JPS6242865B2 - - Google Patents
Info
- Publication number
- JPS6242865B2 JPS6242865B2 JP19193984A JP19193984A JPS6242865B2 JP S6242865 B2 JPS6242865 B2 JP S6242865B2 JP 19193984 A JP19193984 A JP 19193984A JP 19193984 A JP19193984 A JP 19193984A JP S6242865 B2 JPS6242865 B2 JP S6242865B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- base material
- hydrogen
- flow rate
- burner
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C03B37/0142—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/06—Concentric circular ports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
- C03B2207/24—Multiple flame type, e.g. double-concentric flame
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は気相軸付法（VAD法）により光フア
イバ用母材を製造する方法に関し、とくに燃焼バ
ーナに送り込まれるガラス原料の反応効率を向上
させ、多孔質ガラス母材の合成速度を上げるとと
もに多孔質ガラス母材へのガラス微粒子付着効率
を向上させる光フアイバ用母材の製造方法に関す
るものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing an optical fiber base material by the vapor deposition method (VAD method), and in particular, to improve the reaction efficiency of the glass raw material fed into the combustion burner. The present invention relates to a method for producing an optical fiber preform, which increases the synthesis rate of the porous glass preform and improves the efficiency of adhering glass fine particles to the porous glass preform.
一般にVAD法により光フアイバ用母材を製造
する場合、バーナから燃焼ガス、ガラス原料およ
びドーパント原料を混合噴出し、酸水素火炎中に
おいてガラス原料およびドーパント原料の加水分
解反応により生じたガラス微粒子を回転する出発
部材の表面に堆積させ、多孔質ガラス母材を製造
する方法が用いられている。
Generally, when manufacturing optical fiber base materials by the VAD method, combustion gas, glass raw materials, and dopant raw materials are mixed and ejected from a burner, and glass fine particles produced by a hydrolysis reaction of the glass raw materials and dopant raw materials are rotated in an oxyhydrogen flame. A method is used in which a porous glass base material is produced by depositing it on the surface of a starting member.
通常燃焼バーナとしては、複数のノズルを有す
る同心円状多重管バーナが用いられ、ガラス原料
としてSiCl4、ドーパント原料としてGeCl4、燃焼
ガスとしてH2，O2が用いられる。ガラス原料お
よびドーパント原料であるSiCl4およびGeCl4は火
炎中で次に示す(1)式および(2)式により加水分解反
応をおこし、ガラス微粒子を生成する。 A concentric multi-tube burner having a plurality of nozzles is normally used as a combustion burner, and SiCl 4 is used as a glass raw material, GeCl 4 is used as a dopant raw material, and H 2 and O 2 are used as combustion gases. SiCl 4 and GeCl 4 , which are glass raw materials and dopant raw materials, undergo a hydrolysis reaction in a flame according to the following equations (1) and (2) to produce glass particles.
SiCl4＋H2O→SiO2＋HCl …(1)
GeCl4＋H2O→GeO2＋HCl …(2)
このガラス微粒子が多孔質ガラス母材の堆積面
上に付着し、堆積していく。このとき、多孔質ガ
ラス母材の硬さおよびドーパントの固溶分布は、
ガラス微粒子の温度および火炎温度分布に依存し
ている。すなわち合成用バーナにより形成される
火炎の状態が重要な役割をはたす。とくに合成速
度を上げ、大形の母材を製造する場合には、火炎
内温度分布の制御がさらに重要となる。そこで火
炎内温度分布を制御する一つの手段として多重管
バーナを用い、燃焼ガスとしての酸素ガスと水素
ガスにより形成される火炎面を２個以上形成する
方法がある（たとえば、昭和59年度電子通信学会
総合全国大会、No.1138、Ｉ−ECL、須田他：
VAD法による母材高速合成）。この方法による
と、合成バーナの中心部に形成される火炎により
前述した加水分解反応の(1)，(2)式が支持され、さ
らに合成バーナの外側に形成される火炎により火
炎内温度分布の制御がなされることになる。 SiCl 4 +H 2 O→SiO 2 +HCl…(1) GeCl 4 +H 2 O→GeO 2 +HCl…(2) These glass particles adhere to and accumulate on the deposition surface of the porous glass base material. At this time, the hardness of the porous glass base material and the solid solution distribution of the dopant are as follows:
It depends on the temperature of the glass particles and the flame temperature distribution. That is, the condition of the flame formed by the synthesis burner plays an important role. In particular, when increasing the synthesis rate and producing a large base material, controlling the temperature distribution within the flame becomes even more important. Therefore, as a means of controlling the temperature distribution within the flame, there is a method of using a multi-tube burner to form two or more flame surfaces formed by oxygen gas and hydrogen gas as combustion gas (for example, National Conference of Academic Societies, No. 1138, I-ECL, Suda et al.:
High-speed synthesis of base material using VAD method). According to this method, equations (1) and (2) of the hydrolysis reaction described above are supported by the flame formed in the center of the synthesis burner, and the temperature distribution within the flame is also controlled by the flame formed outside the synthesis burner. Control will be exercised.
