JPS6238424B2 - - Google Patents
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- JPS6238424B2 JPS6238424B2 JP56181723A JP18172381A JPS6238424B2 JP S6238424 B2 JPS6238424 B2 JP S6238424B2 JP 56181723 A JP56181723 A JP 56181723A JP 18172381 A JP18172381 A JP 18172381A JP S6238424 B2 JPS6238424 B2 JP S6238424B2
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- amorphous
- atomic
- alloy
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Description
本発明は、耐摩耗性、耐蝕性に優れた非晶質磁
性合金に関するものである。
近年、超急冷技術の進歩により種々の非晶質磁
性合金が得られるようになつた。これらは主とし
て金属元素と半金属半導体元素との組合せで得ら
れ、その代表的なものはFe―P―C,Fe―B―
C,Co―Si―B,Fe―Co―B,Fe―Ni―P―
B,Fe―Si―Bなどである。これらの非晶質合
金は優れた軟磁気特性を有し硬度も高いことから
磁気ヘツドコアへの応力の検討が進んでいる。し
かしながらヘツドの耐摩耗性はパーマロイを十分
上回るものの、センダストを上回つておらないば
かりか、耐蝕性においてパーマロイ、センダスト
に劣るという欠点を有している。耐蝕性はCrを
7%程度添加することにより改善されているが、
飽和磁束密度の大幅な減少を伴うので、あまり好
ましい改良方法でない。上述の遷移金属とメタロ
イドとの組合せで得られる非晶質合金のうち、飽
和磁束密度Bsを最も高く取れるのはBだけもし
くはBとCをメタロイドに用いる合金であるが、
この系は非常に製造が困難であつた。本発明者ら
はこの系にNbを添加することにより、非晶質化
が極めて容易になるばかりでなく、従来では不可
能であつた、Bが極めて少ない領域でもNbの効
果により非晶質化し、従来のB,Si―B,P―
B,B―C,P―C系の非晶質合金化に比べNb
―B系の合金が耐摩耗性において優れていること
を発見した(特願昭55―164978号)。
本発明者らは更に研究を進め、これらの系の中
でも特にBなどのメタロイドを10%以下含み、
Nbを6%以上含む。
() MaNbbXc
(M=Fe,Co,Ni,Mn,Cr,Mo,Wのう
ち1種もしくは2種;
X=B,C,Si,Ge,Al,Snのうち1種も
しくは2種
ただし
71a94
6b<20
0c<10)
で示される組成領域の試料についてその諸特性を
調べた。一例としてBの量と耐摩耗性との相関デ
ータを第1図に示した。摩耗測定はV.T.Rデツキ
にトラツク幅200μm、幅2mmの積層した非晶質
合金をダミーヘツドとして装着し、CrOzテープ
をダミーヘツドとの相対速度5.6m/secで20時間
走行させ、ヘツドの摩耗量を測定することによつ
て行なつた。第1図からBの量が10%以下で極め
て優れた耐摩耗性を示すことがわかる。メタロイ
ドを10%以下含む領域で非晶質化するためには
Nbが6%以上必要であり、この領域ではNbが主
として非晶質化を可能にする元素して働きX=
B,C,Si,Ge,Al,Snはむしろ非晶質化を一
層容易にするための従の働きをしていることが実
験結果からわかつた。従つてメタル―メタル結合
的に非晶質合金がメタル―メタロイド結合的な非
晶質合金よりも耐摩耗性に優れているとも思われ
る。第1表に具体的実施例としてオーデイオ用カ
セツトテープレコーダに各種非晶質合金のダミー
ヘツドを装着し、CrOzテープを4.75cm/secのス
ピードで走行させ1000時間後の摩耗量を測定した
結果を第1表に示す。
同表に示したデータよりメタロイドを含まない
No.2、及び微かしか含まないNo.9,10が他のメタ
ロイドを多く含むものより耐摩耗性において優
れ、またNbを含まないNo.11の試料は極めて耐摩
耗性が悪いことがわかつた。以上より()にお
いてXを含まない。
()′ MaNbb,80a≦94,6≦b≦20(原
子%)という組成の非晶質合金が実要上望まし
いことがわかつた。
The present invention relates to an amorphous magnetic alloy with excellent wear resistance and corrosion resistance. In recent years, advances in ultra-quenching technology have made it possible to obtain various amorphous magnetic alloys. These are mainly obtained by the combination of metal elements and semimetallic semiconductor elements, and the typical ones are Fe-P-C, Fe-B-
C, Co-Si-B, Fe-Co-B, Fe-Ni-P-
B, Fe-Si-B, etc. Since these amorphous alloys have excellent soft magnetic properties and high hardness, studies on stress on the magnetic head core are progressing. However, although the wear resistance of the head is sufficiently superior to Permalloy, it is not superior to Sendust, and has the disadvantage of being inferior to Permalloy and Sendust in terms of corrosion resistance. Corrosion resistance has been improved by adding about 7% Cr, but
This is not a very desirable improvement method because it involves a significant decrease in saturation magnetic flux density. Among the amorphous alloys obtained by combining the above-mentioned transition metals and metalloids, the one that can achieve the highest saturation magnetic flux density B s is an alloy that uses only B or B and C as metalloids.
