JPS6285224A - Liquid crystal display device - Google Patents
Liquid crystal display deviceInfo
- Publication number
- JPS6285224A JPS6285224A JP60226506A JP22650685A JPS6285224A JP S6285224 A JPS6285224 A JP S6285224A JP 60226506 A JP60226506 A JP 60226506A JP 22650685 A JP22650685 A JP 22650685A JP S6285224 A JPS6285224 A JP S6285224A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- crystal display
- display device
- electrode
- conjugated polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
Landscapes
- Physics & Mathematics (AREA)
- Liquid Crystal (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Thin Film Transistor (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
この発明は、■素五員環を有するμ−共役系高分子を半
導体層としt:電界効果型トランジスタ(以下FET素
子と略称する)を液晶駆動制御に用いた液晶表示装置に
関するものである。
〔従来の技術〕
従来の液晶表示装置は画素数を増やす場合、帯状の透明
電極列を直交して対向させただけの単、純マトリクスl
夜品パネルを用いてきた。この場合、最大走査電極数は
求める画像の許容最低コ′、、I−ラスト比によってほ
ぼ決められ、60〜1(10本程度である。このため、
信号電極を2分割にしたり、マトリクス液晶パネルを2
層積重ねt:すすることによって、1画面内に組み込む
走査電極数を等価的に増加させる工夫が試みられてきた
。しかし、いずれも技術的な限界があり、それほど有効
な手段ではなかった。
第3図は従来の液晶表示装置の構成図であるが、画素間
のクロス1−一りを除去する抜本的な方法としてば、第
3図に示すように各画素電極(13)をFET素子など
の画素選択用スイッチ(国で分離し、これらに独立に濃
淡信号電圧を印加することが考んられる。なお、x、−
X、+よ走査電極、Y I−Y aは信号電極である。
これを実現する方法として「液晶□応用編」、岡野光治
・小林驕介共編、培風館に示されているように、単液晶
ンリコン板、多結晶ンリコン板あるいはアモルファスシ
リコン薄膜りにFET素子と液晶表示部を作成し、これ
を液晶表示装置とすることが試みられている。すなわち
単結晶シリコン、多結晶シリコンあるいはアモルファス
シリコンのいずれかを用いfニー F E T素子を各
画素電極(i3)にさせ、このFET素子を液晶駆動用
のスイッチ(14)とすることによって、大面積の液晶
表示部?、Yを多数の個々の小さな液晶表示装置に分離
し、別々に動作させろわけである。
第4図は従来の液晶表示装置の断面図であり、その基本
的な動作の仕方を次に説明する。即ちFET素子(11
)と液晶表示部(L2)をアルミニウム膜(1G)によ
って直列に接続し、両昔間に液晶を駆動するのに充分な
電圧を印加しておく。そしてこの時、FET素子のゲー
ト電極(2)にゲートを開けろことのできるゲート電圧
を印加すると、FET素子のソース電極(4)とドレイ
ン電極(5)の間の半導体層となるアモルファスシリコ
ン膜(6)の抵抗が低下して液晶表示部に電圧が印加さ
れ、液晶(8)が駆動する。
逆にゲートを閉じろと液晶が駆動せず、液晶の駆動を付
属させたFET素子のゲート電圧t6けて制御できるこ
とになる。このため、個々の液晶表示装置を集めて大面
積化した場合でも、藺々C液晶表示装置に付属させたF
ET素子のゲーI−電圧を走査するだけで、個々のlは
高表示装置の駆動を制御でき、大画面表示ができること
になる。なお、(8)(よ液晶5 、 (1?)は保護
膜である。
〔発明が解決しようとする問題点〕
しかし、単結晶シリコン板あるいは多結晶シリコシ板を
用いた液晶表示装置は材料的に大面積化が困難であり、
また非常に高価である。まt:第4図で示したようなア
モルファスシリコン薄膜を用いた液晶表示装置は大面積
化が比較的容易で安価である反面、均質かつ特性が優れ
た膜を得にくい欠点がある。また、上記の単結晶シリコ
ン、多結晶シリコンおよびアモルファスシリコンのいず
れを用いる場合においても製造プロセスが非常に複雑で
液晶表示装置の作成が困難であるという問題があった。
この発明は上記のような問題点を解消するためになされ
たもので、液晶表示装置の大面積化を容易にするととも
に均質かつ優れた性能を有す液晶表示装置を得ることを
目的とする。
又、電解重合法によっても、化学重合法によっても半導
体層の形成が可能となり容易にFET素子が製造でき、
液晶表示装置も安価にかつ容易に製造できる。
〔問題点を解決するための手段〕
この発明の液晶表示装置は、ソース電極とドレイン電極
間の電流通路である半導体層の導電率をゲート電極によ
って制御する電解効果型トランジスタの上記半導体層が
複素五員環を有するπ−共役系高分子である電界効果型
トランジスタを設けた駆動部、並びに上記ソース電極お
よびドレイン電極の内のいずれか一方と直列に接続した
液晶表示部を備え、上記ゲート電圧を変化させることに
より、上記液晶表示部を制御するものである。
〔作 用〕
この発明におけるFET素子の複素五員環を有するμ−
共役系高分子膜は電解重合法または化学酸化重合法によ
って容易に作製できる。このため、均質な半導体層(高
分子膜)を容易に作製でき、液晶表示装置の大面積化が
容易になる。また、安価な有機化合物を用いろため、単
結晶ノリコン。
多結晶シリコンあるいはアモルファスシリコンを用いる
場合に比べて液晶表示装置を安価にすることができる。
さらにはアモルファスシリコン薄膜を用いた場合と同等
あるいはそれ以上の優れた性能を提供することができる
。
〔実施例〕
第1図はこの発明の一実施例の液晶表示装置の断面図で
あり、図において(1)は基板、(2)は基板(1)の
片面に設けられたゲート電極、(3)は基板(1)およ
びゲート電極(2)上に設けられた絶縁膜、(4)は絶
縁膜(3)上に設けられたソース電極、(5)は同じく
絶縁膜(3)上にソース電極(4)と分離して設けられ
たドレイン電極、(6)は絶縁膜(3)、ソース電極(
4)およびドレイン電極(5)上に設けられソース電極
(4)とドレイン電極(5)にそれぞれオーム性接触す
る複素五員環を有するπ−共役系高分子から成る半導体
層である。
上記(2)ないしく6)は液晶表示装置のうち、FET
素子の部分(■)である。
また図において(7)はFET素子(++)のドレイン
電極(5)と接続した電極、(8)は液晶表示層、(9
)は透明電極、(10)は偏光板付ガラス板である。電
極(7)および電極(9)には配向処理を施している。
上記(7)ないしC0)(よ液晶表示装置のうち液晶表
示部(+2)である。
ここて、この発明に用いる材料としては以下に述べるも
のが使用さレル。
基板(1)としてはガラスが一般的に用いられるが、ポ
リエステルフィルム等の高分子膜を用いることもできる
。液晶表示装置のうち、FET素子部C11)において
、ゲート電極(2)としては、金、白金、クロム、パラ
ジウム、アルミニウム、インジウム等の金Eや錫酸化物
、酸化インジウム、インジウム・錫酸化物(工TO)3
を用いるのが一般的であるが、これら材料を2つ以上あ
わせて用いてもよい。
また、p型シリコンやn型シリコノ、あるいは導電性を
有する有機系高分子を用いてもよい。これらを利用する
場合に(才、基板(11を省略することができる。絶縁
膜(3)としては、酸化ノリコン(SiO2)が一般的
に用いられるが、窒化ノリコンや酸化アルミニウムでも
よい。またポリエチレンやポリビリカルバブール、ポリ
フェニレノスルフィド、ポリパラキシレン等絶縁性高分
子を用いてもよい。
もちろノしこれら材料を2つ以上あわせて用いてもよい
。半導体層を形成する複素五員環を有するπ−兵役系高
分子としては、−i式
\・および−〇C,H,基の内の一種、・(,1?数
ツノM4びに一般式 只1.?1
\ 、・′
)・−痩
ハ
/、・ (2)
−′・
′°″l′u、8juR,1,f・−1・−01゛・
\て示されるものが用いられ、これらを2つ以上あ
わせても用いられろ。
複素五員環を有するπ−共役系高分子The present invention relates to a liquid crystal display device in which a μ-conjugated polymer having a five-membered ring is used as a semiconductor layer and a field effect transistor (hereinafter abbreviated as FET element) is used for liquid crystal drive control. [Prior art] When increasing the number of pixels in conventional liquid crystal display devices, a simple matrix consisting of strip-shaped transparent electrode arrays orthogonally opposed is used.
