JPS6252906A - Insulation coating method for amorphous magnetic material - Google Patents
Insulation coating method for amorphous magnetic materialInfo
- Publication number
- JPS6252906A JPS6252906A JP19208385A JP19208385A JPS6252906A JP S6252906 A JPS6252906 A JP S6252906A JP 19208385 A JP19208385 A JP 19208385A JP 19208385 A JP19208385 A JP 19208385A JP S6252906 A JPS6252906 A JP S6252906A
- Authority
- JP
- Japan
- Prior art keywords
- amorphous magnetic
- magnetic material
- discharge
- gas
- reaction cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000696 magnetic material Substances 0.000 title claims abstract description 18
- 238000000576 coating method Methods 0.000 title claims abstract description 10
- 238000009413 insulation Methods 0.000 title description 2
- 238000006243 chemical reaction Methods 0.000 claims abstract description 12
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 2
- 239000005977 Ethylene Substances 0.000 claims description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 238000003786 synthesis reaction Methods 0.000 claims 1
- 239000010409 thin film Substances 0.000 abstract description 9
- 239000011248 coating agent Substances 0.000 abstract description 8
- 239000010408 film Substances 0.000 abstract description 3
- 229920000642 polymer Polymers 0.000 abstract description 3
- CXHPKSYTQFAXIN-UHFFFAOYSA-N 1,4-difluorobutane Chemical compound FCCCCF CXHPKSYTQFAXIN-UHFFFAOYSA-N 0.000 abstract 1
- 239000011810 insulating material Substances 0.000 abstract 1
- 150000004756 silanes Chemical class 0.000 abstract 1
- 238000009751 slip forming Methods 0.000 abstract 1
- 239000012808 vapor phase Substances 0.000 abstract 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 9
- 239000011888 foil Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 5
- 229910000976 Electrical steel Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Soft Magnetic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
（発明の属する技術分野）
本発明は変圧器などの電力用機器の鉄心に用いられるア
モルファス磁性体の薄板に超薄膜の絶縁物を形成する方
法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Technical Field to which the Invention Pertains) The present invention relates to a method for forming an ultra-thin film insulator on a thin plate of amorphous magnetic material used in the iron core of power equipment such as a transformer.
（従来の技術）
非晶質（アモルファス）磁性体は電気抵抗率が高くヒス
テリシス損失が小さいため、変圧器などの電力用機器の
鉄心として用いたときの電力損失を著しく小さくするこ
とができるという特長がある。磁性体中に生じる損失に
はヒステリシス損失と渦電流損失がある。このうち渦電
流損失を低減するには磁性体を薄い板状にし、その表面
に絶縁物をコーティングしてから重ね合わせることが効
果的である。従来のケイ素鋼板を用いた鉄心にはこの方
法が用いられている。この方法は無機あるいは有機の材
料の被膜をケイ素鋼板に塗装形成させるものであるが、
従来の方法ではその厚さが数ミクロン（μｍ）以上であ
った。従来のケイ素鋼板のように板目体の厚さが数１０
０μｍ程度であれば被膜の厚さはほとんど問題でなかっ
たが、アモルファス磁性体では製法上それ自体の厚さが
数１０μｍ程度の非常に薄い板というより箔状になるた
め、従来と同じコーティングを施した場合には鉄心とし
て重ね合わせたときの磁性体の体積分率が著しく低下す
るから、鉄心の磁気抵抗やヒステリシス損失の増大を招
くという欠点が残されていた３（発明の具体的な目的）
本発明は上記の欠点を解消することを目的として開発し
たもので、気相中で絶縁性の超薄膜をアモルファス磁性
体の板上にコーティングする方法であるが、これにより
得られた板を積重ねて鉄心として用いたときの磁気抵抗
およびヒステリシス損失を従来より増大させることなく
、渦電流損失による電力損失を低減できる画期的な製造
方法である。(Prior technology) Amorphous magnetic materials have high electrical resistivity and low hysteresis loss, so they have the advantage of significantly reducing power loss when used as the iron core of power equipment such as transformers. There is. Losses occurring in magnetic materials include hysteresis loss and eddy current loss. Among these, in order to reduce eddy current loss, it is effective to form the magnetic material into a thin plate, coat the surface with an insulator, and then stack the plates. This method is used for iron cores using conventional silicon steel plates. This method involves coating a silicon steel plate with a coating of inorganic or organic material.