合成用バーナにより形成される火炎面を２個以
上つくるためには、燃焼ガスとしての酸素ガスお
よび水素ガスの配置をたとえば第１図に示す構成
とする必要がある。この場合、第１図に示すよう
に、ガラス原料噴出ポート１０を中心に内側から
燃焼ガスとしての水素ガスおよび酸素ガスを噴出
するポートを不活性ガス、たとえばArガスをは
さんで２１−３１−４１−３２−２２−３３−４
２のように複数の火炎面、この例では３個の火炎
面を形成するよう配置する。このように火炎面を
２個以上つくる方法により多孔質ガラス母材の製
造を検討したところ、酸素ガスの噴出ポートをは
さんで内側および外側に配置した水素ガスの噴出
ポートから流出する水素ガスの流量がとくに重要
なパラメータとなつていることが判明した。すな
わち酸素ガスの外側に流出する水素ガスの流量が
少なく、したがつて外側の火炎が小さい場合に
は、中心部で生成したガラス原料のSiO2のガラ
ス微粒子が、流出路の外周部に拡散しやすく、収
率の著しい劣化をまねくことがわかつた。第２図
に検討の結果判明した酸素ガスに対して内側の水
素流量ＱH2１と外側の水素流量ＱH2２との比、す
なわちＱH2２／ＱH2１に対するガラス原料の母材
表面への収率の関係を示す。一般に気体中に存在
する粒子は、気体中の温度勾配に比例して温度の
低い方に力を受ける現象の起ることが知られてい
る（サーモホレシス効果）。外側の火炎が小さい
場合には、この現象および火炎が外乱の影響を受
けやすいことが収率の劣化に原因しているものと
考えられる。また水素流量が少ない場合には、合
成される多孔質ガラス母材の硬さ、すなわち密度
（嵩密度）が小さく、軟かい母材となり割れやす
くなる。これを補うために酸素ガス内側の水素流
量を増加すると、第３図に示すようにガラス原料
の煤粒子流５０の中心部に形成される内側炎５２
で加熱される多孔質ガラス母材の部分は硬くな
り、硬部を形成するが、外側炎５１で加熱され
る部分は軟かいガラス微粒子が堆積することとな
り軟部を形成する。なお第３図で１は多孔質ガ
ラス母材、２はバーナである。第３図に示す方法
で得られた多孔質ガラス母材は、第４図に示すよ
うなかさ密度分布が形成され、割れの原因とな
る。
In order to create two or more flame surfaces formed by the synthesis burner, it is necessary to arrange the oxygen gas and hydrogen gas as combustion gases as shown in FIG. 1, for example. In this case, as shown in FIG. 1, a port for ejecting hydrogen gas and oxygen gas as combustion gas from inside centering on the frit ejection port 10 is connected to a port 21-31- with an inert gas such as Ar gas in between. 41-32-22-33-4
2, the flame surfaces are arranged to form a plurality of flame surfaces, three flame surfaces in this example. When we investigated the production of a porous glass base material by creating two or more flame surfaces in this way, we found that the hydrogen gas flowing out from the hydrogen gas injection ports placed inside and outside the oxygen gas injection port was It turns out that the flow rate is a particularly important parameter. In other words, if the flow rate of hydrogen gas flowing out to the outside of oxygen gas is small, and therefore the flame on the outside is small, glass particles of SiO 2 , which is the glass raw material, generated in the center will diffuse to the outer periphery of the outflow path. It was found that it was easy to use, leading to a significant deterioration of the yield. Figure 2 shows the ratio of the inside hydrogen flow rate Q H2 1 to the outside hydrogen flow rate Q H2 2 for oxygen gas, which was found as a result of the study, that is, the ratio of the hydrogen flow rate to the base material surface of the glass raw material with respect to Q H2 2 /Q H2 1. The relationship between yields is shown. It is generally known that particles existing in a gas experience a phenomenon in which a force is applied to the lower temperature side in proportion to the temperature gradient in the gas (thermophoresis effect). When the outer flame is small, this phenomenon and the flame's susceptibility to disturbances are thought to be the cause of the yield degradation. Further, when the hydrogen flow rate is small, the hardness, that is, the density (bulk density) of the porous glass base material to be synthesized is low, and the base material becomes soft and easily cracked. When the hydrogen flow rate inside the oxygen gas is increased to compensate for this, an inner flame 52 is formed at the center of the soot particle flow 50 of the glass raw material, as shown in FIG.