I have been using night panels. In this case, the maximum number of scanning electrodes is approximately determined by the lowest permissible co', I-last ratio of the desired image, and is approximately 60 to 1 (about 10).
Divide the signal electrode into two, or divide the matrix liquid crystal panel into two.
Layer stacking t: Attempts have been made to equivalently increase the number of scanning electrodes incorporated within one screen by layer stacking. However, both had technical limitations and were not very effective methods. Figure 3 is a diagram showing the configuration of a conventional liquid crystal display device, but as a drastic method to eliminate crosses between pixels, each pixel electrode (13) is connected to an FET element as shown in Figure 3. It may be possible to separate pixel selection switches such as
X and + are scanning electrodes, and YI-Y and a are signal electrodes. As a method for realizing this, as shown in "Liquid Crystal □ Application Edition", co-edited by Mitsuharu Okano and Yosuke Kobayashi, Baifukan, FET elements and liquid crystal displays are mounted on a single liquid crystal liquid crystal board, a polycrystalline liquid crystal board, or an amorphous silicon thin film. Attempts have been made to create a section and use it as a liquid crystal display device. That is, by using either single-crystal silicon, polycrystalline silicon, or amorphous silicon to make each pixel electrode (i3) a f-nee FET element, and using this FET element as a switch (14) for driving the liquid crystal, large LCD display area? , Y into many individual small liquid crystal display devices and operate them separately. FIG. 4 is a cross-sectional view of a conventional liquid crystal display device, and its basic operation will be explained next. That is, the FET element (11
) and the liquid crystal display section (L2) are connected in series by an aluminum film (1G), and a voltage sufficient to drive the liquid crystal is applied between both ends. At this time, when a gate voltage is applied to the gate electrode (2) of the FET element to open the gate, an amorphous silicon film ( The resistance of 6) decreases, voltage is applied to the liquid crystal display section, and the liquid crystal (8) is driven. Conversely, if the gate is closed, the liquid crystal will not be driven, and the driving of the liquid crystal can be controlled by the gate voltage t6 of the attached FET element. For this reason, even if individual liquid crystal display devices are assembled to create a large area, the F.
By simply scanning the gate I-voltage of the ET element, each l can control the drive of a high display device, allowing a large screen display. Note that (8) (yo liquid crystal 5) and (1?) are protective films. [Problems to be solved by the invention] However, liquid crystal display devices using single crystal silicon plates or polycrystalline silicon plates have material limitations. It is difficult to enlarge the area,
It is also very expensive. Although a liquid crystal display device using an amorphous silicon thin film as shown in FIG. 4 is relatively easy to increase in area and inexpensive, it has the disadvantage that it is difficult to obtain a film with uniformity and excellent characteristics. Furthermore, there is a problem in that the manufacturing process is very complicated and it is difficult to create a liquid crystal display device, regardless of whether the above-mentioned single crystal silicon, polycrystal silicon, or amorphous silicon is used. The present invention was made to solve the above-mentioned problems, and an object of the present invention is to easily increase the area of a liquid crystal display device and to obtain a liquid crystal display device having uniform and excellent performance. In addition, it is possible to form a semiconductor layer by both electrolytic polymerization method and chemical polymerization method, and FET elements can be easily manufactured.
Liquid crystal display devices can also be manufactured inexpensively and easily. [Means for Solving the Problems] The liquid crystal display device of the present invention includes a field effect transistor in which the conductivity of the semiconductor layer, which is a current path between a source electrode and a drain electrode, is controlled by a gate electrode. A driving section provided with a field effect transistor made of a π-conjugated polymer having a five-membered ring, and a liquid crystal display section connected in series with either one of the source electrode and the drain electrode, and the gate voltage The liquid crystal display section is controlled by changing the . [Function] μ- having a complex five-membered ring of the FET element in this invention
Conjugated polymer membranes can be easily produced by electrolytic polymerization or chemical oxidative polymerization. Therefore, a homogeneous semiconductor layer (polymer film) can be easily manufactured, and a liquid crystal display device can easily be made larger in area. In addition, single-crystal Noricon uses inexpensive organic compounds. A liquid crystal display device can be made cheaper than when polycrystalline silicon or amorphous silicon is used. Furthermore, it is possible to provide excellent performance equivalent to or better than that using an amorphous silicon thin film. [Embodiment] FIG. 1 is a cross-sectional view of a liquid crystal display device according to an embodiment of the present invention, in which (1) is a substrate, (2) is a gate electrode provided on one side of the substrate (1), and ( 3) is an insulating film provided on the substrate (1) and gate electrode (2), (4) is a source electrode provided on the insulating film (3), and (5) is also provided on the insulating film (3). The drain electrode (6) is provided separately from the source electrode (4), and the insulating film (3) and the source electrode (
4) and the drain electrode (5), and is a semiconductor layer made of a π-conjugated polymer having a five-membered hetero ring that is in ohmic contact with the source electrode (4) and the drain electrode (5), respectively. (2) to 6) above are FETs in liquid crystal display devices.
This is the element part (■). In the figure, (7) is the electrode connected to the drain electrode (5) of the FET element (++), (8) is the liquid crystal display layer, and (9) is the electrode connected to the drain electrode (5) of the FET element (++).
