JPS6233336A - Production of magnetic recording medium - Google Patents
Production of magnetic recording mediumInfo
- Publication number
- JPS6233336A JPS6233336A JP17343385A JP17343385A JPS6233336A JP S6233336 A JPS6233336 A JP S6233336A JP 17343385 A JP17343385 A JP 17343385A JP 17343385 A JP17343385 A JP 17343385A JP S6233336 A JPS6233336 A JP S6233336A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- film
- substrate
- protective film
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 230000001681 protective effect Effects 0.000 claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 230000003647 oxidation Effects 0.000 claims abstract description 9
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 9
- 230000001678 irradiating effect Effects 0.000 claims abstract description 8
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 6
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 239000000314 lubricant Substances 0.000 claims description 7
- 238000005121 nitriding Methods 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 239000007795 chemical reaction product Substances 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 abstract description 13
- 239000000956 alloy Substances 0.000 abstract description 13
- 230000007797 corrosion Effects 0.000 abstract description 6
- 238000005260 corrosion Methods 0.000 abstract description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052753 mercury Inorganic materials 0.000 abstract description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract description 4
- 229910018104 Ni-P Inorganic materials 0.000 abstract description 4
- 229910018536 Ni—P Inorganic materials 0.000 abstract description 4
- 238000007747 plating Methods 0.000 abstract description 4
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 abstract description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 abstract description 2
- 239000006061 abrasive grain Substances 0.000 abstract description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 abstract description 2
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052921 ammonium sulfate Inorganic materials 0.000 abstract description 2
- 235000011130 ammonium sulphate Nutrition 0.000 abstract description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 abstract description 2
- 229910000361 cobalt sulfate Inorganic materials 0.000 abstract description 2
- 229940044175 cobalt sulfate Drugs 0.000 abstract description 2
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 abstract description 2
- 229910003460 diamond Inorganic materials 0.000 abstract description 2
- 239000010432 diamond Substances 0.000 abstract description 2
- 235000011090 malic acid Nutrition 0.000 abstract description 2
- 239000001630 malic acid Substances 0.000 abstract description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 abstract description 2
- 230000003746 surface roughness Effects 0.000 abstract description 2
- 229910018134 Al-Mg Inorganic materials 0.000 abstract 1
- 229910018467 Al—Mg Inorganic materials 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 abstract 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 39
- 239000000203 mixture Substances 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000007772 electroless plating Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910020630 Co Ni Inorganic materials 0.000 description 2
- 229910002440 Co–Ni Inorganic materials 0.000 description 2
- 229910020676 Co—N Inorganic materials 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910020707 Co—Pt Inorganic materials 0.000 description 1
- 229910020706 Co—Re Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910008484 TiSi Inorganic materials 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
この発明は、磁気ディスク、磁気テープ、フロッピーテ
ィスフ、磁気カード等の磁気記録媒体の製造方法に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing magnetic recording media such as magnetic disks, magnetic tapes, floppy disks, magnetic cards, and the like.
（従来の技術）
磁気ディスク、磁気テープ、フロッピィ−ディスク、磁
気カード等の記録密度８高めるためそこに使われる磁性
膜を薄くする必要性から、薄膜の磁性膜が採用されるよ
うになって来た。しかし薄膜であることと、記録密度を
高めるため磁気ヘッドを極力この磁性膜ｌこ接近させる
必要性から摩耗が顕著になることにより必然的に保護膜
の採用が不可欠とされるようになって来ている。(Prior Art) In order to increase the recording density8 of magnetic disks, magnetic tapes, floppy disks, magnetic cards, etc., thin magnetic films have come to be used due to the need to thin the magnetic films used therein. Ta. However, due to the thin film and the need to bring the magnetic head as close to the magnetic film as possible in order to increase the recording density, wear becomes noticeable, making it necessary to use a protective film. ing.
