JPS623760Y2 - - Google Patents
Info
- Publication number
- JPS623760Y2 JPS623760Y2 JP7189081U JP7189081U JPS623760Y2 JP S623760 Y2 JPS623760 Y2 JP S623760Y2 JP 7189081 U JP7189081 U JP 7189081U JP 7189081 U JP7189081 U JP 7189081U JP S623760 Y2 JPS623760 Y2 JP S623760Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- cleaning
- mixer
- mixture
- sodium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 38
- 238000004140 cleaning Methods 0.000 claims description 36
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 239000011261 inert gas Substances 0.000 claims description 12
- 229910001338 liquidmetal Inorganic materials 0.000 claims description 7
- 239000000203 mixture Substances 0.000 description 17
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 11
- 239000011734 sodium Substances 0.000 description 11
- 229910052708 sodium Inorganic materials 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 239000003595 mist Substances 0.000 description 6
- 239000000446 fuel Substances 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
Description
【考案の詳細な説明】 本考案は液体金属付着物の洗浄装置に関する。[Detailed explanation of the idea] The present invention relates to a device for cleaning liquid metal deposits.
大型で形状の複雑な、ナトリウム等液体金属を
とり扱う機器を洗浄する場合、機器の表面および
クレビス部に付着しているナトリウム等を除去す
る洗浄法として、通常、一次洗浄(粗洗浄)およ
び二次洗浄(仕上洗浄)の洗浄工程が採られてい
る。一次洗浄法として水系を用いた洗浄法、アル
コール洗浄法、真空蒸留法などの洗浄法がある
が、経済性、洗浄性などから水を用いた洗浄法が
よく用いられている。 When cleaning large, complex-shaped equipment that handles liquid metals such as sodium, primary cleaning (rough cleaning) and secondary cleaning are usually used to remove sodium adhering to the surface and clevis of the equipment. A cleaning process of next cleaning (finish cleaning) is adopted. As a primary cleaning method, there are cleaning methods such as an aqueous cleaning method, an alcohol cleaning method, and a vacuum distillation method, but the cleaning method using water is often used due to economical efficiency and cleaning efficiency.
第1図は大型ナトリウム機器を水蒸気−不活性
ガス(例えばN2ガス)の洗浄媒体により洗浄す
る一次洗浄法の概念図である。図中、11:洗浄
槽、2:被洗浄体(ナトリウム機器)、3:混合
器、4:N2ガス供給装置、5:水蒸気発生装
置、6:混合気(水蒸気−不活性ガス)供給系、
7:ドレン系、8:排気系である。 FIG. 1 is a conceptual diagram of a primary cleaning method for cleaning large sodium equipment with a cleaning medium of water vapor and inert gas (for example, N2 gas). In the figure, 11: Cleaning tank, 2: Object to be cleaned (sodium equipment), 3: Mixer, 4: N2 gas supply device, 5: Steam generator, 6: Gas mixture (steam-inert gas) supply system ,
7: Drain system, 8: Exhaust system.
この洗浄方法は、水蒸気を蒸気発生装置5、
N2ガスをN2ガス供給装置4よりそれぞれ混合器
3へ送気し、所要水分量の混合気にして、混合気
供給系6より洗浄槽1内へ入る。混合気は洗浄槽
内を上昇し、被洗浄体に付着しているナトリウム
と水蒸気が反応し、ナトリウムを除去する。反応
に関与しない余剰の水蒸気およびN2ガスの混合
気は排気系8より大気放出される。このように、
洗浄槽内へ送気された混合気は大気放出されるの
で大型ナトリウム機器の場合、多量のN2ガスを
消費し、洗浄時間が長いとさらに消費量は増大す
る。 In this cleaning method, water vapor is transferred to a steam generator 5,
N 2 gas is supplied from the N 2 gas supply device 4 to the mixer 3 to form a mixture with a required moisture content, and then enters the cleaning tank 1 from the mixture supply system 6 . The mixture rises in the cleaning tank, and the sodium adhering to the object to be cleaned reacts with the water vapor, removing the sodium. Excess water vapor and N 2 gas mixture that do not participate in the reaction are discharged into the atmosphere from the exhaust system 8. in this way,
Since the air mixture sent into the cleaning tank is released into the atmosphere, large sodium equipment consumes a large amount of N 2 gas, and the longer the cleaning time, the more the consumption will increase.
