭5a−f
91号公報等で公知のものと同様な垂直型磁気ヘッドを
用いて評価した。
The recording/reproducing characteristics of the double-layer film media are as follows:
Evaluation was carried out using a vertical magnetic head similar to that known in Japanese Patent No. 91 and the like.

[実施例および比較例] 下記条件により基板上に種々のパーマロイ薄膜を作成し
、その保磁力及び磁気異方性を評価すると共に、人々の
パーマロイ薄膜上にGo−Crからなる垂直磁化層を順
次形成して二層膜媒体を作成し、その再生特性を評価し
た。
[Examples and Comparative Examples] Various permalloy thin films were created on substrates under the following conditions, and their coercive force and magnetic anisotropy were evaluated. At the same time, perpendicular magnetization layers made of Go-Cr were sequentially formed on people's permalloy thin films. A two-layer film medium was formed and its playback characteristics were evaluated.

Δ、装置条件 Δ−1,軟磁性層 a、ターゲットT+ 、T2材:1−1.T22間。Δ, equipment conditions Δ-1, soft magnetic layer a, Target T+, T2 material: 1-1. Between T22.

−4wt%、 Ni −78wt%、 Fc −18w
t%のパーマロイ b、基板40:50μ面厚のポリエチレンテレフタレー
ト(PET)フィルム C,ターゲットT+、−rz間隔:120#d、ターゲ
ット表面の磁界:100〜200ガウスC,ターゲット
T+、T2形状 :  100INR1−X  150mmWX12mj
の矩形「、基板40とターゲットL、−r2端部の距離
: 20゜ A−2,C0−Cr垂直磁化層 a、ターゲット材:T1.T2共にCo  80wt%
-4wt%, Ni -78wt%, Fc -18w
t% permalloy B, substrate 40: 50μ surface thickness polyethylene terephthalate (PET) film C, target T+, -rz spacing: 120#d, magnetic field on target surface: 100-200 Gauss C, target T+, T2 shape: 100INR1 -X 150mmWX12mj
Rectangle ", Distance between substrate 40 and target L, -r2 end: 20°A-2, C0-Cr perpendicular magnetization layer a, Target material: T1. Both T2 are Co 80wt%
.

Cr−20wt%の合金ターゲット b、ターゲツt゛T+、Tz間隔:160mC,ターゲ
ット表面の磁界:lOO〜200ガウスd、ターゲット
’r+ 、T2形状 :  100mIRL X 150mW X 12NR
tの矩形e、基板40とターゲット−It 、T2端部
の距離:20# B、操作手順 A−1,△−2の条件のもとで順次次の如く行なった。
Cr-20wt% alloy target b, target t゛T+, Tz spacing: 160mC, target surface magnetic field: lOO~200 Gauss d, target 'r+, T2 shape: 100mIRL x 150mW x 12NR
The following operations were performed under the conditions of rectangle e of t, distance between substrate 40 and target -It, and end of T2: 20 #B, and operating procedures A-1 and Δ-2.

a、基板を設置侵、真空槽10内を到達真空度が1 x
 10’ T orr以下まで排気する。
a. After installing the substrate, the degree of vacuum reached in the vacuum chamber 10 is 1 x
Evacuate to below 10' Torr.

b、ガスを所定の圧力まで導入し、3〜5分間のプレス
パツタを行ない、シャッターを開き、基板40を図示の
通りターゲットT+、−rzの対向方向に移送しつつ膜
形成を行なった。なお、スパッタ時のガス圧は4 x 
10’ T orrとした。
b. Gas was introduced to a predetermined pressure, press sputtering was performed for 3 to 5 minutes, the shutter was opened, and film formation was performed while moving the substrate 40 in the opposite direction of targets T+ and -rz as shown. The gas pressure during sputtering is 4 x
It was set to 10' Torr.