) is a transparent electrode, and (10) is a glass plate with a polarizing plate. The electrode (7) and the electrode (9) are subjected to alignment treatment. This is the liquid crystal display section (+2) of the above (7) to C0) (Yo liquid crystal display device). Here, the following materials are used as the materials used in this invention. Glass is used as the substrate (1). Although generally used, a polymer film such as a polyester film can also be used.In the FET element part C11) of the liquid crystal display device, the gate electrode (2) can be made of gold, platinum, chromium, palladium, aluminum, etc. , gold E such as indium, tin oxide, indium oxide, indium/tin oxide (TO) 3
Although it is common to use these materials, two or more of these materials may be used in combination. Furthermore, p-type silicon, n-type silicon, or an organic polymer having conductivity may be used. When using these, the substrate (11) can be omitted. As the insulating film (3), silicon oxide (SiO2) is generally used, but silicon nitride or aluminum oxide may also be used. Insulating polymers such as polyvinylcarbubble, polyphenylene sulfide, and polyparaxylene may also be used.Of course, two or more of these materials may be used in combination.A complex five-membered material forming a semiconductor layer As a π-military service polymer having a ring, -i formula \・ and -〇C, H, one type of group, ・(, 1? number
Horn M4 and general formula only 1. ? 1 \ ,・' )・-Slim Ha/,・ (2) −′・ ′°″l′u, 8juR, 1, f・-1・-01゛・
The one shown as \ is used, and two or more of these can also be used together. π-conjugated polymer with a five-membered heterocyclic ring
【iそれ自身では
通常絶縁体からであるが、適当な電子受容体、例L i
f 過Pg X fi! 4オンやテトラフルオロボレ
ートイニイン、スルホン酸イオンなどをドーピングずろ
ことによ−)てp型半導体にすることができ、その主導
度も絶縁体領域から金に領域まで幅広く制御する・r、
とがテ、% 、:、 、、、”、 ノ実、jjft例I
C)、5 L)T U、Kjぶ五口環をFKするπ−共
役高分子に極(少量のドーピングをし−(”!3 ”j
’!半導体性を付与I、 l’、mものが好ましく用い
られる4゜
・ノー′ス雷極+41 !3よびF L・イン電極(5
)としては、半導体層を形成する複素五員環を有ずろπ
−共役系高分子((h)とオーム性接触することかでさ
る仕事関数の大きい金属が好−iしく、例えば金、白金
。
クロム、パラジウム等が一般的に用いられるが、勿論こ
れらに限られるもので(よない2.あるいは場合によ−
っては、錫酸化物、酸化インジウム、イシジウノ、・錫
酸化物(ITO)や導電性を有する有機系−1分子を用
いてもよい。、
上記キー共役系高分子の薄膜をゲ−1・電(規(2)。
絶縁膜(,3)、リース電へ(4)、ド1、・イノ電極
(5)(時[こは電極(7))により構成された中間部
材の4=に形成ずろ方法としC1,を電気化学的重合法
(電解重合法)または化?)ヲ的重合法(化学酸化重合
法)を川LNろ、。
例えば電解重合法“r上記複製元11環を有するπ−共
役系高分子膜をルニ成するに:よ、十記複素五1瑚を打
するπ−共役系高分子に相当するモノマーおよび支持電
解質を有機溶媒また(よ水に溶かし反応溶液とし、」二
足ソース電極(4)及びドレイ、l/電極(5)のうち
の少なくとも一方を作用電極とし、例えば白金などの対
極との間に電流を通して重合反応を起こさせて作用電極
近傍−トに所望の複製元lliを有ずろπ−共役高分子
を析出させ、析出しt:複素五員環を有するπ−共役系
高分子膜をよく洗浄した後、窒素雰囲気中で乾燥すると
いう方法を用いろ。この場合、析出(7た複製元は環を
aするπ−共役系高分子膜は反応時に支持電解質の)−
ニオンがドーピングされてp型有機半導体となり、また
ソース電極(4)およびドレイン電極(5)間の距離は
充分短いため、両電極間の絶縁膜も捏素五l即を有する
π−共役系高分子膜によって被覆され、両電極はp型有
機半導体膜によって電気的につながる。
またこのp型有機半導体膜は電解重合後にドーピング織
をコントロールしてFET素子に適した主導度に変化さ
せることができる。ここで、有機溶媒と(ッては、支持
電解質および上記モノマーを溶解させるものjiらよく
、例文ばアセト;−、トリル、ニトロベごノセン、ベン
ソニト’Jル、二l−シ+メ々1、N、N−ジダヂ4ホ
ルムアミド(1)MF)、ごメチルスノLホキ、/ド(
DMSO+ 3.:;ノクロロメケ2、テトラヒトL−
コ゛−ノラ〜・、エチルアル−1−ルJ)よびIチルア
ルコール等の極性溶媒が中伸又は2種以上の混合溶媒と
して好ましく用いられろ、3また、L記溶媒と水との混
合溶媒でも使用7iI能である。っ支持電解質としで1
よ、電解@金時にそh自身が酸化又は還元反応を受けず
、かつ溶媒中に溶解さぜることによ−って溶液に電導性
を付りすることのできる物質であり、例えば、過塩素酸
−テ・トラアルキルアンでニウムkL * ’7’ ト
ラア/1.キルアシモニウム工−)・ラフルIロボp、
、 ) 塩、テトラアルキルアンモニウム へキサフ
ルオロホス7エーr−1f=、t+・ラアルキルアンモ
ニウム バラ1−ルエノスル4、ネート塩、 J=Sよ
び水酸化すI・リウへ等が用いられるが、勿論2種Jス
上を併用しても構わない、3次に化学酸化重合法で」二
足複素五貝環を有するπ−共役系高分子膜を形成するに
は脱イオン水または有機溶媒との混合溶媒または有機溶
媒に開始剤として所定量の酸化剤を溶解させ、これを充
分脱酸素した溶液を準備した後にこの溶液中に上記複素
五員環を有するπ−共役系高分子に相当するモノマーを
所定量添加し、モノマーの重合を行う。このときあらか
じめゲート電極(2)、絶縁膜(3)、ソース電極(4
)、ドレイン電極(5)、および電極(7)を設けてお
いた基板(1)、すなわち中間部材をのうちFET素子
部分(川または時によっては全部をこの溶液中に少なく
とも5分以上浸し、複素五員環を有するπ−共役系高分
子の重合膜(6)をFET素子部分(11)上に形成さ
せる。この際、少量の酸化剤またはアニオンが複素五員
環を有するπ−共役系高分子膜(6)中にドーピングさ
れ、この後必要に応じ適当なドーピング剤または電気化
学的ドーピングによって所望の主導度を有するp型のπ
−共役系高分子膜とすることもできる。なお、上記溶液
中にモノマーを添加した後直ちに、あるいは同時に、上
記基板(1)をこの溶液中に浸してもよい。この方法は
、膜厚制御性や膜の均一性に優れ、かつ膜形成と同時に
FETに適した主導度が得られ易い。ここで開始剤とし
ては塩化第二鉄、フェリシアン化カリウム等が用いられ
るが、勿論これらに限るわけてはない。開始剤の酸化還
元電位がモノマーの重合開始電位より責であるすへての
酸化剤を用いることができろ。
液晶表示装置のうち、液晶表示部(12)においてFE
T素子のドレイン電極(5)と短絡した電極(7)は充
分な主導度を有し、液晶に不溶であるものならば何でモ
良< 、金−白金、クロム、アルミニウムなどの金属や
錫酸化物、酸化インジウム、イ′/レウム・錫酸化物(
ITO)などの透明電極、p型シリコノやn型シリコン
、あるいは導電比を有する有機系高分子を用いてもよい
。勿論これら材料を2つ以上組み合せて用いてもよい。
ガラス板α0)上の極(9)としては錫酸化物、酸化イ
ンジウム、インジウム・錫酸化物(ITO)などの透明
電極を用いるのが一般的である。また、適度の透明度を
有する導電性有機系高分子を用いてもよい。あるいはこ
れら材料を2つ以上あわせて用いてもよい。
ただし、これら電極(7)および電極(9)には、51
02の斜め蒸着またはラビング等の配向処理を施してお
く必要がある。液晶層(8)にはゲスト・ホスト型液晶
、TN型液晶またはスメクチックC相液晶等の液晶が用
いられるが、基板(1)におガラスを用い、電極(7)
に透明電極を用いる場合には、基板(1)に偏光板を取
り付ける事によりコントラスト比が上がる。偏光板付ガ
ラス板(10)の偏光板は偏光するものなら何でもよい
。
上記のように構成された液晶表示装置のFET素子(U
)においてその動作機構は不明な点が多いが、複素五員
環を有するπ−共役系高分子膜(6)と絶縁膜(3)の
界面において、複素五員環を有するπ−共役系高分子膜
(6)側に形成した空乏層の幅がゲート電極(2)とソ
ース電極(4)との間にかけた電圧で制御され、実効的
なホールのチャネル断面積が変化するためにソース電極
(4)とドレイン電極(5)の間を流れる電流が変化す
ると考えられる。このとき、複素五員環を有するπ−共
役系高分子膜(6)として主導度の低いp型半導体性し