本考案は上記の混合気としての不活性ガス量を
節減するため、大気放出していた混合気のうち不
活性ガスを再利用して不活性ガス量を節約するこ
とを目的とするもので、上記第1図装置における
排気系を不活性ガス供給系に接続し、放出されて
いた混合気を除去して再度不活性ガス供給系に戻
し再利用をはかつた装置に関するものである。 The purpose of this invention is to reuse the inert gas from the mixture that was released into the atmosphere in order to save the amount of inert gas as the mixture described above. This invention relates to an apparatus in which the exhaust system in the apparatus shown in FIG. 1 is connected to an inert gas supply system, and the released air-fuel mixture is removed and returned to the inert gas supply system for reuse.
本考案の不活性ガス循環系統を設けた液体金属
付着物洗浄装置を、第2図を用いて説明する。 A liquid metal deposit cleaning device equipped with an inert gas circulation system according to the present invention will be explained with reference to FIG.
すなわち、本考案は、内部に被洗浄体2を収納
し蓋で密閉される洗浄容器1、同容器の下部に連
絡した混合器3、同混合器に夫々連絡した不活性
ガス供給器4と水供給器5、洗浄容器1の上部に
連絡した排気管8、同排気管8に連絡したガス分
離器10、およびガス分離器10と混合器3を連
絡したガス循環路9を有してなる、液体金属付着
物洗浄装置に関するものである。 That is, the present invention includes a cleaning container 1 that houses an object 2 to be cleaned inside and is sealed with a lid, a mixer 3 connected to the lower part of the container, an inert gas supply device 4 connected to the mixer, and a water supply device 4. It has a supply device 5, an exhaust pipe 8 connected to the upper part of the cleaning container 1, a gas separator 10 connected to the exhaust pipe 8, and a gas circulation path 9 connecting the gas separator 10 and the mixer 3. This invention relates to a liquid metal deposit cleaning device.
本考案を更に詳細に説明すると、第2図におい
て、1:洗浄槽、2:被洗浄体、3:混合器(水
霧ガス洗浄の場合はジエツトノズルなどの水霧発
生器)、4:不活性ガス供給装置)、5:蒸気発生
器(水霧の場合は水供給装置)、6:混合気供給
配管)、7:ドレン配管、8:排気配管、9:循
環ガス配管、10:凝縮器、11:プロアであ
る。 To explain the present invention in more detail, in Fig. 2, 1: cleaning tank, 2: object to be cleaned, 3: mixer (in the case of water mist gas cleaning, a water mist generator such as a jet nozzle), 4: inert 5: Steam generator (water supply device in case of water mist), 6: Mixture supply piping), 7: Drain piping, 8: Exhaust piping, 9: Circulating gas piping, 10: Condenser, 11: It is proa.
被洗浄体2としてナトリウム機器を、不活性ガ
スとしてN2ガスを用いた場合を例にとつて説明
すると、混合器3で混合されたN2ガス−水蒸気
の混合気(または水霧ガス)は、混合気供給配管
6を通り洗浄槽1内に入り、上昇して被洗浄体2
に付着しているナトリウムと水蒸気(水霧ガスの
場合、水霧)とが反応し、ナトリウムは除去され
る。反応生成物のH2ガスおよび余剰の混合気
は、排気配管8より排気されるが、凝縮器10に
入り、ここで混合気中の水分が除去され、N2ガ
スはさらに循環配管9を通りその途中に設けられ
たブロア11により再びN2供給配管に入り再使
用されることになり、N2ガスが循環利用できる
構造になつている。 Taking a case where sodium equipment is used as the object to be cleaned 2 and N 2 gas is used as the inert gas, the mixture of N 2 gas and water vapor (or water mist gas) mixed in the mixer 3 is as follows. , enters the cleaning tank 1 through the air-fuel mixture supply pipe 6 and rises to the object to be cleaned 2.
