JPS628144A - Coating material and its preparation - Google Patents
Coating material and its preparationInfo
- Publication number
- JPS628144A JPS628144A JP14810185A JP14810185A JPS628144A JP S628144 A JPS628144 A JP S628144A JP 14810185 A JP14810185 A JP 14810185A JP 14810185 A JP14810185 A JP 14810185A JP S628144 A JPS628144 A JP S628144A
- Authority
- JP
- Japan
- Prior art keywords
- compd
- coated
- substrate
- paper
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 28
- 238000000576 coating method Methods 0.000 title claims abstract description 24
- 239000011248 coating agent Substances 0.000 title claims abstract description 22
- 238000002360 preparation method Methods 0.000 title 1
- 239000010410 layer Substances 0.000 claims abstract description 26
- 229920005989 resin Polymers 0.000 claims abstract description 14
- 239000011347 resin Substances 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 239000011247 coating layer Substances 0.000 claims abstract description 10
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 9
- 239000000057 synthetic resin Substances 0.000 claims abstract description 9
- 125000005702 oxyalkylene group Chemical group 0.000 claims abstract description 6
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 6
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 5
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 5
- 125000004437 phosphorous atom Chemical group 0.000 claims abstract description 4
- 125000004434 sulfur atom Chemical group 0.000 claims abstract description 4
- 150000001875 compounds Chemical class 0.000 claims description 23
- 238000010894 electron beam technology Methods 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- 229920005672 polyolefin resin Polymers 0.000 claims 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000000465 moulding Methods 0.000 abstract 1
- 239000000123 paper Substances 0.000 description 25
- -1 oxypropylene group Chemical group 0.000 description 20
- 238000000034 method Methods 0.000 description 15
- 230000003068 static effect Effects 0.000 description 15
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 10
- 239000000839 emulsion Substances 0.000 description 9
- 239000012463 white pigment Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 5
- 150000002894 organic compounds Chemical class 0.000 description 5
- 229920000573 polyethylene Polymers 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 239000008199 coating composition Substances 0.000 description 4
- 208000028659 discharge Diseases 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000004408 titanium dioxide Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 229920000098 polyolefin Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 229920001059 synthetic polymer Polymers 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 231100000987 absorbed dose Toxicity 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000012777 electrically insulating material Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000006353 oxyethylene group Chemical group 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- SFRDXVJWXWOTEW-UHFFFAOYSA-N 2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)CO SFRDXVJWXWOTEW-UHFFFAOYSA-N 0.000 description 1
- POYODSZSSBWJPD-UHFFFAOYSA-N 2-methylprop-2-enoyloxy 2-methylprop-2-eneperoxoate Chemical compound CC(=C)C(=O)OOOC(=O)C(C)=C POYODSZSSBWJPD-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 229920008347 Cellulose acetate propionate Polymers 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229940126062 Compound A Drugs 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 239000001055 blue pigment Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229920006265 cellulose acetate-butyrate film Polymers 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- XENVCRGQTABGKY-ZHACJKMWSA-N chlorohydrin Chemical compound CC#CC#CC#CC#C\C=C\C(Cl)CO XENVCRGQTABGKY-ZHACJKMWSA-N 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- JZMPIUODFXBXSC-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.CCOC(N)=O JZMPIUODFXBXSC-UHFFFAOYSA-N 0.000 description 1
- WGOQVOGFDLVJAW-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCOC(N)=O WGOQVOGFDLVJAW-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000007759 kiss coating Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 1
- 239000001057 purple pigment Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 238000007763 reverse roll coating Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- JUWGUJSXVOBPHP-UHFFFAOYSA-B titanium(4+);tetraphosphate Chemical compound [Ti+4].[Ti+4].[Ti+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O JUWGUJSXVOBPHP-UHFFFAOYSA-B 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/89—Macromolecular substances therefor
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
Abstract
Description
【発明の詳細な説明】
[発明の分野]
本発明は、帯電性が低減されたー春物、およびその製法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to spring clothing with reduced electrostatic properties and a method for producing the same.
[発明の背景]
近年、高分子化学の進歩と相まって合成高分子化合物の
実用化が次々と進み、合成繊維はもとより合成樹脂製の
建材、家庭用品に至るまで広く合成高分子化合物が広く
使用されている。このため合成高分子化合物のもつ電気
絶縁性がもたらす静電気障害も目立ちはじめ、その対策
が強く要望されるようになってきている。[Background of the Invention] In recent years, the practical application of synthetic polymer compounds has progressed one after another in conjunction with advances in polymer chemistry, and synthetic polymer compounds have been widely used not only in synthetic fibers but also in synthetic resin building materials and household goods. ing. For this reason, electrostatic disturbances caused by the electrical insulation properties of synthetic polymer compounds have begun to become noticeable, and countermeasures have been strongly desired.
特に印画紙、写真フィルムなどの写真感光材料は一般に
電気絶縁性の支持体と写真乳剤層とから成っているので
、写真感光材料の製造工程ならびに使用時に同種または
異種物質の表面との間の接触摩擦または強制剥離をうけ
ることによって静電電荷が蓄積されることが多い。この
蓄積された静電電荷は多くの障害を引起こすが、最も重
大な障害は現像処理前に蓄積された静電電荷が放電する
ことによって感光性乳剤層が感光し、印画紙を現像処理
した際に点状スポットまたは樹枝状、羽毛状の線環を生
じることである。これがいわゆるスタチックマークと呼
ばれているものであって、スタチックマークの発生によ
り写真感光材料の商品価値を著しく損なわれ、場合によ
ってはその商品価値が全く失われる。In particular, photographic materials such as photographic paper and film generally consist of an electrically insulating support and a photographic emulsion layer. Electrostatic charges often accumulate due to friction or forced peeling. This accumulated electrostatic charge causes many problems, but the most important one is that the photosensitive emulsion layer is sensitized by the discharge of the accumulated electrostatic charge before processing, and the photographic paper is processed. In some cases, dot-like spots or dendritic or feather-like wire rings are produced. This is what is called a static mark, and the occurrence of static marks significantly impairs the commercial value of the photographic material, and in some cases, the commercial value is completely lost.
