JPS6239401B2 - - Google Patents
Info
- Publication number
- JPS6239401B2 JPS6239401B2 JP11956279A JP11956279A JPS6239401B2 JP S6239401 B2 JPS6239401 B2 JP S6239401B2 JP 11956279 A JP11956279 A JP 11956279A JP 11956279 A JP11956279 A JP 11956279A JP S6239401 B2 JPS6239401 B2 JP S6239401B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- refractive index
- prism
- dielectric
- semi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 75
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 15
- 229910052709 silver Inorganic materials 0.000 claims description 15
- 239000004332 silver Substances 0.000 claims description 15
- 239000003989 dielectric material Substances 0.000 claims description 6
- 238000002834 transmittance Methods 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 7
- 230000031700 light absorption Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000012790 adhesive layer Substances 0.000 description 4
- 238000007496 glass forming Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910001610 cryolite Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Viewfinders (AREA)
- Optical Elements Other Than Lenses (AREA)
- Optical Filters (AREA)
Description
技術分野
本発明は、カメラの二重像合致式距離計フアイ
ンダーの光学系などに用いられるプリズム式の半
透過鏡に関する。
従来技術
従来、２個のプリズムを接合し、該接合面に光
半透過用の薄膜部を設ける構成の半透過鏡におい
て、該薄膜部は、金属薄膜を用いたものと、複数
の誘電体薄膜の組み合わせよりなる薄膜を用いた
ものとがある。前者の場合には、金属薄膜の膜厚
を変えることにより透過率と反射率との比をコン
トロールすることができるし、偏光に対する影響
も少ないという利点はあるものの、光を吸収する
現象を伴うために効率が悪いという欠点がある。
後者の場合には、光の吸収がないという利点はあ
るものの、偏光に対する影響が大きく、更に、透
過光量と反射光量との比のコントロールが困難
で、特に、反射光量を透過光量よりも多くするこ
とが困難である。
更に、USP3559090号によつて、金属薄膜の両
側を1.8〜2.5の高屈折率を有する誘電体薄膜でサ
ンドイツチするように構成して、偏光に対する影
響を金属薄膜のみの場合よりも更に少なくしたも
のが提案されているが、光を吸収する現象につい
ては改善されていない。
目 的
本発明は、上述のような従来の種々の欠点に鑑
みてなされたものであり、その目的は、光学的性
能のバランスのよい半透過鏡を提供することにあ
る。
発明の要旨
上記目的を達成するために、本発明は、２個の
プリズムの接合面に設けられる光半透過用の薄膜
部の構成を、該薄膜部によつて反射される反射光
の通るプリズム側より他方のプリズム側へ、該プ
リズムの屈折率より低い屈折率を有する誘電体か
らなる誘電体薄膜、銀薄膜、該プリズムの屈折率
より高い屈折率を有する誘電体からなる誘電体薄
膜の順に構成した半透過鏡を提供するものであ
る。
実施例
第１図は、本発明の一実施例を示しており、第
１図において、ＰR，ＰTは互いに同屈折率を有す
るガラスからなる２個の直角プリズムであり、該
直角プリズムＰR，ＰTの互いの接合面に接着剤層
６と薄膜部Ｄとが設けられている。２個の直角プ
リズムＰR，ＰTのうち、入射光線ＩLが薄膜部Ｄ
によつて反射光線ＲLと透過光線ＴLとに分けられ
るとして、反射光線ＲLが通る方の直角プリズム
をＰR、他方の直角プリズムをＰTとする。薄膜部
Ｄの構成は、直角プリズムＰRの側から直角プリ