Sodium adhering to the gas reacts with water vapor (or water mist in the case of water mist gas), and the sodium is removed. The reaction product H 2 gas and the excess mixture gas are exhausted from the exhaust pipe 8, but enter the condenser 10, where water in the mixture is removed, and the N 2 gas further passes through the circulation pipe 9. A blower 11 installed in the middle allows the N 2 gas to enter the N 2 supply pipe again and be reused, so that the N 2 gas can be recycled and used.
一般に洗浄に供された混合気はそのまま大気放
出されている。しかし、本考案では、排混合気が
凝縮器内を通ることにより、除湿されN2ガスの
みが、ガス循環配管を介し再び利用できる。この
ように、N2ガスを循環利用することにより、使
用するN2ガスの使用量は最小限ですみ、N2ガス
が大きに節約できる。排混合気中に含まれるナト
リウムと水蒸気との反応生成物H2ガスは排気配
管8より排出するが、この時にN2ガスも幾分排
気される。なお、不活性ガスとして本考案では
N2ガスの例を示したが、Arガス等の場合にも適
用できる。 Generally, the air-fuel mixture used for cleaning is released into the atmosphere as is. However, in the present invention, only the N2 gas that is dehumidified by passing the exhaust gas mixture through the condenser can be reused via the gas circulation pipe. By recycling N 2 gas in this way, the amount of N 2 gas used can be minimized, resulting in significant savings in N 2 gas. H 2 gas, a reaction product of sodium and water vapor contained in the exhaust gas mixture, is exhausted from the exhaust pipe 8, and at this time, some N 2 gas is also exhausted. In addition, in this invention, as an inert gas,
Although N 2 gas is shown as an example, it can also be applied to Ar gas, etc.
本考案は液体金属を扱う機器全般、特に分解が
困難な大型の蒸気発生器、熱交換器などに有効で
ある。 The present invention is effective for all devices that handle liquid metals, especially large steam generators and heat exchangers that are difficult to disassemble.
添付の図面は液体金属機器洗浄装置の概略を示
し、第1図が従来法に関するもの、第2図が本考
案に関するものであり、
1……洗浄容器、2……被洗浄体、3……混合
器、4……不活性ガス供給器、5……水供給器、
8……排気管、9……ガス循環路、10……ガス
分離器を表わす。
The attached drawings schematically show the apparatus for cleaning liquid metal equipment, with Fig. 1 relating to the conventional method and Fig. 2 relating to the present invention. 1...Cleaning container, 2...Object to be cleaned, 3... Mixer, 4... Inert gas supply device, 5... Water supply device,
8... Exhaust pipe, 9... Gas circulation path, 10... Gas separator.
Claims (1)
器、同容器の下部に連絡した混合器、同混合器に
夫々連絡した不活性ガス供給器と水供給器、洗浄
容器の上部に連絡した排気管、同排気管に連絡し
たガス分離器、およびガス分離器と混合器を連絡
したガス循環路を有してなる、液体金属付着物洗
浄装置。 A cleaning container that stores the object to be cleaned inside and is sealed with a lid, a mixer connected to the bottom of the container, an inert gas supply and a water supply connected to the mixer, and a water supply connected to the top of the cleaning container. A liquid metal deposit cleaning device comprising an exhaust pipe, a gas separator connected to the exhaust pipe, and a gas circulation path connecting the gas separator and the mixer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7189081U JPS623760Y2 (en) | 1981-05-20 | 1981-05-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7189081U JPS623760Y2 (en) | 1981-05-20 | 1981-05-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57186000U JPS57186000U (en) | 1982-11-25 |
| JPS623760Y2 true JPS623760Y2 (en) | 1987-01-28 |
Family
ID=29867676
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7189081U Expired JPS623760Y2 (en) | 1981-05-20 | 1981-05-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS623760Y2 (en) |
-
1981
- 1981-05-20 JP JP7189081U patent/JPS623760Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57186000U (en) | 1982-11-25 |
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