JPS6284494A - Read only memory - Google Patents

Read only memory

Info

Publication number
JPS6284494A
JPS6284494A JP60225267A JP22526785A JPS6284494A JP S6284494 A JPS6284494 A JP S6284494A JP 60225267 A JP60225267 A JP 60225267A JP 22526785 A JP22526785 A JP 22526785A JP S6284494 A JPS6284494 A JP S6284494A
Authority
JP
Japan
Prior art keywords
data
write
written
potential
memory cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60225267A
Other languages
Japanese (ja)
Other versions
JPH0736274B2 (en
Inventor
Shuji Kaneuchi
金内 秀志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP22526785A priority Critical patent/JPH0736274B2/en
Publication of JPS6284494A publication Critical patent/JPS6284494A/en
Publication of JPH0736274B2 publication Critical patent/JPH0736274B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Read Only Memory (AREA)

Abstract

PURPOSE:To increase the number of data rewritable times by providing a timer circuit and selectively erasing data prior to data rewriting in accordance with write data. CONSTITUTION:When a boost circuit 1 boosts a voltage to an erasable and rewritable voltage VPP, the timer circuit 3 outputs the voltage VPP at a high potential and a write timing signal WT at a low potential in the first and later halves during one period. Write data D0-Di with a voltage fluctuation of VPP are impressed on the drains of selected memory cells M0-Mi from a data holding circuit 2. In the first half of the WT, the memory cell to be erased has a control gate at a VPP potential and a drain at a low potential, and then said cell is erased. In the memory cell to be written, its control gate and drain come to VPP potential, and therefore previous data is held. In the latter half, a low potential is impressed to the control gates of the memory cells M0-Mi, and the memory cell to be erased holds erasure data, while data is written in the memory cell to be written.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は読出し専用メモリに関し、特にデータの書替え
可能な読出し専用メモリに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a read-only memory, and particularly to a read-only memory in which data can be rewritten.

〔従来の技術〕[Conventional technology]

電気的に消去可能プログ可能な読出し専用メモリ(以下
、EEFROMと記す)では、データ書替えに際し、自
動的にメモリセルの、消去が行なわれた後、データの書
込みが行なわれる自動消去機能が実用化されている。
In electrically erasable programmable read-only memory (hereinafter referred to as EEFROM), an automatic erase function has been put into practical use in which when data is rewritten, memory cells are automatically erased and then data is written. has been done.

従来、この釉の読出し専用メモリは、事前に固定されて
いるデータの状態にかかわらず、一旦、消去すなわちデ
ーター1″の状態にした後、書込みデータのl Q M
が書込まれるため、事前に固定されているデータが10
−で書込みデータが101の場合には、“0習を消去し
てJlにし再び、10−の書込みを行っている。
Conventionally, this glazed read-only memory has been erased, that is, set to the data 1'' state, regardless of the pre-fixed data state, and then the write data l Q M
is written, so the pre-fixed data is 10
If the write data is 101 in -, "0" is erased and changed to Jl, and 10- is written again.

EEPROMでは、書替え可能回数が重要な特性であり
、メモリセルの構造いかんを問わず、薄い酸化膜中に流
れるトンネル電流を利用して書込みが行われるため、酸
化膜中を移動する電荷総量が増すほど酸化膜中に捕獲さ
れる電子が増し、トンネル電流が減少して遂には書込み
、消去が不可能になるため、書き替え可能回数に上限が
できる。
For EEPROMs, the number of times they can be rewritten is an important characteristic, and regardless of the structure of the memory cell, writing is performed using tunnel current flowing through a thin oxide film, which increases the total amount of charge that moves through the oxide film. As the number of electrons captured in the oxide film increases, the tunnel current decreases, and eventually writing and erasing becomes impossible, so there is an upper limit to the number of times that rewriting can be performed.

また、トンネル電流を流すことで酸化膜中の欠陥密度が
増し、データの保持不良につながる。
Furthermore, passing a tunnel current increases the defect density in the oxide film, leading to poor data retention.

〔発明が解決j2ようとする問題点〕 上述した従来の胱出し専用メモリは、すべて消去状態1
11にした後、書込みデータの10−を書込む方式であ
るため、事前に固定さねたデータがlOMで書込みデー
タが10−の場合でも、−〇1→111→101という
消去及び書込み電流を薄い酸化膜中に流すという問題点
がある。
[Problem that the invention attempts to solve 2] The above-mentioned conventional memory dedicated to bladder removal is all erased state 1.
Since the method is to write the write data 10- after setting the data to 11, even if the pre-fixed data is lOM and the write data is 10-, the erase and write currents from -〇1 → 111 → 101 will be changed. There is a problem with flowing through a thin oxide film.