In conventional methods, the thickness was several microns (μm) or more. Like conventional silicon steel sheets, the thickness of the grain body is several tens
The thickness of the coating was hardly a problem if it was about 0 μm, but due to the manufacturing method of amorphous magnetic materials, the thickness of the material itself is about several tens of μm, making it more like a foil than a very thin plate, so it is difficult to apply the same coating as before. However, the volume fraction of the magnetic material when stacked as an iron core is significantly reduced, resulting in an increase in the magnetic resistance and hysteresis loss of the iron core.3 (Specific purpose of the invention) ) The present invention was developed with the aim of eliminating the above-mentioned drawbacks, and is a method of coating an amorphous magnetic plate with an insulating ultra-thin film in a gas phase. This is an innovative manufacturing method that can reduce power loss due to eddy current loss without increasing magnetic resistance and hysteresis loss when stacked and used as an iron core.
（発明の構成と作用）
図面は本発明方法を実施した気相中でアモルファス磁性
体に薄膜をコーティングさせる表面処理装置の構成例図
である。この図において１は反応槽（反応室）、２はア
モルファス磁性体の箔、３は４極、４はモノマー、５は
放電用電源、６は排気口、７と８はそれぞれアモルファ
ス磁性体の箔２の巻取ドラム、９は差動排気のための低
真空室である。(Structure and operation of the invention) The drawings are diagrams illustrating a configuration example of a surface treatment apparatus for coating an amorphous magnetic material with a thin film in a gas phase in which the method of the invention is carried out. In this figure, 1 is a reaction tank (reaction chamber), 2 is an amorphous magnetic foil, 3 is a 4-pole, 4 is a monomer, 5 is a discharge power source, 6 is an exhaust port, 7 and 8 are amorphous magnetic foils, respectively. 2 is a winding drum, and 9 is a low vacuum chamber for differential pumping.
さて反応槽１に導入された帯状のアモルファス磁性体２
は、反応槽中に満たされた気体中で発生した放電、たと
えばグロー放電にさらされる。反応槽を満たす気体４と
してはエチレン、フッ化エチレン、シラン系など重合体
を生成し易く、その重合物の絶縁性、耐熱性が優れたも
のを選択して用いる。また放電の発生方法には種々なも
のが知られているが安定な放電が続けばよく、図の例で
は電極３と接地電位にあるアモルファス磁性体箔２０間
に行われる。アモルファス磁性体箔２を大気中から真空
の反応槽１に連続して導入したり引出すには、大気との
間に設けた低い真空室９を介して行うことが必要で、こ
れを差動排気を利用するということも知られている。こ
のようにしてアモルファス磁性体箔には連続して絶縁体
薄膜の生成処理を行うことができる。Now, the strip-shaped amorphous magnetic material 2 introduced into the reaction tank 1
is exposed to an electrical discharge, such as a glow discharge, generated in the gas filled in the reaction vessel. The gas 4 filling the reaction tank is selected from gases such as ethylene, fluorinated ethylene, and silane, which easily produce polymers and whose polymers have excellent insulation and heat resistance. Various methods are known for generating electric discharge, but it is sufficient that stable electric discharge continues, and in the example shown in the figure, electric discharge is generated between electrode 3 and amorphous magnetic foil 20 at ground potential. In order to continuously introduce or withdraw the amorphous magnetic foil 2 from the atmosphere into the vacuum reaction tank 1, it is necessary to do so through a low vacuum chamber 9 provided between the atmosphere and the atmosphere, and this is done by differential pumping. It is also known to use In this way, the amorphous magnetic foil can be continuously subjected to the process of forming an insulating thin film.
アモルファス磁性体箔に生成された薄膜は均一で非常に
薄く、放電パラメータや処理時間を変えることばより膜
厚は容易に制御できる。The thin film formed on the amorphous magnetic foil is uniform and very thin, and the film thickness can be easily controlled by changing the discharge parameters and processing time.
