JPS6233405A - Magnetic material - Google Patents
Magnetic materialInfo
- Publication number
- JPS6233405A JPS6233405A JP17251485A JP17251485A JPS6233405A JP S6233405 A JPS6233405 A JP S6233405A JP 17251485 A JP17251485 A JP 17251485A JP 17251485 A JP17251485 A JP 17251485A JP S6233405 A JPS6233405 A JP S6233405A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- substrate
- magnetic
- amorphous thin
- soft magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000696 magnetic material Substances 0.000 title claims abstract description 23
- 239000010409 thin film Substances 0.000 claims abstract description 53
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 239000000919 ceramic Substances 0.000 claims abstract description 9
- 230000035699 permeability Effects 0.000 abstract description 9
- 229910000702 sendust Inorganic materials 0.000 abstract description 5
- 229910045601 alloy Inorganic materials 0.000 abstract description 4
- 239000000956 alloy Substances 0.000 abstract description 4
- 229910010293 ceramic material Inorganic materials 0.000 abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 3
- 239000010408 film Substances 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract description 3
- 239000002075 main ingredient Substances 0.000 abstract 3
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 235000002492 Rungia klossii Nutrition 0.000 description 1
- 244000117054 Rungia klossii Species 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、例えば薄膜磁気ヘッドに用いられる磁性材に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic material used, for example, in a thin film magnetic head.
例えば、フェライト、センダスト合金等の磁性材料を磁
気ヘッドの構成材として用いるには、バルクな形又は薄
膜の形で利用されている。For example, magnetic materials such as ferrite and sendust alloys are used in the form of bulk or thin films as components of magnetic heads.
このうち、バルクな形で利用される場合にあっては、磁
性材料自体が磁気ヘッドに必要な特性を満足していなけ
ればならないので、その使用範囲が限定されている。Among these, when used in bulk form, the range of use is limited because the magnetic material itself must satisfy the characteristics required for the magnetic head.
これに対して、薄膜の形で利用される場合にあっては、
基板と磁性薄膜との組み合わせにより、目的に適した特
性を備えさせることができるので、その使用範囲は広い
ものとなっている。On the other hand, when used in the form of a thin film,
By combining the substrate and the magnetic thin film, characteristics suitable for the purpose can be provided, so the range of use thereof is wide.
ところが、基板の上に磁性薄膜層を直接設けた簾膜タイ
プの磁性材は、基板の結晶状態、表面特性等によってそ
の磁気特性が大きく左右され、優れた磁気特性のものに
なっていない欠点がある。However, the magnetic properties of screen-type magnetic materials, in which a magnetic thin film layer is directly provided on the substrate, are greatly affected by the crystalline state and surface characteristics of the substrate, and the drawback is that they do not have excellent magnetic properties. be.
本発明者は、特にＭｎ、Ｎｉ を主成分として含むセ
ラミック製の基板に軟磁性薄膜を設けたタイプの磁性材
について研究を進めた結果、この基板と軟磁性薄膜との
間に非晶質薄膜を設けておくと、このサンドイッチ型の
磁性材は、例えば初透磁率等の磁気特性を大巾に向上さ
せることが出来ることを見い出した。The inventor of the present invention has conducted research on a type of magnetic material in which a soft magnetic thin film is provided on a ceramic substrate containing Mn and Ni as main components, and found that an amorphous thin film is formed between the substrate and the soft magnetic thin film. It has been found that by providing this sandwich type magnetic material, for example, the magnetic properties such as initial magnetic permeability can be greatly improved.
すなわち、基板としてＭｎ、Ｎｉを主成分として含むセ
ラミック製のものを用いた場合に、この基板上に例えば
５ｉＯｙ、Ａム０３等の非磁性材料を用いて高周波スパ
ック法や熱酸化法ν；よって非晶質薄膜を設け、この非
晶質薄膜上に、例えばセンダスト谷金、パーマロイ等を
用いて軟磁性膜を設けた磁性材は、Ｍｎ、Ｎｉを主成分
として含むセラミック材料と非晶質薄膜との組み合わせ
による効果によるせいか、非晶質薄膜を設けないで、す
なわちＭｎ５Ｎｉを主成分として含むセラミック製の基
板上に直接軟磁性膜を設けたタイプの磁性材よりも、初
透磁率の磁気特性が大巾に優れていたのである。That is, when a ceramic substrate containing Mn and Ni as main components is used, a non-magnetic material such as 5iOy or Am03 is used on the substrate and the high frequency spackle method or thermal oxidation method ν; A magnetic material in which an amorphous thin film is provided and a soft magnetic film is provided on the amorphous thin film using, for example, sendust tani metal, permalloy, etc., is a ceramic material containing Mn and Ni as main components and an amorphous thin film. Perhaps due to the effect of the combination with It had outstanding characteristics.