上記のような静電電荷の蓄積によって誘起される写真感
光材料のスタチックマークは、写真感光材料の感度の上
昇および処理速度の増加に応じて顕著となる傾向にある
。特に最近において、写真感光材料の高感度化が進行し
つつあり、また写真感光材料の製造における高速塗布、
そして使用時における高速撮影、高速自動処理等の苛酷
な取扱いを写真感光材料が受ける機会が多くなったこと
によって一層スタチックマークが発生し易くなっている
。またこれらの蓄積された静電電荷は、写真感光材料の
支持体表面に塵埃が付着しやすくなること、均一な塗布
層が得られにくくなることなどの二次的な障害を誘起せ
しめる原因にもなる。Static marks on photographic light-sensitive materials induced by the accumulation of electrostatic charges as described above tend to become more noticeable as the sensitivity of the photographic light-sensitive materials increases and the processing speed increases. Especially recently, the sensitivity of photographic materials has been increasing, and high-speed coating and
In addition, as photographic materials are more likely to be subjected to harsh handling such as high-speed photographing and high-speed automatic processing during use, static marks are more likely to occur. In addition, these accumulated electrostatic charges can cause secondary problems such as dust easily adhering to the surface of the support of photographic light-sensitive materials and making it difficult to obtain a uniform coating layer. Become.
これらの静電気による障害をなくすために最も良い方法
は、その物質の導電性を向上させることにより、電荷の
蓄積が極限に達して放電が発生する前に、蓄積した電荷
を短時間に逸散せしめるようにすることである。The best way to eliminate these electrostatic disturbances is to improve the conductivity of the material so that the accumulated charge can be quickly dissipated before it reaches its limit and a discharge occurs. It is to do so.
[従来技術およびその問題点]
従来から合成樹脂等の電気絶縁性物質の導電性を向上さ
せる方法として種々の界面活性剤、ポリマー等の利用が
試みられてきた0例えば米国特許第2,982,651
号、同3.428.456号、同3,457,076号
、同3 、454 。[Prior art and its problems] Conventionally, attempts have been made to utilize various surfactants, polymers, etc. as a method of improving the conductivity of electrically insulating materials such as synthetic resins. For example, U.S. Pat. No. 2,982, 651
No. 3.428.456, No. 3,457,076, No. 3, 454.
625号、同3,552,972号、同3,655.3
87号等の明細書に記載されているような界面活性剤、
または米国特許第2,882,157号、同2,972
,535号、同3,062゜785号、同3,262,
807号、同3,514.291号、同3,615,5
31号、同3゜753.716号、同3.938.99
9号等の明細書に記載されているようなポリマー等をバ
インダー中に添加させたものを基体表面に塗布する方法
が知られている。No. 625, No. 3,552,972, No. 3,655.3
Surfactants as described in specifications such as No. 87,
or U.S. Patent Nos. 2,882,157 and 2,972.
, No. 535, No. 3,062゜785, No. 3,262,
No. 807, No. 3,514.291, No. 3,615,5
No. 31, No. 3753.716, No. 3.938.99
A method is known in which a binder containing a polymer or the like as described in No. 9 and the like is coated on the surface of a substrate.
しかしながらこれらの方法はいずれも充分な帯電防止能
を付与するにいたらず、また多量に添加すれば効果を発
揮するものもあるが、特に写真感光材料の支持体に使用
した場合に、写真特性に悪影響をおよぼし使用できない
ことが多い、また上記の物質を塗布するには希釈剤とし
て水あるいは溶剤が使用されるため、必ず乾燥工程が必
要となる。乾燥には熱風ドライヤ一方式が一般的に使用
されているが、それには多大な熱エネルギーを要する。However, none of these methods can provide sufficient antistatic ability, and although some are effective when added in large amounts, they do not improve photographic properties, especially when used as a support for photographic light-sensitive materials. They often have adverse effects and cannot be used, and since water or solvents are used as diluents to apply these materials, a drying step is always required. A single type hot air dryer is generally used for drying, but this requires a large amount of thermal energy.
そして、この乾燥工程を高速化すればするほど設備スペ
ースが増加し、設備設計1好ましくないという問題点が
あった。There is a problem in that the faster this drying process is made, the more equipment space is required, which is unfavorable in terms of equipment design.
最近になっである種の7クリレート、メタクリレートに
電子線を照射することにより重合硬化して造膜させる技
術が知られるようになってきた。Recently, a technique has become known in which certain types of 7-acrylates and methacrylates are polymerized and cured to form a film by irradiating them with electron beams.
