JPS6237200U - - Google Patents
Info
- Publication number
- JPS6237200U JPS6237200U JP12854485U JP12854485U JPS6237200U JP S6237200 U JPS6237200 U JP S6237200U JP 12854485 U JP12854485 U JP 12854485U JP 12854485 U JP12854485 U JP 12854485U JP S6237200 U JPS6237200 U JP S6237200U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- gas introduction
- gas
- introduction tube
- electrode plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Description
第１図はこの考案の一実施例の部分断面図、第
２図は従来の装置の断面図である。
２……電極部、４……電極板、６，７，１６，
１７……ガス導入管、１０……絶縁管。
FIG. 1 is a partial sectional view of an embodiment of this invention, and FIG. 2 is a sectional view of a conventional device. 2... Electrode part, 4... Electrode plate, 6, 7, 16,
17...Gas introduction pipe, 10...Insulation pipe.
Claims (1)
電極板から噴出させ、前記ガス導入管に沿つて前
記電極板に電力を供給することによつてプラズマ
の発生を行なうプラズマ発生装置において、前記
ガス導入管の内部に電気的絶縁管を設け、前記絶
縁管を通して前記ガスの導入を行なうことを特徴
とするプラズマ発生装置。 In a plasma generation device that generates plasma by ejecting gas introduced from a gas introduction tube from a plasma discharge electrode plate and supplying electric power to the electrode plate along the gas introduction tube, the gas introduction tube A plasma generating device characterized in that an electrically insulating tube is provided inside the plasma generator, and the gas is introduced through the insulating tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12854485U JPH0528720Y2 (en) | 1985-08-22 | 1985-08-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12854485U JPH0528720Y2 (en) | 1985-08-22 | 1985-08-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6237200U true JPS6237200U (en) | 1987-03-05 |
| JPH0528720Y2 JPH0528720Y2 (en) | 1993-07-23 |
Family
ID=31024312
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12854485U Expired - Lifetime JPH0528720Y2 (en) | 1985-08-22 | 1985-08-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0528720Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04182997A (en) * | 1990-11-16 | 1992-06-30 | Inter Nitsukusu Kk | High-speed sample-hold circuit |
| JP2006100305A (en) * | 2004-09-28 | 2006-04-13 | Asm Japan Kk | Plasma processing equipment |
-
1985
- 1985-08-22 JP JP12854485U patent/JPH0528720Y2/ja not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04182997A (en) * | 1990-11-16 | 1992-06-30 | Inter Nitsukusu Kk | High-speed sample-hold circuit |
| JP2006100305A (en) * | 2004-09-28 | 2006-04-13 | Asm Japan Kk | Plasma processing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0528720Y2 (en) | 1993-07-23 |