本発明の目的は、書込み前に行う消去を、書込みデータ
に応じて選択的に行うことのできる読出し専用メモリを
提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a read-only memory in which erasing before writing can be selectively performed in accordance with written data.

〔間組点を解決するための手段〕[Means for solving inter-group points]

本発明の読出し専用メモリは、電源電圧を所定の電圧値
に昇圧する昇圧回路と、書込むべきデータを一時保持し
書込み指示に応じて前記所定の電圧値の書込みデータを
出力するデータ保持回路と、前記書込み指示に応じて1
周期の前半が前記所定の電圧値の高レベルに後半が低レ
ベルになる書込みタイミング信号を出力するタイマ回路
と、行及び列に配置され前記書込タイミング信号が制御
ゲートに入力される複数個のメモリセルからなるセルア
レイと、前記書込みデータを選択される前記メモリセル
のドレインに供給する列セレクタ及び行デコーダとを含
んで構成される。
The read-only memory of the present invention includes a booster circuit that boosts the power supply voltage to a predetermined voltage value, and a data holding circuit that temporarily holds data to be written and outputs write data of the predetermined voltage value in response to a write instruction. , 1 according to the write instruction
a timer circuit that outputs a write timing signal in which the first half of the cycle is at a high level of the predetermined voltage value and the second half is at a low level; and a plurality of timer circuits arranged in rows and columns and into which the write timing signal is input to a control gate. The memory cell includes a cell array made up of memory cells, and a column selector and a row decoder that supply the write data to the drains of the selected memory cells.

〔実施例1 次に、本発明の実施例について図面を参照して説明する
[Example 1 Next, an example of the present invention will be described with reference to the drawings.

第10は本発明の一実施例のブロック図である。10 is a block diagram of an embodiment of the present invention.

第1図に示す読出し専用メモリは、電源電圧Vccを所
定の電圧値の電圧Vl)I)昇圧する昇圧回路lと、書
込むべきデータを一時保持し書込み指示に応じて電圧V
pI)の書込みデータD0〜Diを出力するデータ保持
回路2と、書込み指示に応じて1周期の前半が電圧■p
pの高レベルに後半が低レベルになる書込みタイミング
信号WTを出力するタイマ回路3と、−5・ 扁4葎〒行及び列に配置 され書込タイミング信号WTが制御ゲートに入力される
複数個のメモリセルM6〜Miからなるセルアレイ4と
、書込みデータD、〜Diを選択されるメモリセルM0
〜′Miのドレインに供給する列セレクタ5及び行デコ
ーダ6とを含んで構成される。
The read-only memory shown in FIG.
The data holding circuit 2 outputs write data D0 to Di of pI), and the first half of one cycle is a voltage p
A timer circuit 3 outputs a write timing signal WT whose second half is at a low level while the second half is at a high level, and a plurality of timer circuits arranged in -5. A cell array 4 consisting of memory cells M6 to Mi and a memory cell M0 to which write data D, to Di are selected.
It is configured to include a column selector 5 and a row decoder 6 that supply data to the drains of ~'Mi.

次に、第1図に示す読出し専用メモリの動作について第
2図を参照して説明する。第2図は第1図に示す読出し
専用メモリの動作を説明するための波形図である。
Next, the operation of the read-only memory shown in FIG. 1 will be explained with reference to FIG. 2. FIG. 2 is a waveform diagram for explaining the operation of the read-only memory shown in FIG. 1.

本実施例では、メモリセルM0〜Miけフローティング
・ゲート型を用いており、制御ゲートに高電位、ドレイ
ンに低電位を印加することにより消去されて11−状態
になり、制御ゲートに低電位、ドレインに高電位を印加
することにより書込みが行われ101状態になる。曹込
み及び消去時ニは、メモリセルM0〜Miのソースはフ
ローティングに設定される。
In this embodiment, the memory cells M0 to Mi are of floating gate type, and are erased to the 11-state by applying a high potential to the control gate and a low potential to the drain. Writing is performed by applying a high potential to the drain, resulting in the 101 state. During filling and erasing, the sources of the memory cells M0 to Mi are set to floating.

