JPS6237926U - - Google Patents
Info
- Publication number
- JPS6237926U JPS6237926U JP13035185U JP13035185U JPS6237926U JP S6237926 U JPS6237926 U JP S6237926U JP 13035185 U JP13035185 U JP 13035185U JP 13035185 U JP13035185 U JP 13035185U JP S6237926 U JPS6237926 U JP S6237926U
- Authority
- JP
- Japan
- Prior art keywords
- rotating body
- wafer
- wafer drying
- support shaft
- air introduction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001035 drying Methods 0.000 claims description 9
- 239000000969 carrier Substances 0.000 claims 1
Landscapes
- Drying Of Solid Materials (AREA)
Description
第１図は本考案装置を例示する一部破断正面図
である。また第２図および第３図は従来のウエー
ハ乾燥装置の一部破断正面図および線―に沿
う横断面図である。
３０…ウエーハキヤリヤ、２０…ウエーハ乾燥
装置、２２…回転体（回転アーム）、２３…中空
器体、２４…ウエーハ乾燥室、２６…回転体の支
持軸、２６ａ…乾燥用空気の導入口、２８ａ，２
８ｂ…ベアリング。
FIG. 1 is a partially cutaway front view illustrating the device of the present invention. Further, FIGS. 2 and 3 are a partially cutaway front view and a cross-sectional view taken along line - of a conventional wafer drying apparatus. 30... Wafer carrier, 20... Wafer drying device, 22... Rotating body (rotating arm), 23... Hollow container body, 24... Wafer drying chamber, 26... Support shaft of rotating body, 26a... Drying air inlet, 28a,2
8b...Bearing.
Claims (1)
置せしめた回転体と、該回転体の周囲に固設され
た中空器体からなるウエーハ乾燥室と、前記回転
体の駆動装置とからなるウエーハ乾燥装置に於い
て、 前記ウエーハ乾燥室の内壁と対向する回転体の
支持軸を円周面に乾燥用空気の導入孔を開口せし
めた中空円筒体から構成すると共に、該空気導入
孔穿設域に隣設して円筒状のフイルタ部材を配置
し、且つ、前記支持軸の上部に所定の間隔を置い
て対向配置された２個のベアリングによつて前記
回転体を回転自在に支持したことを特徴とするウ
エーハ乾燥装置。[Claims for Utility Model Registration] A wafer drying chamber consisting of a rotating body in which a plurality of wafer carriers are arranged at the same circumference, a hollow container fixed around the rotating body, and the rotating body. In the wafer drying apparatus, the support shaft of the rotating body facing the inner wall of the wafer drying chamber is constituted by a hollow cylindrical body having a drying air introduction hole opened in the circumferential surface, and A cylindrical filter member is disposed adjacent to the area where the air introduction hole is formed, and the rotating body is supported by two bearings disposed oppositely at a predetermined distance above the support shaft. A wafer drying device characterized by being rotatably supported.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985130351U JPH046206Y2 (en) | 1985-08-27 | 1985-08-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985130351U JPH046206Y2 (en) | 1985-08-27 | 1985-08-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6237926U true JPS6237926U (en) | 1987-03-06 |
| JPH046206Y2 JPH046206Y2 (en) | 1992-02-20 |
Family
ID=31027765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985130351U Expired JPH046206Y2 (en) | 1985-08-27 | 1985-08-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH046206Y2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57196532A (en) * | 1981-05-27 | 1982-12-02 | Toshiba Corp | Drying device for wafer |
-
1985
- 1985-08-27 JP JP1985130351U patent/JPH046206Y2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57196532A (en) * | 1981-05-27 | 1982-12-02 | Toshiba Corp | Drying device for wafer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH046206Y2 (en) | 1992-02-20 |