（発明が解決しようとする問題点）
しかしながら、保護膜は薄く、機械的に耐久力のある非
磁性体でかつ磁性膜とも密着万人でしかも耐食性に優れ
たものでなけれはならず、このような目的に適する材料
及び製造方法は極めて少くしかも磁気ディスク、ａｉ気
テープフロッピーディスク、８１気カード等に共通する
ものは皆無といってよい。(Problems to be solved by the invention) However, the protective film must be thin, mechanically durable, non-magnetic, adhere well to the magnetic film, and have excellent corrosion resistance. There are very few materials and manufacturing methods suitable for this purpose, and it can be said that there are none that are common to magnetic disks, AI tape floppy disks, 81 cards, etc.
この発明は、磁気ディスク、Ｂｉ磁気テープフロッピー
ティスク、ａ１気カード等のすべその磁気記録媒体に適
する保護膜の形成方法を提供することを目的とするもの
である。The object of the present invention is to provide a method for forming a protective film suitable for all magnetic recording media such as magnetic disks, Bi magnetic tape floppy disks, and A1 cards.
（問題点を解決するための手段）
この発明による磁気記録媒体の製造方法は基体上に金属
磁性膜を形成する工程と、この金属磁性膜の表面を酸素
原子又は窒素原子又は双方の存在する雰囲気中で紫外線
を照射しながら酸化又は窒化又はその両方を行う工程を
含む発明と、基体上に磁性膜を形成する工程と、この磁
性膜の上に金属膜を形成する工程亡、この金属膜を酸素
原子又は窒素原子又はその両方の存在する雰囲気中で紫
外線を照射しながら酸化又は窒化又はその両方を行う工
程とを含む発明であり、さらにこれらに潤滑剤を塗布す
る工程とを含む発明である。(Means for Solving the Problems) The method for manufacturing a magnetic recording medium according to the present invention includes the steps of forming a metal magnetic film on a substrate, and heating the surface of the metal magnetic film in an atmosphere containing oxygen atoms, nitrogen atoms, or both. The present invention includes a step of oxidizing or nitriding or both while irradiating ultraviolet rays in a substrate, a step of forming a magnetic film on a substrate, and a step of forming a metal film on this magnetic film. This invention includes a step of oxidizing or nitriding or both while irradiating ultraviolet rays in an atmosphere containing oxygen atoms, nitrogen atoms, or both, and further includes a step of applying a lubricant to the oxidation or nitriding, or both. .
（作用）
本発明に適用さｎる材料の一例と製造の具体例を以下に
行す。基体としてはディスク形状のアルミニウム合金基
板、アルミニウム上にＮｉｐ合金をメッキしれ基板、ア
ルミニウム合金表面に陽極酸化法で形成した酸化膜８有
する基板、ガラス基板セラミック基板、セラミックスの
表面に５ｉ０２゜Ａ／２０３． Ｓｉ３Ｎ４．Ｃｒ、
ＴｉｌＭｏ、Ｗ Ｓｉ、 Ｇｅ、 ＡＪ。(Function) An example of the material applied to the present invention and a specific example of its production will be described below. The bases include a disk-shaped aluminum alloy substrate, a substrate plated with NIP alloy on aluminum, a substrate with an oxide film 8 formed on the aluminum alloy surface by anodizing, a glass substrate ceramic substrate, and a 5i02°A/203 on the surface of the ceramic. ．． Si3N4. Cr,
TilMo, WSi, Ge, AJ.
Ｃｕ 等のいずれかを主成分さする非磁気性膚を有する
基板、テープ又はフロッピーディスク又はカードの形状
をしたポリエステル、ポリイミド、ポリイミドアミド、
ポリメチルメタクリレート、ポリカーボネート、塩化ビ
ニル重合体等の有機高分子フィルム、又はこれらの有機
高分子フィルムの表面に５ｉ０２． ＡＪ２０３．５ｉ
３ｈ４、Ｃｒ、ＴｉｌＭｏ、 Ｗ。Polyester, polyimide, polyimideamide, in the form of a tape or floppy disk or card, with a non-magnetic skin mainly composed of Cu, etc.