この方法により溶媒を用いることなく被覆層の形成が可
能となる。従って、上記の乾燥工程を不必要とすること
ができるので、形成される被覆層が帯電防止能を有して
いれば、エネルギーおよび設備スペース上の問題点を解
消しつつ帯電防止能の付午が可能となる。しかしながら
通常の7クリレートおよびメタクリレートの重合体は電
気絶縁物質であるので、静電気蓄積の問題は全く解決さ
れない、また、前述の界面活性剤やポリマーを7クリレ
ート、メタクリレートに添加し、電子線で硬化させる方
法も考えられるが、その結果は通常のバインダーを使用
した場合と同様であって、満足できる効果が得られない
。This method makes it possible to form a coating layer without using a solvent. Therefore, since the above drying process can be made unnecessary, if the coating layer to be formed has antistatic ability, energy and equipment space problems can be solved while the antistatic ability can be improved. becomes possible. However, since ordinary 7-acrylate and methacrylate polymers are electrically insulating materials, the problem of static electricity accumulation is not solved at all.Also, the above-mentioned surfactants and polymers are added to 7-acrylate and methacrylate and cured with electron beam. Although this method is conceivable, the results are similar to those using a normal binder, and a satisfactory effect cannot be obtained.
[発明の目的]
本発明の第一の目的は帯電性が低減された塗布物および
その製法を提供することにある。[Object of the Invention] The first object of the present invention is to provide a coated product with reduced chargeability and a method for producing the same.
本発明の第二の目的は写真特性を損なうことなく写真感
光材料の帯電防止性が改良された写真感光材料用支持体
およびその製法を提供することにある。A second object of the present invention is to provide a support for photographic light-sensitive materials in which the antistatic properties of photographic light-sensitive materials are improved without impairing photographic properties, and a method for producing the same.
本発明の第三の目的は、省エネルギーでコンパクトな設
備の使用を可能にし、しかも帯電防止能を有する写真感
光材料用支持体およびその製法を提供することにある。A third object of the present invention is to provide a support for photographic light-sensitive materials that enables the use of energy-saving and compact equipment and has an antistatic ability, and a method for producing the same.
[発明の要旨1
本発明の目的は、下記の一般式(I)で表わされる不飽
和化合物を50重量%以上含む組成物の重合硬化層が基
体表面に形成されていることを特徴とする帯電性が低減
された塗布物ニ
ー−(I)
ただし、R:水素原子もしくはメチル基X : CHN
Cl2(7)アルキレン基もしくはオキシアルキレン基
Mニリン原子もしくはイオウ原子
n:l、2.もしくは3である。[Summary of the Invention 1 The object of the present invention is to provide a charging method characterized in that a polymerized and cured layer of a composition containing 50% by weight or more of an unsaturated compound represented by the following general formula (I) is formed on the surface of a substrate. Coated material with reduced properties (I) However, R: hydrogen atom or methyl group X: CHN
Cl2(7) alkylene group or oxyalkylene group M niline atom or sulfur atom n:l, 2. Or 3.
[発明の効果]
本発明が提供する被覆物は帯電性が低減されているため
、静電気の蓄積に伴なう好ましくない”諸・現象の発生
が顕著に低減される。特に本発明の被覆物が印画紙支持
体等の写真感光用支持体である場合には、スタチックマ
ークの発生が顕著に低減されるなどの実用上極めて価値
の高い効果が達成される。[Effects of the Invention] Since the coating provided by the present invention has reduced chargeability, the occurrence of various undesirable phenomena due to accumulation of static electricity is significantly reduced.In particular, the coating provided by the present invention When the support is a photosensitive support such as a photographic paper support, effects of extremely high practical value such as a marked reduction in the occurrence of static marks can be achieved.
[発明の詳細な記述]
本発明の帯電性が低減され塗布物は、上記のように特定
の組成を有する組成物を重合硬化して形成された重合硬
化層が基体表面に形成されていることを特徴とする。[Detailed Description of the Invention] The coated article with reduced chargeability of the present invention has a polymerized and cured layer formed on the surface of the substrate by polymerizing and curing a composition having a specific composition as described above. It is characterized by
前記一般式CI)で表わされる不飽和化合物の具体的な
例としては、下記の三種の式であられされる化合物群を
挙げることができる。Specific examples of the unsaturated compound represented by the general formula CI) include compounds represented by the following three formulas.
九
(3) R
CH2=C−C0O−X−0
ただし、上記の各式において、RはHもしくはCH3,
XはCI ”’CI2のフルキレン基もしくは
□オキシアルキレン基、モしてMはPもしくはSを表
わす、各式において、Xは、アルキレン基としては特に
c、 Na3 、その中でも01〜C3が最も好ましく
、またオキシアルキレン基としてはオキシエチレン基、
オキシプロピレン基、オキシブチレン基、およびオキシ
スチレン基のいずれかであることが好ましく、その中で
もオキシエチレン基とオキシプロピレン基が好ましい、
これらの基の付加モル数は1〜2モル程度が好ましい、
またMとしてはP(リン原子)が最も好ましい。9 (3) R CH2=C-C0O-X-0 However, in each of the above formulas, R is H or CH3,
X is a fullkylene group of CI '''CI2 or
□Oxyalkylene group, and M represents P or S. In each formula, X is particularly an alkylene group such as c or Na3, among which 01 to C3 are most preferable, and an oxyalkylene group is an oxyethylene group. ,
Any one of an oxypropylene group, an oxybutylene group, and an oxystyrene group is preferable, and among these, an oxyethylene group and an oxypropylene group are preferable.
The number of moles of these groups added is preferably about 1 to 2 moles,
Moreover, as M, P (phosphorus atom) is most preferable.