This system was extremely difficult to manufacture. By adding Nb to this system, the present inventors not only made it extremely easy to make it amorphous, but also achieved the effect of Nb, which made it possible to make it amorphous even in areas where there was very little B, which was previously impossible. , conventional B,Si-B,P-
Compared to amorphous alloys of B, B-C, and P-C systems, Nb
- Discovered that B-series alloys have excellent wear resistance (Japanese Patent Application No. 164978-1982). The present inventors further conducted research and found that among these systems, in particular, metalloids such as B are contained in an amount of 10% or less,
Contains 6% or more of Nb. () M a Nb b X c (M = one or two of Fe, Co, Ni, Mn, Cr, Mo, W; The various properties of samples having the following composition range (71a94 6b<20 0c<10) were investigated. As an example, correlation data between the amount of B and wear resistance is shown in FIG. Wear measurement was performed by attaching a laminated amorphous alloy with a track width of 200 μm and a width of 2 mm as a dummy head to the VTR deck, running the CrO z tape at a relative speed of 5.6 m/sec with the dummy head for 20 hours, and measuring the amount of wear on the head. He did this by doing. It can be seen from FIG. 1 that extremely excellent wear resistance is exhibited when the amount of B is 10% or less. To make amorphous in a region containing less than 10% metalloid
6% or more of Nb is required, and in this region, Nb mainly acts as an element that enables amorphization.
It has been found from the experimental results that B, C, Si, Ge, Al, and Sn play a supporting role to make the amorphization even easier. Therefore, it is thought that an amorphous alloy with a metal-metal bond has better wear resistance than an amorphous alloy with a metal-metalloid bond. Table 1 shows the results of measuring the amount of wear after 1000 hours by attaching various amorphous alloy dummy heads to an audio cassette tape recorder and running a CrOz tape at a speed of 4.75 cm/sec. Shown in Table 1. Contains no metalloids according to the data shown in the same table.
It was found that sample No. 2, as well as samples No. 9 and 10 containing only a small amount of metalloid, had better wear resistance than samples containing a large amount of other metalloids, and sample No. 11, which did not contain Nb, had extremely poor wear resistance. . From the above, () does not include X. It has been found that an amorphous alloy having a composition of ( )' MaNb b , 80a≦94, 6≦b≦20 (atomic %) is practically desirable.