The part of the porous glass base material heated by the outer flame 51 becomes hard and forms a hard part, but the part heated by the outer flame 51 has soft glass particles deposited thereon and forms a soft part. In FIG. 3, 1 is a porous glass base material, and 2 is a burner. In the porous glass base material obtained by the method shown in FIG. 3, a bulk density distribution as shown in FIG. 4 is formed, which causes cracks.
逆に酸素ガスの外側に位置する水素流量を増加
させていくと、火炎の温度が高くなり過ぎ、多孔
質ガラス母材の堆積面の先端部が過熱され、安定
な成長が得られなくなつてくる。すなわち第５図
に示すように、多孔質ガラス母材１の先端形状は
中心部に凹み３の形成された形となりやすい。ま
た、たとえ安定な成長が得られた場合でも、母材
先端部の温度が高くなり過ぎるため、母材中に形
成する屈折率分布を制御しにくくなる。 Conversely, if the flow rate of hydrogen outside the oxygen gas is increased, the temperature of the flame becomes too high, the tip of the deposition surface of the porous glass base material becomes overheated, and stable growth cannot be achieved. come. That is, as shown in FIG. 5, the shape of the tip of the porous glass base material 1 tends to be such that a recess 3 is formed in the center. Furthermore, even if stable growth is achieved, the temperature at the tip of the base material becomes too high, making it difficult to control the refractive index distribution formed in the base material.
〔問題点を解決するための手段）
本発明は以上述べた問題点を解決するため、燃
焼バーナに同心円状で複数の噴出ノズルを有する
多重管バーナを用い、中心部のノズルからガラス
原料を噴出させ、中心部から外周に燃焼ガスとし
ての水素ガス、酸素ガスを順次層状に噴出させて
多層の火炎面を形成させ、酸素ガスをはさんだ内
側および外側の水素ガスの水素流量ＱH2１および
ＱH2２の比、ＱH2２／ＱH2１を１≦ＱH2２／ＱH2
１≦５と設定することを特徴としている。[Means for Solving the Problems] In order to solve the above-mentioned problems, the present invention uses a multi-tube burner having a plurality of concentric jet nozzles as a combustion burner, and jets the glass raw material from the central nozzle. hydrogen gas and oxygen gas as combustion gas are ejected sequentially in layers from the center to the outer periphery to form a multilayered flame front, and the hydrogen flow rate of the hydrogen gas inside and outside with oxygen gas sandwiched between them is Q H2 1 and Q Ratio of H2 2, Q H2 2/Q H2 1 to 1≦Q H2 2/Q H2
It is characterized by setting 1≦5.
本発明により、多孔質ガラス母材の合成収率を
向上させ、安定に大形母材の合成を行うと同時
に、屈折率分布の制御が容易に行える。
According to the present invention, the synthesis yield of porous glass preforms can be improved, large-sized preforms can be synthesized stably, and at the same time, the refractive index distribution can be easily controlled.
本発明の燃焼ガスとしての酸素ガスの内側およ
び外側の水素流量比ＱH2２／ＱH2１を、１≦
2QH22／ＱH2１≦５に設定することにより、安定
した母材成長が実現できる。すなわち、第６図に
水素流量比ＱH2２／ＱH2１に対する収率をプロツ
トした結果を示す。第６図からＱH2２／ＱH2１＜
１となると収率が急激に劣化することが解る。ま
た第７図に水素流量比ＱH2２／ＱH2１に対し製造
した母材の歩留りを示す。第７図からＱH2２／Ｑ
H2１＞５の領域では、歩留りが急激に悪くなるこ
とが解つた。以下実施例について説明する。 The hydrogen flow rate ratio Q H2 2/Q H2 1 of the inside and outside of the oxygen gas as the combustion gas of the present invention is 1≦
By setting 2Q H2 2/Q H2 1≦5, stable base material growth can be achieved. That is, FIG. 6 shows the results of plotting the yield against the hydrogen flow rate ratio Q H2 2/Q H2 1. From Figure 6, Q H2 2/Q H2 1<
It can be seen that when the value becomes 1, the yield deteriorates rapidly. Further, FIG. 7 shows the yield of the base material manufactured for the hydrogen flow rate ratio Q H2 2/Q H2 1. From Figure 7, Q H2 2/Q
It was found that in the region of H2 1>5, the yield deteriorated rapidly. Examples will be described below.