次に、ワード単位の書替え動作について説明するO 書込むべきデータがデータ保持回路2にラッチされた後
、昇圧回路1が動作して電源電圧Vccを消去及び書込
み可能な電圧VpI)に昇圧する。
Next, a word-by-word rewrite operation will be explained. After the data to be written is latched in the data holding circuit 2, the booster circuit 1 operates to boost the power supply voltage Vcc to a voltage VpI) that allows erasing and writing.

タイマ回路3はタイミング信号発生回路31及びインバ
ータ回路32からなり、書込み指示に応じて発生するタ
イミング信号発生回路31の出力信号は、その1周期の
前半T’/2が高レベルで後半’I’/2が低レベルの
信号であり、その信号は電圧VPpを電源とするインバ
ータ回路32の入力となるため、インバータ回路32か
らの出力の書込みタイミング信号WTは前半T/2が電
圧Vppの高置&、後半T/2が低電位になる。従って
、セルアレイ4のメモリセルM0〜Miの制御ゲートへ
の印加電位は、前半T/2が電圧Vl)pの高電位。
The timer circuit 3 consists of a timing signal generation circuit 31 and an inverter circuit 32, and the output signal of the timing signal generation circuit 31, which is generated in response to a write instruction, has a high level in the first half T'/2 and a high level 'I' in the second half of one cycle. /2 is a low level signal, and this signal is input to the inverter circuit 32 whose power source is voltage VPp. Therefore, the write timing signal WT output from the inverter circuit 32 has a first half T/2 at a high level of voltage Vpp. &, the second half T/2 becomes a low potential. Therefore, the potential applied to the control gates of the memory cells M0 to Mi of the cell array 4 is a high potential of voltage Vl)p in the first half T/2.

後半T/2が低電位になる。The second half T/2 becomes a low potential.

データ保持回路2はデータ保持部21及びインバータ回
路22からなり、データ保持部21で保持される書込む
べきデータは電圧Vl)Pを電源とするインバータ回路
22の入力となる。従って、デ−タ保持回路2からVl
)pの電圧振幅をもつ書込みデータD0〜Diが出力さ
れ、列セレクタ5及び行デコーダ6を軽て、選択された
メモリセルM0〜Miのドレインに印加される。
The data holding circuit 2 includes a data holding section 21 and an inverter circuit 22, and the data to be written held in the data holding section 21 is input to the inverter circuit 22 whose power source is the voltage Vl)P. Therefore, Vl from the data holding circuit 2
) Write data D0-Di having a voltage amplitude of p is output, passes through the column selector 5 and row decoder 6, and is applied to the drains of the selected memory cells M0-Mi.

この場合、書込みタイミング信号WTの前半T/2では
、消去すべきメモリセルは制御ゲートがVl)p電位、
ドレインが低電位になり、書込まれるメモリセルは制御
ゲートがVl)I)電位、ドレインがVl)p電位にな
る。それ故、消去すべきメモリセルは消去が行われるが
、書込まれるメモリセルは前のデータを保持している。
In this case, in the first half T/2 of the write timing signal WT, the control gate of the memory cell to be erased is at Vl)p potential,
The drain becomes a low potential, and the memory cell to be written has a control gate at a Vl)I) potential and a drain at a Vl)p potential. Therefore, the memory cell to be erased is erased, but the memory cell to be written retains the previous data.

書込みタイミング信号WTの後半T’/2では、メモリ
セルM。−Mlの制御ゲートには低電位が印加される。
At the second half T'/2 of the write timing signal WT, the memory cell M. A low potential is applied to the control gate of -Ml.