5i02. on the surface of organic polymer films such as polymethyl methacrylate, polycarbonate, and vinyl chloride polymers, or these organic polymer films. AJ203.5i
3h4, Cr, TilMo, W.
Ｓｉ、Ｇｅ、ＡＡ！、Ｃｕ等のいずれかを主成分とする
非ａ性層を有するフィルム等が適する。Si, Ge, AA! , Cu, or the like is suitable.
金属磁性膜を形成する工程には、 Ｃｏ、−Ｐ、Ｃｏ−
Ｎｉ −Ｐ。In the process of forming a metal magnetic film, Co, -P, Co-
Ni-P.
Ｃｏ−Ｎｉ−Ｍｎ−Ｐ、Ｃｏ−Ｎｉ−＃、Ｉｎ−Ｒｅ−
Ｐ、 Ｃｏ−Ｎ１−Ｒｅ−Ｐ等の合金を電解又は無電解
メッキで形成する方法が。Co-Ni-Mn-P, Co-Ni-#, In-Re-
There is a method of forming alloys such as P, Co-N1-Re-P, etc. by electrolytic or electroless plating.
Ｃｏ−Ｎｉ、Ｃｏ−Ｃｒ、Ｃｏ−Ｐｔ、 Ｃｏ−Ｒｅ
、 Ｃｏ−Ｆ３ｍ、Ｆｅ→瓜Ｆｅ−ａＣｏ−Ｖ、 Ｐ
ｅ−Ｃｒ−Ｃｏ、Ｎｉ −Ｆｅ ４％の合金或いはこれ
らの合金のいずれかを主成分とする合金をスパッタ法も
しくは蒸着法で形成する方法が適する。Co-Ni, Co-Cr, Co-Pt, Co-Re
, Co-F3m, Fe→MelonFe-aCo-V, P
A method of forming e-Cr-Co, Ni-Fe 4% alloy, or an alloy containing any of these alloys as a main component by sputtering or vapor deposition is suitable.
磁性膜を形成する工程には、前記金属磁性膜を形成する
工程と同様の材料と工程の他、 Ｆｅ２Ｏ３を主成分
とする金属（Ｃｏ、Ｃｕ、Ｓｉ等）の酸化物との混合体
、Ｂａ１−フェライ） ＣｏとＣｏＯの混合体等をスパ
ッタ法もしくは蒸着法で形成する方法が適する。In the step of forming the magnetic film, in addition to the same materials and steps as in the step of forming the metal magnetic film, a mixture of metals (Co, Cu, Si, etc.) containing Fe2O3 as a main component with oxides, Ba1 - Ferrite) A method of forming a mixture of Co and CoO by sputtering or vapor deposition is suitable.
金属膜を形成する工程には、 ＡＩ、Ｃｕ、 Ｃｒ、
ＴｉＳｉ、ａＦｅ、 Ｃｏｔ、Ｇｅ、 Ｍｏ又は、これ
らを主成分とする合金の蒸着もしくはスパッタ法、Ｎｉ
Ｐ、Ｇｏ Ｐ。In the process of forming a metal film, AI, Cu, Cr,
Vapor deposition or sputtering of TiSi, aFe, Cot, Ge, Mo or alloys containing these as main components, Ni
P, Go P.
Ｎｉ −Ｔ３． Ｃｏ−Ｂ等の合金を電解もしくは無
電解によるメッキ法等が適する。Ni-T3. Electrolytic or electroless plating of an alloy such as Co--B is suitable.