上記の不飽和化合物は、他の不飽和化合物(好ましくは
電子線照射により重合硬化可能な不飽和化合物)と混合
して使用してもよい。The above-mentioned unsaturated compounds may be used in combination with other unsaturated compounds (preferably unsaturated compounds that can be polymerized and cured by electron beam irradiation).
併用可能な不飽和化合物の例としては、1分子中に1個
のC=C二重結合を有する不飽和有機化合物(例、アク
リル酸エステル、メタクリル故エステル、エーテルアク
リレート)、1分子中に2個のC=C二重結合を有する
不飽和有機化合物(例、エステル、エーテル、エポキシ
、ウレタン系のジアクリレートあるいはジメタクリレー
ト)、1分子中3個のC=C二重結合を有する不飽和有
機化合物(例、エステル、エーテル、エポキシ、ウレタ
ン系のトリアクリレートあるいはトリメタクリレート)
、1分子中に1個のC=C二重結合と1個のエポキシ基
を有する不飽和有機化合物(例、エポキシ基を有する不
飽和有機化合物(例、エポキシアクリレート、エポキシ
メタクリレート)を挙げることができる。Examples of unsaturated compounds that can be used in combination include unsaturated organic compounds that have one C=C double bond in one molecule (e.g., acrylic ester, late methacrylic ester, ether acrylate), unsaturated organic compounds with 3 C=C double bonds (e.g. esters, ethers, epoxies, urethane diacrylates or dimethacrylates), unsaturated organic compounds with 3 C=C double bonds in one molecule Compounds (e.g. esters, ethers, epoxies, urethane triacrylates or trimethacrylates)
, unsaturated organic compounds having one C=C double bond and one epoxy group in one molecule (e.g., unsaturated organic compounds having an epoxy group (e.g., epoxy acrylate, epoxy methacrylate) can.
ただし、このように他の不飽和化合物と併用する際にお
いては、塗布組成物中に一般式CI)の不飽和化合物が
50重量%以上存在する必要があり、そして特に70重
量%以上存在していることが望ましい、50重量%未満
では充分な帯電防止効果が発揮されない。However, when used in combination with other unsaturated compounds in this way, the unsaturated compound of general formula CI) must be present in the coating composition in an amount of 50% by weight or more, and especially 70% by weight or more. If the amount is less than 50% by weight, sufficient antistatic effect will not be exhibited.
塗布組成物の粘度を調整し、塗布適性を改善するために
上記の塗布組成物中に少量の有機溶剤を添加してもよい
、有機溶剤としては、アセトン、メチルエチルケトン、
メチルイソブチルケトン、シクロヘキサノン等のケトン
:酢酸メチル、酢酸エチル、酢酸ブチル、乳酸エチル、
酢酸グリコールモノエチルエーテル等のエステル;エー
テル、グリコールジメチルエーテル、グリコールモノエ
チルエーテル、ジオキサン等のグリコールエーテル;ベ
ンゼン、トルエン、キシレン等の芳香族炭化水素:メチ
レンクロライド、エチレンクロライド、四塩化炭素、ク
ロロホルム、エチレンクロルヒドリン、ジクロルベンゼ
ン等の塩素化炭化水素等のものが選択して使用できる。A small amount of organic solvent may be added to the above coating composition in order to adjust the viscosity of the coating composition and improve coating suitability. Examples of the organic solvent include acetone, methyl ethyl ketone,
Ketones such as methyl isobutyl ketone and cyclohexanone: methyl acetate, ethyl acetate, butyl acetate, ethyl lactate,
Esters such as acetic acid glycol monoethyl ether; Glycol ethers such as ether, glycol dimethyl ether, glycol monoethyl ether, and dioxane; Aromatic hydrocarbons such as benzene, toluene, and xylene: methylene chloride, ethylene chloride, carbon tetrachloride, chloroform, ethylene Chlorinated hydrocarbons such as chlorohydrin and dichlorobenzene can be selected and used.
さらに下記に示すような樹脂を塗布組成物に予め配合し
ておいて、形成される重合硬化層に柔軟性、耐熱性が付
学することもできる。Furthermore, flexibility and heat resistance can be imparted to the polymerized and cured layer formed by adding a resin as shown below to the coating composition in advance.
セルロースエステル、ポリビニルブチラール、ポリ酢酸
ビニル、酢酸ビニル共重合体、飽和および不飽和のスチ
ロール不合ポリエステル樹脂、スチロール争アクリレー
ト共重合体樹脂、ポリスチロール樹脂。Cellulose esters, polyvinyl butyral, polyvinyl acetate, vinyl acetate copolymers, saturated and unsaturated styrene-unpolyester resins, styrene-containing acrylate copolymer resins, polystyrene resins.
なお、帯電性が低減された写真感光材料支持体を得るこ
とが目的である場合には、次のような態様が利用される
。Incidentally, when the purpose is to obtain a photographic light-sensitive material support with reduced chargeability, the following embodiments are used.
特に写真感光材料を使用して得られた画像は。Especially images obtained using photographic materials.
透過光によって観察する場合と1反射光によって観察す
る場合とがある。後者の場合、特に写真印画紙の場合に
は、支持体としては、不透明で、しかも反射率ができる
だけ高いことが望まれる。この目的のために無機白色顔
料を本発明の化合物に含有させて使用しても良い。There are cases where observation is performed using transmitted light and cases where observation is performed using single reflected light. In the latter case, especially in the case of photographic paper, it is desirable that the support be opaque and have as high a reflectance as possible. For this purpose, an inorganic white pigment may be incorporated into the compound of the present invention.
