JPS6251499B2 - - Google Patents

Info

Publication number
JPS6251499B2
JPS6251499B2 JP56194697A JP19469781A JPS6251499B2 JP S6251499 B2 JPS6251499 B2 JP S6251499B2 JP 56194697 A JP56194697 A JP 56194697A JP 19469781 A JP19469781 A JP 19469781A JP S6251499 B2 JPS6251499 B2 JP S6251499B2
Authority
JP
Japan
Prior art keywords
external
electrode
electrodes
pieces
filler metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56194697A
Other languages
Japanese (ja)
Other versions
JPS5893361A (en
Inventor
Toshiaki Matoba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP56194697A priority Critical patent/JPS5893361A/en
Publication of JPS5893361A publication Critical patent/JPS5893361A/en
Publication of JPS6251499B2 publication Critical patent/JPS6251499B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/40Leadframes
    • H10W70/481Leadframes for devices being provided for in groups H10D8/00 - H10D48/00
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/076Connecting or disconnecting of strap connectors
    • H10W72/07651Connecting or disconnecting of strap connectors characterised by changes in properties of the strap connectors during connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/60Strap connectors, e.g. thick copper clips for grounding of power devices

Landscapes

  • Wire Bonding (AREA)

Description

【発明の詳細な説明】 この発明は、外部端子として引出された外部電
極と内部電極との接続を改良した半導体装置に関
する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device in which the connection between external electrodes drawn out as external terminals and internal electrodes is improved.

ダイオード、サイリスタ、トライアツクなどの
半導体装置では、絶縁基板上に装着された半導体
ペレツトから各極の内部電極が出され、これらの
内部電極に外部電極が接続され引出されている。
In semiconductor devices such as diodes, thyristors, and triacs, internal electrodes of each pole are extended from a semiconductor pellet mounted on an insulating substrate, and external electrodes are connected to these internal electrodes and extended out.

半導体装置としてトライアツクの場合について
説明する。
The case of a TRIACK as a semiconductor device will be explained.

従来の半導体装置は第1図に斜視図で示すよう
になつていた。図はトライアツクの場合を示し、
1はアルミナなどからなる絶縁基板で、鉄材又は
銅材からなる放熱板2にはんだなどで接着されて
いる。放熱板2には取付け穴2aがあけられてあ
る。絶縁基板1上面には各電極に対す個所にメタ
ライズ層3が施されてある。4はT2外部電極
で、メタライズ層3上に共にはんだ付けされた
T2内部電極5にはんだ接合されてある。6はT1
外部電極で7はG外部電極であり、それぞれ各メ
タライズ層3上はんだ付けされ引出されてある。
これら各外部電極4,6,7は黄銅材又は銅材な
ど導電金属からなり、外部端子を形成する。8は
T2内部電極5上にはんだ接合された半導体ペレ
ツト、9は銅材などからなり半導体ペレツト8と
T1外部電極6とをはんだ付け接続するT1内部電
極、10は銅材などからなり半導体ペレツト8と
G外部電極7とをはんだ付け接続するG内部電極
である。
A conventional semiconductor device was constructed as shown in a perspective view in FIG. The figure shows the case of triax,
Reference numeral 1 denotes an insulating substrate made of alumina or the like, which is bonded to a heat sink 2 made of iron or copper with solder or the like. A mounting hole 2a is formed in the heat sink 2. A metallized layer 3 is provided on the upper surface of the insulating substrate 1 at a location corresponding to each electrode. 4 is the T2 external electrode, both soldered on the metallized layer 3
It is soldered to the T2 internal electrode 5. 6 is T 1
The external electrodes 7 are G external electrodes, which are each soldered onto each metallized layer 3 and drawn out.
Each of these external electrodes 4, 6, and 7 is made of a conductive metal such as brass or copper, and forms an external terminal. 8 is
T 2 Semiconductor pellet soldered onto internal electrode 5; 9 made of copper material, etc.; semiconductor pellet 8;
A T1 internal electrode is connected to the T1 external electrode 6 by soldering, and 10 is a G internal electrode made of copper or the like and connected to the semiconductor pellet 8 and the G external electrode 7 by soldering.