実施例 １：
第１図に示す構成の同心円状８重管バーナを用
い、各ガス流の配置は第１図と同様の方法によ
り、第４ポート４１の酸素の内側の第２ポート２
１および外側の第６ポート２２からの水素流量Ｑ
H2２およびＱH2６の比、ＱH2６／ＱH2２＝0.8とし
て多孔質ガラス母材の製造を行つた。ガスの流量
条件は、それぞれの各ガス全体量として、燃焼ガ
スとしてはH2＝24l／min，O2＝41l／min，Ar＝
17l／min、ガラス原料およびドーパント原料とし
てはSiCl4＝1500cc／min，GeCl4＝230cc／minと
した。この結果、多孔質ガラス母材の製造はでき
たものの、収率は40％と非常に低い値であつた。
またかさ密度は第４図に示すようなものであつ
た。
Example 1: A concentric eight-pipe burner having the configuration shown in FIG. 1 was used, and each gas flow was arranged in the same manner as in FIG.
1 and the hydrogen flow rate Q from the outer 6th port 22
A porous glass base material was produced by setting the ratio of H2 2 and Q H2 6 as Q H2 6/Q H2 2 = 0.8. The gas flow conditions are: H2 = 24 l/min, O 2 = 41 l/min, Ar =
The glass raw materials and dopant raw materials were SiCl 4 =1500 cc/min and GeCl 4 =230 cc/min. As a result, although a porous glass base material could be produced, the yield was very low at 40%.
Moreover, the bulk density was as shown in FIG.
実施例 ２：
実施例１と同じ８重管構造のバーナで、各ガス
の流出配置およびガスの流量条件も同じとし、水
素流量比は、ＱH2６／ＱH2２＝3.3として多孔質
ガラス母材の製造を行つた。この結果、ガラス微
粒子の付着収率は72％と高い値が得られた。この
得られた多孔質ガラス母材を抵抗炉で脱水し、次
いで透明ガラス化して内部の屈折率を測定したと
ころ第８図に示すなめらかな分布を得ることがで
きた。Example 2: The burner had the same eight-pipe structure as Example 1, the outflow arrangement of each gas and the gas flow conditions were also the same, and the hydrogen flow rate ratio was set to Q H2 6/Q H2 2 = 3.3, and a porous glass matrix was used. Manufactured wood. As a result, a high adhesion yield of glass particles of 72% was obtained. The obtained porous glass base material was dehydrated in a resistance furnace, then made into transparent glass, and when the internal refractive index was measured, a smooth distribution as shown in FIG. 8 could be obtained.
実施例 ３：
実施例１と同じ８重管構造のバーナで、各ガス
の流出配置も同じとし、水素流量比は、ＱH2６／
ＱH2２＝6.5として多孔質ガラス母材の製造を行
つた。なおガスの流量条件は、H2＝35l／min，
O2＝50l＝min，Ar＝20l／minとし、ガラス原料
およびドーパント原料のガス流量は実施例１と同
様とした。この結果、得られた多孔質ガラス母材
の先端形状は、第５図に示すような中心部に凹み
が生じ、安定な製造を行うことができなかつた。Example 3: The burner had the same 8-pipe structure as Example 1, the outflow arrangement of each gas was also the same, and the hydrogen flow rate ratio was Q H2 6/
A porous glass base material was manufactured with Q H2 2 = 6.5. The gas flow conditions are H2=35l/min,
O 2 =50l=min, Ar=20l/min, and the gas flow rates of the glass raw material and dopant raw material were the same as in Example 1. As a result, the shape of the tip of the porous glass base material obtained had a depression in the center as shown in FIG. 5, and stable production could not be performed.