ガスはへ−1の場合Ar  (アルゴン)100%およ
び02  (酸素)を0.1. 0,3.1.3゜5 
、10.15.20容量%(以下゛%″と略記する)混
入したArガスを用い、以下のように膜形成した。すな
わち、まず第1層の低異方性層を所定の雰囲気中で所定
の膜厚にフィルムを移送しつつ形成し、次いで、ガスを
100%のArガスに切換えてフィルムを逆り向に移送
しつつ第1層と同じ方法で第2層の低保磁力層を積層し
た。各層の膜厚はフィルム移送速度を変えることにより
調節した。なお、3種以上の膜を積層する場合にはかか
る方法を繰り返すことにより膜を形成すれば良い。
The gases were 100% Ar (argon) and 0.1% oxygen (02). 0,3.1.3゜5
, 10.15. A film was formed using Ar gas mixed with 20% by volume (hereinafter abbreviated as ``%'') as follows. That is, first, the first low anisotropic layer was formed in a predetermined atmosphere. A film is formed to a predetermined thickness while being transferred, and then the second low coercive force layer is formed in the same manner as the first layer while changing the gas to 100% Ar gas and transferring the film in the opposite direction. The films were laminated. The film thickness of each layer was adjusted by changing the film transport speed. In the case of laminating three or more types of films, the film may be formed by repeating this method.

マjc A−2(7)場合はA rloO%(3N)を
用いた。
In the case of majc A-2 (7), ArloO% (3N) was used.

C,スパッタ111投入電力はA−1,A−2ともに3
KW′c行なった。
C, sputter 111 input power is 3 for both A-1 and A-2.
I did KW'c.

C9実施結果 第2図に比較例のパーマロイ薄膜の特徴的’s ta磁
化特性示す。基板の走行方向(MD力方向と基板の幅方
向(T I)方向)それぞれの磁化特性が異なり、面内
で磁気異方性が生じでおり、MD力方向磁化容易軸、T
D方向は磁化困難軸であった。
C9 results Figure 2 shows the characteristic magnetization characteristics of the permalloy thin film of the comparative example. The magnetization characteristics in the running direction of the substrate (MD force direction and substrate width direction (T I) direction) are different, and magnetic anisotropy occurs in the plane.
The D direction was the axis of difficult magnetization.

なお、第2図でト(は印加磁界の強さを示し、Bは軟磁
性層の磁化を示す。
In FIG. 2, G indicates the strength of the applied magnetic field, and B indicates the magnetization of the soft magnetic layer.

得られた各パーマロイ薄膜の面内保磁力の測定結果を表
−1に示づ。
Table 1 shows the measurement results of the in-plane coercive force of each permalloy thin film obtained.

本結果は比較例の単層膜及び前述の酸素を含む酸素雰囲
気下で形成した低異方性膜と含まない雰囲気で形成した
低保磁力膜とを積層した2層構成のパーマロイ薄膜の測
定結果である。各膜厚はトータルで0.4μmになるよ
うに調節した。表−1【ユ保磁力の測定結果を示したも
ので、A欄は酸素濃度(%)、BIIglは酸素雰囲気
中で形成した低異方性膜の膜厚(μm) 、 Of[l
IIは同一のサンプルの面内保磁力の測定方向でEは磁
化容易軸方向、]]は磁化困難軸方向を示す。
These results are the measurement results of the single-layer film of the comparative example and the permalloy thin film with a two-layer structure, which is a stack of a low anisotropy film formed in an oxygen-containing atmosphere and a low coercive force film formed in an oxygen-free atmosphere. It is. The thickness of each film was adjusted to a total of 0.4 μm. Table 1 shows the measurement results of the coercive force, where column A is the oxygen concentration (%), BIIgl is the thickness (μm) of the low anisotropic film formed in an oxygen atmosphere, and Of[l
II is the measurement direction of the in-plane coercive force of the same sample, E is the easy axis direction of magnetization, ]] is the direction of the hard axis of magnetization.

従って、表中のE欄の数値は、Al111. B欄で規
定されるサンプルの磁化容易軸方向の面内保磁力1−I
 CEであり、(」欄のものは該サンプルの磁化困難軸
方向の面内保磁力HCHであり、単位(よ、エルステッ
ド(Oe)である。
Therefore, the values in column E in the table are Al111. In-plane coercive force in the easy axis direction of the sample specified in column B 1-I
CE, and the column ( ) is the in-plane coercive force HCH in the direction of the hard magnetization axis of the sample, which is in Oersteds (Oe).

又、垂直磁気記録媒体を得るために表−1の特性を有す
る各パーマロイ薄膜上にA−2の条件で形成されたC0
−0r層からなる垂直磁化層の特性を表−2に示す。
In addition, in order to obtain a perpendicular magnetic recording medium, C0 was formed under the conditions of A-2 on each permalloy thin film having the characteristics shown in Table-1.
Table 2 shows the characteristics of the perpendicular magnetization layer consisting of the -0r layer.