ズムＰTの側へ順に、直角プリズムＰR，ＰTを構
成するガラスの屈折率より低い屈折率を有する誘
電体からなる低屈折率誘電体薄膜Ｌ、銀薄膜
Ag、直角プリズムＰR，ＰTを構成するガラスの
屈折率より高い屈折率を有する誘電体からなる高
屈折率誘電体薄膜Ｈとなつている。
このような構成の半透過鏡を製造するには、ま
ず直角プリズムＰTに高屈折率誘電体薄膜Ｈを蒸
着し、その上に銀薄膜Agを蒸着し、その上に低
屈折率誘電体薄膜Ｌを蒸着して、最後に直角プリ
ズムＰTと直角プリズムＰRとを接着剤で接着すれ
ばよい。
低屈折率誘電体薄膜Ｌに用いられる誘電体は、
MgF2、チオライト、氷晶石など、直角プリズム
ＰR，ＰTを形成するガラスの屈折率よりも低い屈
折率を有するものであればよいが、稠密性が高く
て銀薄膜Agをよく保護するものが好ましい。高
屈折率誘電体薄膜Ｈに用いられる誘電体は、
ZnS、CeO2、ZrO2、TiO2など、直角プリズムＰ
R，ＰTを形成するガラスの屈折率よりも屈折率を
有するものであればよいが、屈折率が高いものを
用いるほど光の吸収を少なくすることができる。
接着剤層６は、薄膜部Ｄと直角プリズムＰTと
の間に設けてもよいが、そのように構成しようと
すれば、直角プリズムＰRに低屈折率誘電体薄膜
Ｌ、銀薄膜Ag、高屈折率誘電体薄膜Ｈの順に蒸
着して、その後直角プリズムＰRと直角プリズム
ＰTとを接着しなければならなくなり、高屈折率
誘電体薄膜Ｈの蒸着には基板温度をある程度まで
上げる必要があるので銀薄膜Agの蒸着前の方が
望ましく、従つて、接着剤層６は、直角プリズム
ＰRと薄膜部Ｄとの間の方が好ましい。
第２図は、第１図に示した半透過鏡を二重像合
致式距離計フアインダーの光学系に用いた適用例
を示すもので、逆ガリレオ系を構成するレンズ８
とレンズ１０との間に第１図の実施例の半透過鏡
を配置し、該半透過鏡によつて、レンズ８を通過
した撮影範囲観察用光線を透過させてレンズ１０
に導くとともに、反射ミラー１２によつて反射さ
れ中空ミラー１４を通過し像合致用可動レンズ１
６を透過した測距用光線、及び、視野枠表示窓１
８から入射し中空ミラー１４によつて反射されレ
ンズ２０を透過した撮影範囲表示用光線を反射し
てレンズ１０に導くように構成したものである。
第２図において、半透過鏡を透過する光線は、直
角プリズムＰTから入射し薄膜部Ｄを透過し直角
プリズムＰRを通つて該半透過鏡から射出するよ
うに構成されており、これは、直角プリズムＰ
R、薄膜部Ｄ、直角プリズムＰTの順に透過光線が
通る第１図の場合と光路が全く逆になつている
が、透過光線は各物質を通る順序によつてその性
質が変化しないので、第１図の実施例を第２図の
ように用いても問題はない。薄膜部Ｄによつて反
射される光線の通る順序は、第１図の場合と第２
図の場合と全く同様である。
本実施例の効果を示すために、第１図の銀薄膜
Agの両側の誘電体薄膜をいろいろかえて、薄膜
部Ｄの透過率及び反射率などを計算した結果が第
１表に示されている。第１表は、薄膜部Ｄの構成
を直角プリズムＰRの側から直角プリズムＰTの側
へ順に、
Ｌ―Ag―Ｈとした場合
Ｈ―Ag―Ｌとした場合
Ｌ―Ag―Ｌとした場合
TECHNICAL FIELD The present invention relates to a prism-type semi-transmissive mirror used in the optical system of a double-image matching rangefinder finder of a camera. Prior Art Conventionally, in a semi-transmitting mirror configured by joining two prisms and providing a thin film part for semi-transmitting light on the joined surface, the thin film part is made of a metal thin film or a plurality of dielectric thin films. There is one that uses a thin film made of a combination of the following. In the former case, the ratio of transmittance and reflectance can be controlled by changing the thickness of the metal thin film, and although it has the advantage of having little effect on polarization, it also involves the phenomenon of light absorption. has the disadvantage of being inefficient.