実施例 ４：
実施例１と同じ８重管構造のバーナで、各ガス
の流出配置およびガラス原料とドーパント原料の
ガス流量条件も実施例１と同じとし、水素流量比
はＱH2６／ＱH2２＝6.0、燃焼ガス流量条件はH2
＝30l＝min，O2＝45l／min，Ar＝18l／minとし
て多孔質ガラス母材の製造を行つたところ、得ら
れた母材のガラス微粒子の付着収率は約65％で合
成できたが、屈折率分布は第９図のようになつ
た。Example 4: The burner had the same 8-pipe structure as in Example 1, the outflow arrangement of each gas and the gas flow conditions for the glass raw material and dopant raw material were also the same as in Example 1, and the hydrogen flow rate ratio was Q H2 6/Q H2 2 = 6.0, combustion gas flow condition is H2
When a porous glass base material was manufactured using the following conditions: = 30 l = min, O 2 = 45 l/min, and Ar = 18 l/min, the yield of adhesion of glass fine particles to the resulting base material was approximately 65%. However, the refractive index distribution became as shown in FIG.
実施例 ５：
第１０図に示す10重管構造のバーナで、各ガス
の流出配置は図示の如く１１，４３，３４，２
３，３５，４４，３６，２４，３７，４５の各ガ
ス噴出ポートからなる４層火炎面構成として多孔
質ガラス母材の合成を行つた。各ガスの流量条件
は、燃焼ガスとして、H2＝32l／min，O2＝40l／
min，Ar＝16l／min、ガラス原料およびドーパン
ト原料として、SiCl4＝1600cc／min，GeCl4＝
200cc／minとした。また、第６ポート44の酸素
の内側の第４ポート２３および外側の第８ポート
２４からの水素流量ＱH2４およびＱH2８の比は、
ＱH2８／ＱH2４＝2.2とした。この結果、ガラス
微粒子の付着収率は65％で多孔質ガラス母材の合
成を行うことができた。Embodiment 5: A burner with a 10-ply structure shown in Fig. 10 has the outflow arrangement of each gas as shown in the figure:
A porous glass base material was synthesized with a four-layer flame front configuration consisting of gas ejection ports 3, 35, 44, 36, 24, 37, and 45. The flow conditions for each gas are H2 = 32l/min, O2 = 40l/min as combustion gas.
min, Ar = 16l/min, SiCl 4 = 1600cc/min, GeCl 4 = as glass raw material and dopant raw material
It was set to 200cc/min. Further, the ratio of the hydrogen flow rates Q H2 4 and Q H2 8 from the fourth port 23 on the inside of the oxygen in the sixth port 44 and the eighth port 24 on the outside is as follows:
Q H2 8/Q H2 4 = 2.2. As a result, a porous glass base material could be synthesized with a deposition yield of glass particles of 65%.
以上各実施例においては、バーナおよび各ガス
の流出配置として２例を示したのみであるが、ガ
スの流出配置は、火炎面が２個以上形成できれ
ば、どのような流出配置でもよい。また水素の流
量比の設定は、酸素の噴出ポートの内側および外
側に位置する水素の噴出ポートからの水素の流量
比であれば適用できる。 In each of the above embodiments, only two examples have been shown as the burner and the outflow arrangement of each gas, but any gas outflow arrangement may be used as long as two or more flame surfaces can be formed. Furthermore, the hydrogen flow rate ratio can be set as long as it is the hydrogen flow rate ratio from the hydrogen ejection ports located inside and outside the oxygen ejection port.
以上詳述したように、本発明によれば、多重管
構造のバーナを適用し、燃焼ガスとしての酸素ガ
スをはさむ内側および外側に位置する噴出ポート
からの水素の流量比を１および５の間に設定する
ことにより、多孔質母材の合成速度を上げる際に
ガラス微粒子を収率よく、かつ安定に多孔質ガラ
ス母材の合成を行うことができ、また屈折率分布
の制御性も良くすることができ、その効果大であ
る。
As described in detail above, according to the present invention, a burner with a multi-tube structure is applied, and the flow rate ratio of hydrogen from the injection ports located inside and outside sandwiching oxygen gas as combustion gas is set between 1 and 5. By setting to It is possible and the effect is great.
