JPS628120A - Adjusting method for position of optical system of optical heating furnace - Google Patents

Abstract

PURPOSE:To easily adjust the position of an optical system by a simple method with high precision without turning on a light source lamp actually by placing the light source for position adjustment at a set position, and converting light from it through an elliptic mirror and tracking the image formation position. CONSTITUTION:The light source 9 for position adjustment is placed at the 2nd focus position of one elliptic mirror 2 and the other elliptic mirror 3 which coincide with each other, i.e. a setting position A and this light source 9 for position adjustment is turned on to irradiate the elliptic mirror 3 with its light after the light is reflected by a plane reflecting mirror 4. The position of the plane reflecting mirror 4 is so adjusted that the light from the light source 9 is converged by the elliptic mirror 3 to form an irradiated position 6 on a sample table 5 where a sample to be heated is positioned, i.e. the position where the sample to be heated is irradiated with the light actually in light heating processing. Consequently, the position of the plane reflecting mirror 4 is adjusted with high precision and light converged into a high-density fine spot illuminates the object sample, so that high-temperature, fast heating is carried out.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for adjusting the position of an optical system in a light heating furnace.

[Conventional technology]

By combining a light source and an optical system, a light heating furnace can irradiate a heated object with high-density energy, enabling high-speed, high-temperature heating.Moreover, the device can be miniaturized, so it is possible to Alternatively, it can be advantageously used as a heating furnace for melting a powder sample of the oxide. Therefore, by attaching various measuring devices to a tapered thermal furnace such as 5, it is possible to conduct various heating experiments, and to conduct research on the physical properties of objects to be heated, such as research and development of basic physical properties of high-temperature materials, and amorphous metals. It is possible to advantageously conduct research such as the development of amorphous oxides, physical property research of amorphous oxides, analysis of thermal properties by temperature measurement, and quality control by temperature measurement.

An example of the optical system of such a tapered thermal furnace is shown in FIG. One elliptical mirror 2 is provided in combination with the light source lamp 1 and the light source lamp 1 is to be positioned at its first focus, and the light from the light source lamp 1 and one of the elliptical mirrors 2 is condensed into a micro spot shape with high density. The other elliptical mirror 3 is provided to irradiate the heated sample held at the irradiated position 6 of the sample stage 5 with the light of It has a flat reflecting mirror 4 inserted between the elliptical mirror 3 and the second focal point of the other elliptical mirror 3 to change the traveling direction of light, and the second focal point of the one elliptical mirror 2 One elliptical mirror 2 and the other elliptical mirror 3 are fixed in position in a state where the second focal point of the other elliptical mirror 3 (the second focal point formed by reflection by the plane reflecting mirror 4) coincides with each other. Reference numeral 7 denotes an aperture member, and this aperture member 7 is held by a holder 8 such that its aperture is located at the second focal point of one of the elliptical mirrors 2, so that the light source lamp 1
Among the light from one elliptical mirror 2, light that is not focused on the second focal point is blocked. P is the optical axis.

In a tapered thermal furnace with such a configuration, the focus of the optical system must be precisely adjusted in order to make the light irradiated onto the sample to be heated into a highly dense, minute spot. be. Particularly from a practical point of view, it is desirable that the focal position accuracy be adjusted to an order of about 0.1 dragon, and when the focal position is adjusted with such high accuracy, the output will be It is possible to rapidly heat up to an extremely high temperature, for example, about 3000° C., using a light source lamp of about 10 KW.

[Problem that the invention seeks to solve]

In a tapered thermal furnace with such a configuration, the position of the focal point of the optical system is normally adjusted in the order described above during manufacturing. As the optical system becomes dirty as the furnace is used, it may be necessary to clean the flat reflector 4 or replace the light source lamp 1. The focal position of the optical system may shift slightly. If the focal position of the optical system is shifted in this way, it will not be possible to obtain a highly concentrated micro-spot of light. Therefore, in a tapered thermal furnace, it is necessary to adjust the position of the optical system. be done.

In order to adjust the position of the optical system with high precision, it is sufficient to turn on the light source lamp l of the optical layer thermal furnace. There is a problem in that the furnace user cannot easily adjust the position of the optical system with the required high precision.