また放電中で生成するため膜の内部が高度に架橋してい
て耐熱温度が高いので、この薄膜付アモルファス磁性体
を機器の鉄心として用いたときの使用温度を従来の材料
使用のものより高くとることができる。In addition, since it is generated during electrical discharge, the inside of the film is highly cross-linked and has a high heat resistance, so when this amorphous magnetic material with thin film is used as the iron core of equipment, the operating temperature can be higher than that of conventional materials. be able to.
（発明の効果）
本発明による薄膜付アモルファス磁性体箔による鉄心を
用いた機器では、鉄心の磁気抵抗やヒステリシス損失を
増大させることなく渦電流損失を低減でき、電力効率の
向上と機器の小形化に著しい効果が期待できる。(Effects of the Invention) In a device using an iron core made of amorphous magnetic foil with a thin film according to the present invention, eddy current loss can be reduced without increasing magnetic resistance or hysteresis loss of the iron core, improving power efficiency and downsizing of the device. A significant effect can be expected.
図面は本発明を実施したアモルファス磁性体に絶縁薄膜
をコーティングする表面処理装置の構成例図である。
１・・・反応槽、 ２・・・アモルファス磁性体の箔
、３・・・電極、 ４・・・モノマー、 ５・・・電
源、 ６・・・排気口、 ７．訃・・巻取りドラム、
９・・・低真空室。The drawing is a configuration example of a surface treatment apparatus for coating an amorphous magnetic material with an insulating thin film according to the present invention. 1... Reaction tank, 2... Amorphous magnetic foil, 3... Electrode, 4... Monomer, 5... Power source, 6... Exhaust port, 7. Death... winding drum,
9...Low vacuum chamber.
Claims (1)
などの重合合成を起こし易い気体中に起させた放電を利
用して、該反応室内を通過するアモルファス磁性体の薄
い箔状の帯の面上にごく薄い絶縁体の膜を連続して形成
することを特徴とするアモルファス磁性体の絶縁コーテ
ィング方法。Utilizing an electric discharge generated in a gas that easily undergoes polymerization synthesis, such as ethylene or silane, which is sent into an evacuated reaction chamber, the surface of a thin foil-like strip of amorphous magnetic material passing through the reaction chamber is An insulating coating method for an amorphous magnetic material that is characterized by continuously forming a very thin insulating film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19208385A JPS6252906A (en) | 1985-09-02 | 1985-09-02 | Insulation coating method for amorphous magnetic material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19208385A JPS6252906A (en) | 1985-09-02 | 1985-09-02 | Insulation coating method for amorphous magnetic material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6252906A true JPS6252906A (en) | 1987-03-07 |
Family
ID=16285359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19208385A Pending JPS6252906A (en) | 1985-09-02 | 1985-09-02 | Insulation coating method for amorphous magnetic material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6252906A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6931713B2 (en) * | 2001-03-15 | 2005-08-23 | Waseem A. Roshen | Methods of making low loss, high frequency composite magnetic material |
| JP2008071982A (en) * | 2006-09-15 | 2008-03-27 | Hitachi Industrial Equipment Systems Co Ltd | Transformer |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57204104A (en) * | 1981-06-11 | 1982-12-14 | Sanyo Electric Co Ltd | Forming method of insulating film for amorphous magnetic substance |
-
1985
- 1985-09-02 JP JP19208385A patent/JPS6252906A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57204104A (en) * | 1981-06-11 | 1982-12-14 | Sanyo Electric Co Ltd | Forming method of insulating film for amorphous magnetic substance |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6931713B2 (en) * | 2001-03-15 | 2005-08-23 | Waseem A. Roshen | Methods of making low loss, high frequency composite magnetic material |
| JP2008071982A (en) * | 2006-09-15 | 2008-03-27 | Hitachi Industrial Equipment Systems Co Ltd | Transformer |
| US8198973B2 (en) | 2006-09-15 | 2012-06-12 | Hitachi Industrial Equipment Systems Co., Ltd. | Transformer |
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