第１図は本発明に適用する火炎面を２個以上形
成する多重管構造のバーナと原料ガスおよび燃焼
ガス配置の一実施例、第２図は燃焼ガスとしての
酸素ガスをはさむ内側および外側に位置する水素
ガスの流量比と収率の関係を示す図、第３図は外
側の水素流量が少ない場合の多孔質ガラス母材の
硬さ形成を示す模式図、第４図は第３図で得られ
た多孔質ガラス母材のかさ密度分布、第５図は外
側の水素流量が多い場合の多孔質ガラス母材の先
端形状、第６図は酸素をはさむ内側および外側の
水素流量比に対する収率の関係、第７図は酸素を
はさむ内側および外側の水素流量比に対する歩留
りの関係、第８図は本発明の実施例２により得ら
れた母材の屈折率分布、第９図は本発明の実施例
４により得られた母材の屈折率分布、第１０図は
本発明の実施例５に用いた多重管バーナと原料ガ
スおよび燃焼ガス配置の他の実施例である。
１……母材、２……バーナ、３……凹み、１
０，１１，２１〜２４，３１〜３７，４１〜４５
……ガス噴出ポート、５０……煤粒子流、５１…
…外側炎、５２……内側炎。
Figure 1 shows an example of the arrangement of a burner with a multi-tube structure that forms two or more flame surfaces, raw material gas, and combustion gas, which is applied to the present invention. Figure 3 is a schematic diagram showing the hardness formation of the porous glass base material when the outside hydrogen flow rate is small. Figure 4 is a diagram showing the relationship between the hydrogen gas flow rate ratio and yield. The bulk density distribution of the porous glass base material obtained, Figure 5 shows the tip shape of the porous glass base material when the hydrogen flow rate on the outside is large, and Figure 6 shows the density distribution for the hydrogen flow rate ratio between the inside and outside parts that sandwich oxygen. Fig. 7 shows the relationship between the yield and the ratio of hydrogen flow rate inside and outside sandwiching oxygen, Fig. 8 shows the refractive index distribution of the base material obtained in Example 2 of the present invention, and Fig. 9 shows the yield according to the present invention. Fig. 10 shows another example of the arrangement of the multi-tube burner, raw material gas, and combustion gas used in Example 5 of the present invention. 1... Base material, 2... Burner, 3... Dent, 1
0, 11, 21-24, 31-37, 41-45
...Gas ejection port, 50...Soot particle flow, 51...
...lateral inflammation, 52...medial inflammation.
Claims (1)
て火炎加水分解することにより生成する粒状ガラ
スを回転する出発部材に堆積させ、該出発部材の
回転軸方向に成長させる多孔質ガラス母材の製造
方法において、前記燃焼バーナは同心円状で複数
の噴出ノズルを有する多重管バーナからなり、該
多重管バーナの内側から外側へ燃焼ガスとして水
素ガス、酸素ガス、水素ガスと層状に流出する配
置とし、該酸素ガスをはさんで内側から流出する
水素ガスの水素流量ＱH2１と外側から流出する水
素ガスの水素流量ＱH2２の比を１≦ＱH2２／ＱH2
１≦５とすることを特徴とする光フアイバ用母材
の製造方法。1. A method for producing a porous glass base material in which granular glass produced by ejecting gaseous glass raw materials from a combustion burner and flame hydrolysis is deposited on a rotating starting member and grows in the direction of the rotational axis of the starting member. , the combustion burner is a multi-tube burner having a plurality of concentric jet nozzles, and is arranged so that hydrogen gas, oxygen gas, and hydrogen gas flow out as combustion gas from the inside to the outside of the multi-tube burner in layers, and the oxygen The ratio of the hydrogen flow rate Q H2 1 of the hydrogen gas flowing out from the inside with the gas in between and the hydrogen flow rate Q H2 2 of the hydrogen gas flowing out from the outside is 1≦ Q H2 2 /Q H2
A method for manufacturing an optical fiber base material, characterized in that 1≦5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19193984A JPS6168342A (en) | 1984-09-13 | 1984-09-13 | Production of parent material for optical fiber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19193984A JPS6168342A (en) | 1984-09-13 | 1984-09-13 | Production of parent material for optical fiber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6168342A JPS6168342A (en) | 1986-04-08 |
| JPS6242865B2 true JPS6242865B2 (en) | 1987-09-10 |
Family
ID=16282967
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19193984A Granted JPS6168342A (en) | 1984-09-13 | 1984-09-13 | Production of parent material for optical fiber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6168342A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6173627U (en) * | 1984-10-23 | 1986-05-19 | ||
| KR100724924B1 (en) | 2006-02-20 | 2007-06-04 | 삼성전자주식회사 | Apparatus for manufacturing soot base material |
-
1984
- 1984-09-13 JP JP19193984A patent/JPS6168342A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6168342A (en) | 1986-04-08 |
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