酸素原子又は窒素原子又はその双方の存在する雰囲気中
で紫外線を照射しながら酸化する工程には、雰囲気とし
て、空気、 ０２． Ｎ２．Ｃｏ２．ＮＱＮＯ２，Ｈ
ｃ凡 Ｈ２Ｑ アルコール等又はこれらを一部に含む
混合気体の存在する雰囲気加速し、紫外線の発生源とし
ては高圧水銀ラング、キセノンランプ、ヨー素人りタン
グステンランプ等が適する。In the step of oxidizing while irradiating ultraviolet rays in an atmosphere where oxygen atoms, nitrogen atoms, or both exist, air is used as the atmosphere; 02. N2. Co2. NQNO2,H
The atmosphere is accelerated in the presence of alcohol or a gas mixture partially containing these, and suitable sources of ultraviolet rays include high-pressure mercury lamps, xenon lamps, and tungsten lamps.
潤滑剤を塗布する工程には、潤滑剤として脂肪酸、金属
石ケン等の炭化水素、シリコーンオイル、フロロシリコ
ンオイル、バー７０ロアルキルポリエーテル、テトラフ
ロロエチレン重合体、カーボン、二硫化モリブテン、も
しくハ、これらの混合物、もしくは、以上の潤滑剤のい
ずれかを適当な溶剤ｌこ溶解もしくは分散させたものを
、浸漬法。In the process of applying a lubricant, fatty acids, hydrocarbons such as metal soap, silicone oil, fluorosilicone oil, Bar 70 loalkyl polyether, tetrafluoroethylene polymer, carbon, molybdenum disulfide, or C. Dipping method in which a mixture of these or any of the above lubricants is dissolved or dispersed in an appropriate solvent.
スフ”レー法、蒸着法、ローラーコート法、スピン塗布
法等による塗布法が適す暮。Application methods such as the soufflé method, vapor deposition method, roller coating method, and spin coating method are suitable.
次に媒体形状として、磁気ディスク、磁気テープ、フロ
ッピーディスクを例にそれぞれ具体的な実施例を挙げて
説明する。Next, specific examples of media shapes will be described using magnetic disks, magnetic tapes, and floppy disks as examples.
（実施例り
Ａ７→鍮合金の上ｌこ非磁性ＮｉＰを無１解メツキ法そ
の表面をダイアモンド砥粒で表面粗さが０．０１μｍ以
下となるように研磨し基体とした。この基体を硫酸ニッ
ケル・硫酸コバルト、次亜リン酸、硫酸アンモニウム、
コハフ酸、リンゴ酸、マロン酸から成るメッキ浴に浸漬
し、８００ＡのＣｏ−Ｎ ｉ −Ｐ 合金から成る金属
磁性膜を無電解メッキ法ｌこより形成し１次いで通常の
大気の雰囲気で２００℃ に加熱しながら、ｌＫＷ の
水銀ラングで紫外線を１時間照射し保護膜を形成し磁気
記録媒体とした。この時表面から約１６ＯＡの深さまで
ｔｏ−Ｎｉ Ｐ の酸化膜から成る保護膜が形成され、
非出性体となっていることが確かめられた。この膜は、
硬度もとッカース値で６００以上あり、耐蝕性にも優れ
。(Example A7 → Brass alloy upper l) Non-magnetic NiP was polished using diamond abrasive grains to a surface roughness of 0.01 μm or less to form a base. Nickel/cobalt sulfate, hypophosphorous acid, ammonium sulfate,
A metal magnetic film made of 800A Co-Ni-P alloy was formed by electroless plating by immersing it in a plating bath consisting of succinic acid, malic acid, and malonic acid, and then heated to 200°C in a normal atmosphere. While heating, ultraviolet rays were irradiated for 1 hour using a 1 KW mercury rung to form a protective film, thereby forming a magnetic recording medium. At this time, a protective film consisting of a to-Ni P oxide film is formed to a depth of about 16 OA from the surface.
It was confirmed that the body was illegitimate. This membrane is
It has a hardness of over 600 in terms of Kerr's value and excellent corrosion resistance.
薄さ、密着力共正こ申し分の無い保護膜であることが確
認式れた。It was confirmed that this is a perfect protective film in terms of both its thinness and adhesion.