表−1パーマロイ薄膜の面内保磁力 表−2垂直磁化層の特性 表−2において保磁力の垂百とは媒体膜面と垂直り向の
保磁力を、水平とは媒体膜面と平行方向の保磁力を示す
。なお、保磁力の測定は二に4 Itφ媒体の軟磁性層
を分離して行った。半値幅△θ切は、二層膜媒体のまま
測定した。
Table 1: In-plane coercive force of permalloy thin film Table 2: Characteristics of perpendicular magnetic layer shows the coercive force of The coercive force was measured by separating the soft magnetic layer of the 2-4Itφ medium. The half-width Δθ cut was measured using the two-layer film medium as it is.

D、電磁変換特性 表−1の特性を有する各パーマロイ薄膜を軟磁性層とす
る前述の二層膜媒体について、第3図に示すように、M
Dh向、TD力方向長方形のサンプルを切り出して、記
録密度50KFRPIにJ′3いてそれぞれの再生出力
を測定して電磁変換特性を評価した。
D, Electromagnetic Conversion Characteristics As shown in FIG. 3, M
Rectangular samples in the Dh and TD force directions were cut out, and their respective reproduction outputs were measured at J'3 at a recording density of 50KFRPI to evaluate electromagnetic conversion characteristics.

表−3に測定結果を示す。Table 3 shows the measurement results.

なお、電磁変換特性は記録時にはテープ走行を4.75
cni/秒、再生時には9.5cm/秒で行なった。
In addition, the electromagnetic conversion characteristics are 4.75 when the tape runs during recording.
cni/sec, and 9.5 cm/sec during playback.

又、表の数値は各測定値を適当なサンプルの測定値で除
した相対値で示しである。表のΔ欄、B欄は表−1と同
じでありC欄はサンプルの切り出し方向を示す。
Further, the numerical values in the table are shown as relative values obtained by dividing each measured value by the measured value of an appropriate sample. The Δ column and B column of the table are the same as Table-1, and the C column shows the cutting direction of the sample.

又、表−4に各サンプルのMD力方向TDh向の出力比
を示す。
Furthermore, Table 4 shows the output ratio of each sample in the MD force direction and TDh direction.

表−3二層媒体の再生出力 (注)*印は規格化の基準測定値 表−4MD力方向TD力方向出力比 表−3の測定結果から明らかのJ:うに、11層のパー
マロイ薄膜を低保磁力層と低異方性層との2層構成にし
たものでは、比較例のtli層のパーマロイ膜のらのに
比較し、非常に広範囲に要求特性を満足することがわか
る。ザなわら実用上必要と云われているモジュレーショ
ン5%以下を満犀するためには、MD力方向1” D方
向の出力比が0.90〜1.10であることが必要であ
る。ところで表−32表−4の結果から明らかのように
比較例の単層パーマロイ薄膜の二層媒体では、上記のし
ジコレーションの条rトを満たすものはその出力が規格
化の基準測定値に比しても0.5以下と大tIJに低下
する。これに対して本発明の多層膜パーマロイ簿膜の二
層媒体では、前記モジュレーションの条件を満足づる範
囲で、出力もそれ程低下しない領域が広範囲に存在する
ことがわかる。このように本発明によれば、出力を大巾
に低下させることなくモジコレ−ジョンを実用上支障な
いものと′ ツることができる。
Table-3 Reproduction output of two-layer media (Note) *marks indicate standard measurement values Table-4MD force direction TD force direction output ratio Table-3 J: sea urchin, 11-layer permalloy thin film It can be seen that the two-layer structure of the low coercive force layer and the low anisotropy layer satisfies the required characteristics over a much wider range than the permalloy film of the tli layer in the comparative example. In order to achieve the modulation of 5% or less, which is said to be practically necessary, it is necessary that the output ratio in the MD force direction 1" and the D direction is 0.90 to 1.10. As is clear from the results in Table 32 and Table 4, for the two-layer medium of the comparative example of single-layer permalloy thin film, the output that satisfies the above dicolation condition is compared to the standard measurement value. On the other hand, in the two-layer medium of the multilayer permalloy film of the present invention, there is a wide range in which the output does not decrease significantly as long as the above modulation conditions are satisfied. As described above, according to the present invention, it is possible to achieve moji correction without causing any practical problems without significantly reducing the output.