In the latter case, although it has the advantage of not absorbing light, it has a large effect on polarization, and furthermore, it is difficult to control the ratio between the amount of transmitted light and the amount of reflected light, especially when the amount of reflected light is greater than the amount of transmitted light. It is difficult to do so. Furthermore, according to USP 3559090, a dielectric thin film having a high refractive index of 1.8 to 2.5 is sandwiched between both sides of the metal thin film to reduce the effect on polarization even more than when using only the metal thin film. Although it has been proposed, the phenomenon of light absorption has not been improved. Purpose The present invention has been made in view of the various drawbacks of the conventional art as described above, and its purpose is to provide a semi-transmissive mirror with well-balanced optical performance. SUMMARY OF THE INVENTION In order to achieve the above object, the present invention provides a configuration of a thin film part for semi-transmitting light provided at the joining surface of two prisms to a prism through which reflected light reflected by the thin film part passes. from one side to the other prism side, in this order: a dielectric thin film made of a dielectric material having a refractive index lower than the refractive index of the prism, a silver thin film, and a dielectric thin film made of a dielectric material having a refractive index higher than the refractive index of the prism. The present invention provides a semi-transparent mirror having the following structure. Embodiment FIG. 1 shows an embodiment of the present invention. In FIG. 1, P R and P T are two right angle prisms made of glass having the same refractive index, and the right angle prism P An adhesive layer 6 and a thin film portion D are provided on the joint surfaces of R and PT . Of the two right angle prisms P R and P T , the incident light beam I L is directed to the thin film portion D
Assuming that the light beam is divided into a reflected light beam R L and a transmitted light beam T L by , let P R be the right-angle prism through which the reflected light R L passes, and P T be the other right-angle prism. The structure of the thin film portion D is such that, in order from the right angle prism P R side to the right angle prism PT side, a low refractive index film made of a dielectric material having a refractive index lower than the refractive index of the glass constituting the right angle prisms P R and PT is formed. Dielectric thin film L, silver thin film
The high refractive index dielectric thin film H is made of Ag, a dielectric material having a refractive index higher than the refractive index of the glass constituting the right angle prisms P R and PT . To manufacture a semi-transmissive mirror with such a configuration, first, a high refractive index dielectric thin film H is deposited on the right angle prism P T , a silver thin film Ag is deposited on it, and a low refractive index dielectric thin film is deposited on top of it. After L is vapor-deposited, the right-angle prism P T and the right-angle prism P R are finally bonded together with an adhesive. The dielectric used for the low refractive index dielectric thin film L is:
Any material such as MgF 2 , thiolite, or cryolite may be used as long as it has a refractive index lower than that of the glass forming the rectangular prisms P R and P T , but it is highly dense and protects the silver thin film Ag well. Preferably. The dielectric used for the high refractive index dielectric thin film H is
Right angle prism P such as ZnS, CeO 2 , ZrO 2 , TiO 2
Any material having a refractive index higher than that of the glass forming R and P T may be used, but the higher the refractive index used, the less light absorption can be achieved. The adhesive layer 6 may be provided between the thin film portion D and the right angle prism P T , but if such a structure is intended, the right angle prism P R is provided with a low refractive index dielectric thin film L, a silver thin film Ag, The high refractive index dielectric thin film H must be deposited in this order, and then the right angle prism P R and the right angle prism P T must be bonded, and it is necessary to raise the substrate temperature to a certain level to deposit the high refractive index dielectric thin film H. Therefore, it is preferable to place the adhesive layer 6 between the rectangular prism PR and the thin film portion D before the vapor deposition of the silver thin film Ag. Figure 2 shows an example in which the semi-transmissive mirror shown in Figure 1 is used in the optical system of a double-image matching rangefinder finder.
The semi-transmissive mirror of the embodiment shown in FIG.
It is reflected by the reflection mirror 12 and passes through the hollow mirror 14 to form the image matching movable lens 1
6 and the field frame display window 1
The photographing range displaying light beam is incident from the hollow mirror 14, reflected by the hollow mirror 14, and transmitted through the lens 20, so as to be reflected and guided to the lens 10.
In FIG. 2, the light beam passing through the semi-transmissive mirror is configured to enter from a right-angle prism P T , pass through a thin film portion D, pass through a right-angle prism P R , and exit from the semi-transmissive mirror. , right angle prism P
Although the optical path is completely reversed from the case in Figure 1 where the transmitted light passes through R , the thin film portion D, and the rectangular prism PT in this order, the properties of the transmitted light do not change depending on the order in which it passes through each substance, so There is no problem even if the embodiment shown in FIG. 1 is used as shown in FIG. The order in which the light rays reflected by the thin film portion D pass is the same as in the case of Fig. 1 and in the case of Fig. 2.
It is exactly the same as the case shown in the figure. In order to demonstrate the effect of this example, the silver thin film shown in FIG.