【表】
また、本発明者らはNbを6%以上含む非晶質
合金は優れた耐蝕性をあわせて持つことを発見し
た。これは、Nbが不働態膜を形成するためであ
ることが実験結果からわかつた。第2図に本発明
合金のポテンシヨダイナミツクポラリゼーシヨン
カーブ(Potentiodynamic Polarization
Curves)を示す。これよりNbを含む非晶質合金
は不働態膜を形成することがわかる。又Bなどの
メタロイドを10%以上入れると、たとえNbが6
%以上あつても、不動態膜の安定性が悪くなるこ
とがわかる。又Nbを20%以上入れると飽和磁束
密度Bsを著しく減少させるのでb<20であるこ
とが実用上望ましい。
次に、本発明者は上述のXのかわりに、ある特
定の金属T=Ti,Zr,Hf,V,Taを用いて優れ
た特性を有する非晶質合金が得られることを発見
した。これらの金属は上述のXと異なり10%以上
添加しても何ら耐摩耗性を劣化させるようなこと
はなかつたが、Xと異なり、5%以上添加すると
著しく飽和磁束密度を劣化させたり、Zrなどは著
しく耐蝕性を劣化させるので、磁性合金としての
長所を保持するためには5%以内にした方が望ま
しい。第3図に各種のTをCo85.5Nb14.5に添加し
た場合の飽和磁束密度Bsの変化の様子を示し
た。更にNbもBsをあまりそこなわないためには
20%以下にすることが望ましく、又非晶質化する
ためには6%以上必要であることから、この系に
おいては、
() MaNbbTd (T=Ti,Zr,Hf,V,Ta)
ただし76a94,6b20,0.1d<5と
いう組成範囲が実用上望ましいものとなる。この
()で示された組成範囲内の非晶質合金は、上
述()′で示されたものと同様に良好な耐摩耗
性と耐蝕性を示した第2表に第1表と同様な耐摩
耗試験結果を示す。[Table] The present inventors also discovered that an amorphous alloy containing 6% or more of Nb also has excellent corrosion resistance. Experimental results revealed that this is because Nb forms a passive film. Figure 2 shows the potentiodynamic polarization curve of the alloy of the present invention.
Curves). This shows that the amorphous alloy containing Nb forms a passive film. Also, if more than 10% of metalloids such as B are added, even if Nb is 6
% or more, the stability of the passive film deteriorates. Furthermore, if Nb is added in an amount of 20% or more, the saturation magnetic flux density B s is significantly reduced, so it is practically desirable that b<20. Next, the present inventor discovered that an amorphous alloy with excellent properties could be obtained by using a specific metal T=Ti, Zr, Hf, V, Ta in place of the above-mentioned X. Unlike X mentioned above, these metals did not cause any deterioration in wear resistance even when added in an amount of 10% or more; Since these materials significantly deteriorate the corrosion resistance, it is preferable to keep the content within 5% in order to maintain the advantages of a magnetic alloy. Figure 3 shows how the saturation magnetic flux density B s changes when various types of T are added to Co 85.5 Nb 14.5 . Furthermore, in order not to damage Nb too much, B s
It is desirable that the concentration be 20% or less, and 6% or more is required to make it amorphous, so in this system, () MaNb b T d (T=Ti, Zr, Hf, V, Ta ) However, a composition range of 76a94, 6b20, 0.1d<5 is practically desirable. Amorphous alloys within the composition range shown in ()' are shown in Table 2, showing good wear resistance and corrosion resistance similar to those shown in ()' above, as shown in Table 1. The results of the wear resistance test are shown.
【表】
次に、本発明者らはY及び希土類元素をCo―
Nbを主成分とする非晶質合金に添加してその効
果を調べた。しかしながら、従来の片ロール法を
用いて超急冷法では希土類元素の添加は非晶質リ
ボン化にあまり有効な効果を示さず、むしろ2%
以上の添加は非晶質リボン化をさまたげる結果と
なつた。ところがスパツター法及び蒸着法を用い
て非晶質薄膜を作成したところ、Y及び希土類元
素の微少添加は著しく結晶化温度を上昇させ極め
て好ましい効果を示すことがわかつた。ただし5
%以上の添加は著しく非晶質Co―Nb膜の軟磁気
特性をそこない急激なHcの増加をきたし、好ま
しくない結果を示すこともわかつた。したがつて
実用上望ましい組成範囲は上述と同様の理由で6
b20となる条件を考慮して以下のようにな
る。
() MaNbbRf
a+b+f=100,70a94,6b20,
0.1f<5
第3表にCo85.5Nb14.5にY及び各種希土類元素
を添加した場合の結晶化温度Txの変化の様子を
示す。[Table] Next, the present inventors added Y and rare earth elements to Co-
The effect of adding Nb to an amorphous alloy whose main component is Nb was investigated. However, in the ultra-quenching method using the conventional one-roll method, the addition of rare earth elements does not show much effect on forming an amorphous ribbon, and in fact 2%
The above addition resulted in hindering formation of an amorphous ribbon. However, when an amorphous thin film was created using a sputtering method and a vapor deposition method, it was found that the addition of small amounts of Y and rare earth elements significantly increased the crystallization temperature and exhibited a very favorable effect. However, 5
It was also found that addition of more than % of the amorphous Co--Nb film causes a rapid increase in Hc that significantly impairs the soft magnetic properties of the amorphous Co--Nb film, resulting in unfavorable results. Therefore, the practically desirable composition range is 6 for the same reason as mentioned above.