無機白色顔料としては、従来より写真印画紙の隠蔽用に
用いられているもの、あるいは提案されているものを用
いることができる。その例としては、二酸化チタン、硫
酸バリウム、硫酸カルシウム、炭酸バリウム、炭酸カル
シウム、リトポン、アルミナ白、酸化亜鉛、シリカ、三
酸化アンチモン、燐酸チタン等が挙げられる。これらは
単独で或いは混合して用いることができる。As the inorganic white pigment, those conventionally used for hiding photographic paper or those that have been proposed can be used. Examples include titanium dioxide, barium sulfate, calcium sulfate, barium carbonate, calcium carbonate, lithopone, alumina white, zinc oxide, silica, antimony trioxide, titanium phosphate, and the like. These can be used alone or in combination.
無機白色顔料としては、二酸化チタンが隠蔽力が大きい
ので特に好ましい、二酸化チタンはルチル型であっても
、アナターゼ型でも良く、それらを単独または混合して
使用してもよい、また、二酸化チタンは、硫酸法で作ら
れたもの、塩素法で作られたものでもよい、二酸化チタ
ンとしては。As an inorganic white pigment, titanium dioxide is particularly preferred because it has a large hiding power.Titanium dioxide may be of the rutile type or anatase type, and they may be used alone or in combination. , those made by the sulfuric acid method and those made by the chlorine method are also acceptable as titanium dioxide.
含水アルミナ処理、含水二酸化ケイ素処理等の無機物質
による表面被覆処理したもの、トリメチロールメタン、
トリメチロールエタン、トリメチロールプロパン、2.
4−ジヒドロキシ−2−メチルペンタン等のアルコール
で表面被覆処理したもの、あるいはシロキサン処理した
ものを適宜用いることができる。Surface coating treatment with inorganic substances such as hydrated alumina treatment and hydrated silicon dioxide treatment, trimethylolmethane,
Trimethylol ethane, trimethylol propane, 2.
Those whose surface has been coated with alcohol such as 4-dihydroxy-2-methylpentane or those which have been treated with siloxane can be used as appropriate.
無機白色顔料の平均粒径は0.1pmよりも大きいこと
が好ましく、さらに0.151Lmよりも大きいことが
特に好ましい。The average particle size of the inorganic white pigment is preferably larger than 0.1 pm, and particularly preferably larger than 0.151 Lm.
白色顔料含有樹脂層の形成に際しては、上記のバインダ
成分(不飽和化合物および所望により樹脂)と無機白色
顔料からなる組成物の塗布液を調製し、この塗布液を基
体表面に塗布する。バインダ成分と無機白色顔料との比
率(重量比)は、3/l−1/9の範囲にあることが好
ましく、特に2/1−174の範囲にあることが好まし
い。When forming the white pigment-containing resin layer, a coating liquid of a composition consisting of the above-mentioned binder component (unsaturated compound and optionally resin) and an inorganic white pigment is prepared, and this coating liquid is applied to the surface of the substrate. The ratio (weight ratio) of the binder component to the inorganic white pigment is preferably in the range of 3/1 to 1/9, particularly preferably in the range of 2/1 to 174.
なお、無機白色顔料と共に所望により青色、紫色、赤色
などの顔料など印画紙支持体における公知の添加剤を併
用することもできる。In addition, in addition to the inorganic white pigment, known additives for photographic paper supports, such as blue, purple, and red pigments, can also be used in combination, if desired.
上記の白色顔料含有樹脂層形成用の組成物は公知の混合
機を用いて混線分散して塗布液とすることができる。The above composition for forming a white pigment-containing resin layer can be cross-dispersed using a known mixer to form a coating liquid.
本発明における基体の例としては合成樹脂成形物および
合成樹脂フィルム(プレート、シートをも含む)、たと
えば、セルロースアセテートフィルム、セルロースアセ
テートブチレートフィルム、セルロースアセテートプロ
ピオネートフィルム、ポリスチレンフィルム、ポリエチ
レンテレフタレートフィルム、ポリカーボネートフィル
ム、ポリエチレンフィルム、ポリプロピレンフィルムお
よびこれらの積層物等がある。また抄紙して調製した原
紙、原紙の両面に防水性樹脂被覆層が形成された樹脂被
覆紙を挙げることができる。Examples of the substrate in the present invention include synthetic resin molded products and synthetic resin films (including plates and sheets), such as cellulose acetate film, cellulose acetate butyrate film, cellulose acetate propionate film, polystyrene film, and polyethylene terephthalate film. , polycarbonate film, polyethylene film, polypropylene film, and laminates thereof. Further examples include base paper prepared by papermaking and resin-coated paper in which waterproof resin coating layers are formed on both sides of the base paper.
原紙の材料は公知の支持体用原料の材料から選ぶことが
できる。その例として、天然パルプよりなる紙、ポリエ
チレンやポリプロピレンなど合成樹脂材料製の合成パル
プよりなる紙、あるいは天然パルプと合成パルプの混抄
により作られた紙、あるいは天然パルプと合成パルプの
抄き合せにより作られた紙等種々のものが用いられる。The material for the base paper can be selected from known raw materials for supports. Examples include paper made from natural pulp, paper made from synthetic pulp made from synthetic resin materials such as polyethylene or polypropylene, paper made by mixing natural pulp and synthetic pulp, or paper made by mixing natural pulp and synthetic pulp. Various types of paper are used.