（実施例２）
実施例１と同様の基体に、同様の無１解メツキ法により
Ｃｏ−Ｎ ｉ −Ｐ 合金を５０ＯＡ メッキし、次い
で市販のＮｉＰメッキ浴により非磁性ＮｉＰ合金を３０
ＯＡ無電解メツキ法により形成し、実施例１と同様の工
程で酸化工程を通して保護膜を形成し磁気記録媒体とし
た。この結果ＮｉＰの表面から同じく約１６０Ａ の深
さまで酸化膜が形成されていることが確認され、その特
徴に略実施例１と同様でｔり−）た。(Example 2) The same substrate as in Example 1 was plated with 50 OA of Co-N i -P alloy by the same no-solution plating method, and then 30 OA of non-magnetic NiP alloy was plated using a commercially available NiP plating bath.
It was formed by the OA electroless plating method, and a protective film was formed through an oxidation process in the same process as in Example 1 to obtain a magnetic recording medium. As a result, it was confirmed that an oxide film was formed from the surface of the NiP to a depth of about 160 Å, and its characteristics were substantially the same as in Example 1.
（実施例３）
実施例１と同様の工程で磁気記録媒体を作成した。但し
雰囲気としては１′１１Ｈ３とＮＯ２の混合体を用いた
。この結果Ｃｏ−Ｎ ｉ −Ｐ の表面には約１６ＯＡ
の酸化物と窒化物の混合体からなる保護膜が形成された
が、この保護膜の性質は実施例１と同様であった。(Example 3) A magnetic recording medium was produced using the same steps as in Example 1. However, the atmosphere used was a mixture of 1'11H3 and NO2. As a result, about 16 OA on the surface of Co-N i -P
A protective film made of a mixture of oxide and nitride was formed, and the properties of this protective film were similar to those in Example 1.
（実施例４）
実施例２と同様の工程で磁気記録媒体を作成した。但し
雰囲気としては、 ＮＨ３とＨ２Ｏの混合気体を用いた
。この結果ＮｉＰの表面には約１６ＯＡの酸化物と窒化
物の混合物から成る保護膜が形成されたが、この保護膜
の性′Ｘは実施例Ｉと同様であった。(Example 4) A magnetic recording medium was produced using the same steps as in Example 2. However, the atmosphere used was a mixed gas of NH3 and H2O. As a result, a protective film made of a mixture of oxide and nitride of about 16 OA was formed on the surface of the NiP, and the properties 'X of this protective film were the same as in Example I.
（実施例５）
厚さ５０μｍ ポリイミドフィルムを基体としてこの上
に厚さ８００Ａ のＣｏ−Ｎｉ合金からなる金属磁性膜
をスパッタ法で形成し、大気の雰囲気中で２００℃ に
加熱しながら３０分間ＩＫＷの水銀ランプで紫外線を照
射して保＠膜を形成し一つは。(Example 5) Using a 50 μm thick polyimide film as a base, a metal magnetic film made of a Co-Ni alloy with a thickness of 800 A was formed by sputtering on the polyimide film, and was subjected to IKW for 30 minutes while heating at 200°C in the air. One is to form a protective film by irradiating ultraviolet light with a mercury lamp.
フロッピーティスフ形状に一つはテープ形状に切り出し
磁気記録媒体とした。この結果ＣｏＮｉの表面には約１
０ＯＡ の酸化膜が形成されるが、硬度耐蝕性、薄さ、
密着力共に申し分の無い特性を有することが確認された
。One of the floppy tape shapes was cut out into a tape shape and used as a magnetic recording medium. As a result, approximately 1
An oxide film of 0OA is formed, but the hardness, corrosion resistance, thinness,
It was confirmed that it had perfect properties in terms of adhesion and adhesion.