Considering the conditions for b20, it is as follows. () M a Nb b R f a+b+f=100, 70a94, 6b20,
0.1f<5 Table 3 shows how the crystallization temperature Tx changes when Y and various rare earth elements are added to Co85.5Nb14.5 .
【表】
又第4図に各種希土類元素を添加した場合のは
Hcの変化の様子を示す。上述のように希土類元
素の微少添加はスパツター法、もしくは蒸着法な
どでCo―Nb非晶質薄膜を作成する際極めて有効
である。又一般に超急冷法よりスパツター法、蒸
着法の方が非晶質化が容易であるので、(),
(),()で述べた組成範囲のものとこの希土
類元素とを組合せれば一層容易に非晶質薄膜が作
成されることは言うまでなく、それらの望ましい
組成範囲は
() M′aNbbTdRf
71≦a<94,6b<20,0.1d<5,0.1
f<5
である。これらの組成の非晶質合金薄膜をスパツ
ター法によりMn―Znフエライト基板上に厚さ20
μm形成し、V.T.Rデツキを用いてフエライトと
偏摩摩耗を調べ、第4表に代表的な組成のものの
結晶化温度Txと摩耗試験結果を示す。偏摩耗量
は、Coドープのγテープを用いて上述のフエラ
イト、非晶質複合体ダミーヘツドを装着したV.
T.Rデツキを100時間走行させ、フエライト面に
比較して非晶質部のくぼみ量を測定した。第5図
に実験方法を図示している。[Table] Also, Figure 4 shows the results when various rare earth elements are added.
The change in Hc is shown. As mentioned above, adding a small amount of rare earth elements is extremely effective when creating a Co--Nb amorphous thin film by sputtering or vapor deposition. In addition, since it is generally easier to make amorphous by sputtering method or vapor deposition method than by ultra-quenching method, (),
It goes without saying that an amorphous thin film can be created more easily by combining the composition ranges mentioned in () and () with this rare earth element, and their desirable composition range is () M′ a Nb b T d R f 71≦a<94, 6b<20, 0.1d<5, 0.1
f<5. An amorphous alloy thin film with these compositions was deposited on a Mn-Zn ferrite substrate to a thickness of 20 mm using a sputtering method.
The crystallization temperature T x and wear test results of typical compositions are shown in Table 4. The amount of uneven wear was determined by the V.
The TR deck was run for 100 hours, and the amount of depression in the amorphous area was measured compared to the ferrite surface. FIG. 5 illustrates the experimental method.
【表】
第5図において、第5図aはV.T.Rのダミーヘ
ツドチツプの先端部を示し、左側は正面図、右側
は側面図を示す。同図において、1,2はフエラ
イト部を、3は非晶質スパツター膜を、4はテー
プ摺動面を示す。第5図bはダミーヘツドチツプ
の摩耗状況を示すもので、△lはその偏摩耗量を
示す。
第4表の実験結果からもわかるように、本発明
非晶質合金は結晶化温度も高く、耐摩耗特性に優
れておりVTR用ヘツドコアにも使用できる材料
である。又本発明非晶質合金はNbが不働態膜を
形成するので、耐蝕性にも優れている。又希土類
元素の添加はスパツター法や蒸着法で非晶質膜を
形成する場合、得られる合金の結晶化温度を上昇
させる効果を有する。
以上述べたように本発明の磁性金属元素とNb
を主成分とする非晶質合金は、高飽和磁束密度と
軟磁気特性を有する他、極めて優れた耐摩耗性、
耐蝕性を有し、磁気ヘツド用コア材に最適の合金
である。[Table] In Fig. 5, Fig. 5a shows the tip of a dummy head chip of a VTR, with the left side showing a front view and the right side showing a side view. In the figure, 1 and 2 are ferrite parts, 3 is an amorphous sputtered film, and 4 is a tape sliding surface. FIG. 5b shows the state of wear of the dummy head chip, and Δl indicates the amount of uneven wear. As can be seen from the experimental results in Table 4, the amorphous alloy of the present invention has a high crystallization temperature and excellent wear resistance, making it a material that can be used for head cores for VTRs. Furthermore, since Nb forms a passive film in the amorphous alloy of the present invention, it also has excellent corrosion resistance. Furthermore, when an amorphous film is formed by sputtering or vapor deposition, the addition of rare earth elements has the effect of increasing the crystallization temperature of the resulting alloy. As described above, the magnetic metal element of the present invention and Nb
In addition to having high saturation magnetic flux density and soft magnetic properties, the amorphous alloy whose main component is
This alloy has corrosion resistance and is ideal for core material for magnetic heads.