特に表−1の結果から明らかの如く、多層膜パーンロイ
薄膜で、その全体の面内保磁力が磁化困難軸方向及び磁
化容易軸方向共に1.0〜12.0Q eの範囲にある
ものは、二層媒体のモジコレ−シコンが5%以下で、出
力も基準ザンプルの10%以上であり、実用上充分な性
能を有する点で好ましい。
In particular, as is clear from the results in Table 1, a multilayer Pernloy thin film whose overall in-plane coercive force is in the range of 1.0 to 12.0 Q e in both the hard axis direction and the easy axis direction, The two-layer medium has a modulation ratio of 5% or less and an output of 10% or more of the standard sample, which is preferable since it has practically sufficient performance.

又、表−1より上述の多層膜パーマロイ薄膜(ユ、酸素
含有率が1.0%以上の雰囲気で形成された低異方性層
と低保磁力層との組合せにより得られることがわかる。
Furthermore, from Table 1, it can be seen that the multilayer permalloy thin film described above can be obtained by a combination of a low anisotropy layer and a low coercive force layer formed in an atmosphere with an oxygen content of 1.0% or more.

なお、低保磁力層は、後述の通り、酸素含有率が0.5
%以下の雰囲気で形成されたものであれば十分である。
Note that the low coercive force layer has an oxygen content of 0.5 as described later.
% or less is sufficient.

以上のように、低異方性層と低保磁力層との積層パーマ
ロイ薄膜とすることにより、二層媒体の特性が比較例に
比べて大巾に改良されることが判る。
As described above, it can be seen that by forming a laminated permalloy thin film of a low anisotropy layer and a low coercive force layer, the characteristics of the two-layer medium are greatly improved compared to the comparative example.

このような積層の効果は2つあるいはそれ以」−の異る
雰囲気条件で作った膜の膜厚を適当に変えることによっ
て発現される。しかしながら酸素含有率が10%より多
い酸素雰囲気中で作成したパーマロイ膜は、実際には反
応性スパッタとなりパーマロイの構成原子−鉄やニッケ
ルの酸化物を形成することになり、またスパッタリング
速度が遅くなるなど生産プロヒスの点からは好ましくな
い。
The effect of such lamination can be achieved by suitably changing the thickness of two or more films made under different atmospheric conditions. However, permalloy films made in an oxygen atmosphere with an oxygen content of more than 10% actually undergo reactive sputtering, forming oxides of permalloy's constituent atoms - iron and nickel, and the sputtering rate becomes slower. This is not desirable from the point of view of production efficiency.

また積層づる薄膜の層数は3層以上でも本発明の目的を
達することはできるが、プロセスの17!liさ、1q
られる特性からいって2層で十分である。
Furthermore, the object of the present invention can be achieved even if the number of laminated thin film layers is three or more, but the number of layers in the process is 17! lisa, 1q
Considering the characteristics, two layers are sufficient.

2層にした場合には下層を酸素雰囲気中で形成した低異
方性層、上層を酸素を含まない雰囲気中で形成した低保
磁力層とすることがより好ましい。
In the case of two layers, it is more preferable that the lower layer is a low anisotropy layer formed in an oxygen atmosphere, and the upper layer is a low coercive force layer formed in an oxygen-free atmosphere.

これは、パーマロイ層の上にざらにCo−Crを主体と
する垂直磁化層を形成した場合、GO−Cr膜はパーマ
ロイ層の結晶の影響をうけるため、境界はできるだけ結
晶性のすぐれたパーマロイ膜である方がよいことによる
This is because when a vertical magnetization layer mainly made of Co-Cr is formed on a permalloy layer, the GO-Cr film is affected by the crystals of the permalloy layer, so the boundary is made of a permalloy film with as good crystallinity as possible. Because it is better to be.

さらに低保磁力層のパーマロイ層を形成する雰囲気は酸
素濃度が0.5%より少なければざしつがえない。いい
かえれば0.5%より少ない酸素雰囲気ではパーマロイ
膜の結晶性は実質的に損われず、酸素を含まない系で形
成した膜とほぼ同様の特性を示すことによる。
Furthermore, the atmosphere in which the permalloy layer of the low coercive force layer is formed must have an oxygen concentration of less than 0.5%. In other words, in an oxygen atmosphere of less than 0.5%, the crystallinity of the permalloy film is not substantially impaired, and it exhibits almost the same characteristics as a film formed in an oxygen-free system.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施に用いた対向ターゲット式スパッ
タ装置の説明図、第2図は磁気特性の説明図、第3図は
1ナンブル切り出しの説明図である。
FIG. 1 is an explanatory diagram of a facing target type sputtering apparatus used in carrying out the present invention, FIG. 2 is an explanatory diagram of magnetic characteristics, and FIG. 3 is an explanatory diagram of one number extraction.