（実施例６）
実施例５と同様の基体に厚さ８００Ａ のＣｏ−Ｎｉ合
金から成る金属磁性Ｈをスパッタ法で形成し、純いて厚
さ３００ＡのＢをスパッタ法で形成し。(Example 6) On the same substrate as in Example 5, a magnetic metal H made of a Co--Ni alloy with a thickness of 800 Å was formed by sputtering, and a pure B with a thickness of 300 Å was formed by sputtering.
ＮＨ３とＮＯ２の混合気体雰囲気中で２００℃に加熱し
ながら３０分間ＩＫＷ の水銀ランプにより紫外線照射
を行って保護膜を・形成し一つはフロピーディスク形状
ｌこ、一つはテープ形状に切り出し磁気記録媒体とした
、この結果Ｂの表面には約１０ＯＡの酸化膜と窒化膜の
混合物が形成されたが、硬度、耐蝕性、薄さ、密着力共
に申し分の無い特性をＨすることが確認された。A protective film was formed by heating it to 200℃ in a mixed gas atmosphere of NH3 and NO2 and irradiating it with ultraviolet light using an IKW mercury lamp for 30 minutes.One part was cut into a floppy disk shape, and the other part was cut into a tape shape. As a result, a mixture of oxide film and nitride film of about 10 OA was formed on the surface of B as a magnetic recording medium, but it was confirmed that it had impeccable properties in terms of hardness, corrosion resistance, thinness, and adhesion. It was done.
（実施例７）
実施例１の至６の磁気記録媒体の表面に潤滑剤の代表例
であるバー７０ロアルキルボリエーデル（デュポン社製
、商品名クライトックス）を浸漬法で塗布し、エーテル
を含むガーゼで軽くふき取り磁気記録媒体とした。この
励来潤滑剤の膜厚は１００Ａ ± ５ＯＡであった。(Example 7) Bar 70 loalkylboriedel (manufactured by DuPont, trade name Krytox), which is a typical example of a lubricant, was applied to the surface of the magnetic recording media of Examples 1 to 6 by a dipping method, and ether was applied. A magnetic recording medium was prepared by wiping it gently with gauze containing the material. The film thickness of this excited lubricant was 100A ± 5OA.
実施例１乃至７に、そｎそれ優れた保護膜を持っている
ため化学的−こ安定であり機械的耐久性ｌこも優れてい
る特に潤滑剤付の例では、山気ディスクに関し２０００
０回以上のコンタクトスタートストップ回数を損傷なく
耐え、磁気テープに関してａＶＴ几装置テストで、スチ
ル再生が３０分以上保証でき、フロッピーディスクに関
しては市販の５．２５ インチフレキシブル装置に装着
しバスウェアテストを行っても３００万回はクリアした
。In Examples 1 to 7, it has an excellent protective film, is chemically stable, and has excellent mechanical durability.Especially in the case of the lubricant, the 2000
It withstood more than 0 contact start-stop cycles without damage, guaranteed still playback for more than 30 minutes in the aVT device test for magnetic tape, and busware test for floppy disks by attaching it to a commercially available 5.25-inch flexible device. Even when I went there, I cleared it 3 million times.
（発明の効果）
上述の様に本発明の製造方法によｆ′Ｌは磁気ディスク
も、山気テープも、磁気カードもフロッピーディスクも
皆同じ工程で保護膜の形成が出来、かつスループットが
高く信頼性（耐久性、耐食性。(Effects of the Invention) As described above, by the manufacturing method of the present invention, f'L can form protective films on magnetic disks, Yamaki tapes, magnetic cards, and floppy disks in the same process, and has a high throughput. Reliability (durability, corrosion resistance.
薄さ、密着力等）も良好で、極めて優れた磁気記録媒体
が得られる。Thinness, adhesion, etc.) are also good, and an extremely excellent magnetic recording medium can be obtained.