[Objective of the Invention] The present invention has been made based on the above circumstances, and its object is to provide an optical system for a tapered thermal furnace that allows the position of the optical system to be adjusted with high precision using a simple method. The object of the present invention is to provide a position adjustment method.

[Means for solving problems]

The method for adjusting the position of the optical system of a light heating furnace according to the present invention includes one elliptical mirror in which a light source lamp is installed, which is arranged so that the second focal points of each mirror coincide at the set position, and the condensed light thereof is placed on the sample stage. In a tapered thermal furnace comprising a second elliptical mirror that irradiates the irradiation position 1, a position adjustment light source is placed at the set position, and the light from the position adjustment light source is focused by the one elliptical mirror. The position of at least one of the one elliptical mirror and the light source lamp is adjusted so that the light spot position of the light source lamp is at the same position, or the first and second focal points of the one elliptical mirror are adjusted. When a flat reflecting mirror is inserted between them, the position of at least one of the one elliptical mirror, the light source lamp, and the flat reflecting mirror is adjusted, and the second focal point of each is matched at the set position. In a light heating furnace comprising one elliptical mirror in which a light source lamp is incorporated and the other elliptical mirror arranged to irradiate the irradiated position of the sample stage with the focused light,
A position adjustment light source is placed at the set position, and the other elliptical mirror is set so that the irradiated position of the sample stage coincides with the position where the light from the position adjustment light source is focused by the other elliptical mirror. Adjust the position, or if a plane reflecting mirror is inserted between the first focus and the second focus of the other elliptical mirror, adjust the position of at least one of the other elliptical mirror and the plane reflecting mirror. It is characterized by

According to this method, the light source for position adjustment is placed at a set position and the light is focused by one of the elliptical mirrors so that the light spot position of the light source lamp coincides with the focused position, or the light source for position adjustment is Place the light source lamp, one elliptical mirror, and the other elliptical mirror as necessary so that the light is focused by the other elliptical mirror at the set position and the irradiated position on the sample stage matches the focused position. Since this is a method of adjusting the position of the optical system by adjusting the position of at least one of the plane reflecting mirrors provided,
When adjusting the position of the optical system that is required after replacing the light source lamp or cleaning the optical system, it is possible to easily and easily adjust the position of the optical system using simple means without actually lighting the light source lamp. Can be done with precision.

Since a light source with a small output can be used as the light source for position adjustment, the imaging position of the light image by one elliptical mirror or the other elliptical mirror of this light source for position adjustment can be easily adjusted without causing glare. Therefore, when adjusting the position of the light source lamp, it is possible to adjust the position visually, for example, and from this point of view, the position of the optical system is Nl! Easy to adjust.

The present invention will be described in detail below with reference to the drawings.

In a light heating furnace having an optical system configured as shown in FIG. 1, for example, after cleaning the flat reflecting mirror 4,
2nd rf! As shown in J, the second focal position of one elliptical mirror 2 and the other elliptical mirror 3 that coincide with each other, that is, the set position A
A position adjustment light source 9 is placed at the position adjustment light source 9, the position adjustment light source 9 is turned on, the light is reflected by the plane reflecting mirror 4, and then irradiated toward the other elliptical mirror 3. Irradiation position 6 where the heated sample on the sample stage 5 is located! II. The plane reflecting mirror 4 is positioned so that the light from the position adjustment light source 9 is focused by the other elliptical mirror 3 and formed into an image at the position where the sample to be heated should actually receive light during optical heating treatment. Adjust.

Specifically, a mock sample 10 for position adjustment with a reflective mark provided on its surface is placed at the irradiation position 6, and the position Wi
While the lJ adjustment light source 9 is turned on, the reflected light from the reflective mark of the simulated sample 10 is received by the digital luminance meter 12 through the aperture 11 provided at the bottom of the other elliptical mirror 3, and its luminance is measured. As shown in FIG.
When the brightness measured by 2 reaches its maximum value, the plane reflector 4
Fix the position.

In this way, the position of the plane reflecting mirror 4 can be adjusted with high precision, and as a result, the sample to be heated can be irradiated with a highly dense micro-spot of light, thereby performing high-temperature and high-speed heating. becomes possible.