上記従来の装置の各部品のはんだ接合による組
立てには、各部品間にろう材片をはさみ、水素ふ
ん囲気中で一度にろう付け接合している。
In assembling the parts of the above-mentioned conventional apparatus by soldering, a piece of brazing material is sandwiched between each part, and the parts are brazed and joined all at once in a hydrogen atmosphere.

上記従来装置では、T1外部電極6とT1内部電
極9との間、及びG外部電極7とG内部電極10
との間にそれぞれろう材片をはさみろう付け接合
していて、作業工程がそれだけ複雑となり、自動
化を阻害し、作業能率を非常に低下させ量産化が
困難であつた。また、はさみ込むろう材片数が多
く、手間がかかり価格が高くなつていた。
In the above conventional device, between the T 1 external electrode 6 and the T 1 internal electrode 9 and between the G external electrode 7 and the G internal electrode 10
Pieces of brazing filler metal are sandwiched between the two and soldered together, which complicates the work process, hinders automation, and greatly reduces work efficiency, making mass production difficult. In addition, there are many pieces of brazing filler metal to be inserted, which is time consuming and expensive.

この発明は、内部電極と外部電極との接続を、
絶縁基板上に施してある外部電極箇所のメタライ
ズ層上にろう材片を置き、このろう材片上に外部
電極と内部電極とを並べて載せ、それぞれろう材
で溶着することにより、双方が間につながるろう
材により接続され、作業工程が簡略化され、自動
化が容易となり、作業能率が向上し、量産化する
ことができ、ろう材片数が減少される半導体装置
を提供することを目的としている。
This invention connects internal electrodes and external electrodes,
A piece of brazing material is placed on the metallized layer of the external electrode on the insulating substrate, and the external and internal electrodes are placed side by side on this piece of brazing material, and the two are connected in between by welding them with the brazing material. The object of the present invention is to provide a semiconductor device that is connected by a brazing filler metal, which simplifies the working process, facilitates automation, improves working efficiency, allows mass production, and reduces the number of pieces of brazing filler metal.

第2図はこの発明の一実施例による半導体装置
を示すトライアツクの場合の斜視図であり、1〜
8,2aは上記従来装置と同一のものである。絶
縁基板1上面に、T1外部電極6とG外部電極7
の箇所に対し施されてある各メタライズ層3上
に、それぞれろう材片21を置く。一方のろう材
片21上にT1外部電極6とT1内部電極22とを
小さいすき間で並べて載せる。このT1内部電極
の他方側は半導体ペレツト8上に載せてある。他
方のろう材片21上にG外部電極7とG内部電極
23とを比較的小さいすき間で並べて載せる。こ
れらろう材片21の箇所以外の各部品間には、上
記従来装置と同様にそれぞれろう材片がはさまれ
てあり、水素ふん囲気中で一度にろう付け接合さ
れる。
FIG. 2 is a perspective view of a triax showing a semiconductor device according to an embodiment of the present invention.
8 and 2a are the same as those of the conventional device. A T1 external electrode 6 and a G external electrode 7 are placed on the top surface of the insulating substrate 1.
A piece of brazing material 21 is placed on each metallized layer 3 applied to the location. The T 1 external electrode 6 and the T 1 internal electrode 22 are placed side by side on one piece of brazing material 21 with a small gap. The other side of this T1 internal electrode is placed on the semiconductor pellet 8. On the other brazing material piece 21, the G external electrode 7 and the G internal electrode 23 are placed side by side with a relatively small gap. Pieces of brazing filler metal are sandwiched between each of the parts other than the brazing filler metal pieces 21, as in the conventional apparatus described above, and the parts are brazed and joined together in a hydrogen atmosphere.

