JPS6286734A - Method for chip mounting - Google Patents

Method for chip mounting

Info

Publication number
JPS6286734A
JPS6286734A JP60226259A JP22625985A JPS6286734A JP S6286734 A JPS6286734 A JP S6286734A JP 60226259 A JP60226259 A JP 60226259A JP 22625985 A JP22625985 A JP 22625985A JP S6286734 A JPS6286734 A JP S6286734A
Authority
JP
Japan
Prior art keywords
pedestal
bonded
silicon
diaphragm
thermal expansion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60226259A
Other languages
Japanese (ja)
Inventor
Toshisuke Hishii
菱井 利祐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP60226259A priority Critical patent/JPS6286734A/en
Publication of JPS6286734A publication Critical patent/JPS6286734A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms

Landscapes

  • Die Bonding (AREA)

Abstract

PURPOSE:To reduce the temperature dependence of the offset in a silicon diaphragm type pressure sensor by bonding the structure to a semiconductor element in a point contact manner. CONSTITUTION:A diaphragm 2 is formed on a first main surface of a silicon chip 1 by recessing part of the first main surface and an electronic circuit is integrated on a second main surface. A pedestal 3 consists of pyrex having a roughly equal thermal expansion coefficient to that of silicon and the pedestal 3 and the silicon chip 1 are bonded by an electrostatic bonding method in a vacuum. The bonding of the pedestal 3 and a structure 7 is bonded by a method wherein an epoxy silver paste with a fine area is applied on the pedestal by a screen printing method and so on and the pedestal is bonded on the structure 7 in a point contact manner. As the bonded part of the pedestal 3 and the structure 7 is bonded in a point contact manner in such a manner, the contact area becomes smaller and the effect of thermal expansion of the structure 7 becomes harder to conduct to the pedestal 3. Accordingly, the effect of thermal expansion of the structure 7, which exerts on the diaphragm 2 formed on the silicon chip 1, can be reduced.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はシリコンダイアフラム型圧力センサのチップマ
ウント方法に関し、特に絶対圧を測定対象とするシリコ
ンダイアフラム型圧力センサのチップマウント方法に関
する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for mounting a chip on a silicon diaphragm pressure sensor, and more particularly to a method for mounting a chip on a silicon diaphragm pressure sensor that measures absolute pressure.

〔従来の技術〕[Conventional technology]

近年半導体技術を背景にしてシリコンダイアフラム型圧
力センナが脚光を浴びるようになってきた。このセンサ
はシリコンを単に電気要素の母材としてのみならず、剛
性の高い機械要素としても用いている点に特徴がある。
In recent years, silicon diaphragm pressure sensors have come into the spotlight due to semiconductor technology. This sensor is unique in that silicon is used not only as a base material for electrical elements, but also as a highly rigid mechanical element.

シリコンダイアフラム型圧力センサはシリコンウェーハ
内に多数配列された単位セルの第一の主面の一部に異方
性エツチング、機械加工等によシ凹みをつけて第二の主
面には感圧素子となるr−ジ抵抗1等の電子回路を集積
化し、しかる後に単位セル毎に分割して、この単位セル
をグイとすることによって製造される。このダイは前記
圧力センサのパッケージとなる構造体に接着され、所望
の電気配線を施こすことにより前記圧力センサが実現さ
れる。ダイの接着に際しては、前記構造体とダイの材料
であるシリコンとの熱膨張係数の差に起因する熱歪効果
を防ぐために、前記構造体とグイとの中間に台座を介在
させることが知られている。台座としては例えばシリコ
ンウェーノ・と熱膨張係数が近似したパイレックスガラ
スが利用される。
A silicon diaphragm pressure sensor has a large number of unit cells arranged in a silicon wafer, and a part of the first main surface is indented by anisotropic etching, machining, etc., and the second main surface is pressure-sensitive. It is manufactured by integrating electronic circuits such as the r-di resistor 1, which becomes the element, and then dividing it into unit cells, and making the unit cells into pieces. This die is adhered to a structure that becomes a package for the pressure sensor, and the pressure sensor is realized by applying desired electrical wiring. When bonding the die, it is known that a pedestal is interposed between the structure and the goo in order to prevent thermal strain effects caused by the difference in thermal expansion coefficient between the structure and silicon, which is the material of the die. ing. As the pedestal, for example, Pyrex glass, which has a coefficient of thermal expansion similar to that of silicon wafer, is used.

絶対圧用のシリコンダイアフラム型圧力センサの場合、
このガラスとグイとの接着は真空中において静電接着す
ることによってなされ、シリコンダイアスラム部に真窒
圧が封入される。
For absolute pressure silicon diaphragm pressure sensors,
The glass and the goo are bonded together by electrostatic bonding in a vacuum, and true nitrogen pressure is sealed in the silicon diaphragm portion.