When the light source lamp 1 is replaced, the position adjustment light source 9 is placed at the setting position A, as shown in FIG. The adjustment light [9 is turned on and the light is directed towards one of the elliptical mirrors 2. The position of the light source lamp 1 is adjusted so that the light spot position of the light source lamp 1 coincides with the position where the light from the position adjustment light source 9 is focused and imaged by one of the elliptical mirrors 2. Specifically, while visually tracking the light image formed by one elliptical mirror 2 of the position adjustment light source 9, the light image is determined at the light spot position W of the light source lamp 1 (usually near the tip of the cathode body).
The position of the light source lamp 1 is adjusted by moving it relative to one of the elliptical mirrors 2 so as to match the position.

In this case, since a light with a small output can be used as the position adjustment light B9, the position of the light image formed by one of the elliptical mirrors 2 of the position adjustment light source 9 can be visually confirmed without feeling dazzling. Moreover, since the light source lamp 1 is not turned on, the power consumption required for adjusting the position of the optical system is small, and power saving can be achieved.

Furthermore, after both replacing the light source lamp 1 and cleaning the flat reflecting mirror 4 in the light heating furnace, it is necessary to adjust the position of the light source lamp 1 and the flat reflecting mirror 4. In this case, the position adjustment of the light source lamp 1 and the position adjustment of the flat reflector 4 must be performed separately.
In individual position adjustments, each position is adjusted with high precision, but in reality it contains minute errors, and the position of the entire optical system is adjusted with these errors added together. There is also. Considering such a case, it is preferable to further confirm that the positions of the light source lamp 1 and the plane reflecting mirror 4 in the entire optical system have been precisely adjusted after completing the individual position adjustments. That is, as shown in FIG. 5, for example, an LED light source 13 having a dot-shaped light emitting portion is placed at the irradiation position 6 where the heated sample is placed on the sample stage 5, and this LED light source 13 is turned on. The light image of the LED light source 13 is transmitted to the other elliptical mirror 3.
It is preferable to visually confirm, for example, that the image is formed by one of the elliptical mirrors 2 via the plane reflecting mirror 4 and coincides with the light spot position of the light source lamp 1.

If the light image of the LED light source 13 does not match the light spot position of the light source lamp 1, one or both of the plane reflecting mirror 4 and the light source lamp 1 may be finely adjusted again to adjust the light source lamp 1 and the light source lamp 1 in the entire optical system. The position of the plane reflecting mirror 4 is adjusted.

In the above, a mirror condenser type halogen lamp can be cited as a specific example of the position adjustment light aI9, and the size of the light spot of this position adjustment light source 9 is slightly larger than the bright spot size of the light source lamp l. is preferable, and by selecting the position adjustment light source 9 in this way, it is possible to increase the adjustment accuracy of the focal position of the optical system.

It is practically convenient that the light source 9 for position adjustment can be detachably attached to a predetermined position in the light heating furnace using a suitable holder. It is practically convenient to configure it so that it can also be used as a holder for the adjustment light source 9. For example, as shown in FIG. 6, a stopper 14 and a pair of guides 15 and 15 into which both sides of the aperture member 7 are fitted to slidably hold the aperture member 7 are mounted on a base (not shown). is fixed to constitute the holder 8, while the seventh
As shown in the figure, the holder 16 is molded so that it fits into the pair of guides 15, 15 of the holder 8 and is slidably held.
The position adjusting light source 9 is fixed to the holder 16 so that the position of the light point of the position adjusting light source 9 coincides with the set position A when the light source 9 is attached to the holder 8 in contact with the holder 16. When adjusting the focus, the aperture member 7 is removed from the holder 8, and the holder 16 to which the position adjustment light source 9 is fixed is attached to the holder 8 so that the position adjustment light source 9 is positioned at the set position A. In this case, the position adjustment light source 9
When using a mirror as the light source 9, the light from the position adjustment light source 9 has directionality, so it is necessary to take this directionality into consideration when attaching the position adjustment light a9 to the holder 16. When the light from the position adjustment light source 9 is irradiated toward one elliptical mirror 2 and when the light is irradiated toward the other elliptical mirror 3, the positions of the reflective surfaces of the mirrors must be set in opposite directions. Therefore, for example, the holder 16 can be mounted in the opposite direction to the holder 8, and even when the reflective surface of the mirror faces in either direction, the light spot position of the position adjustment light source 9 can be adjusted. For example, it is desirable to fix the position adjustment light source 9 to the holder 16 so that the light source 9 is always located at the set position A, so that the light point position thereof is located at the center of the holder 16. In this way, the holder 8 of the aperture member 7 is moved by the position adjusting light I.
By also serving as a holder for the IA 9, the position adjustment light source 9 can be easily fixed at the set position A at all times, which is extremely convenient.

