JPS625635U - - Google Patents

Info

Publication number
JPS625635U
JPS625635U JP9708885U JP9708885U JPS625635U JP S625635 U JPS625635 U JP S625635U JP 9708885 U JP9708885 U JP 9708885U JP 9708885 U JP9708885 U JP 9708885U JP S625635 U JPS625635 U JP S625635U
Authority
JP
Japan
Prior art keywords
resist film
coated substrate
plate
heating body
shaped heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9708885U
Other languages
English (en)
Other versions
JPH0234822Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985097088U priority Critical patent/JPH0234822Y2/ja
Publication of JPS625635U publication Critical patent/JPS625635U/ja
Application granted granted Critical
Publication of JPH0234822Y2 publication Critical patent/JPH0234822Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)

Description

【図面の簡単な説明】
第１図は本考案に係る熱処理装置の一実施例を
示す外観斜視図、第２図ａ，ｂは同装置の一部破
断正面図および部分的右側面図、第３図は熱プレ
ートの透視図、第４図は本考案の他の実施例を示
す熱処理装置の斜視図、第５図ａ，ｂは同装置の
一部破断正面図および部分的側断面図、第６図は
クリーンオープンを使用した従来装置の一部破断
斜視図、第７図はホツトプレートを使用した従来
装置の断面図である。 ３……フオトマスクブランク、９……基板、１
１……レジスト膜、２０……熱プレート（板状加
熱体）、２１……ヒーター、２３……板体、２４
……ホルダー、２５……温度制御・調整用コント
ローラ、２８……放熱板、３０……バイメタル、
５０……箱体、５１……ホルダー。

Claims (1)

    【実用新案登録請求の範囲】
  1. 熱源を内蔵する板状加熱体によつてレジスト膜
    付基板を加熱処理する熱処理装置において、前記
    板状加熱体に前記レジスト膜付基板のレジスト膜
    を対面させて前記レジスト膜付基板を保持する放
    熱手段を備えたホルダーと、前記レジスト膜付基
    板近傍の温度を感知する温度感知手段とを設け、
    前記板状加熱体と前記ホルダーとは離間して配置
    されていることを特徴とする熱処理装置。
JP1985097088U 1985-06-26 1985-06-26 Expired JPH0234822Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985097088U JPH0234822Y2 (ja) 1985-06-26 1985-06-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985097088U JPH0234822Y2 (ja) 1985-06-26 1985-06-26

Publications (2)

Publication Number Publication Date
JPS625635U true JPS625635U (ja) 1987-01-14
JPH0234822Y2 JPH0234822Y2 (ja) 1990-09-19

Family

ID=30963661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985097088U Expired JPH0234822Y2 (ja) 1985-06-26 1985-06-26

Country Status (1)

Country Link
JP (1) JPH0234822Y2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101877403B1 (ko) * 2016-01-12 2018-07-13 에이피시스템 주식회사 기판 처리 장치 및 방법

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10206691B2 (en) 2015-10-29 2019-02-19 Medtronic Xomed, Inc. Method and apparatus to select vibration

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52142972A (en) * 1976-05-25 1977-11-29 Toshiba Corp Semiconductor production device
JPS5726433A (en) * 1980-07-23 1982-02-12 Hitachi Ltd Bake of photoresist or the like and apparatus therefor
JPS5961027A (ja) * 1982-09-29 1984-04-07 Toshiba Corp 半導体基板加熱装置
JPS59211243A (ja) * 1983-05-17 1984-11-30 Toshiba Corp 半導体基板処理装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52142972A (en) * 1976-05-25 1977-11-29 Toshiba Corp Semiconductor production device
JPS5726433A (en) * 1980-07-23 1982-02-12 Hitachi Ltd Bake of photoresist or the like and apparatus therefor
JPS5961027A (ja) * 1982-09-29 1984-04-07 Toshiba Corp 半導体基板加熱装置
JPS59211243A (ja) * 1983-05-17 1984-11-30 Toshiba Corp 半導体基板処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101877403B1 (ko) * 2016-01-12 2018-07-13 에이피시스템 주식회사 기판 처리 장치 및 방법

Also Published As

Publication number Publication date
JPH0234822Y2 (ja) 1990-09-19

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