尚、Ｍｎ、Ｎｉを主成分として含むセラミック製の基板
上に設ける非晶質薄膜は、その厚さが約０．５μｍ以下
で０．１μｍ以上、さらに望ましくは約０．１５〜０゜
２５μｍのものであることが好ましい。すなわち、非晶
質薄膜をＭｎ、Ｎｉを主成分として含むセラミック製の
基板上に設け、この非晶質薄膜上に軟磁性薄膜を設けた
場合において、非晶質薄膜の厚みが薄すぎる場合には磁
気特性の向上効果は弱く、実用上充分大きな効果が認め
られ始めるのは非晶質薄膜の厚みが約０．１μｍ以上、
より一層望ましくは約０．１５μｍ以上の場合であるか
らであり、そして非晶質薄膜の厚みが厚くなりすぎると
軟磁性薄膜の付着強度が低下することになり、又、非晶
質薄膜を厚く形成するには、それだけ時間もかかり、製
造能率も悪くなることより、非晶質薄膜の厚みは約０．
５ｔｔｍ以下、より一層望ましくは約０．２５μｍ以下
であることが好ましいのである。The amorphous thin film provided on the ceramic substrate containing Mn and Ni as main components has a thickness of about 0.5 μm or less and 0.1 μm or more, more preferably about 0.15 to 0.25 μm. Preferably. That is, when an amorphous thin film is provided on a ceramic substrate containing Mn and Ni as main components and a soft magnetic thin film is provided on this amorphous thin film, if the thickness of the amorphous thin film is too thin, The effect of improving magnetic properties is weak, and a sufficiently large effect begins to be recognized for practical use only when the thickness of the amorphous thin film is approximately 0.1 μm or more.
More preferably, the thickness is about 0.15 μm or more, and if the thickness of the amorphous thin film becomes too thick, the adhesion strength of the soft magnetic thin film will decrease; The thickness of the amorphous thin film is approximately 0.0 mm because it takes a long time to form and the manufacturing efficiency is poor.
It is preferably less than 5 ttm, more preferably less than about 0.25 μm.
又、非晶質薄膜上に形成される軟磁性薄膜については、
その厚みが約０．１〜６０μｍの場合には磁気特性向上
効果は充分に認められるが、通常の形態においては軟磁
性薄膜の厚みは約５〜２０／Ｉｍのものである。Regarding soft magnetic thin films formed on amorphous thin films,
When the thickness is about 0.1 to 60 μm, the effect of improving magnetic properties is sufficiently recognized, but in a normal form, the thickness of the soft magnetic thin film is about 5 to 20/Im.
第１図は本発明に係る磁性材の１実施例の一部断面図、
第２図はこの磁性材の磁気特性、すなわち初透磁率を示
すグラフである。FIG. 1 is a partial cross-sectional view of one embodiment of the magnetic material according to the present invention;
FIG. 2 is a graph showing the magnetic properties of this magnetic material, that is, the initial magnetic permeability.
同図中、１は、Ｍｎ、Ｎｉを主成分として含むセラミッ
ク製、例えば日立金属■製のＭＮ １３０よりなるセ
ラミック製の外径１０闘、内径６ｍｍ、厚さ０．７朋の
トロイダルリング状の基板であり、この基板１の表面は
鏡面研磨されている。In the figure, 1 is a toroidal ring-shaped ceramic material containing Mn and Ni as main components, such as MN 130 manufactured by Hitachi Metals, with an outer diameter of 10 mm, an inner diameter of 6 mm, and a thickness of 0.7 mm. The surface of the substrate 1 is mirror polished.
２は、この基板１の鏡面研磨面上にＳｉＯｘを高周波ス
パッタ法によって設けた厚さ０．２５μｍの非晶質薄膜
である。2 is an amorphous thin film having a thickness of 0.25 .mu.m formed by depositing SiOx on the mirror-polished surface of the substrate 1 by high-frequency sputtering.
３は、この非晶質薄膜２上にセンダスト合金を高周波ス
パッタ法によって設けた厚さ１０μｍの軟磁性薄膜であ
る。3 is a soft magnetic thin film having a thickness of 10 μm, in which Sendust alloy is provided on the amorphous thin film 2 by high frequency sputtering.