When adjusting the position of the optical system by measuring the light reflected from the reflective mark of the simulated sample 10 by the light from the position adjustment light source 9 using the digital luminance meter 12, the position adjustment light source 9 emits the light. It is desirable that the strength is constant;
For this purpose, it is preferable that the position adjustment light source 9 be turned on by the voltage stabilized power source 17 (see FIG. 2).

When adjusting the position of the optical system in a light heating furnace in which one elliptical mirror 2 and the other elliptical mirror 3 are configured to allow fine adjustment of their positions, these one elliptical mirror 2 and the other elliptical mirror 3 The elliptical mirror 3 may be finely adjusted.

According to the above embodiment, in adjusting the position of the plane reflecting mirror 4, the light source 9 for position adjustment is placed at the second focal position of one elliptical mirror 2 and the other elliptical mirror 3, that is, the set position A, which coincide with each other. This light source 9 for position adjustment is turned on, and the light is reflected by the flat reflecting mirror 4 and then irradiated toward the other elliptical mirror 3, so that the irradiated position 6 on the sample stage 5 where the sample to be heated is located. That is, the plane reflecting mirror 4 is arranged so that the light from the position adjustment light source 9 is focused by the other elliptical mirror 3 and formed into an image at the position where the sample to be heated should actually receive light during optical heating treatment.
Therefore, the set position A is not restricted to the position of the light source lamp 1, and the set position A strictly becomes the second focus of the other elliptical mirror 3, and the irradiated position where the heated sample on the sample stage 5 is located. Since the position of the plane reflecting mirror 4 can be fixed so that the mirror 6 becomes exactly the first focal point of the other elliptical mirror 3, the position can be adjusted very easily.

In addition, when adjusting the position of the light source lamp 1, place the position adjustment light source 9 at the set position A, turn on the position adjustment light source 9, and irradiate the light toward one of the elliptical mirrors 2. Since the position of the light source lamp 1 is adjusted so that the light point position of the light source lamp 1 coincides with the position where the light from the adjustment light source 9 is focused and imaged by one of the elliptical mirrors 2, the position of the light source lamp 1 is adjusted. The set position gA without being constrained by the position
is strictly the second focal point of one elliptical mirror 2 and the light source lamp 1
Since the position of the light source lamp 1 can be fixed so that the position of the light spot strictly becomes the first focal point of one of the elliptical mirrors 2, the position adjustment can be performed extremely easily.

Next, an example in which the configuration of the optical system is different from the above case will be described.

For example, when an ultra-high-pressure mercury lamp is used as the light source lamp l, the ultra-high-pressure mercury lamp must be lit with its electrodes extending in the vertical direction. , and a flat reflecting mirror 41
is inserted between the first focus and the second focus of one of the elliptical mirrors 2 to form an optical system. When adjusting the position of the optical system of a light heating furnace having such an optical system,
After replacing the light source lamp 1, place the position adjustment light 1l19 at the set position A which should be the second focus of one elliptical mirror 2 and the other elliptical mirror 3, and turn on this position adjustment light 'a9. After the light is reflected by the plane reflecting mirror 41, it is irradiated toward one of the elliptical mirrors 2, and a light source lamp is placed at a position where the light from this position adjustment light source 9 is condensed by one of the elliptical mirrors 2 to form an image. The position of the light source lamp 1 is adjusted in the same manner as in the previously described embodiments so that the light spot positions of the light sources 1 and 1 coincide with each other.