Claims (1)
金属磁性膜の表面を酸素原子又は窒素原子又はその両方
雰囲気中で紫外線を照射しながら酸化又は窒化又は、酸
化と窒化と両方を行う保護膜形成工程とを含む磁気記録
媒体の製造方法。 ２、少くとも基体上に磁性膜を形成する工程と、次いで
この磁性膜の上に金属膜を形成する工程と、この金属膜
を酸素原子又は窒素原子又はその両方の存在する雰囲気
中で紫外線を照射しながら酸化又は窒化又は酸化と窒化
の両方を行う保護膜形成３、少くとも基体上の金属磁性
膜の表面に形成された酸化又は窒化又は酸化と窒化の両
方の反応生成物の上に潤滑油を塗布する工程を含む磁気
記録媒体の製造方法。 ４、少くとも基体上の磁性膜のさらにその上に存在する
金属膜の表面に酸化又は窒化又は酸化と窒化の両方の反
応生成物の上に潤滑剤を塗布する工程を含む磁気記録媒
体の製造方法。[Claims] 1. At least the step of forming a metal magnetic film on a substrate and oxidizing, nitriding, or oxidizing the surface of the metal magnetic film while irradiating ultraviolet rays in an atmosphere of oxygen atoms, nitrogen atoms, or both. and nitriding, and a protective film forming step that performs both. 2. At least a step of forming a magnetic film on the substrate, a step of forming a metal film on the magnetic film, and a step of exposing the metal film to ultraviolet rays in an atmosphere containing oxygen atoms, nitrogen atoms, or both. Formation of a protective film that performs oxidation or nitridation or both oxidation and nitridation while irradiating 3. At least lubricates the reaction product of oxidation or nitridation or both oxidation and nitridation formed on the surface of the metal magnetic film on the substrate. A method of manufacturing a magnetic recording medium including a step of applying oil. 4. Manufacture of a magnetic recording medium including at least the step of applying a lubricant on the surface of the magnetic film on the substrate and on the surface of the metal film present thereon, on the oxidation or nitridation, or on the reaction products of both oxidation and nitridation. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17343385A JPS6233336A (en) | 1985-08-06 | 1985-08-06 | Production of magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17343385A JPS6233336A (en) | 1985-08-06 | 1985-08-06 | Production of magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6233336A true JPS6233336A (en) | 1987-02-13 |
Family
ID=15960367
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17343385A Pending JPS6233336A (en) | 1985-08-06 | 1985-08-06 | Production of magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6233336A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0322895A3 (en) * | 1987-12-28 | 1992-04-15 | Domain Technology | Methods and compositions for electroless plating of magnetic recording media |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57167133A (en) * | 1981-04-08 | 1982-10-14 | Hitachi Maxell Ltd | Production for magnetic recording medium |
| JPS59201224A (en) * | 1983-04-28 | 1984-11-14 | Fuji Photo Film Co Ltd | Magnetic recording medium |
| JPS6063723A (en) * | 1983-09-16 | 1985-04-12 | Hitachi Maxell Ltd | Manufacture of magnetic recording medium |
| JPS61172222A (en) * | 1985-01-28 | 1986-08-02 | Hitachi Maxell Ltd | Production of magnetic recording medium |
-
1985
- 1985-08-06 JP JP17343385A patent/JPS6233336A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57167133A (en) * | 1981-04-08 | 1982-10-14 | Hitachi Maxell Ltd | Production for magnetic recording medium |
| JPS59201224A (en) * | 1983-04-28 | 1984-11-14 | Fuji Photo Film Co Ltd | Magnetic recording medium |
| JPS6063723A (en) * | 1983-09-16 | 1985-04-12 | Hitachi Maxell Ltd | Manufacture of magnetic recording medium |
| JPS61172222A (en) * | 1985-01-28 | 1986-08-02 | Hitachi Maxell Ltd | Production of magnetic recording medium |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0322895A3 (en) * | 1987-12-28 | 1992-04-15 | Domain Technology | Methods and compositions for electroless plating of magnetic recording media |
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