Claims (1)

【特許請求の範囲】 1、非磁性の基板上にパーマロイ薄膜からなる軟磁性層
と膜面に垂直方向の磁化容易軸を有する磁気記録層を有
する垂直磁気記録媒体において、前記軟磁性層のパーマ
ロイ薄膜が、保磁力の小さい低保磁力層と面内磁気異方
性の小さい低異方性層との積層膜からなることを特徴と
する垂直磁気記録媒体。 2、前記パーマロイ薄膜の面内保磁力が1.0〜12.
0エルステッド(Oc)である特許請求の範囲第1項記
載の垂直磁気記録媒体。 3、前記低異方性層と低保磁力層は共に物理的堆積法に
より形成された層であつて、低異方性層は酸素濃度が1
.0〜10容量%の雰囲気下で形成された層であり、低
保磁力層は酸素を含まないか、含んだとしてもその濃度
が0.5容量%以下である雰囲気下で形成された層であ
る特許請求の範囲第1項若しくは第2項記載の垂直磁気
記録媒体。 4、前記パーマロイ薄膜の磁気記録層側の最外層が低保
磁力層である特許請求の範囲第1項、第2項若しくは第
3項記載の垂直磁気記録媒体。 5、前記パーマロイ薄膜がスパッタリング法により形成
された特許請求の範囲第1項、第2項、第3項若しくは
第4項記載の垂直磁気記録媒体。 6、前記パーマロイ薄膜が対向ターゲット式スパッタ法
により形成された特許請求の範囲第5項記載の垂直磁気
記録媒体。
[Claims] 1. A perpendicular magnetic recording medium having a soft magnetic layer made of a permalloy thin film on a nonmagnetic substrate and a magnetic recording layer having an axis of easy magnetization perpendicular to the film surface, wherein the permalloy of the soft magnetic layer is 1. A perpendicular magnetic recording medium characterized in that the thin film is composed of a laminated film of a low coercivity layer having a small coercive force and a low anisotropy layer having a small in-plane magnetic anisotropy. 2. The permalloy thin film has an in-plane coercive force of 1.0 to 12.
2. The perpendicular magnetic recording medium according to claim 1, wherein the perpendicular magnetic recording medium is 0 oersted (Oc). 3. Both the low anisotropy layer and the low coercive force layer are formed by a physical deposition method, and the low anisotropy layer has an oxygen concentration of 1.
.. It is a layer formed in an atmosphere of 0 to 10% by volume, and the low coercive force layer is a layer formed in an atmosphere that does not contain oxygen, or even if it does, its concentration is 0.5% by volume or less. A perpendicular magnetic recording medium according to claim 1 or 2. 4. The perpendicular magnetic recording medium according to claim 1, 2 or 3, wherein the outermost layer of the permalloy thin film on the magnetic recording layer side is a low coercive force layer. 5. The perpendicular magnetic recording medium according to claim 1, 2, 3, or 4, wherein the permalloy thin film is formed by a sputtering method. 6. The perpendicular magnetic recording medium according to claim 5, wherein the permalloy thin film is formed by a facing target sputtering method.
JP17101185A 1985-08-05 1985-08-05 Vertical magnetic recording medium Pending JPS6233321A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17101185A JPS6233321A (en) 1985-08-05 1985-08-05 Vertical magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17101185A JPS6233321A (en) 1985-08-05 1985-08-05 Vertical magnetic recording medium

Publications (1)

Publication Number Publication Date
JPS6233321A true JPS6233321A (en) 1987-02-13

Family

ID=15915441

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17101185A Pending JPS6233321A (en) 1985-08-05 1985-08-05 Vertical magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS6233321A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05131069A (en) * 1991-11-14 1993-05-28 Juki Corp Starting device for sewing machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05131069A (en) * 1991-11-14 1993-05-28 Juki Corp Starting device for sewing machine

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