か持たせていない場合には、ゲー)・電極(2)として
は金属電極以外にp型シリコンやn型シリコン、あるい
は導電性を有する有機系高分子等の主導度の大きい材料
を用いても、複素五員環を有すπ−共役系高分子膜(6
)中に充分大きな幅の空乏層が形成されて電解効果が現
れると考えられる。
この発明の液晶表示装置において、上記FET素子(1
1)と液晶表示部(I2)は直列に接続されている。
ソース電極(4)を基準として透明電博(9)に負電圧
を印加しておき、デーl−電極(2)に負電圧を印加す
ると液晶が点灯することになる。これは先述したように
FET素子のソース・ドレイン電極間の抵抗がデー1−
電極への負電圧印加により減少し、液晶表示部に電圧が
かかるためであると考えられる。
一方、ソース電極を基準として透明電極(9)に負電圧
を印加したままゲート電圧を切ると、液晶は点灯しなく
なる。これLt F E T素子のソース・ツレイン電
極間の抵抗が:1″≦Yす、電圧区かによって液晶表示
部に電圧がかからなくなるためであると考えられる。以
−Fのように、この発明の液晶表示装置は付、7iSさ
せ/ニア F E T素子のゲート電圧を変人ることに
より、液晶表示部の駆動を制御できろ。
なお、第1図では基板[1)」:にゲー)−電極(2)
か設けられているが、逆に、基板上に>a素置員環を有
するπ−共役系高分子膜を設け、その上にソース電極お
よびこのソース電極と分離してトレイン電極を設け、上
記ソース電極およびドL・イノ電極との間に絶縁膜を介
在させてデーl−電極を設けてもよい。
あるいはまた基板(1)」−にゲート電極(2)を設け
、絶縁膜を介在させて、その」二に複素冗員ζを有する
π−共役系高分子膜を設け、さらにその上にソース電極
およびこのソース電極と分離してドし・イノ電極を設け
てもよい。あるいはまた基板(1)上にソース電極およ
びこのソース電極と分離してトレイン電極を設け、この
上に複素五員環を有するπ−共役系高分子膜を設け、さ
らに絶縁膜を介在させてデー1−電極を設けてもよい。
さらにまた、上記実施例ではFET素子と液晶表示部を
同一基板上に作製したが、これらを別々の基板トに4′
[成しノニ後に接続して用いてもよい。
以下、この発明を実施例により具体的に説明するが、勿
論実施例にLりこの発明が制限されるもの−C(よない
。
実施例1
厚さ3(10μmのp9ノリコン(反(251ui X
40mm )を熱酸化して厚さ役3(100人の酸化
膜(S、0゜膜)を両面に形成させた。この表面上に第
1図におけるソース電極(4)、ドレイン電極(5)お
よび電極(7)となるべき金属電極(全被覆クロム電極
; クロム2(10人、金3(10人)を真空蒸着法に
よって設けた。ここでソース電極およびドレイン電極は
、いずれも有効面積2鴎×4はであり、6pff1幅で
分離されている。また、電極(7)は有効面積17mm
+ X 19+nm単位である。以下、この基板を液晶
表示装置基板と呼ぶ。
五酸化ニリンを加えて蒸留を2回行ったl七トニトリル
75m1に電解質として過塩素酸テトラエチルアンモニ
ウム0.55g、モノマートL42.2’ −ジチオフ
ェン0.27gを溶解させ、30分以上高純と空ぶガス
を通気して脱酸ふしt:。これに液晶表示装置基板のう
ち、FET素子部(第1図の(11)に相当する部分)
を?2 L、ソース73 極お1びドレイン電極を作用
極として、これに定電流電解法で、】OOμA/cm’
のア、ノード電流を8分間流した。この操作(こより、
アセ)・二トリルン容1α(こaシrニソース電極、ト
レイン電極りおよびソースドレイン間の絶縁膜1−にポ
リチオ7二ンの薄膜を形成させt:。この後、金電極の
電位を飽和カロメル電極に対し、−1−0,20Vに2
70分間設定し、ポリチオフェン膜の電気化学的説ドー
プを行い、ポリチオフェン膜の主導度をFET素子に適
したものにした。次にこの1改品表示装首基板をアセl
−二1−リル溶液から取出して、高純度のアセトニトリ
ルて2回1先浄した後、高純度窒素ガスを吹きつけ、更
にテン1フータに入れて真空乾燥を行った。以りの操作
により、液晶表示装置のうらFET宋子部子部分成した
。
次に液晶表示基板とこれと対向させるガラス板1−にS
、O□を↑1め蒸着し液晶の配向が起こるように配向処
理を施した3、そして液晶表示装置基板とこれと対向さ
せるガラス板との間に10μm厚のトリエステルフィル
ムを液晶表示部が開口部となるように一部分だけ残して
はさみ込み、その周辺を同しく一部分だけ残1.てエポ
キシ樹脂で封止した。
そして、この未封止部分からゲスト・ホスト液晶(Me
rck社製商品名ZLi1841)を注入してエポキシ
樹脂で封tkニー1.、ガラス電極上に偏向板をはり合
わせ、液晶表示装置のうち、液晶表示部を完成させた。
最後に、液晶表示装置基板の裏面のS、02の一部を(
tがし、ここに金を真空蒸着しく1. Oc+a X
1. Oc+n )、これに銀ベーストてリード線を取
り付けて、この発明の一実施例の液晶表示装置を完成さ
せt:9.これをtI1品表不表示装置試料)とした。
実施例2
厚さ1、Omのガラス基1i (25mm X 40M
)上に金属電極(金被覆クロム電極;クロム2(10
人、金3(10人)を真空蒸着法によって設け、これを
ゲート電極とした(rT効ゲート電極記積は2岨×5μ
m)。
さらに基板十およびデーl−電極上に酸化シリコン膜を
3.(100人の厚さにCVD法によって設け、これを
絶縁膜とした。さらにその上にチャネル長が5μmにな
るように金属電極(金被覆クロム電極;クロム2(10
人、金3(10人)をゲート電極をはさんで2ケ所に真
空蒸着法によって設け、これらをソース電極とドレイン
電極とした(有効面積はいずれも2 mm X 4 m
m )。さらにこのドレイン電極と短絡させて液晶表示
部となる金属電極(金被覆クロム電極;クロム2(10
人、金3(10人、有効面積は19mmX17mm)を
真空蒸着法によって設けた。
以下、このガラス基板を液晶表示装置と呼ぶ。
1(10 mjの純水中に塩化第二鉄(Fee13−6
H,0,2,7g)を溶解させた液に高純度窒素ガスを
30分間通気してから」二足のソース電極、ドレイン電
極、絶縁膜、ゲート電極および液晶表示部となる電極を
設けた液晶表示装置基板を浸した。そして高純度窒素ガ
スの通気を続けながら、この溶液に1 mlのN−メチ
ルピロールを加えた。N−メチルピロールを加えるとす
ぐに化学酸化重合反応が開始し、液晶表示装置基板上に
ボ’J(N−メチルピロール)膜が形成し始める。そし
て60分後に溶液中から液晶表示装置基板を取出し水お
よびエタノールで洗浄した後、これを3時間真空乾燥し
た。以上の操作により、液晶表示装置のうちFET素子
に相当する部分を完成させた。
次に実施例1で示したように液晶表示装置基板とこれと
対向させるガラス板上に310゜を斜め蒸着し液晶の配
向が起こるようにした。そして液晶表示装置基板とこれ
と対向させるガラス板との間に10μm厚のマイラフィ
ルムを液晶表示部が開口部となるように一部分だけ残し
てはさみ込み、その周辺を同じく一部分だけを残してエ
ポキシ樹脂で封止した。そしてこの未到正部分からTN
型液晶(Merck社製商品名ZL11565)にコレ
ステリルノナノエートを0.5重量%混合したものを注
入してエポキシ樹脂で封止した。そしてさらにガラス板
上に偏向板をはり合せて液晶表示部を完成させた。
これを液晶表示装置試料(Irlとした。
第2図は;1り晶表示装置試料(II)中のFET素子
のデーl−電圧(V)を変えた時のソース・ドレイン間
電流(μA)−ソース・ドレイン間電圧(V)特性を示
す特性図であり、横軸はソース・ドレイン間電圧(V)
、縦軸はソース・ドレイン間電流(μA)を示す。又、
液晶表示装置試料(I)の中のFET素子も第2図に示
したものと同様の特性を示した。
すなわち、FET素子のゲート電圧をOvにしている時
はソース電極とドレイン電極の間に電圧を印加しても、
小さなドレイン電流しか流れないが、ゲート電圧を負に
すればすれ程、大きなソース・ドレイン間電流が流れた
。このFET素子と液晶表示部は直列に接続しているた
め、液晶表示部のガラス板上の透明電極とFET素子の
ソース電極の間に液晶を駆動するのに充分な電圧を印加
しておき、ゲート電極に負電圧を印加すると液晶表示部
に電圧がかかり、液晶が配向し駆動したが、ゲート電圧
をOvにすると液晶表示部に電圧がかからず、液晶の駆
動は止まった。すなわち、液晶の駆動を付属させた複素
五員環を有するπ−共役系高分子膜を半導体層とするF
ET素子で制御することができた。また、安定性の面で
もこの発明の液晶表示装置は1力月以上経過しても安定
にり3作した。
なお、実施例1および2ではFET素子および液晶表示
部をそれぞれ1つだけ作製して液晶表示装置としたが、
同様の手法を用いて複数のFET素子および液晶表示部
を作製して液晶表示装置とする乙とが可能である。たt
!シ、その場合、実施例1においてはS1板にフォトレ
ジストによるバクー2作製とイオン注入法を組み合わせ
た方法などを用いて必要な部分にのみ適度の導電性を与
えて各装置間を電気的に分離する等の方法が考えられる
。また、FET素子部と液晶表示部を別の基板上に作製
した後に接続して1つの装置とすることも可能である。
なお、液晶表示装置の製造中におけろパターンは、写真
製版技術を用いた通宝の半導体製造技術により行える。
〔発明の効果〕
以上説明したとおり、この発明は、ソースTs 1%と
ドレイン電1重間の電流通路である半導体層の導電゛6
を、ゲート電極によって制御する電界薄部べI!1−ラ
ノジス!2の」二足半導体層が復製五員環を有すπ−共
役系高分子である電界効果ヤトランジスタを設けた駆動
部、並びに」二足ソース電極およびドじイシ電極の内の
いずれか一方と直列に接続しt:液晶表示部を備え、ト
記ゲー1−電圧を変化させることにより、L記液晶表示
部を1ν制御−?ろものを用いることにより、大面積化
を容易にすると共に、均質かつ優れた性能を有する液晶
表示装置を得ることができろ。[i itself usually from an insulator, but with a suitable electron acceptor, e.g.
f over Pg X fi! It can be made into a p-type semiconductor by doping with 4-on, tetrafluoroborate inine, sulfonate ion, etc., and its conductivity can be controlled over a wide range from the insulator region to the gold region.
Toga Te, %, :, ,,,”, Nomi, jjft Example I
