JPS6237957A - Manufacture of thick film resistor - Google Patents

Manufacture of thick film resistor

Info

Publication number
JPS6237957A
JPS6237957A JP60177916A JP17791685A JPS6237957A JP S6237957 A JPS6237957 A JP S6237957A JP 60177916 A JP60177916 A JP 60177916A JP 17791685 A JP17791685 A JP 17791685A JP S6237957 A JPS6237957 A JP S6237957A
Authority
JP
Japan
Prior art keywords
thick film
resistor
film resistor
resistance value
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60177916A
Other languages
Japanese (ja)
Inventor
Hiroshi Takahara
博司 高原
Yasushi Totomi
遠富 康
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60177916A priority Critical patent/JPS6237957A/en
Publication of JPS6237957A publication Critical patent/JPS6237957A/en
Pending legal-status Critical Current

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  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、描画あるいは印刷によりセラミック基板上に
作製される厚膜抵抗体の製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method of manufacturing a thick film resistor produced on a ceramic substrate by drawing or printing.

従来の技術 近年、電子機器の小型化にともない、その回路基板も小
型化となり、そのため高密度実装化の傾向にある。その
高密度実装の方法の1つにハイブリッドIC(以下HI
Cと呼ぶ。)がある。HIO2ページ に用いられる抵抗体の製造方法は、セラミック基板上に
抵抗体ならびに配線パターン形成後、抵抗体を描画また
は印刷により形成する方法がとられている。
BACKGROUND OF THE INVENTION In recent years, as electronic devices have become smaller, their circuit boards have also become smaller, leading to a trend towards higher density packaging. One of the methods for high-density packaging is hybrid IC (hereinafter referred to as HI).
Call it C. ). The method for manufacturing the resistor used in the HIO2 page is to form the resistor and wiring pattern on a ceramic substrate, and then form the resistor by drawing or printing.

従来の厚膜抵抗は第3図に示すように基板上の平面矩形
の抵抗体1を電極2,2に金山に接して構成している。
As shown in FIG. 3, a conventional thick film resistor is constructed by having a planar rectangular resistor 1 on a substrate in contact with electrodes 2, 2 in gold mines.

3は抵抗体1と電極2との接触部である。3 is a contact portion between the resistor 1 and the electrode 2.

一方、厚膜抵抗ペーストは抵抗体となる粒子の大きさ・
粘度・固形分の含有率等々により比抵抗が変化し、求め
ようとする比抵抗になかなか定まらず、抵抗値が目標抵
抗値からはなれてしまう傾向がある。そこで従来は、そ
の調整のため、一旦セソトしたペーストを印刷法ではス
クリーンから描画法では描画インクタンクより取りさり
、シンナー等の稀釈剤で粘度をコントロールしたり、他
の抵抗ペーストとブレンドしたりして調整していた。
On the other hand, with thick film resistor paste, the size of the particles that become the resistor
The specific resistance changes depending on the viscosity, solid content, etc., and it is difficult to determine the desired specific resistance, and the resistance value tends to deviate from the target resistance value. Conventionally, in order to adjust this, the paste was removed from a screen in the printing method or from a drawing ink tank in the drawing method, and the viscosity was controlled with a diluent such as thinner, or blended with other resistance pastes. I was making adjustments.

発明が解決しようとする問題点 しかしながら、上記のような方法では、一旦セ3 ぺ−
7 ツトしたペーストを比抵抗調整のためスクリーンあるい
は描画インクタンクより取りさる・V・要があるため、
非常に生産性の悪いものであった。
Problems to be Solved by the Invention However, in the above method, once the
7. It is necessary to remove the paste from the screen or drawing ink tank to adjust the resistivity.
It was extremely unproductive.

本発明は上記問題点に鑑み、抵抗値の調整を簡単におこ
なえる厚膜抵抗体の製造方法を提供することを目的とす
る。
SUMMARY OF THE INVENTION In view of the above problems, it is an object of the present invention to provide a method for manufacturing a thick film resistor, which allows the resistance value to be easily adjusted.

問題点を解決するだめの手段 上記問題点を解決するだめ、厚膜抵抗体の福方向に厚膜
抵抗体作製位置を変化させ、厚膜抵抗体と厚膜抵抗体の
両端に形成される電極との接触面積を変化させることに
より所望の抵抗値を得る厚膜抵抗体の製造方法である。
Means to solve the problem In order to solve the above problem, the thick film resistor fabrication position is changed in the direction of the thick film resistor, and the electrodes formed at both ends of the thick film resistor are changed. This is a method of manufacturing a thick film resistor in which a desired resistance value is obtained by changing the contact area with the resistor.

作用 本発明は」−記したように厚膜抵抗体の作製位置を抵抗
体長幅方向に変化させ、その両端に形成される電極との
接触面積を変化させることにより所望の抵抗値を得るも
のであるから、抵抗値の調整を簡単におこなえ所望抵抗
値を得ることになる。
Function: As described above, the present invention obtains a desired resistance value by changing the manufacturing position of the thick film resistor in the lengthwise and widthwise direction of the resistor and changing the contact area with the electrodes formed at both ends thereof. Therefore, the resistance value can be easily adjusted to obtain the desired resistance value.

実施例 以下、本発明の一実施例の厚膜抵抗体の製造方法につい
て図面を参照しながら説明する。第1図。
EXAMPLE Hereinafter, a method for manufacturing a thick film resistor according to an example of the present invention will be described with reference to the drawings. Figure 1.