上記のように構成された磁性材について、０．１〜１０
ＭＨｚの領域において初透磁率を測定すると第２図に示
す通りである。For the magnetic material configured as above, 0.1 to 10
The initial magnetic permeability measured in the MHz range is as shown in FIG.
尚、第２図中、実線Ａは上記実施例に係るもの、点線Ｂ
は上記実施例の構成において非晶質薄膜２を設けなかっ
た磁性材に係るものであり、そして縦軸の単位は非晶質
薄膜２を設けなかった磁性材において１００ＫＨｚにお
ける初透磁率を１として表わしている。In addition, in FIG. 2, the solid line A is related to the above embodiment, and the dotted line B is
is related to the magnetic material in which the amorphous thin film 2 was not provided in the configuration of the above example, and the unit of the vertical axis is the initial magnetic permeability at 100 KHz of the magnetic material not provided with the amorphous thin film 2 as 1. It represents.
これによれば、Ｍｎ、Ｎｉを主成分として含むセラミッ
ク材料を磁性材の基板として用いる場合には、この基板
上に直接軟磁性薄膜を設けるのではなく、この基板上に
は非晶質薄膜を設け、この非晶質薄膜上に軟磁性薄膜を
設けるようにすると、初透磁率の大巾な向上が図れるこ
とがわかる。According to this, when a ceramic material containing Mn and Ni as main components is used as a magnetic material substrate, an amorphous thin film is not provided directly on the substrate, but an amorphous thin film is not provided directly on the substrate. It can be seen that by providing a soft magnetic thin film on this amorphous thin film, the initial magnetic permeability can be greatly improved.
又、軟磁性薄膜として例えばセンダスト合金を用いて多
層形成する場合にあっても、基板側の最下層の軟磁性薄
膜と基板との間に絶縁性の非晶質薄膜が設けられている
ことより、最下層の軟磁性薄膜の磁気特性の改善が大き
いことより、積層膜全体の磁気特性は一段と良いものに
なる。Furthermore, even when forming a multilayer soft magnetic thin film using Sendust alloy, for example, an insulating amorphous thin film is provided between the bottom soft magnetic thin film on the substrate side and the substrate. Since the magnetic properties of the soft magnetic thin film at the bottom layer are greatly improved, the magnetic properties of the entire laminated film become even better.
本発明に係る磁性材は、Ｍｎ、Ｎｉを主成分として含む
セラミックの基板層と磁性層との間に非晶質薄膜を介在
させたものであるから、初透磁率等の磁気特性が大巾に
向上し、又、バルクな形態ではなく薄膜タイプのもので
あるから磁性層が有してν心ない物理的特性をＭｎ、Ｎ
ｉを主成分として含むセラミックの基板層で補えるもの
であり、従ってこの磁性材の応用範囲は広いものである
等の特長を有する。Since the magnetic material according to the present invention has an amorphous thin film interposed between the ceramic substrate layer containing Mn and Ni as main components and the magnetic layer, the magnetic properties such as initial magnetic permeability are greatly improved. Moreover, since it is not a bulk type but a thin film type, the magnetic layer has physical properties that are not ν-centered compared to Mn and N.
This magnetic material can be supplemented with a ceramic substrate layer containing i as a main component, and therefore has the advantage that the range of application of this magnetic material is wide.
第１図は本発明に係る磁性材の１実施例を示す一部の断
面図、第２図はこの実施例による磁性材および非晶質薄
膜を設けない磁性材の各初透磁率を示すグラフである。
１・・・基板、２・・・非晶質薄膜、３・・・軟磁性薄
膜。FIG. 1 is a partial cross-sectional view showing one example of the magnetic material according to the present invention, and FIG. 2 is a graph showing the initial magnetic permeability of the magnetic material according to this example and the magnetic material without an amorphous thin film. It is. 1...Substrate, 2...Amorphous thin film, 3...Soft magnetic thin film.
Claims (1)
磁性層との間に非晶質薄膜を介在させたことを特徴とす
る磁性材。A magnetic material characterized in that an amorphous thin film is interposed between a ceramic substrate layer containing Mn and Ni as main components and a magnetic layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17251485A JPS6233405A (en) | 1985-08-07 | 1985-08-07 | Magnetic material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17251485A JPS6233405A (en) | 1985-08-07 | 1985-08-07 | Magnetic material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6233405A true JPS6233405A (en) | 1987-02-13 |
Family
ID=15943366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17251485A Pending JPS6233405A (en) | 1985-08-07 | 1985-08-07 | Magnetic material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6233405A (en) |
-
1985
- 1985-08-07 JP JP17251485A patent/JPS6233405A/en active Pending
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