こうして、T1外部電極6とT1内部電極22と
が間のろう材を介して接続され、また、G外部電
極7とG内部電極23とが間のろう材を介して接
続される。この場合、主電流が流れるT1外部電
極6とT1内部電極22の間隔tは、特に注意を
要する点であり、tは0.5mm以下にしておく必要
がある。間隔tを大きくすると、大電流領域にお
いて電圧降下が大きくなり、大電流を流すことが
不可能となる。
In this way, the T 1 external electrode 6 and the T 1 internal electrode 22 are connected via the brazing material between them, and the G external electrode 7 and the G internal electrode 23 are connected via the brazing material between them. In this case, special attention must be paid to the distance t between the T 1 external electrode 6 and the T 1 internal electrode 22 through which the main current flows, and t must be kept at 0.5 mm or less. If the interval t is increased, the voltage drop will increase in the large current region, making it impossible to flow a large current.

このように、絶縁基板1上のメタライズ層3上
に置いたろう材片21により、この上に載せた外
部電極と内部電極とをろう付けし接続してあり、
作業工程が簡略化され自動化が容易となる。
In this way, the external electrode and internal electrode placed thereon are brazed and connected by the brazing material piece 21 placed on the metallized layer 3 on the insulating substrate 1,
The work process is simplified and automation becomes easier.

なお、上記実施例では半導体装置としてトライ
アツクの場合について説明したが、ダイオード、
サイリスタなどの場合にも適用できるものであ
る。
In the above embodiments, the semiconductor device is a TRIAT, but a diode,
It can also be applied to thyristors and the like.

以上のように、この発明によれば、外部電極と
内部電極を絶縁基板上のメタライズ層上のろう材
片上に並べ、ろう付けして接続したので、作業工
程が簡単となり、自動化が容易になり、作業能率
が向上し、量産化ができ、ろう材片数が減少し、
価格が低下される。
As described above, according to the present invention, the external electrodes and internal electrodes are arranged on the brazing material piece on the metallized layer on the insulating substrate and connected by brazing, which simplifies the work process and facilitates automation. , work efficiency is improved, mass production is possible, the number of pieces of filler metal is reduced,
Prices will be reduced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の半導体装置を示すトライアツク
の斜視図、第2図はこの発明の一実施例による半
導体装置を示すトライアツクの斜視図である。 1……絶縁基板、3……メタライズ層、4……
T2外部電極、5……T2内部電極、6……T1外部
電極、7……G外部電極、8……半導体ペレツ
ト、21……ろう材片、22……T1内部電極、
23……G内部電極。なお、図中同一符号は同一
又は相当部分を示す。
FIG. 1 is a perspective view of a triac showing a conventional semiconductor device, and FIG. 2 is a perspective view of a triac showing a semiconductor device according to an embodiment of the present invention. 1... Insulating substrate, 3... Metallized layer, 4...
T2 external electrode, 5... T2 internal electrode, 6... T1 external electrode, 7...G external electrode, 8... semiconductor pellet, 21... brazing metal piece, 22... T1 internal electrode,
23...G internal electrode. Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】[Claims] 1 絶縁基板上に施された複数箇所のメタライジ
ング層上にそれぞれろう材片が置かれ、これらの
ろう材片上にそれぞれ同極の外部電極と内部電極
とが並べて配置され、上記各ろう材片の加熱溶融
により上記各同極の外部電極及び内部電極がそれ
ぞれ接合され、双方間がろう材により接続されて
あることを特徴とする半導体装置。
1 Pieces of brazing filler metal are placed on the metallizing layer at multiple locations on an insulating substrate, external electrodes and internal electrodes of the same polarity are placed side by side on these pieces of brazing filler metal, and each of the pieces of brazing filler metal A semiconductor device characterized in that the external electrodes and internal electrodes of the same polarity are joined by heating and melting, and the two are connected by a brazing material.
JP56194697A 1981-11-30 1981-11-30 Semiconductor device Granted JPS5893361A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56194697A JPS5893361A (en) 1981-11-30 1981-11-30 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56194697A JPS5893361A (en) 1981-11-30 1981-11-30 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS5893361A JPS5893361A (en) 1983-06-03
JPS6251499B2 true JPS6251499B2 (en) 1987-10-30

Family

ID=16328762

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56194697A Granted JPS5893361A (en) 1981-11-30 1981-11-30 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5893361A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033441U (en) * 1983-08-11 1985-03-07 富士電機株式会社 semiconductor equipment

Also Published As

Publication number Publication date
JPS5893361A (en) 1983-06-03

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