第2図は本発明の厚膜抵抗体の製造方法により抵抗体を
形成した時の平面図である。第1図、第2図において抵
抗体と電極との接触面積を変化させている。第1図では
厚膜抵抗体と電極との接触部分はわずかであるが、第2
図ではほぼ全中にわたり接触している。
FIG. 2 is a plan view of a resistor formed by the thick film resistor manufacturing method of the present invention. In FIGS. 1 and 2, the contact area between the resistor and the electrode is changed. In Figure 1, the contact area between the thick film resistor and the electrode is small, but the contact area between the thick film resistor and the electrode is small.
In the figure, almost the entire area is in contact.

第1図のごとく抵抗体を作製した際、抵抗値が所望抵抗
値より高い場合、第2図に示すように抵抗体を下方向に
ずらせて形成し、電極2は元の位、置のまま形成する。
When the resistor is fabricated as shown in Figure 1, if the resistance value is higher than the desired resistance value, the resistor is shifted downward as shown in Figure 2, and the electrode 2 is left in its original position. Form.

すると抵抗体と電極面積は増大し、それにしたがい抵抗
値は低くカリ所望抵抗値に近づく。つまり抵抗体作製後
の抵抗値を測定し、所望抵抗値に近づけるように抵抗体
の形成位置を変化させることにより所望抵抗値を得るこ
とができる。この接触面積と抵抗値の関係は第4図の抵
抗体において電極長さXを変化させると第6図のように
なる。
Then, the area of the resistor and electrode increases, and the resistance value decreases accordingly and approaches the desired resistance value. That is, the desired resistance value can be obtained by measuring the resistance value after the resistor is manufactured and changing the formation position of the resistor so as to approach the desired resistance value. The relationship between the contact area and the resistance value becomes as shown in FIG. 6 when the electrode length X is changed in the resistor shown in FIG. 4.

上記のように抵抗体の形成位置をずらせるには印刷によ
り厚膜抵抗体を形成する場合は、印刷機5 ページ に取付けるスクリーンの位置をずらせるか、印刷面のホ
ルダーの位置を微少に動かすことにより容易におこなう
ことができる。また描画方法によシ厚膜抵抗体を形成す
る場合は抵抗体描画位置座標を変化させればよい。
To shift the formation position of the resistor as described above, when forming a thick film resistor by printing, either shift the position of the screen attached to page 5 of the printing machine, or slightly move the position of the holder on the printing surface. This can be easily done. Further, when forming a thick film resistor using a drawing method, the coordinates of the resistor drawing position may be changed.

なお上記実施例では、電極の形成位置を一定とし、抵抗
体作製位置をずらせるとしたが、逆に抵抗体作製位置を
一定とし、電極作製位置をずらせてもよい。
In the above embodiment, the electrode formation position is kept constant and the resistor fabrication position is shifted, but it is also possible to conversely keep the resistor fabrication position constant and the electrode fabrication position to be shifted.

発明の効果 本発明の厚膜抵抗体の製造方法によれば、抵抗体と電極
位置を相対的(でずらせただけで抵抗値調整をおこなう
ことができ、生産性が格段に向上する。
Effects of the Invention According to the method for manufacturing a thick film resistor of the present invention, the resistance value can be adjusted by simply shifting the positions of the resistor and the electrode relative to each other, thereby significantly improving productivity.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図は本発明の一実施例における平面図、第
3図は従来の厚膜抵抗体の製造方法により抵抗体を形成
したときの平面図、第4図は厚膜抵抗体の外観図、第6
図は第4図において電極の長さを変化させたときの抵抗
体の特性図である。 6 ヘ−7 1・・・・・・厚膜抵抗体、2・・・・・・電極、3・
・・・・・厚膜抵抗体と電極接触部。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名/ 
−m−簿膜抵抗体 ?−−−電 極 第1図     3−1H腋&!体と 霊屋の重fJ、l 4¥ ! 第2図 第3図
1 and 2 are plan views of an embodiment of the present invention, FIG. 3 is a plan view of a resistor formed by a conventional thick film resistor manufacturing method, and FIG. 4 is a plan view of a thick film resistor. External view, No. 6
This figure is a characteristic diagram of the resistor when the length of the electrode is changed in FIG. 4. 6 He-7 1... Thick film resistor, 2... Electrode, 3...
...Thick film resistor and electrode contact area. Name of agent: Patent attorney Toshio Nakao and 1 other person/
-m-membrane resistor? ---Electrode Figure 1 3-1H armpit &! The weight of the body and the spirit house fJ, l 4 yen! Figure 2 Figure 3

Claims (1)

【特許請求の範囲】[Claims]  描画または印刷により作製される厚膜抵抗体の製造方
法であって、厚膜抵抗体の幅方向に厚膜抵抗体の作製位
置を変化させ、厚膜抵抗体と厚膜抵抗体の両端に形成さ
れる電極との接触面積を変化させることにより所望の抵
抗値を得る厚膜抵抗体の製造方法。
A method for manufacturing a thick film resistor produced by drawing or printing, in which the production position of the thick film resistor is changed in the width direction of the thick film resistor, and the thick film resistor is formed at both ends of the thick film resistor. A method of manufacturing a thick film resistor in which a desired resistance value is obtained by changing the contact area with an electrode.
JP60177916A 1985-08-13 1985-08-13 Manufacture of thick film resistor Pending JPS6237957A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60177916A JPS6237957A (en) 1985-08-13 1985-08-13 Manufacture of thick film resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60177916A JPS6237957A (en) 1985-08-13 1985-08-13 Manufacture of thick film resistor

Publications (1)

Publication Number Publication Date
JPS6237957A true JPS6237957A (en) 1987-02-18

Family

ID=16039303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60177916A Pending JPS6237957A (en) 1985-08-13 1985-08-13 Manufacture of thick film resistor

Country Status (1)

Country Link
JP (1) JPS6237957A (en)

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