静電接着は、ガラスとシリコンと全密着させ高温高電界
の雰囲気で結合させる技術で、メイ分離以前の工程中で
、ウェーハ単位で接着できるためコスト低減に特に有効
である。
Electrostatic adhesion is a technology in which glass and silicon are completely bonded and bonded in an atmosphere of high temperature and high electric field, and is particularly effective in reducing costs because it can be bonded wafer by wafer during the process before separation.

前記構造体と前記ガラスとの接着は前記ガラスの全面に
スクリーン印刷法等によジェポキシ系接着剤を塗布する
ことによシなされていた。
The structure and the glass are bonded together by applying a jepoxy adhesive to the entire surface of the glass by screen printing or the like.

以下図面を用いて従来技術全説明する。The prior art will be fully explained below with reference to the drawings.

第2図は、従来法によシチップマウントされたシリコン
ダイアフラム型圧力センサの構造を示す断面図でおる。
FIG. 2 is a sectional view showing the structure of a silicon diaphragm type pressure sensor mounted on a chip by a conventional method.

第2図においてシリコンチップ11は第一の主面(台座
と対峙する面)の一部を凹ませダイアフラム12ヲ形成
し第2の主面に電子回路が集積化されている。台座13
はシリコンと熱膨張係数がほぼ等しい・母イレックスガ
ラスからなシ、台座13とシリコンチップ11は静電接
着によって接着されている。この台座13の全面にスク
リーン印刷法によジェポキシ系銀ペースト15全印刷し
構造体17に接着し、さらに、シリコンチップ11とス
テム18との間にワイアボ/7′イング20t−施し、
構造一 体17キヤツプ19にて封止することによシ完成される
。
In FIG. 2, a silicon chip 11 has a first main surface (the surface facing the pedestal) partially recessed to form a diaphragm 12, and an electronic circuit is integrated on the second main surface. Pedestal 13
The pedestal 13 and the silicon chip 11 are bonded to each other by electrostatic adhesion. Gepoxy silver paste 15 is entirely printed on the entire surface of this pedestal 13 by a screen printing method and adhered to the structure 17, and further, 20 tons of wireboring/7' ing is applied between the silicon chip 11 and the stem 18.
The structural unit 17 is completed by sealing with a cap 19.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながらこのようにして得られたシリコンダイアフ
ラム型圧力センサにおいては、台座13の全面が構造体
17と、接着しているため、構造体17の熱膨張が直接
的に台座13に伝わシ、シリコンチップ11に対する構
造体17の熱膨張の影響を完全に遮断できず温度の変化
によってシリコンチップ11のダイアフラム12に歪を
生じ、オフセットが温度によって変化する原因となって
いた。
However, in the silicon diaphragm pressure sensor obtained in this way, the entire surface of the pedestal 13 is bonded to the structure 17, so the thermal expansion of the structure 17 is directly transmitted to the pedestal 13. The influence of thermal expansion of the structure 17 on the silicon chip 11 could not be completely blocked, causing distortion in the diaphragm 12 of the silicon chip 11 due to temperature changes, causing the offset to change depending on the temperature.

本発明の目的はオフセットの温度依存性の少ないシリコ
ンダイアフラム型圧力センサを提供することにある。
An object of the present invention is to provide a silicon diaphragm type pressure sensor whose offset is less dependent on temperature.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は半導体素子を構造体にマウントする方法におい
て、構造体を半導体素子に点接触的に接着することを特
徴とするチップマウント方法である。
The present invention is a method for mounting a semiconductor element on a structure, which is characterized in that the structure is bonded to the semiconductor element in a point-contact manner.

〔作用〕[Effect]

本発明によれば、半導体素子は台座に接着して構造体内
にセットされるが台座と構造体との接着部分の面積が小
さくなシ、構造体の熱膨張の影響が台座に伝わシにくく
なシ、従って、温度の変化によるオフセットの変化が低
減する。
According to the present invention, the semiconductor element is set in the structure by adhering it to the pedestal, but since the area of the bonded part between the pedestal and the structure is small, the influence of thermal expansion of the structure is not easily transmitted to the pedestal. Therefore, changes in offset due to changes in temperature are reduced.

〔実施例〕〔Example〕

次に本発明の実施例について図面を参照して説明する。 Next, embodiments of the present invention will be described with reference to the drawings.