また、上記のように、これらの原紙の表面にポリエチレ
ン、ポリプロピレンなどのポリオレフィン層を形成した
もの(いわゆる樹脂被覆紙)を用いることもできる。Moreover, as mentioned above, those having a polyolefin layer such as polyethylene or polypropylene formed on the surface of these base papers (so-called resin-coated paper) can also be used.
本発明の被覆物表面に形成される帯電防止樹脂層は原紙
に直接設けても、あるいは原紙表面に設けられたポリオ
レフィン層の上に設けてもよく。The antistatic resin layer formed on the surface of the coating of the present invention may be provided directly on the base paper, or may be provided on the polyolefin layer provided on the surface of the base paper.
原紙とポリオレフィン層との間に設けてもよい。It may be provided between the base paper and the polyolefin layer.
これらの支持体は感光材料の使用目的に応じて透明なも
のと不透明なものの中から選択して用いられる。These supports are selected from transparent and opaque supports depending on the intended use of the photosensitive material.
本発明の帯電防止能形成用の上記塗布液を基体とへ塗布
する方法としては、たとえば、エアードクターコート、
ブレードコート、エアナイフコート、スクイズコート、
含浸コート、リバースロールコート、トランスファーロ
ールコート、グラビヤコート、キスコート、キャストコ
ート、スプレィコート、スピンコード等の従来より公知
の塗布方法を挙げることができる。Methods for applying the above-mentioned coating liquid for forming antistatic ability of the present invention to a substrate include, for example, air doctor coating,
Blade coat, air knife coat, squeeze coat,
Conventionally known coating methods include impregnation coating, reverse roll coating, transfer roll coating, gravure coating, kiss coating, cast coating, spray coating, and spin cord.
塗布層の厚みは、一般には0.5〜100#Lmであり
、好ましくは1〜50JLmである。この範囲をはずれ
ると、塗布ムラを生じたり、硬化のために多大なエネル
ギーが必要とされ、硬化が不充分になりやすい、なお基
体と塗布層との濡れ、および接着を向上する目的で基体
表面を予めコロナ □処理等の表面処理を施した後
、前記の塗布液をa □布してもよい。The thickness of the coating layer is generally 0.5 to 100 #Lm, preferably 1 to 50 JLm. Outside this range, uneven coating may occur, a large amount of energy is required for curing, and curing is likely to be insufficient. After surface treatment such as corona □ treatment in advance, the coating solution may be applied to a □ cloth.
基体上に塗布された塗布液は、電子線照射により重合し
、硬化する。電子線重合は従来より公知の電子線加速器
を利用して行なうことができる。The coating liquid applied onto the substrate is polymerized and cured by electron beam irradiation. Electron beam polymerization can be carried out using a conventionally known electron beam accelerator.
加速器により加速された電子によって塗布層にお
□いてラジカル重合反応が発生する。Electrons accelerated by an accelerator are applied to the coating layer.
□A radical polymerization reaction occurs.
カーテンビーム方式が採用できるが、好ましいの
i5電子線加速器としてはパンデグラーフ型のスキャニ
ング方式、ダブルスキャニング方式あるいはは、比較的
安価で大出力が得られるカーテンビーム方式である。電
子線特性としては加速電圧が 1:100〜100
OKV、好マシくは100〜 ’300KVであり
、吸収線量は0.5〜20メガラツド、好ましくは2〜
lOメガラツドである。 ”照射時における酸素
濃度は5000ppm以下 1であることが望まし
い。A curtain beam system can be used, but is preferable.
The i5 electron beam accelerator is a Pandegraaf scanning method, a double scanning method, or a curtain beam method which is relatively inexpensive and can provide a large output. As for the electron beam characteristics, the accelerating voltage is 1:100 to 100.
OKV, preferably 100 to 300 KV, and the absorbed dose is 0.5 to 20 megarads, preferably 2 to 300 kV.
This is lO Megarad. ``It is desirable that the oxygen concentration during irradiation is 5000 ppm or less.
ゴニ:二二t2m::::=工ニl:i(I、::二:
二 ;茅のマツトロールによって表面をマット化させた
りすることもできる。また写真感光材料用支持体の場合
には、写真乳剤層との接着性を向上する目的でコロナ処
理等の表面処理を硬化層の表面に施してもよい、あるい
は、硬化層の表面に下塗層を設けてもよい。Goni:22t2m::::=Goni l:i(I,::2:
2. The surface can also be matted using a pine trol. In the case of supports for photographic light-sensitive materials, the surface of the cured layer may be subjected to surface treatment such as corona treatment in order to improve adhesion to the photographic emulsion layer, or the surface of the cured layer may be coated with an undercoat. Layers may be provided.
本発明の塗布物を写真印画紙用支持体として用いる場合
には1、公知の技術に従って、塗布物の上にハロゲン化
銀・ゼラチン系感光乳剤層、無機あるいは有機光導電層
、ジアゾ化合物・感光性樹脂層等を形成することにより
写真感光材料とすることができる。When the coated product of the present invention is used as a support for photographic paper, 1. On the coated product, a silver halide/gelatin-based light-sensitive emulsion layer, an inorganic or organic photoconductive layer, a diazo compound/photosensitive layer, etc. By forming a transparent resin layer or the like, a photographic light-sensitive material can be obtained.