After cleaning the plane reflecting mirror 41, the position adjusting light aI9 is placed at the set position mA that should become the second focal point of one elliptical mirror 2 and the other elliptical mirror 3, and Wil! The alignment light source 9 is turned on, and the light is reflected by the flat reflecting mirror 41 and then irradiated toward one of the elliptical mirrors 2, and the light from this positioning light source 9 is focused by the one of the elliptical mirrors 2. The position of the plane reflecting mirror 41 is adjusted in the same manner as in the previously described embodiments so that the light spot of the light source lamp 1 is at the position where the image is formed.

Furthermore, in a light heating furnace, a flat reflecting mirror is not necessarily required, so as shown in FIG. When adjusting the position of the optical system in , the position adjustment light source 9 is placed at the setting position A that should be the second focus of one elliptical mirror 2 and the other elliptical mirror 3, and this position adjustment light source 9 is turned on. The light from the position adjustment light source 9 is focused by one of the elliptical mirrors 2 to form an image, and the light spot position of the light source lamp 1 matches the position where the light from the position adjustment light source 9 is focused and imaged by the one of the elliptical mirrors 2. The position of the light source lamp 1 is adjusted in the same manner as in the previously described embodiments. Further, the positions of one elliptical mirror 2 and the other elliptical mirror 3 may be finely adjusted as necessary.

〔Effect of the invention〕

As explained above, the present invention provides one elliptical mirror in which a light source lamp is installed, which is arranged so that each second focal point is completely lost at a set position, and the condensed light is directed to the irradiated position of the sample stage. In a light heating furnace equipped with an elliptical mirror and an elliptical mirror, the light source for position adjustment is placed at a set position and the light from this is focused by one elliptical mirror or the other elliptical mirror to form an image. This method adjusts the position of the optical system by tracking the position of at least one of the light source lamp, one elliptical mirror, the other elliptical mirror, and a flat reflecting mirror provided as necessary. When adjusting the position of the optical system that is required after replacing the light source lamp or cleaning the optical system, WtPi can easily adjust the position of the optical system using simple means without actually lighting the light source lamp. can be performed with high precision. Since a light source with a small output can be used as the light source for position adjustment, the position of the light image formed by one elliptical mirror or the other elliptical mirror of this light source for position adjustment can be easily detected without glare. Therefore, when adjusting the position of the light source lamp, it is possible to adjust the position by visual inspection, for example, and from this point of view as well, the position adjustment of the optical system becomes easy.

[Brief explanation of drawings]

FIG. 1 is an explanatory diagram showing an example of the optical system of a light heating furnace, FIGS. 2 to 7 are explanatory diagrams showing an embodiment of the present invention, and FIGS. FIG. 3 is an explanatory diagram showing another example of the system.

Claims (1)

[Claims] 1) One elliptical mirror in which a light source lamp is installed, which is arranged so that the second focal points of the respective second focal points coincide at the set position, and the condensed light thereof is irradiated onto the irradiated position of the sample stage. and the other elliptical mirror, a light source for position adjustment is placed at the set position, and the light source lamp is placed at a position where light from the light source for position adjustment is focused by the one elliptical mirror. one of the elliptical mirrors so that the light spot positions of
When the position of at least one of the light source lamps is adjusted or a plane reflecting mirror is inserted between the first focus and the second focus of the one elliptical mirror, the one elliptical mirror, the light source lamp, A method for adjusting the position of an optical system in a light heating furnace, comprising adjusting the position of at least one of the plane reflecting mirrors. 2) One elliptical mirror in which the light source lamp is installed and the other elliptical mirror in which the focused light is irradiated onto the irradiated position of the sample stage, which are arranged so that their second focal points coincide at the set position. In the light heating furnace, a light source for position adjustment is placed at the set position, and the irradiated position of the sample stage coincides with the position where the light from the light source for position adjustment is focused by the other elliptical mirror. The position of the other elliptical mirror is adjusted so that the other elliptical mirror is adjusted to A method for adjusting the position of an optical system in a light heating furnace, the method comprising adjusting the position of at least one reflecting mirror.