第1図は、本発明の方法によシチップマウントされたシ
リコンダイアフラムを圧力センサの構造を示す断面図で
ある。第1図において、シリコンチップ1は第1の主面
(台座と対峙する面)の一部を凹ませてダイアフラム2
を形成し、第2の主面に電子回路が集積化されている。
FIG. 1 is a sectional view showing the structure of a pressure sensor using a silicon diaphragm chip-mounted by the method of the present invention. In FIG. 1, a silicon chip 1 has a diaphragm 2 formed by recessing a part of its first main surface (the surface facing the pedestal).
is formed, and an electronic circuit is integrated on the second main surface.

台座3はシリコンと熱膨張係数がほぼ等しいパイレック
スガラスからなシ、台座3とシリコンチップ1とは真空
中において静電接着法によって接着されている。
The pedestal 3 is made of Pyrex glass, which has a coefficient of thermal expansion approximately equal to that of silicon, and the pedestal 3 and the silicon chip 1 are bonded together in a vacuum by electrostatic adhesion.

以上は従来法によるものと全く同じである。本発明は、
台座3と構造体7との接着は、スフ1フーン印刷法等に
より、微小面積のエポキシ系鋼ペース)1台座3に塗布
し−、構造体7に点接触的に接着することによシ装着し
たものである。
The above is exactly the same as the conventional method. The present invention
The pedestal 3 and the structure 7 are bonded together by applying a small area of epoxy steel paste (1) to the pedestal 3 using a printing method or the like, and adhering it to the structure 7 in a point contact manner. This is what I did.

さらに従来同様にシリコンテップ1とステム8との間に
ワイアざ/ディング10ヲ施し、構造体7をキャップ9
にて封止することによシ完成する。
Further, as in the conventional case, a wire zapping 10 is applied between the silicon tip 1 and the stem 8, and the structure 7 is connected to the cap 9.
It is completed by sealing with.

本発明の方法によれば台座3と構造体7との接着部分が
点接触的のため、接触面積が小さくなシ、構造体7の熱
膨張の影響が台座3に伝りにくくなシ従ってシリコンチ
ップ1に形成されたダイアフラム2に及ぼす、構造体7
の熱膨張の影響が低減する。
According to the method of the present invention, since the adhesive portion between the pedestal 3 and the structure 7 is in point contact, the contact area is small and the influence of thermal expansion of the structure 7 is not easily transmitted to the pedestal 3. Structure 7 that acts on the diaphragm 2 formed on the chip 1
The effect of thermal expansion is reduced.

〔発明の効果〕 以上説明したように本発明の方法によればオフセットの
温度依存性の少ないシリコンダイアフラム型圧力センサ
を提供できる効果を有するものである。
[Effects of the Invention] As explained above, the method of the present invention has the effect of providing a silicon diaphragm type pressure sensor with less temperature dependence of offset.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の実施例を示すシリコンダイアフラム
型圧力センサの断面図、第2図は従来の方法によシチッ
プマウントされたシリコンダイアフラム型圧力センサの
断面図である。 1・・・シリコンチップ、2・・・ダイアフラム、3・
・・台座、5・・・エポキシ系銀ペースト、7・・・構
造体。 8・・・ステム、9・・・キャン7’、  10・・・
ボンディングワイア。
FIG. 1 is a sectional view of a silicon diaphragm type pressure sensor showing an embodiment of the present invention, and FIG. 2 is a sectional view of a silicon diaphragm type pressure sensor chip-mounted by a conventional method. 1... Silicon chip, 2... Diaphragm, 3.
... Pedestal, 5... Epoxy silver paste, 7... Structure. 8...Stem, 9...Can 7', 10...
bonding wire.

Claims (1)

【特許請求の範囲】[Claims] (1)半導体素子を構造体にマウントする方法において
、構造体に半導体素子を点接触的に接着することを特徴
とするチップマウント方法。
(1) A chip mounting method for mounting a semiconductor element on a structure, the method comprising bonding the semiconductor element to the structure in a point-contact manner.
JP60226259A 1985-10-11 1985-10-11 Method for chip mounting Pending JPS6286734A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60226259A JPS6286734A (en) 1985-10-11 1985-10-11 Method for chip mounting

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60226259A JPS6286734A (en) 1985-10-11 1985-10-11 Method for chip mounting

Publications (1)

Publication Number Publication Date
JPS6286734A true JPS6286734A (en) 1987-04-21

Family

ID=16842394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60226259A Pending JPS6286734A (en) 1985-10-11 1985-10-11 Method for chip mounting

Country Status (1)

Country Link
JP (1) JPS6286734A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5137762A (en) * 1989-09-18 1992-08-11 Toyo Seikan Kaisha, Ltd. Laminated metal plate for drawn can, and drawn can prepared therefrom

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5137762A (en) * 1989-09-18 1992-08-11 Toyo Seikan Kaisha, Ltd. Laminated metal plate for drawn can, and drawn can prepared therefrom

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