C), 5 L) A small amount of doping is applied to the π-conjugated polymer that FKs the pentacyclic ring.
'! A 4° north lightning pole +41 which imparts semiconducting properties to I, l', and m is preferably used. 3 and F L/in electrode (5
) has a complex five-membered ring forming a semiconductor layer.
- Conjugated polymers (metals with a large work function due to ohmic contact with (h) are preferred, such as gold and platinum. Chromium, palladium, etc. are generally used, but of course they are not limited to these. (Yonai 2. Or as the case may be)
For this reason, tin oxide, indium oxide, indium oxide, tin oxide (ITO), or an organic molecule having conductivity may be used. , the thin film of the above key conjugated polymer is applied to the gate electrode (rule (2)). (7) The intermediate member constructed by 4 is formed by an electrochemical polymerization method (electrolytic polymerization method) or a chemical oxidation polymerization method (chemical oxidation polymerization method) by a method C1. . For example, in order to form a π-conjugated polymer film having 11 replicating rings using the electrolytic polymerization method, monomers and supporting electrolytes corresponding to π-conjugated polymers having 11 complex rings and supporting electrolytes are used. is dissolved in an organic solvent or water to form a reaction solution, at least one of the bipedal source electrode (4) and the drain electrode (5) is used as a working electrode, and a current is applied between it and a counter electrode such as platinum. to cause a polymerization reaction to precipitate a π-conjugated polymer having a desired replication source near the working electrode, and thoroughly wash the deposited π-conjugated polymer film having a five-membered heterocyclic ring. After that, use a method of drying in a nitrogen atmosphere.In this case, the precipitation (the π-conjugated polymer membrane in which the replication source is a ring is the supporting electrolyte during the reaction)-
It is doped with ions to become a p-type organic semiconductor, and since the distance between the source electrode (4) and drain electrode (5) is sufficiently short, the insulating film between the two electrodes is also a π-conjugated polymer having boron atoms. Covered by a molecular film, both electrodes are electrically connected by a p-type organic semiconductor film. Further, after electrolytic polymerization, the p-type organic semiconductor film can control the doping structure to change the conductivity to a value suitable for an FET element. Here, the organic solvent (i.e., a supporting electrolyte and a solvent capable of dissolving the monomers mentioned above), such as acetate, tolyl, nitrobegonocene, bensonitol, dichloromethane, etc. N, N-Didadi 4 formamide (1) MF)
DMSO+3. :; Nochloromeke 2, Tetrahuman L-
Polar solvents such as ethanol, ethyl alcohol, and ethyl alcohol are preferably used as a medium or as a mixed solvent of two or more of them. It is possible to use 7iI. Supporting electrolyte 1
Electrolysis is a substance that does not undergo oxidation or reduction reactions itself and can impart conductivity to a solution by dissolving it in a solvent. Chloric acid-tetraalkyluane kL * '7' tria/1. Killasimonium Engineering) Rahul I Robo p,
, ) salt, tetraalkylammonium hexafluorophos 7er r-1f=, t+・raalkylammonium rose 1-luenosul 4, nate salt, J=S and hydroxide I・Liu, etc. are used, but of course In order to form a π-conjugated polymer film having a bipedal complex five-shell ring by a tertiary chemical oxidation polymerization method, it is possible to use two types of J-S in combination with deionized water or an organic solvent. A predetermined amount of an oxidizing agent is dissolved as an initiator in a mixed solvent or an organic solvent, and a solution is sufficiently deoxidized, and then a monomer corresponding to the π-conjugated polymer having the above five-membered heterocyclic ring is added to the solution. A predetermined amount of is added to polymerize the monomer. At this time, the gate electrode (2), the insulating film (3), the source electrode (4)
), the drain electrode (5), and the substrate (1) on which the electrode (7) has been provided, that is, the intermediate member, is immersed in the FET element portion (or in some cases, the entire part) in this solution for at least 5 minutes, A polymer film (6) of a π-conjugated polymer having a five-membered hetero ring is formed on the FET element portion (11). At this time, a small amount of oxidizing agent or anion The p-type π is doped into the polymer film (6) and then has a desired conductivity by using a suitable doping agent or electrochemical doping if necessary.