Table 1 shows the results of calculating the transmittance and reflectance of thin film portion D by changing the dielectric thin films on both sides of Ag. Table 1 shows the configuration of the thin film portion D in order from the right-angle prism P R side to the right-angle prism P T side: L-Ag-H, H-Ag-L, L-Ag-L. case
【表】
Ｈ―Ag―Ｈとした場合
及び比較のために、
Agのみの場合
の５つの場合について薄膜部Ｄの反射率及び透過
率の変化などを計算したものである。
計算に際して、銀薄膜Agの屈折率を0.13、吸
収係数を25.4とし、基準波長をλとして高屈折率
誘電体薄膜Ｈ及び低屈折率誘電体薄膜Ｌの膜厚を
λ／４とし、高屈折率誘電体薄膜Ｈの屈折率を
2.1とし、低屈折率誘電体薄膜Ｌの屈折率を1.38
として、銀薄膜Agの膜厚は薄膜部Ｄにおける透
過率Ｔと反射率Ｒとの比が、Ｔ：Ｒ≒１：1.5に
なるように設定した。第１表において、Ｒは反射
率、Ｔは透過率をそれぞれ示し、Ｐは入射面に平
行な面内の偏光成分に関する反射率あるいは透過
率を、Ｓは入射面に垂直な面内の偏光成分に関す
る反射率あるいは透過率をそれぞれ示している。
最下行は、Agの幾何学的の膜厚を示すものであ
る。第１表は、薄膜部Ｄへの光線の入射角を45゜
±15゜にして計算を行なつたものであるが、これ
を35゜±10゜及び55゜±10゜にして計算してもほ
ぼ同様の傾向を示す。尚、誘電体薄膜Ｈ，Ｌの薄
膜をλ／４より厚め（例えば0.3λ）にすると、
薄膜部Ｄにおける光の吸収はやや少なくなるが、
銀薄膜Agの反射特性が短波長側でややフラツト
でないので、誘電体薄膜Ｈ，Ｌの薄膜をλ／４よ
りやや薄めにして薄膜部Ｄにおける反射特性をフ
ラツトにした方がよい。
なお、誘電体薄膜のみの組合せからなるものに
ついては、上記〜のように透過率よりも反射
率を高くすることが困難であるので、はじめから
比較の対象外とした。
第１表を見ると、の場合が〜の場合に比
較して、Ｒ＋Ｔが比較的大きいために光の吸収が
少ないことがわかり、更に、入射角の変化による
反射率Ｒや透過率Ｔの変化が少なく、反射率Ｒあ
るいは透過率ＴにおいてＰとＳが大きく異ならな
いので偏光に対する影響が少ないこともわかるの
で、の場合すなわち薄膜部の構成をＬ―Ag―
Ｈとした場合が、他の場合に比べて光学的性能の
バランスが良いことがわかる。
効 果
本発明のように、２個のプリズムを接合し、該
接合面に光半透過用の薄膜部を設ける構成の半透
過鏡において、該薄膜部の構成を、該薄膜部によ
つて反射される反射光が通る側のプリズム側より
他方のプリズム側へ、該プリズムの屈折率より低
い屈折率を有する誘電体薄膜に次いで銀薄膜を配
し、次いで該プリズムの屈折率より高い屈折率を
有する誘電体薄膜を配するように構成することに
よつて、光の吸収が少なく、偏光に対する影響も
少なく、更に、透過及び反射特性を可視光線の波
長全域にわたつてほぼフラツトすることができ、
更に、前記薄膜部への光線の入射角の変化による
透過率と反射率との比の変化も少ないなど、光学
的性能のバランスのよい半透過鏡を得ることがで
きる。更に、本発明の半透過鏡は、薄膜部の銀薄
膜の膜厚を変えることにより透過率と反射率との
比を容易にコントロールすることができる。[Table] Changes in reflectance and transmittance of thin film portion D are calculated for five cases: H-Ag-H and, for comparison, only Ag. In the calculation, the refractive index of the silver thin film Ag is 0.13, the absorption coefficient is 25.4, the reference wavelength is λ, the film thickness of the high refractive index dielectric thin film H and the low refractive index dielectric thin film L is λ/4, and the high refractive index The refractive index of the dielectric thin film H is
2.1, and the refractive index of the low refractive index dielectric thin film L is 1.38.
The thickness of the silver thin film Ag was set so that the ratio of the transmittance T to the reflectance R in the thin film portion D was T:R≈1:1.5. In Table 1, R is the reflectance, T is the transmittance, P is the reflectance or transmittance for the polarized light component in the plane parallel to the plane of incidence, and S is the polarized light component in the plane perpendicular to the plane of incidence. The reflectance or transmittance for each is shown.
The bottom row shows the geometric thickness of Ag. In Table 1, calculations were performed with the angle of incidence of the light beam on the thin film portion D being 45° ± 15°, but calculations were performed using angles of incidence of 35° ± 10° and 55° ± 10°. shows almost the same tendency. Note that if the dielectric thin films H and L are made thicker than λ/4 (for example, 0.3λ),
Although the absorption of light in the thin film portion D is slightly reduced,
Since the reflection characteristics of the silver thin film Ag are not quite flat on the short wavelength side, it is better to make the dielectric thin films H and L slightly thinner than λ/4 so that the reflection characteristics in the thin film portion D are flat. In addition, since it is difficult to make the reflectance higher than the transmittance as described in ~ above, the combination of only dielectric thin films was excluded from the comparison from the beginning. Looking at Table 1, it can be seen that in the case of , compared to the case of ~, there is less absorption of light because R+T is relatively large, and furthermore, the reflectance R and transmittance T change due to changes in the angle of incidence. It can be seen that there is little influence on polarized light because P and S do not differ greatly in reflectance R or transmittance T.