以丁に本発明を、写真印画紙用支持体の例を実施例とし
て挙げて詳細に説明するが、本発明はこれによって限定
されるものではない、なお、実施例において帯電防止性
能は、r記の方法で表面抵抗率を測定し、またスタチッ
クマークの発生を観察することにより評価した。Hereinafter, the present invention will be explained in detail using a support for photographic paper as an example, but the present invention is not limited thereto. Evaluation was made by measuring the surface resistivity using the method described above and observing the occurrence of static marks.
(a)表面抵抗率の測定
支持体を電極間隔0.14cm、長さlocmの真ちゅ
う製電極(試料片と接する部分はステンレスを使用)に
挟み、タケダ理研■製エレクトロメーター:TR−86
51で通電1分後の電流値を読み、オームの法則に従っ
て表面抵抗率を計算した0表面抵抗値の値が小さいほど
帯電防止性が良いことを示す。(a) Measurement of surface resistivity The support was sandwiched between brass electrodes with an electrode spacing of 0.14 cm and a length of loc (stainless steel was used for the part in contact with the sample piece). Electrometer manufactured by Takeda Riken: TR-86
51, the current value was read after 1 minute of energization, and the smaller the 0 surface resistance value, the surface resistivity calculated according to Ohm's law, the better the antistatic property.
(b)スタチックマークの観察
支持体の片面にハロゲン化銀カラー乳剤を塗布した試料
片を暗室で、100m/分の速度で回転するウレタンゴ
ム系のローラー間を通過させたのち現像処理したものの
スタチックマークを観察。(b) Observation of static marks A sample piece coated with a silver halide color emulsion on one side of the support was passed between urethane rubber rollers rotating at a speed of 100 m/min in a dark room, and then developed. Observe static marks.
次のようにランク付けした。Ranked as follows:
工:乳剤面にスタチックマークが全く発生しなかった
■:乳剤面の一部分にスタチックマークが発生したこと
■:乳剤面のほぼ全面にスタチッマークが発生した
[実施例1]
両面が厚さ307zmのポリエチレンで被覆された原紙
(厚さ180gm)の片面に下記A、B、Cの不飽和化
合物(液体)をそれぞれ溶媒を用いることなく塗布し1
次いで窒素雰囲気下(酸素濃度300ppm)で加速電
圧200kv、吸収線量10メガラツドにて電子線を照
射して塗布層を硬化させ、写真用支持体を得た。硬化層
の厚さは5JLmであった。Technique: No static marks were generated on the emulsion surface ■: Static marks were generated on a part of the emulsion surface ■: Static marks were generated on almost the entire emulsion surface [Example 1] Both sides had a thickness of 307 mm The following unsaturated compounds (liquids) A, B, and C were applied to one side of base paper (thickness 180 gm) coated with polyethylene (180 gm) without using a solvent.
The coated layer was then cured by irradiation with an electron beam at an acceleration voltage of 200 kV and an absorbed dose of 10 megarads in a nitrogen atmosphere (oxygen concentration 300 ppm) to obtain a photographic support. The thickness of the cured layer was 5 JLm.
このようにして得られた写真感光材料支持体を25℃、
60%RHで2時間調湿後硬化層の片面の抵抗率を測定
した。The photographic light-sensitive material support thus obtained was heated at 25°C.
After conditioning the humidity at 60% RH for 2 hours, the resistivity of one side of the cured layer was measured.
次にに3i!塗布面とは反対側のポリエチレン被覆面に
放電出力4KW、放電処理速度100m/分でコロナ放
電処理を行ない、次いでこの表面にハロゲン化銀カラー
写真乳剤を塗布した。得られた印画紙を25℃、30%
RHで2時間調湿後スタチックマーク発生の有無を観察
するための試験を行なった。Next 3i! Corona discharge treatment was performed on the polyethylene coated surface opposite to the coated surface at a discharge output of 4 kW and a discharge processing speed of 100 m/min, and then a silver halide color photographic emulsion was coated on this surface. The obtained photographic paper was heated to 30% at 25°C.
After conditioning the humidity at RH for 2 hours, a test was conducted to observe the presence or absence of static marks.
H
不飽和化合物A : CH2−GHCOOGHzCH
20−P =I0不飽和化合物C:CH2ツCHCOO
CH2Ckh、0CH2−CHCOOCH20H20−
P 瓢 0CH2−CHCOOCHzCH20
それらの結果を第1表に示す。H Unsaturated compound A: CH2-GHCOOGHzCH
20-P = I0 unsaturated compound C: CH2CHCOO
CH2Ckh,0CH2-CHCOOCH20H20-
P Gourd 0CH2-CHCOOCHzCH20 The results are shown in Table 1.
[比較例IJ
実施例1の不飽和化合物を下記に示す不飽和化合物りに
変えた以外は実施例1と同様にして、試料を作成し、表
面抵抗率とスタチックマーク発生の有無を試験した。[Comparative Example IJ A sample was prepared in the same manner as in Example 1 except that the unsaturated compound in Example 1 was changed to the unsaturated compound shown below, and the surface resistivity and the presence or absence of static marks were tested. .
cn2−cncooそC3)!6 o)−−ocnまた
だし、l土層+n=3
それらの結果を第1表に示す。cn2-cncoosoC3)! 6 o) -- ocn, but l soil layer + n = 3 The results are shown in Table 1.