ドレイン電位は王妃した状態のままであるから、消去す
べきメモリセルは制御ゲートが低電位、ドレインが低電
位になり、消去データ111が保持される。書込着れる
メモリセルの制御ゲートは低電位、ドレインが■pp電
位であるから、書込みが行われる・ 〔発明の効果) 以上説明したように本発明の読出し専用メモリは、タイ
マ回路を追加して、データの書替え時に先立って行われ
る消去を、書込みデータに応じ選択的に行うことにより
、書込み済のメモリセルに再書込みする場合、一旦、消
去することなしに以前の状態を保持することができるの
で、実使用でのデータ書替え可能回数を増加できるとい
う効果がある。
Since the drain potential remains in the queen state, the control gate of the memory cell to be erased is at a low potential, the drain is at a low potential, and the erased data 111 is held. Writing is performed because the control gate of the memory cell to be written is at a low potential and the drain is at a pp potential. [Effects of the Invention] As explained above, the read-only memory of the present invention adds a timer circuit. By selectively performing erasing prior to data rewriting according to the written data, when rewriting a written memory cell, it is possible to retain the previous state without erasing it. This has the effect of increasing the number of times data can be rewritten in actual use.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例のブロック図、第2図は第1
図に示す読出し専用メモリ回路の動作を説明するための
波形図である。 1・・・・・・昇圧回路、!・・・・・・データ保持回
路、3・・・・・・タイマ回路、4・・・・・・セルア
レイ、5・・・・・・列セレクタ、6・・・・・・行デ
コーダ、D0〜Di・・・・・・書込みデータ、Mo〜
Mし・・・・・メモリセル、WT・・・・・・書込みタ
イミング信号。
FIG. 1 is a block diagram of one embodiment of the present invention, and FIG. 2 is a block diagram of an embodiment of the present invention.
FIG. 3 is a waveform diagram for explaining the operation of the read-only memory circuit shown in the figure. 1...boost circuit! ... Data holding circuit, 3 ... Timer circuit, 4 ... Cell array, 5 ... Column selector, 6 ... Row decoder, D0 ~Di...Write data, Mo~
M...Memory cell, WT...Write timing signal.

Claims (1)

【特許請求の範囲】[Claims] 電源電圧を所定の電圧値に昇圧する昇圧回路と、書込む
べきデータを一時保持し書込み指示に応じて前記所定の
電圧値の書込みデータを出力するデータ保持回路と、前
記書込み指示に応じて1周期の前半が前記所定の電圧値
の高レベルに後半が低レベルになる書込みタイミング信
号を出力するタイマ回路と、行及び列に配置され前記書
込タイミング信号が制御ゲートに入力される複数個のメ
モリセルからなるセルアレイと、前記書込みデータを選
択される前記メモリセルのドレインに供給する列セレク
タ及び行デコーダとを含むことを特徴とする読出し専用
メモリ。
a booster circuit that boosts the power supply voltage to a predetermined voltage value; a data holding circuit that temporarily holds data to be written and outputs write data of the predetermined voltage value in response to a write instruction; a timer circuit that outputs a write timing signal in which the first half of the cycle is at a high level of the predetermined voltage value and the second half is at a low level; and a plurality of timer circuits arranged in rows and columns and into which the write timing signal is input to a control gate. A read-only memory comprising: a cell array of memory cells; and a column selector and a row decoder that supply the write data to the drains of the selected memory cells.
JP22526785A 1985-10-08 1985-10-08 Read-only memory Expired - Lifetime JPH0736274B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22526785A JPH0736274B2 (en) 1985-10-08 1985-10-08 Read-only memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22526785A JPH0736274B2 (en) 1985-10-08 1985-10-08 Read-only memory

Publications (2)

Publication Number Publication Date
JPS6284494A true JPS6284494A (en) 1987-04-17
JPH0736274B2 JPH0736274B2 (en) 1995-04-19

Family

ID=16826641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22526785A Expired - Lifetime JPH0736274B2 (en) 1985-10-08 1985-10-08 Read-only memory

Country Status (1)

Country Link
JP (1) JPH0736274B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01113997A (en) * 1987-10-28 1989-05-02 Hitachi Ltd Method for setting threshold voltage of non-volatile semiconductor memory device
JPH0214494A (en) * 1988-03-09 1990-01-18 Philips Gloeilampenfab:Nv Eeprom having data-controlled erasing and programming mode
JPH02126497A (en) * 1987-10-19 1990-05-15 Sgs Thomson Microelectron Sa A method of programming memory cells of a memory and a circuit for implementing this method
JPH02146192A (en) * 1988-11-28 1990-06-05 Nec Corp Nonvolatile eeprom
US6026022A (en) * 1998-03-24 2000-02-15 Nec Corporation Nonvolatile semiconductor memory device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02126497A (en) * 1987-10-19 1990-05-15 Sgs Thomson Microelectron Sa A method of programming memory cells of a memory and a circuit for implementing this method
JPH01113997A (en) * 1987-10-28 1989-05-02 Hitachi Ltd Method for setting threshold voltage of non-volatile semiconductor memory device
JPH0214494A (en) * 1988-03-09 1990-01-18 Philips Gloeilampenfab:Nv Eeprom having data-controlled erasing and programming mode
JPH02146192A (en) * 1988-11-28 1990-06-05 Nec Corp Nonvolatile eeprom
US6026022A (en) * 1998-03-24 2000-02-15 Nec Corporation Nonvolatile semiconductor memory device

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JPH0736274B2 (en) 1995-04-19

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