- It can also be a conjugated polymer membrane. The substrate (1) may be immersed in the solution immediately or simultaneously after adding the monomer to the solution. This method has excellent film thickness controllability and film uniformity, and it is easy to obtain a conductivity suitable for an FET at the same time as film formation. Here, as the initiator, ferric chloride, potassium ferricyanide, etc. are used, but of course the initiator is not limited to these. Any oxidizing agent in which the redox potential of the initiator is greater than the polymerization initiation potential of the monomer may be used. FE in the liquid crystal display section (12) of the liquid crystal display device
The drain electrode (5) of the T element and the short-circuited electrode (7) can be made of any metal as long as it has sufficient conductivity and is insoluble in liquid crystal, or metals such as gold-platinum, chromium, aluminum, or tin oxide. metal, indium oxide, i'/rheum/tin oxide (
A transparent electrode such as ITO), p-type silicon or n-type silicon, or an organic polymer having a conductivity ratio may be used. Of course, two or more of these materials may be used in combination. As the electrode (9) on the glass plate α0), it is common to use a transparent electrode made of tin oxide, indium oxide, indium-tin oxide (ITO), or the like. Further, a conductive organic polymer having appropriate transparency may be used. Alternatively, two or more of these materials may be used in combination. However, these electrodes (7) and (9) have 51
It is necessary to perform orientation treatment such as oblique vapor deposition or rubbing of 02. A liquid crystal such as a guest-host type liquid crystal, a TN type liquid crystal, or a smectic C-phase liquid crystal is used for the liquid crystal layer (8), and the substrate (1) is made of glass and the electrodes (7)
When using transparent electrodes, the contrast ratio can be increased by attaching a polarizing plate to the substrate (1). The polarizing plate of the glass plate with polarizing plate (10) may be any type as long as it polarizes light. The FET element (U
), the operating mechanism is largely unknown, but at the interface between the π-conjugated polymer film (6) and the insulating film (3), The width of the depletion layer formed on the molecular film (6) side is controlled by the voltage applied between the gate electrode (2) and the source electrode (4), and the effective hole channel cross section changes. It is considered that the current flowing between (4) and the drain electrode (5) changes. At this time, if the π-conjugated polymer film (6) having a five-membered complex ring has only p-type semiconductivity with low conductivity, the electrode (2) may be other than a metal electrode. Even if materials with high conductivity such as p-type silicon, n-type silicon, or conductive organic polymers are used, it is difficult to obtain a π-conjugated polymer film with a five-membered heterocyclic ring (6
) is thought to form a depletion layer with a sufficiently large width to produce an electrolytic effect. In the liquid crystal display device of the present invention, the FET element (1
1) and the liquid crystal display section (I2) are connected in series. A negative voltage is applied to the transparent electrode (9) using the source electrode (4) as a reference, and when a negative voltage is applied to the data electrode (2), the liquid crystal is turned on. As mentioned earlier, this is because the resistance between the source and drain electrodes of the FET element is
This is thought to be due to the decrease due to the application of a negative voltage to the electrodes and the voltage applied to the liquid crystal display section. On the other hand, if the gate voltage is turned off while applying a negative voltage to the transparent electrode (9) with respect to the source electrode, the liquid crystal will not light up. It is thought that this is because the resistance between the source and drain electrodes of the LtFET element is: 1''≦Y, and no voltage is applied to the liquid crystal display depending on the voltage range. The liquid crystal display device of the invention is equipped with a 7iS/near FET element. By varying the gate voltage of the FET element, the driving of the liquid crystal display section can be controlled. In addition, in FIG. -electrode (2)
However, conversely, a π-conjugated polymer film having a >a-membered ring is provided on the substrate, and a source electrode and a train electrode separated from the source electrode are provided thereon. An insulating film may be interposed between the source electrode and the do-L-ino electrode to provide a de-L-electrode. Alternatively, a gate electrode (2) is provided on the substrate (1), an insulating film is interposed therebetween, a π-conjugated polymer film having complex redundancy ζ is provided on the substrate (1), and a source electrode and a A do/in electrode may be provided separately from this source electrode. Alternatively, a source electrode and a train electrode separated from the source electrode are provided on the substrate (1), a π-conjugated polymer film having a five-membered complex ring is provided on this, and an insulating film is interposed between the train electrode and the train electrode. 1- An electrode may be provided. Furthermore, in the above embodiment, the FET element and the liquid crystal display section were fabricated on the same substrate, but they were fabricated on separate substrates.
[You may also use it by connecting it after making it. Hereinafter, this invention will be explained in detail with reference to Examples, but of course, the invention is not limited to the Examples.
40 mm) was thermally oxidized to form an oxide film (S, 0° film) with a thickness of 3 (100 mm) on both sides.The source electrode (4) and drain electrode (5) in Fig. 1 were formed on this surface. And metal electrodes to become electrodes (7) (fully covered chromium electrodes; chromium 2 (10 people) and gold 3 (10 people) were provided by vacuum evaporation method. Here, both the source electrode and the drain electrode have an effective area of 2. The 4 seagulls are separated by 6pff1 width.Also, the electrode (7) has an effective area of 17mm.
+X 19+nm unit. Hereinafter, this substrate will be referred to as a liquid crystal display device substrate. Dissolve 0.55 g of tetraethylammonium perchlorate as an electrolyte and 0.27 g of monomer L42.2'-dithiophene in 75 ml of heptonitrile that has been distilled twice with the addition of niline pentoxide, and leave to maintain high purity for over 30 minutes. Deoxidize by venting gas:. This is the FET element part (the part corresponding to (11) in Figure 1) of the liquid crystal display device board.
of? 2 L, source 73 Using the electrode 1 and the drain electrode as working electrodes, a constant current electrolysis method is applied to the electrode, ]OOμA/cm'
Node current was applied for 8 minutes. This operation (from this
A thin film of polythiol is formed on the insulating film between the source electrode, the train electrode, and the source and drain. After this, the potential of the gold electrode is changed to a saturated calomel layer. 2 to -1-0,20V to the electrode
The polythiophene film was electrochemically doped for 70 minutes, and the conductivity of the polythiophene film was made suitable for an FET device. Next, assemble this 1 modified display neck board.