It can be seen that the case of H has a better balance of optical performance than the other cases. Effects As in the present invention, in a semi-transmitting mirror having a structure in which two prisms are joined and a thin film part for semi-transmitting light is provided on the joining surface, the structure of the thin film part is reflected by the thin film part. A dielectric thin film having a refractive index lower than the refractive index of the prism is disposed, followed by a silver thin film, from the side of the prism through which the reflected light passes through to the other prism side, and then a silver thin film is disposed with a refractive index higher than the refractive index of the prism. By arranging a dielectric thin film having the following characteristics, light absorption is small, the influence on polarization is small, and the transmission and reflection characteristics can be made almost flat over the entire wavelength range of visible light.
Furthermore, it is possible to obtain a semi-transmissive mirror with well-balanced optical performance, such as a small change in the ratio of transmittance and reflectance due to a change in the angle of incidence of the light beam on the thin film portion. Further, in the semi-transmissive mirror of the present invention, the ratio of transmittance to reflectance can be easily controlled by changing the thickness of the silver thin film in the thin film portion.
第１図は発明の一実施例を示す図、第２図は第
１図の実施例の半透過鏡をカメラのフアインダー
光学系に適用した適用例を示す図である。
Ｄ；薄膜部、Ag；銀薄膜、ＲR，ＰT；プリズ
ム、６；接着剤層、Ｌ；プリズムを形成するガラ
スの屈折率より低い屈折率を有する誘電体からな
る誘電体薄膜、Ｈ；プリズムを形成するガラスの
屈折率より高い屈折率を有する誘電体からなる誘
電体薄膜。
FIG. 1 is a diagram showing one embodiment of the invention, and FIG. 2 is a diagram showing an application example in which the semi-transmissive mirror of the embodiment of FIG. 1 is applied to a finder optical system of a camera. D: Thin film portion, Ag: Silver thin film, R R , P T ; Prism, 6: Adhesive layer, L: Dielectric thin film made of a dielectric having a refractive index lower than the refractive index of the glass forming the prism, H; A dielectric thin film made of a dielectric material with a refractive index higher than that of the glass forming the prism.
Claims (1)
過用の薄膜部を設ける構成の半透過鏡において、
該薄膜部が、該薄膜部によつて反射される反射光
の通るプリズム側より他方のプリズム側へ、Ｌ―
Ag―Ｈの順に構成されていることを特徴とする
半透過鏡； 但し、ここで、 Ｌ：前記プリズムより低い屈折率を有する誘電
体からなる誘電体薄膜、 Ag：銀薄膜、 Ｈ：前記プリズムより高い屈折率を有する誘電
体からなる誘電体薄膜、 である。[Claims] 1. A semi-transparent mirror configured by bonding two prisms and providing a thin film portion for semi-transmitting light on the bonded surface,
The thin film portion extends from the prism side through which reflected light reflected by the thin film portion passes to the other prism side.
A semi-transmissive mirror characterized by being configured in the order of Ag--H; however, here, L: a dielectric thin film made of a dielectric having a lower refractive index than the prism, Ag: a silver thin film, H: the prism A dielectric thin film made of a dielectric material having a higher refractive index.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11956279A JPS5643601A (en) | 1979-09-17 | 1979-09-17 | Semipermeable mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11956279A JPS5643601A (en) | 1979-09-17 | 1979-09-17 | Semipermeable mirror |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5643601A JPS5643601A (en) | 1981-04-22 |
| JPS6239401B2 true JPS6239401B2 (en) | 1987-08-22 |
Family
ID=14764392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11956279A Granted JPS5643601A (en) | 1979-09-17 | 1979-09-17 | Semipermeable mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5643601A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58159512U (en) * | 1982-04-20 | 1983-10-24 | 株式会社東芝 | Laser beam synthesizer |
| JPH0619482B2 (en) * | 1983-07-26 | 1994-03-16 | ミノルタカメラ株式会社 | Prism beam splitter |
-
1979
- 1979-09-17 JP JP11956279A patent/JPS5643601A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5643601A (en) | 1981-04-22 |
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