第1図は非晶質合金の耐摩耗特性と含まれるB
量との相関特性を示す図、第2図は(Co.855Nb.
145)100-xBx(X=2,5,10,12)及び
Co75Si10B15の1mol NaCl溶液中での腐蝕電圧電流
曲線を示す図、第3図は非晶質合金(Co.855Nb.
145)100-xTxの飽和磁束密度Bsの変化を示す図、
第4図は(Co.855Nb.145)100-xRxのHcの変化を示
す図、第5図はスパツター膜の偏摩耗測定法を示
す図である。
1,2……フエライト、3……非晶質スパツタ
ー膜、4……テープ摺動面。
Figure 1 shows the wear resistance properties of amorphous alloys and the B contained in them.
Figure 2 shows the correlation characteristics with the amount of (Co. 855 Nb.
145 ) 100-x B x (X=2, 5, 10, 12) and
Figure 3 shows the corrosion voltage-current curve of Co 75 Si 10 B 15 in a 1 mol NaCl solution. Figure 3 shows an amorphous alloy (Co. 855 Nb.
145 ) Diagram showing the change in saturation magnetic flux density B s of 100-x T x ,
FIG. 4 is a diagram showing changes in Hc of (Co. 855 Nb. 145 ) 100-x R x , and FIG. 5 is a diagram showing a method for measuring uneven wear of a sputtered film. 1, 2... Ferrite, 3... Amorphous sputter film, 4... Tape sliding surface.
Claims (1)
6ないし20原子%のNbとからなることを特徴と
する非晶質磁性合金。 但し、MはFe,Co,Ni,Mn,Cr,Mo,Wか
らなる群から選ばれた1種または2種以上の金属
元素。 2 本質的に76ないし94原子%の金属元素Mと、
6ないし20原子%のNbと、0.1ないし5原子%未
満の金属元素Tとからなることを特徴とする非晶
質磁性合金。 但し、MはFe,Co,Ni,Mn,Cr,Mo,Wか
らなる群から選ばれた1種または2種以上の金属
元素、TはTi,Zr,Hf,V,Taからなる群から
選ばれた1種または2種以上の金属元素。 3 本質的に76ないし94原子%の金属元素Mと、
6ないし20原子%のNbと、Yと希土類元素を0.1
ないし5原子%未満とからなることを特徴とする
非晶質磁性合金。 但し、MはFe,Co,Ni,Mn,Cr,Mo,Wか
らなる群から選ばれた1種または2種以上の金属
元素。 4 本質的に71ないし94原子%の金属元素Mと、
6ないし20原子%のNbと、0.1ないし5原子%未
満の金属元素Tと、Yと希土類元素を0.5ないし
5原子%未満とからなることを特徴とする非晶質
磁性合金。 但し、MはFe,Co,Ni,Mn,Cr,Mo,Wか
らなる群から選ばれた1種または2種以上の金属
元素、TはTi,Zr,Hf,V,Taからなる群から
選ばれた1種または2種以上の金属元素。[Claims] 1. essentially 80 to 94 atomic % of a metal element M;
An amorphous magnetic alloy characterized by comprising 6 to 20 atomic percent Nb. However, M is one or more metal elements selected from the group consisting of Fe, Co, Ni, Mn, Cr, Mo, and W. 2 essentially 76 to 94 atomic % of the metallic element M;
An amorphous magnetic alloy comprising 6 to 20 atomic percent Nb and 0.1 to less than 5 atomic percent metallic element T. However, M is one or more metal elements selected from the group consisting of Fe, Co, Ni, Mn, Cr, Mo, and W, and T is selected from the group consisting of Ti, Zr, Hf, V, and Ta. One or more metal elements. 3 essentially 76 to 94 atomic % of the metallic element M;
6 to 20 atomic% Nb, Y and rare earth elements 0.1
An amorphous magnetic alloy characterized in that it consists of from 5 at. However, M is one or more metal elements selected from the group consisting of Fe, Co, Ni, Mn, Cr, Mo, and W. 4 essentially 71 to 94 atomic % of the metallic element M;