The sample was taken out from the -21-lyl solution, pre-cleaned twice with high-purity acetonitrile, and then blown with high-purity nitrogen gas, and then placed in a ten-footer and vacuum-dried. By the above operations, the back FET component part of the liquid crystal display device was completed. Next, the liquid crystal display board and the glass plate 1- facing it are
, O□ was vapor-deposited ↑1 and alignment treatment was performed to cause alignment of the liquid crystal.3, and a 10 μm thick triester film was placed between the liquid crystal display device substrate and the glass plate facing it, so that the liquid crystal display part had an opening. 1. Leave only a portion so that it forms a section, and sandwich it in, leaving only a portion of the area around it. and sealed with epoxy resin. Then, from this unsealed part, the guest/host liquid crystal (Me
Inject TK knee (product name: ZLi1841) manufactured by RCK Corporation and seal with epoxy resin.1. A polarizing plate was pasted onto the glass electrode to complete the liquid crystal display part of the liquid crystal display device. Finally, remove part of S and 02 on the back side of the liquid crystal display board (
1. Oc+a
1. Oc+n), a silver base and lead wires were attached to this to complete a liquid crystal display device according to an embodiment of the present invention.t:9. This was designated as tI1 product list non-display device sample). Example 2 Glass base 1i (25mm x 40M) with thickness 1, Om
) on a metal electrode (gold-coated chromium electrode; chromium 2 (10
Gold and gold 3 (10 people) were deposited by vacuum evaporation method and used as the gate electrode (rT effect gate electrode area is 2 m x 5 μm).
m). 3. Further, a silicon oxide film is formed on the substrate 1 and the electrode. (This was formed by the CVD method to a thickness of 100 mm and used as an insulating film.Furthermore, a metal electrode (gold coated chromium electrode; chromium 2 (10 mm)
Gold and gold 3 (10 people) were deposited at two locations across the gate electrode by vacuum evaporation, and these were used as the source and drain electrodes (the effective area for both was 2 mm x 4 m).
m). Furthermore, a metal electrode (gold coated chromium electrode; chromium 2 (10
Gold 3 (10 people, effective area 19 mm x 17 mm) was provided by vacuum evaporation. Hereinafter, this glass substrate will be referred to as a liquid crystal display device. 1 (10 mj of ferric chloride (Fee13-6) in pure water
High-purity nitrogen gas was bubbled through the solution for 30 minutes in which H, 0, 2, 7 g) was dissolved, and then two pairs of source electrodes, drain electrodes, insulating films, gate electrodes, and electrodes that would become the liquid crystal display section were installed. The liquid crystal display substrate was immersed. Then, 1 ml of N-methylpyrrole was added to this solution while continuing to supply high-purity nitrogen gas. As soon as N-methylpyrrole is added, a chemical oxidative polymerization reaction begins, and a Bo'J (N-methylpyrrole) film begins to form on the liquid crystal display substrate. After 60 minutes, the liquid crystal display device substrate was taken out of the solution, washed with water and ethanol, and then vacuum-dried for 3 hours. Through the above operations, a portion of the liquid crystal display device corresponding to the FET element was completed. Next, as shown in Example 1, a 310° diagonal vapor deposition was performed on the liquid crystal display substrate and the glass plate facing it so that alignment of the liquid crystal occurred. Then, a 10 μm thick Mylar film is sandwiched between the liquid crystal display device substrate and the glass plate facing it, leaving only a part of the film open so that the liquid crystal display part becomes an opening. It was sealed with. And from this unreached part TN
A mixture of 0.5% by weight of cholesteryl nonanoate was injected into a type liquid crystal (product name ZL11565 manufactured by Merck) and sealed with an epoxy resin. A polarizing plate was then attached to the glass plate to complete the liquid crystal display. This was designated as a liquid crystal display sample (Irl). Figure 2 shows the source-drain current (μA) when the voltage (V) of the FET element in the single crystal display sample (II) was changed. -A characteristic diagram showing source-drain voltage (V) characteristics, where the horizontal axis is the source-drain voltage (V)
, the vertical axis indicates the source-drain current (μA). or,
The FET element in the liquid crystal display sample (I) also exhibited characteristics similar to those shown in FIG. In other words, when the gate voltage of the FET element is set to Ov, even if a voltage is applied between the source electrode and the drain electrode,
Only a small drain current flows, but the more negative the gate voltage, the larger the source-drain current flows. Since this FET element and the liquid crystal display section are connected in series, a voltage sufficient to drive the liquid crystal is applied between the transparent electrode on the glass plate of the liquid crystal display section and the source electrode of the FET element. When a negative voltage was applied to the gate electrode, a voltage was applied to the liquid crystal display section, and the liquid crystal was aligned and driven. However, when the gate voltage was set to Ov, no voltage was applied to the liquid crystal display section, and the driving of the liquid crystal stopped. In other words, an F-type film whose semiconductor layer is a π-conjugated polymer film having a five-membered heterocyclic ring and which is attached to drive a liquid crystal.
It was possible to control it with an ET element. In addition, in terms of stability, the liquid crystal display device of the present invention remained stable even after one month or more, and three liquid crystal display devices were manufactured. In addition, in Examples 1 and 2, only one FET element and one liquid crystal display part were each produced to form a liquid crystal display device.
It is possible to use a similar method to fabricate a plurality of FET elements and a liquid crystal display section to form a liquid crystal display device. Tat
! In that case, in Embodiment 1, a method that combines photoresist Baku 2 fabrication and ion implantation is used on the S1 plate to provide appropriate conductivity only to the necessary portions and electrically connect each device. Possible methods include separation. Furthermore, it is also possible to fabricate the FET element section and the liquid crystal display section on separate substrates and then connect them to form a single device. Note that the patterning during manufacturing of the liquid crystal display device can be done by Tsuho's semiconductor manufacturing technology using photolithography technology. [Effects of the Invention] As explained above, the present invention improves the conductivity of the semiconductor layer, which is a current path between the source Ts 1% and the drain current.
, the electric field thin section controlled by the gate electrode I! 1-Ranojis! 2. A drive unit provided with a field effect transistor whose bipedal semiconductor layer is a π-conjugated polymer having a reproduced five-membered ring, and either a bipedal source electrode or a doji electrode. The liquid crystal display section L can be controlled by 1ν by changing the voltage of the gate 1. By using a liquid crystal display device, it is possible to easily increase the area and obtain a liquid crystal display device having homogeneous and excellent performance.
第1図はこの発明の一実施例の液晶表示装置の断面図、
第2図(まこの発明に係わるF F、 T素子の各り゛
−1−電圧におけろソース・ドレイン電極(μm)□ソ
ース・ドレイン電極(V)待ffE図、第3図は従来の
液晶表示装置の構成図、第4図は従来の液晶表示装置の
断面図である。
図において(2)はゲート電極、(3)は絶縁膜、(4
)はソース電極、(5)(よドレイン電極、(6)は半
導体層を形成する複素五員環を有するπ−共役系高分子
膜、(7)は1夜品表示部の主将i、(9)は対向透明
電極、(8)は液晶層である。
なお、各図中同一符号は同−叉は相当部分を・jξす。FIG. 1 is a sectional view of a liquid crystal display device according to an embodiment of the present invention.
Figure 2 (source/drain electrodes (μm) □ source/drain electrodes (V) ffE diagram for each of the FF and T elements according to the present invention at -1-voltage; Figure 3 shows the ffE diagram of the conventional Figure 4 is a cross-sectional view of a conventional liquid crystal display device. In the figure, (2) is a gate electrode, (3) is an insulating film, and (4) is a gate electrode.
) is the source electrode, (5) is the drain electrode, (6) is the π-conjugated polymer film having a five-membered complex ring forming the semiconductor layer, (7) is the main character i of the one-night product display section, ( 9) is a counter transparent electrode, and (8) is a liquid crystal layer. In each figure, the same reference numerals represent the same or corresponding parts.
Claims (10)
導体層の導電率を、ゲート電極によって制御する電界効
果型トランジスタの上記半導体層が複素五員環を有する
π−共役系高分子である電界効果型トランジスタを設け
た駆動部、並びに上記ソース電極およびドレイン電極の
内のいずれか一方と直列に接続した液晶表示部を備え、
上記ゲート電圧を変化させることにより、上記液晶表示
部を制御する液晶表示装置。(1) An electric field in which the semiconductor layer of a field effect transistor is a π-conjugated polymer having a complex five-membered ring, in which the conductivity of the semiconductor layer, which is a current path between the source electrode and the drain electrode, is controlled by the gate electrode. comprising a driving section provided with an effect type transistor, and a liquid crystal display section connected in series with either one of the source electrode and the drain electrode,
A liquid crystal display device that controls the liquid crystal display section by changing the gate voltage.