第1表
不飽和化合物 表面抵抗率(Ω) スダフfクマーク
A 5X106 IB
lX107 IC3X 107
1
D 5X10L4 m第1表に示さ
れた結果から、本発明に従う被覆物を用いて得られた写
真感光性材料は優れた帯電防止効果を有していることが
わかる。Table 1 Unsaturated Compounds Surface Resistivity (Ω) Sudafukumark A 5X106 IB
lX107 IC3X 107
1 D 5 X 10 L4 m The results shown in Table 1 show that the photographic material obtained using the coating according to the invention has an excellent antistatic effect.
さらに上記の実施例で得られた印画紙のカラー写真特性
を調べたところ、感度カブリ等の写真特性は良好であっ
た。Furthermore, when the color photographic properties of the photographic paper obtained in the above examples were examined, the photographic properties such as sensitivity fog were good.
Claims (1)
量%以上含む組成物の重合硬化層が基体表面に形成され
ていることを特徴とする帯電性が低減された塗布物: ▲数式、化学式、表等があります▼−−( I ) ただし、R:水素原子もしくはメチル基 X:C_1〜C_1_2のアルキレン基 もしくはオキシアルキレン基 M:リン原子もしくはイオウ原子 n:1、2、もしくは3である。 2、該組成物が実質的に一般式( I )で表わされる不
飽和化合物のみからなることを特徴とする特許請求の範
囲第1項記載の塗布物。 3、Rが水素原子であることを特徴とする特許請求の範
囲第1項記載の塗布物。 4、Mがリン原子であることを特徴とする特許請求の範
囲第1項記載の塗布物。 5、基体の表面が合成樹脂から形成されていることを特
徴とする特許請求の範囲第1項記載の塗布物。 6、合成樹脂がポリオレフィン樹脂であることを特徴と
する特許請求の範囲第5項記載の塗布物。 7、基体が樹脂被覆紙であることを特徴とする特許請求
の範囲第1項記載の塗布物。 8、樹脂被覆紙が写真印画紙用支持体であることを特徴
とする特許請求の範囲第7項記載の塗布物。 9、一般式( I )で表わされる不飽和化合物を50重
量%以上含む組成物の塗布層を基体表面に形成し、次い
で該塗布層に電子線を照射することにより該塗布層を重
合硬化させることを特徴とする塗布物の製法: ▲数式、化学式、表等があります▼−−−( I ) ただし、R:水素原子もしくはメチル基 X:C_1〜C_1_2のアルキレン基 もしくはオキシアルキレン基 M:リン原子もしくはイオウ原子 n:1、2、もしくは3である。 10、該組成物が実質的に一般式( I )で表わされる
不飽和化合物のみからなることを特徴とする特許請求の
範囲第9項記載の塗布物の製法。[Claims] 1. A product with reduced chargeability, characterized in that a polymerized and cured layer of a composition containing 50% by weight or more of an unsaturated compound represented by the general formula (I) is formed on the surface of the substrate. Coated material: ▲Mathematical formulas, chemical formulas, tables, etc.▼--(I) However, R: hydrogen atom or methyl group X: alkylene group or oxyalkylene group of C_1 to C_1_2 M: phosphorus atom or sulfur atom n: 1, 2 or 3. 2. The coating material according to claim 1, wherein the composition consists essentially of an unsaturated compound represented by general formula (I). 3. The coated product according to claim 1, wherein R is a hydrogen atom. 4. The coated product according to claim 1, wherein M is a phosphorus atom. 5. The coated article according to claim 1, wherein the surface of the substrate is made of synthetic resin. 6. The coated product according to claim 5, wherein the synthetic resin is a polyolefin resin. 7. The coated product according to claim 1, wherein the substrate is resin-coated paper. 8. The coated product according to claim 7, wherein the resin-coated paper is a support for photographic paper. 9. Forming a coating layer of a composition containing 50% by weight or more of an unsaturated compound represented by general formula (I) on the surface of a substrate, and then polymerizing and curing the coating layer by irradiating the coating layer with an electron beam. Manufacturing method for coatings characterized by: ▲Mathematical formulas, chemical formulas, tables, etc.▼---(I) However, R: hydrogen atom or methyl group X: C_1 to C_1_2 alkylene group or oxyalkylene group M: phosphorus Atom or sulfur atom n: 1, 2, or 3. 10. The method for producing a coating material according to claim 9, wherein the composition consists essentially only of the unsaturated compound represented by the general formula (I).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60148101A JPH0797203B2 (en) | 1985-07-04 | 1985-07-04 | Manufacturing method of photographic paper support |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60148101A JPH0797203B2 (en) | 1985-07-04 | 1985-07-04 | Manufacturing method of photographic paper support |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS628144A true JPS628144A (en) | 1987-01-16 |
| JPH0797203B2 JPH0797203B2 (en) | 1995-10-18 |
Family
ID=15445264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60148101A Expired - Lifetime JPH0797203B2 (en) | 1985-07-04 | 1985-07-04 | Manufacturing method of photographic paper support |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0797203B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58195869U (en) * | 1982-06-24 | 1983-12-26 | 旭化成株式会社 | Drive device for cartridge type pump |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54133324A (en) * | 1978-04-07 | 1979-10-17 | Fuji Photo Film Co Ltd | Silver halide photosensitive material prevented of static charging |
-
1985
- 1985-07-04 JP JP60148101A patent/JPH0797203B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54133324A (en) * | 1978-04-07 | 1979-10-17 | Fuji Photo Film Co Ltd | Silver halide photosensitive material prevented of static charging |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58195869U (en) * | 1982-06-24 | 1983-12-26 | 旭化成株式会社 | Drive device for cartridge type pump |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0797203B2 (en) | 1995-10-18 |
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