1. An amorphous magnetic alloy comprising 6 to 20 atomic % of Nb, 0.1 to less than 5 atomic % of metallic element T, and 0.5 to less than 5 atomic % of Y and a rare earth element. However, M is one or more metal elements selected from the group consisting of Fe, Co, Ni, Mn, Cr, Mo, and W, and T is selected from the group consisting of Ti, Zr, Hf, V, and Ta. One or more metal elements.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56181723A JPS5884957A (en) | 1981-11-14 | 1981-11-14 | Amorphous magnetic alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56181723A JPS5884957A (en) | 1981-11-14 | 1981-11-14 | Amorphous magnetic alloy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5884957A JPS5884957A (en) | 1983-05-21 |
| JPS6238424B2 true JPS6238424B2 (en) | 1987-08-18 |
Family
ID=16105745
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56181723A Granted JPS5884957A (en) | 1981-11-14 | 1981-11-14 | Amorphous magnetic alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5884957A (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59193235A (en) * | 1983-04-15 | 1984-11-01 | Hitachi Ltd | Composite magnetic head |
| JPS60135546A (en) * | 1983-12-22 | 1985-07-18 | Seiko Epson Corp | Amorphous soft magnetic alloy |
| JPS62120454A (en) * | 1985-11-20 | 1987-06-01 | Canon Electronics Inc | Amorphous alloy |
| JPH0699769B2 (en) * | 1986-05-22 | 1994-12-07 | 松下電器産業株式会社 | Thermal stability High magnetic flux density amorphous alloy |
| JPS6376846A (en) * | 1986-09-19 | 1988-04-07 | Kurasawa Kogaku Kogyo Kk | Amorphous magnetic alloy |
| JPS63100178A (en) * | 1986-10-15 | 1988-05-02 | Tokin Corp | Sputtering target |
| US6494056B1 (en) | 2002-04-23 | 2002-12-17 | Hank Roth | Method and system for use with a consumable beverage |
| KR100440243B1 (en) | 2002-04-23 | 2004-07-12 | 돈나 로쓰 | Method and system for use with a consumable beverage |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2924280A1 (en) * | 1979-06-15 | 1981-01-08 | Vacuumschmelze Gmbh | AMORPHE SOFT MAGNETIC ALLOY |
| JPS5633453A (en) * | 1979-08-27 | 1981-04-03 | Takeshi Masumoto | Iron-base amorphous alloy having high magnetic flux density and small magnetostriction |
| JPS5672153A (en) * | 1979-11-14 | 1981-06-16 | Takeshi Masumoto | Amorphous iron alloy of high permeability |
| JPS56105454A (en) * | 1980-01-23 | 1981-08-21 | Matsushita Electric Ind Co Ltd | Amorphous alloy |
| JPS56116854A (en) * | 1980-02-21 | 1981-09-12 | Takeshi Masumoto | Noncrystalline alloy having low thermal expansion coefficient |
| JPS56130449A (en) * | 1980-03-19 | 1981-10-13 | Takeshi Masumoto | Amorphous cobalt alloy with very low magnetostriction and high permeability |
-
1981
- 1981-11-14 JP JP56181723A patent/JPS5884957A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5884957A (en) | 1983-05-21 |
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