びR_2は−H,−CH_3,−OCH_3,−C_2
H_5および−OC_2H_5基の内の一種、nは整数
である。) で示されるものである特許請求の範囲第1項記載の液晶
表示装置。(2) A π-conjugated polymer having a five-membered heterocyclic ring has a general formula ▲ Numerical formula, chemical formula, table, etc. ▼ (However, X is one of S and O atoms, R_1 and R_2 are -H, -CH_3, -OCH_3, -C_2
One of the groups H_5 and -OC_2H_5, n is an integer. ) The liquid crystal display device according to claim 1, which is represented by:
フェンおよびポリ(3−メチルチオフェン)の内の一種
である特許請求の範囲第2項記載の液晶表示装置。(3) The liquid crystal display device according to claim 2, wherein the π-conjugated polymer having a five-membered hetero ring is one of polythiophene and poly(3-methylthiophene).
CH_3,−C_2H_5,および−OC_2H_5基
の内の一種、R_3は−CH_3,−C_2H_5,C
_3H_7,▲数式、化学式、表等があります▼および
▲数式、化学式、表等があります▼−NO_2の内の一
種、nは整数である。) で示されるものである特許請求の範囲第1項記載の液晶
表示装置。(4) A π-conjugated polymer having a five-membered heterocyclic ring has a general formula ▲ Numerical formula, chemical formula, table, etc. ▼ (However, R_1 and R_2 are -H, -CH_3, O
One of the groups CH_3, -C_2H_5, and -OC_2H_5, R_3 is -CH_3, -C_2H_5, C
_3H_7, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ and ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ - One of NO_2, n is an integer. ) The liquid crystal display device according to claim 1, which is represented by:
いずれか一つにより組成された電界効果型トランジスタ
を用いた特許請求の範囲第1項ないし第4項の何れかに
記載の液晶表示装置。(5) A liquid crystal display device according to any one of claims 1 to 4, using a field effect transistor whose gate electrode is composed of either p-type silicon or n-type silicon.
上に設けたことを特徴とする特許請求の範囲第1項ない
し第5項の何れかに記載の液晶表示装置。(6) A liquid crystal display device according to any one of claims 1 to 5, characterized in that a field effect transistor and a liquid crystal display section are provided on the same substrate.
板上に設けた特許請求の範囲第1項ないし第5項の何れ
かに記載の液晶表示装置。(7) A liquid crystal display device according to any one of claims 1 to 5, wherein the field effect transistor and the liquid crystal display section are provided on different substrates.
請求の範囲第1項ないし第7項何れかに記載の液晶表示
装置。(8) A liquid crystal display device according to any one of claims 1 to 7, characterized in that a nematic phase liquid crystal is used.
許請求の範囲第1項ないし第7項何れかに記載の液晶表
示装置。(9) A liquid crystal display device according to any one of claims 1 to 7, characterized in that a smectic phase liquid crystal is used.
求の範囲第1項ないし第7項の何れかに記載の液晶表示
装置。(10) A liquid crystal display device according to any one of claims 1 to 7, which uses a guest-host type liquid crystal display element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60226506A JPH0711631B2 (en) | 1985-10-09 | 1985-10-09 | Liquid crystal display manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60226506A JPH0711631B2 (en) | 1985-10-09 | 1985-10-09 | Liquid crystal display manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6285224A true JPS6285224A (en) | 1987-04-18 |
| JPH0711631B2 JPH0711631B2 (en) | 1995-02-08 |
Family
ID=16846186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60226506A Expired - Lifetime JPH0711631B2 (en) | 1985-10-09 | 1985-10-09 | Liquid crystal display manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0711631B2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5705826A (en) * | 1994-06-28 | 1998-01-06 | Hitachi, Ltd. | Field-effect transistor having a semiconductor layer made of an organic compound |
| JP2003508797A (en) * | 1999-08-24 | 2003-03-04 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Display device |
| JP2003177682A (en) * | 2001-09-05 | 2003-06-27 | Konica Corp | Display panel and manufacturing method thereof |
| US6593591B2 (en) | 1996-05-15 | 2003-07-15 | Seiko Epson Corporation | Thin film device provided with coating film, liquid crystal panel and electronic device, and method the thin film device |
| US6821553B2 (en) | 1996-11-25 | 2004-11-23 | Seiko Epson Corporation | Method of manufacturing organic EL element, organic EL element, and organic EL display device |
| US6843937B1 (en) | 1997-07-16 | 2005-01-18 | Seiko Epson Corporation | Composition for an organic EL element and method of manufacturing the organic EL element |
| US6936190B2 (en) | 2001-10-15 | 2005-08-30 | Fujitsu Limited | Electrically conductive organic compound and electronic device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58114465A (en) * | 1981-12-26 | 1983-07-07 | Nippon Telegr & Teleph Corp <Ntt> | High molecular semiconductor field effect transistor and manufacture thereof |
-
1985
- 1985-10-09 JP JP60226506A patent/JPH0711631B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58114465A (en) * | 1981-12-26 | 1983-07-07 | Nippon Telegr & Teleph Corp <Ntt> | High molecular semiconductor field effect transistor and manufacture thereof |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5705826A (en) * | 1994-06-28 | 1998-01-06 | Hitachi, Ltd. | Field-effect transistor having a semiconductor layer made of an organic compound |
| US7229859B2 (en) | 1996-05-15 | 2007-06-12 | Seiko Epson Corporation | Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device |
| US7067337B2 (en) | 1996-05-15 | 2006-06-27 | Seiko Epson Corporation | Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device |
| US6593591B2 (en) | 1996-05-15 | 2003-07-15 | Seiko Epson Corporation | Thin film device provided with coating film, liquid crystal panel and electronic device, and method the thin film device |
| US6838192B2 (en) | 1996-11-25 | 2005-01-04 | Seiko Epson Corporation | Method of manufacturing organic EL element, organic EL element, and organic EL display device |
| US6833156B2 (en) | 1996-11-25 | 2004-12-21 | Seiko Epson Corporation | Method of manufacturing organic EL element, organic EL element, and organic EL display device |
| US6821553B2 (en) | 1996-11-25 | 2004-11-23 | Seiko Epson Corporation | Method of manufacturing organic EL element, organic EL element, and organic EL display device |
| US6863961B2 (en) | 1996-11-25 | 2005-03-08 | Seiko Epson Corporation | Method of manufacturing organic EL element, organic EL element, and organic EL display device |
| US7662425B2 (en) | 1996-11-25 | 2010-02-16 | Seiko Epson Corporation | Method of manufacturing organic EL element, organic EL element and organic EL display device |
| US8614545B2 (en) | 1996-11-25 | 2013-12-24 | Seiko Epson Corporation | Organic EL display device having a bank formed to fill spaces between pixel electrodes |
| US6843937B1 (en) | 1997-07-16 | 2005-01-18 | Seiko Epson Corporation | Composition for an organic EL element and method of manufacturing the organic EL element |
| JP2003508797A (en) * | 1999-08-24 | 2003-03-04 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Display device |
| JP2003177682A (en) * | 2001-09-05 | 2003-06-27 | Konica Corp | Display panel and manufacturing method thereof |
| US6936190B2 (en) | 2001-10-15 | 2005-08-30 | Fujitsu Limited | Electrically conductive organic compound and electronic device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0711631B2 (en) | 1995-02-08 |
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